JP2004039696A5 - - Google Patents

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Publication number
JP2004039696A5
JP2004039696A5 JP2002191282A JP2002191282A JP2004039696A5 JP 2004039696 A5 JP2004039696 A5 JP 2004039696A5 JP 2002191282 A JP2002191282 A JP 2002191282A JP 2002191282 A JP2002191282 A JP 2002191282A JP 2004039696 A5 JP2004039696 A5 JP 2004039696A5
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JP
Japan
Prior art keywords
mirror
temperature
reflection
mirror device
radiation plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
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JP2002191282A
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English (en)
Japanese (ja)
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JP2004039696A (ja
JP3944008B2 (ja
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Publication date
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Priority claimed from JP2002191282A external-priority patent/JP3944008B2/ja
Priority to JP2002191282A priority Critical patent/JP3944008B2/ja
Priority to CNB038023571A priority patent/CN100377303C/zh
Priority to EP03761769A priority patent/EP1518262A4/en
Priority to PCT/JP2003/007796 priority patent/WO2004003982A1/en
Priority to KR1020047021039A priority patent/KR100572098B1/ko
Priority to TW092116860A priority patent/TW594436B/zh
Priority to US10/647,376 priority patent/US7349063B2/en
Publication of JP2004039696A publication Critical patent/JP2004039696A/ja
Publication of JP2004039696A5 publication Critical patent/JP2004039696A5/ja
Publication of JP3944008B2 publication Critical patent/JP3944008B2/ja
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2002191282A 2002-06-28 2002-06-28 反射ミラー装置及び露光装置及びデバイス製造方法 Expired - Fee Related JP3944008B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2002191282A JP3944008B2 (ja) 2002-06-28 2002-06-28 反射ミラー装置及び露光装置及びデバイス製造方法
KR1020047021039A KR100572098B1 (ko) 2002-06-28 2003-06-19 반사미러장치, 노광장치 및 디바이스제조방법
EP03761769A EP1518262A4 (en) 2002-06-28 2003-06-19 REFLECTIVE MIRROR APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
PCT/JP2003/007796 WO2004003982A1 (en) 2002-06-28 2003-06-19 Reflection mirror apparatus, exposure apparatus and device manufacturing method
CNB038023571A CN100377303C (zh) 2002-06-28 2003-06-19 反射镜设备、曝光设备以及器件制造方法
TW092116860A TW594436B (en) 2002-06-28 2003-06-20 Reflection mirror apparatus, exposure apparatus and device manufacturing method
US10/647,376 US7349063B2 (en) 2002-06-28 2003-08-26 Reflection mirror apparatus, exposure apparatus and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002191282A JP3944008B2 (ja) 2002-06-28 2002-06-28 反射ミラー装置及び露光装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2004039696A JP2004039696A (ja) 2004-02-05
JP2004039696A5 true JP2004039696A5 (enExample) 2007-04-26
JP3944008B2 JP3944008B2 (ja) 2007-07-11

Family

ID=29996915

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002191282A Expired - Fee Related JP3944008B2 (ja) 2002-06-28 2002-06-28 反射ミラー装置及び露光装置及びデバイス製造方法

Country Status (7)

Country Link
US (1) US7349063B2 (enExample)
EP (1) EP1518262A4 (enExample)
JP (1) JP3944008B2 (enExample)
KR (1) KR100572098B1 (enExample)
CN (1) CN100377303C (enExample)
TW (1) TW594436B (enExample)
WO (1) WO2004003982A1 (enExample)

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US7641349B1 (en) * 2008-09-22 2010-01-05 Cymer, Inc. Systems and methods for collector mirror temperature control using direct contact heat transfer
JP5732257B2 (ja) * 2010-01-15 2015-06-10 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置、デバイス製造方法およびコンピュータ読取可能媒体
WO2011116792A1 (en) * 2010-03-26 2011-09-29 Carl Zeiss Smt Gmbh Optical system, exposure apparatus, and waverfront correction method
JP5478553B2 (ja) 2010-09-03 2014-04-23 日東電工株式会社 連続ウェブ状光学フィルム積層体ロール及びその製造方法
DE102011005778A1 (de) * 2011-03-18 2012-09-20 Carl Zeiss Smt Gmbh Optisches Element
CN103814331B (zh) * 2011-09-21 2016-06-29 卡尔蔡司Smt有限责任公司 在微光刻投射曝光设备中热致动反射镜的布置
JP6041541B2 (ja) * 2012-06-04 2016-12-07 キヤノン株式会社 露光装置及びデバイス製造方法
JP2013179330A (ja) * 2013-04-25 2013-09-09 Gigaphoton Inc 極端紫外光源装置
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DE102014219770A1 (de) 2014-09-30 2016-03-31 Carl Zeiss Smt Gmbh Spiegelanordnung, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage, sowie Verfahren zur Ableitung eines Wärmestromes aus dem Bereich einer Spiegelanordnung
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