JP2004080025A - 冷却装置及び方法、当該冷却装置を有する露光装置 - Google Patents

冷却装置及び方法、当該冷却装置を有する露光装置 Download PDF

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Publication number
JP2004080025A
JP2004080025A JP2003284379A JP2003284379A JP2004080025A JP 2004080025 A JP2004080025 A JP 2004080025A JP 2003284379 A JP2003284379 A JP 2003284379A JP 2003284379 A JP2003284379 A JP 2003284379A JP 2004080025 A JP2004080025 A JP 2004080025A
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Prior art keywords
optical member
radiation
temperature
cooling
cooling device
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Pending
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JP2003284379A
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English (en)
Japanese (ja)
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JP2004080025A5 (enExample
Inventor
Shinichi Hara
原　真一
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Canon Inc
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Canon Inc
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Priority to JP2003284379A priority Critical patent/JP2004080025A/ja
Publication of JP2004080025A publication Critical patent/JP2004080025A/ja
Publication of JP2004080025A5 publication Critical patent/JP2004080025A5/ja
Pending legal-status Critical Current

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    • Y02B30/66—

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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2003284379A 2002-07-31 2003-07-31 冷却装置及び方法、当該冷却装置を有する露光装置 Pending JP2004080025A (ja)

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JP2003284379A JP2004080025A (ja) 2002-07-31 2003-07-31 冷却装置及び方法、当該冷却装置を有する露光装置

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JP2002222911 2002-07-31
JP2003284379A JP2004080025A (ja) 2002-07-31 2003-07-31 冷却装置及び方法、当該冷却装置を有する露光装置

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JP2004080025A true JP2004080025A (ja) 2004-03-11
JP2004080025A5 JP2004080025A5 (enExample) 2006-09-07

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Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7116399B2 (en) 2003-05-13 2006-10-03 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
US7295284B2 (en) 2004-02-27 2007-11-13 Canon Kk Optical system, exposure apparatus using the same and device manufacturing method
US7315347B2 (en) 2003-12-12 2008-01-01 Canon Kabushiki Kaisha Exposure apparatus and device manufacturing method
US7360366B2 (en) 2004-09-03 2008-04-22 Canon Kabushiki Kaisha Cooling apparatus, exposure apparatus, and device fabrication method
JPWO2007122856A1 (ja) * 2006-04-24 2009-09-03 株式会社ニコン 光学素子冷却装置および露光装置
JP2010245541A (ja) * 2009-04-09 2010-10-28 Carl Zeiss Smt Ag 光線束を案内するためのミラー
JP2012124520A (ja) * 2005-01-26 2012-06-28 Carl Zeiss Smt Gmbh 光学アセンブリ
KR101411251B1 (ko) * 2009-09-30 2014-06-24 칼 짜이스 에스엠티 게엠베하 광학 시스템, 특히 마이크로리소그래피 투영 노광 장치의 광학 장치
JP2014179624A (ja) * 2007-10-09 2014-09-25 Carl Zeiss Smt Gmbh 光学素子の温度制御装置
WO2016091486A1 (en) * 2014-12-12 2016-06-16 Asml Netherlands B.V. Reflector
JP2021515907A (ja) * 2018-03-06 2021-06-24 エーエスエムエル ネザーランズ ビー．ブイ． 放射遮蔽デバイス及びそのような遮蔽デバイスを備えた装置

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7116399B2 (en) 2003-05-13 2006-10-03 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
US7315347B2 (en) 2003-12-12 2008-01-01 Canon Kabushiki Kaisha Exposure apparatus and device manufacturing method
US7295284B2 (en) 2004-02-27 2007-11-13 Canon Kk Optical system, exposure apparatus using the same and device manufacturing method
US7360366B2 (en) 2004-09-03 2008-04-22 Canon Kabushiki Kaisha Cooling apparatus, exposure apparatus, and device fabrication method
JP2012124520A (ja) * 2005-01-26 2012-06-28 Carl Zeiss Smt Gmbh 光学アセンブリ
JPWO2007122856A1 (ja) * 2006-04-24 2009-09-03 株式会社ニコン 光学素子冷却装置および露光装置
JP2017021350A (ja) * 2007-10-09 2017-01-26 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学素子の温度制御装置
JP2014179624A (ja) * 2007-10-09 2014-09-25 Carl Zeiss Smt Gmbh 光学素子の温度制御装置
US8717531B2 (en) 2009-04-09 2014-05-06 Carl Zeiss Smt Gmbh Mirror for guiding a radiation bundle
JP2010245541A (ja) * 2009-04-09 2010-10-28 Carl Zeiss Smt Ag 光線束を案内するためのミラー
KR101411251B1 (ko) * 2009-09-30 2014-06-24 칼 짜이스 에스엠티 게엠베하 광학 시스템, 특히 마이크로리소그래피 투영 노광 장치의 광학 장치
US9134504B2 (en) 2009-09-30 2015-09-15 Carl Zeiss Smt Gmbh Optical arrangement in an optical system, in particular in a microlithographic projection exposure apparatus
US9639007B2 (en) 2009-09-30 2017-05-02 Carl Zeiss Smt Gmbh Optical arrangement in an optical system, in particular in a microlithographic projection exposure apparatus
WO2016091486A1 (en) * 2014-12-12 2016-06-16 Asml Netherlands B.V. Reflector
US10216101B2 (en) 2014-12-12 2019-02-26 Asml Netherlands B.V. Reflector
JP2021515907A (ja) * 2018-03-06 2021-06-24 エーエスエムエル ネザーランズ ビー．ブイ． 放射遮蔽デバイス及びそのような遮蔽デバイスを備えた装置
JP7402808B2 (ja) 2018-03-06 2023-12-21 エーエスエムエル ネザーランズ ビー．ブイ． 放射遮蔽デバイス及びそのような遮蔽デバイスを備えた装置

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