JP2004537176A5 - - Google Patents

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Publication number
JP2004537176A5
JP2004537176A5 JP2003516804A JP2003516804A JP2004537176A5 JP 2004537176 A5 JP2004537176 A5 JP 2004537176A5 JP 2003516804 A JP2003516804 A JP 2003516804A JP 2003516804 A JP2003516804 A JP 2003516804A JP 2004537176 A5 JP2004537176 A5 JP 2004537176A5
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JP
Japan
Prior art keywords
spectrum
pulse
wavelength
pulses
laser
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Application number
JP2003516804A
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English (en)
Japanese (ja)
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JP2004537176A (ja
JP4252896B2 (ja
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Priority claimed from US09/918,773 external-priority patent/US6671294B2/en
Priority claimed from US10/036,925 external-priority patent/US6853653B2/en
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Publication of JP2004537176A publication Critical patent/JP2004537176A/ja
Publication of JP2004537176A5 publication Critical patent/JP2004537176A5/ja
Application granted granted Critical
Publication of JP4252896B2 publication Critical patent/JP4252896B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2003516804A 2001-07-27 2002-07-11 リソグラフィ処理のためのレーザスペクトルエンジニアリング Expired - Lifetime JP4252896B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/918,773 US6671294B2 (en) 1997-07-22 2001-07-27 Laser spectral engineering for lithographic process
US10/036,925 US6853653B2 (en) 1997-07-22 2001-12-21 Laser spectral engineering for lithographic process
PCT/US2002/022190 WO2003011595A2 (en) 2001-07-27 2002-07-11 Laser spectral engineering for lithographic process

Publications (3)

Publication Number Publication Date
JP2004537176A JP2004537176A (ja) 2004-12-09
JP2004537176A5 true JP2004537176A5 (enExample) 2006-01-05
JP4252896B2 JP4252896B2 (ja) 2009-04-08

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JP2003516804A Expired - Lifetime JP4252896B2 (ja) 2001-07-27 2002-07-11 リソグラフィ処理のためのレーザスペクトルエンジニアリング

Country Status (5)

Country Link
US (3) US6853653B2 (enExample)
EP (1) EP1412182A4 (enExample)
JP (1) JP4252896B2 (enExample)
AU (1) AU2002355718A1 (enExample)
WO (1) WO2003011595A2 (enExample)

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TWI749546B (zh) 2019-05-14 2021-12-11 美商希瑪有限責任公司 用於調變光源波長的裝置及方法
JP7382424B2 (ja) 2019-05-22 2023-11-16 サイマー リミテッド ライアビリティ カンパニー 複数の深紫外光発振器のための制御システム
CN114144731B (zh) 2019-07-23 2024-04-09 西默有限公司 补偿由重复率偏差引起的波长误差的方法
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