JP2005501399A5 - - Google Patents

Download PDF

Info

Publication number
JP2005501399A5
JP2005501399A5 JP2002590463A JP2002590463A JP2005501399A5 JP 2005501399 A5 JP2005501399 A5 JP 2005501399A5 JP 2002590463 A JP2002590463 A JP 2002590463A JP 2002590463 A JP2002590463 A JP 2002590463A JP 2005501399 A5 JP2005501399 A5 JP 2005501399A5
Authority
JP
Japan
Prior art keywords
pulse
laser
spectrum
burst
wavelength
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002590463A
Other languages
English (en)
Japanese (ja)
Other versions
JP4437006B2 (ja
JP2005501399A (ja
Filing date
Publication date
Priority claimed from US09/854,097 external-priority patent/US6757316B2/en
Priority claimed from US09/918,773 external-priority patent/US6671294B2/en
Application filed filed Critical
Publication of JP2005501399A publication Critical patent/JP2005501399A/ja
Publication of JP2005501399A5 publication Critical patent/JP2005501399A5/ja
Application granted granted Critical
Publication of JP4437006B2 publication Critical patent/JP4437006B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP2002590463A 2001-05-11 2002-04-19 リソグラフィ処理のためのレーザスペクトルエンジニアリング Expired - Lifetime JP4437006B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/854,097 US6757316B2 (en) 1999-12-27 2001-05-11 Four KHz gas discharge laser
US09/918,773 US6671294B2 (en) 1997-07-22 2001-07-27 Laser spectral engineering for lithographic process
PCT/US2002/012396 WO2002093700A1 (en) 2001-05-11 2002-04-19 Laser spectral engineering for lithographic process

Publications (3)

Publication Number Publication Date
JP2005501399A JP2005501399A (ja) 2005-01-13
JP2005501399A5 true JP2005501399A5 (enExample) 2006-01-05
JP4437006B2 JP4437006B2 (ja) 2010-03-24

Family

ID=27127208

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002590463A Expired - Lifetime JP4437006B2 (ja) 2001-05-11 2002-04-19 リソグラフィ処理のためのレーザスペクトルエンジニアリング

Country Status (6)

Country Link
US (2) US6671294B2 (enExample)
EP (1) EP1386376B1 (enExample)
JP (1) JP4437006B2 (enExample)
DE (1) DE60237515D1 (enExample)
TW (1) TW541607B (enExample)
WO (1) WO2002093700A1 (enExample)

Families Citing this family (97)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6853653B2 (en) 1997-07-22 2005-02-08 Cymer, Inc. Laser spectral engineering for lithographic process
US20020127497A1 (en) * 1998-09-10 2002-09-12 Brown Daniel J. W. Large diffraction grating for gas discharge laser
US6567450B2 (en) 1999-12-10 2003-05-20 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
US6625191B2 (en) * 1999-12-10 2003-09-23 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
US6914919B2 (en) * 2000-06-19 2005-07-05 Cymer, Inc. Six to ten KHz, or greater gas discharge laser system
US6912052B2 (en) 2000-11-17 2005-06-28 Cymer, Inc. Gas discharge MOPA laser spectral analysis module
US6750972B2 (en) * 2000-11-17 2004-06-15 Cymer, Inc. Gas discharge ultraviolet wavemeter with enhanced illumination
US6553559B2 (en) * 2001-01-05 2003-04-22 International Business Machines Corporation Method to determine optical proximity correction and assist feature rules which account for variations in mask dimensions
US6713770B2 (en) * 2001-01-29 2004-03-30 Cymer, Inc. High resolution spectral measurement device
US7079564B2 (en) * 2001-04-09 2006-07-18 Cymer, Inc. Control system for a two chamber gas discharge laser
US7039086B2 (en) * 2001-04-09 2006-05-02 Cymer, Inc. Control system for a two chamber gas discharge laser
US6690704B2 (en) 2001-04-09 2004-02-10 Cymer, Inc. Control system for a two chamber gas discharge laser
US7061959B2 (en) * 2001-04-18 2006-06-13 Tcz Gmbh Laser thin film poly-silicon annealing system
US7009140B2 (en) * 2001-04-18 2006-03-07 Cymer, Inc. Laser thin film poly-silicon annealing optical system
US7465946B2 (en) 2004-03-10 2008-12-16 Cymer, Inc. Alternative fuels for EUV light source
US20050259709A1 (en) * 2002-05-07 2005-11-24 Cymer, Inc. Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate
US7372056B2 (en) 2005-06-29 2008-05-13 Cymer, Inc. LPP EUV plasma source material target delivery system
US7598509B2 (en) 2004-11-01 2009-10-06 Cymer, Inc. Laser produced plasma EUV light source
US7439530B2 (en) 2005-06-29 2008-10-21 Cymer, Inc. LPP EUV light source drive laser system
US7378673B2 (en) 2005-02-25 2008-05-27 Cymer, Inc. Source material dispenser for EUV light source
US7088758B2 (en) 2001-07-27 2006-08-08 Cymer, Inc. Relax gas discharge laser lithography light source
US7154928B2 (en) * 2004-06-23 2006-12-26 Cymer Inc. Laser output beam wavefront splitter for bandwidth spectrum control
US7830934B2 (en) 2001-08-29 2010-11-09 Cymer, Inc. Multi-chamber gas discharge laser bandwidth control through discharge timing
US6963595B2 (en) 2001-08-29 2005-11-08 Cymer, Inc. Automatic gas control system for a gas discharge laser
US20050100072A1 (en) * 2001-11-14 2005-05-12 Rao Rajasekhar M. High power laser output beam energy density reduction
US7741639B2 (en) * 2003-01-31 2010-06-22 Cymer, Inc. Multi-chambered excimer or molecular fluorine gas discharge laser fluorine injection control
US7218443B2 (en) * 2003-02-25 2007-05-15 Toptica Photonics Ag Generation of tunable light pulses
US20040190577A1 (en) * 2003-02-27 2004-09-30 Hans-Stephan Albrecht Fast linear motor for wavelength variation for lithography lasers
US7217941B2 (en) 2003-04-08 2007-05-15 Cymer, Inc. Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source
US7277188B2 (en) 2003-04-29 2007-10-02 Cymer, Inc. Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate
EP1510869A3 (en) * 2003-08-29 2009-07-29 ASML Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
EP1517183A1 (en) 2003-08-29 2005-03-23 ASML Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
US6873418B1 (en) 2003-09-30 2005-03-29 Cymer, Inc. Optical mountings for gas discharge MOPA laser spectral analysis module
US6894785B2 (en) * 2003-09-30 2005-05-17 Cymer, Inc. Gas discharge MOPA laser spectral analysis module
US6829040B1 (en) 2003-11-07 2004-12-07 Advanced Micro Devices, Inc. Lithography contrast enhancement technique by varying focus with wavelength modulation
US20080038675A1 (en) * 2004-02-20 2008-02-14 Nikon Corporation Exposure Method, Exposure Apparatus, Exposure System and Device Manufacturing Method
US7196342B2 (en) 2004-03-10 2007-03-27 Cymer, Inc. Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source
US20050243876A1 (en) * 2004-04-29 2005-11-03 Academia Sinica Narrow bandwidth high repetition rate optical parametric oscillator
US20050286599A1 (en) * 2004-06-29 2005-12-29 Rafac Robert J Method and apparatus for gas discharge laser output light coherency reduction
US7352791B2 (en) * 2004-07-27 2008-04-01 Corning Incorporated Optical systems including wavefront correcting optical surfaces
US7355191B2 (en) 2004-11-01 2008-04-08 Cymer, Inc. Systems and methods for cleaning a chamber window of an EUV light source
US20060114956A1 (en) * 2004-11-30 2006-06-01 Sandstrom Richard L High power high pulse repetition rate gas discharge laser system bandwidth management
US7366219B2 (en) * 2004-11-30 2008-04-29 Cymer, Inc. Line narrowing module
US7643522B2 (en) * 2004-11-30 2010-01-05 Cymer, Inc. Method and apparatus for gas discharge laser bandwidth and center wavelength control
US7534552B2 (en) * 2004-12-23 2009-05-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20060139607A1 (en) * 2004-12-23 2006-06-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4580338B2 (ja) 2004-12-23 2010-11-10 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置、エキシマ・レーザ、およびデバイス製造方法
US7256870B2 (en) * 2005-02-01 2007-08-14 Asml Netherlands B.V. Method and apparatus for controlling iso-dense bias in lithography
US7482609B2 (en) 2005-02-28 2009-01-27 Cymer, Inc. LPP EUV light source drive laser system
US7525638B2 (en) * 2005-03-23 2009-04-28 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20060222034A1 (en) * 2005-03-31 2006-10-05 Cymer, Inc. 6 Khz and above gas discharge laser system
US7286207B2 (en) * 2005-04-28 2007-10-23 Infineon Technologies, Ag Exposing a semiconductor wafer using two different spectral wavelengths and adjusting for chromatic aberration
US7443484B2 (en) * 2005-05-13 2008-10-28 Infineon Technologies Ag Method for exposing a semiconductor wafer by applying periodic movement to a component
US7141806B1 (en) 2005-06-27 2006-11-28 Cymer, Inc. EUV light source collector erosion mitigation
US7180083B2 (en) 2005-06-27 2007-02-20 Cymer, Inc. EUV light source collector erosion mitigation
US7365349B2 (en) 2005-06-27 2008-04-29 Cymer, Inc. EUV light source collector lifetime improvements
US7317536B2 (en) 2005-06-27 2008-01-08 Cymer, Inc. Spectral bandwidth metrology for high repetition rate gas discharge lasers
US8379687B2 (en) 2005-06-30 2013-02-19 Cymer, Inc. Gas discharge laser line narrowing module
US7653095B2 (en) * 2005-06-30 2010-01-26 Cymer, Inc. Active bandwidth control for a laser
US7394083B2 (en) 2005-07-08 2008-07-01 Cymer, Inc. Systems and methods for EUV light source metrology
US7679029B2 (en) 2005-10-28 2010-03-16 Cymer, Inc. Systems and methods to shape laser light as a line beam for interaction with a substrate having surface variations
US7317179B2 (en) 2005-10-28 2008-01-08 Cymer, Inc. Systems and methods to shape laser light as a homogeneous line beam for interaction with a film deposited on a substrate
US7321607B2 (en) * 2005-11-01 2008-01-22 Cymer, Inc. External optics and chamber support system
US7453077B2 (en) 2005-11-05 2008-11-18 Cymer, Inc. EUV light source
KR100702845B1 (ko) * 2006-01-20 2007-04-03 삼성전자주식회사 엑시머 레이저 및 그의 협대역 모듈
US7822084B2 (en) * 2006-02-17 2010-10-26 Cymer, Inc. Method and apparatus for stabilizing and tuning the bandwidth of laser light
US7852889B2 (en) * 2006-02-17 2010-12-14 Cymer, Inc. Active spectral control of DUV light source
US8518030B2 (en) * 2006-03-10 2013-08-27 Amo Manufacturing Usa, Llc Output energy control for lasers
JP2007250947A (ja) * 2006-03-17 2007-09-27 Canon Inc 露光装置および像面検出方法
JP2008140956A (ja) * 2006-12-01 2008-06-19 Canon Inc 露光装置
US7720120B2 (en) * 2008-10-21 2010-05-18 Cymer, Inc. Method and apparatus for laser control in a two chamber gas discharge laser
US7751453B2 (en) * 2008-10-21 2010-07-06 Cymer, Inc. Method and apparatus for laser control in a two chamber gas discharge laser
US7756171B2 (en) * 2008-10-21 2010-07-13 Cymer, Inc. Method and apparatus for laser control in a two chamber gas discharge laser
US8520186B2 (en) * 2009-08-25 2013-08-27 Cymer, Llc Active spectral control of optical source
NL2006073A (en) * 2010-02-12 2011-08-15 Asml Netherlands Bv Lithographic apparatus and method.
JP5410396B2 (ja) 2010-03-23 2014-02-05 ギガフォトン株式会社 レーザ装置
US8837536B2 (en) 2010-04-07 2014-09-16 Cymer, Llc Method and apparatus for controlling light bandwidth
CN103309166B (zh) * 2012-03-09 2016-03-30 上海微电子装备有限公司 可动镜片调整装置及应用其的可调式光学系统
US9207119B2 (en) 2012-04-27 2015-12-08 Cymer, Llc Active spectral control during spectrum synthesis
US9715180B2 (en) 2013-06-11 2017-07-25 Cymer, Llc Wafer-based light source parameter control
US10416566B2 (en) 2015-12-14 2019-09-17 Asml Netherlands B.V. Optimization of source and bandwidth for new and existing patterning devices
US9835959B1 (en) 2016-10-17 2017-12-05 Cymer, Llc Controlling for wafer stage vibration
US9997888B2 (en) 2016-10-17 2018-06-12 Cymer, Llc Control of a spectral feature of a pulsed light beam
US10416471B2 (en) 2016-10-17 2019-09-17 Cymer, Llc Spectral feature control apparatus
US9989866B2 (en) 2016-10-17 2018-06-05 Cymer, Llc Wafer-based light source parameter control
US10288483B2 (en) * 2017-04-09 2019-05-14 Cymer, Llc Recovering spectral shape from spatial output
CN118011728A (zh) 2017-10-19 2024-05-10 西默有限公司 在单次光刻曝光通过过程中形成多个空间图像
NL2022609A (en) 2018-03-12 2019-09-18 Asml Netherlands Bv Control System and Method
JP7044894B2 (ja) * 2018-03-30 2022-03-30 サイマー リミテッド ライアビリティ カンパニー パルス光ビームのスペクトル特性選択及びパルスタイミング制御
WO2020078844A1 (en) * 2018-10-19 2020-04-23 Asml Netherlands B.V. Method to create the ideal source spectra with source and mask optimization
CN111385020B (zh) * 2018-12-29 2022-04-29 海思光电子有限公司 一种波长测量装置
TWI749546B (zh) 2019-05-14 2021-12-11 美商希瑪有限責任公司 用於調變光源波長的裝置及方法
JP7382424B2 (ja) 2019-05-22 2023-11-16 サイマー リミテッド ライアビリティ カンパニー 複数の深紫外光発振器のための制御システム
CN114144731B (zh) 2019-07-23 2024-04-09 西默有限公司 补偿由重复率偏差引起的波长误差的方法
US20230010700A1 (en) * 2019-12-02 2023-01-12 Cymer, Llc Method and system for enhancing target features of a pattern imaged onto a substrate
US12276897B2 (en) 2022-09-06 2025-04-15 Orbotech Ltd. Dynamic correction for an acousto-optic deflector
CN115473119B (zh) * 2022-10-10 2024-06-25 湖南五凌电力科技有限公司 一种可调谐半导体激光器调制电路

Family Cites Families (52)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4223279A (en) 1977-07-18 1980-09-16 Mathematical Sciences Northwest, Inc. Pulsed electric discharge laser utilizing water dielectric blumlein transmission line
US4455658A (en) 1982-04-20 1984-06-19 Sutter Jr Leroy V Coupling circuit for use with a transversely excited gas laser
US4883352A (en) * 1984-06-21 1989-11-28 American Telephone And Telegraph Company Deep-uv lithography
US4599730A (en) * 1984-10-01 1986-07-08 The United States Of America As Represented By The Secretary Of The Navy Visible and ultraviolet lasers based on excimer transitions in the homonuclear halogens
US4937619A (en) * 1986-08-08 1990-06-26 Hitachi, Ltd. Projection aligner and exposure method
US4697270A (en) 1986-08-27 1987-09-29 The United States Of America As Represented By The United States Department Of Energy Copper vapor laser acoustic thermometry system
US4940331A (en) 1986-09-24 1990-07-10 The United States Of America As Represented By The United States Department Of Energy Heterodyne laser instantaneous frequency measurement system
US4798467A (en) 1986-09-24 1989-01-17 The United States Department Of Energy Heterodyne laser instantaneous frequency measurement system
US5189678A (en) 1986-09-29 1993-02-23 The United States Of America As Represented By The United States Department Of Energy Coupling apparatus for a metal vapor laser
US5315611A (en) 1986-09-25 1994-05-24 The United States Of America As Represented By The United States Department Of Energy High average power magnetic modulator for metal vapor lasers
US4817101A (en) 1986-09-26 1989-03-28 The United States Of America As Represented By The United States Department Of Energy Heterodyne laser spectroscopy system
DE3891284T1 (de) * 1987-07-17 1990-04-26 Komatsu Mfg Co Ltd Laserwellenlaengen-regelvorrichtung
US4823354A (en) * 1987-12-15 1989-04-18 Lumonics Inc. Excimer lasers
US4959840A (en) 1988-01-15 1990-09-25 Cymer Laser Technologies Compact excimer laser including an electrode mounted in insulating relationship to wall of the laser
US5023884A (en) 1988-01-15 1991-06-11 Cymer Laser Technologies Compact excimer laser
US5025446A (en) 1988-04-01 1991-06-18 Laserscope Intra-cavity beam relay for optical harmonic generation
US4881231A (en) * 1988-11-28 1989-11-14 Kantilal Jain Frequency-stabilized line-narrowed excimer laser source system for high resolution lithography
IL91240A (en) 1989-08-07 1994-07-31 Quick Tech Ltd Pulsed laser apparatus and systems and techniques for its operation
US5025445A (en) 1989-11-22 1991-06-18 Cymer Laser Technologies System for, and method of, regulating the wavelength of a light beam
US5095492A (en) 1990-07-17 1992-03-10 Cymer Laser Technologies Spectral narrowing technique
US5471965A (en) 1990-12-24 1995-12-05 Kapich; Davorin D. Very high speed radial inflow hydraulic turbine
US5691989A (en) 1991-07-26 1997-11-25 Accuwave Corporation Wavelength stabilized laser sources using feedback from volume holograms
US5347392A (en) * 1992-02-26 1994-09-13 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Electric-optic resonant phase modulator
US5371587A (en) 1992-05-06 1994-12-06 The Boeing Company Chirped synthetic wavelength laser radar
JP3155837B2 (ja) 1992-09-14 2001-04-16 株式会社東芝 光伝送装置
US5303002A (en) * 1993-03-31 1994-04-12 Intel Corporation Method and apparatus for enhancing the focus latitude in lithography
US5420877A (en) 1993-07-16 1995-05-30 Cymer Laser Technologies Temperature compensation method and apparatus for wave meters and tunable lasers controlled thereby
US5440578B1 (en) * 1993-07-16 2000-10-24 Cymer Inc Gas replenishment method ad apparatus for excimer lasers
US5448580A (en) 1994-07-05 1995-09-05 The United States Of America As Represented By The United States Department Of Energy Air and water cooled modulator
JPH08172233A (ja) 1994-12-15 1996-07-02 Anritsu Corp 可変波長光源装置
JP3175515B2 (ja) * 1994-12-26 2001-06-11 キヤノン株式会社 露光装置及びそれを用いたデバイスの製造方法
US5706301A (en) 1995-08-16 1998-01-06 Telefonaktiebolaget L M Ericsson Laser wavelength control system
US5991324A (en) 1998-03-11 1999-11-23 Cymer, Inc. Reliable. modular, production quality narrow-band KRF excimer laser
US5982800A (en) 1997-04-23 1999-11-09 Cymer, Inc. Narrow band excimer laser
US6128323A (en) 1997-04-23 2000-10-03 Cymer, Inc. Reliable modular production quality narrow-band high REP rate excimer laser
US5856991A (en) 1997-06-04 1999-01-05 Cymer, Inc. Very narrow band laser
US6018537A (en) 1997-07-18 2000-01-25 Cymer, Inc. Reliable, modular, production quality narrow-band high rep rate F2 laser
US5852621A (en) 1997-07-21 1998-12-22 Cymer, Inc. Pulse laser with pulse energy trimmer
US5870420A (en) 1997-08-18 1999-02-09 Cymer, Inc. Cross-flow blower with braces
WO1999012235A1 (en) 1997-09-05 1999-03-11 Micron Optics, Inc. Tunable fiber fabry-perot surface-emitting lasers
US5953360A (en) 1997-10-24 1999-09-14 Synrad, Inc. All metal electrode sealed gas laser
US5978405A (en) 1998-03-06 1999-11-02 Cymer, Inc. Laser chamber with minimized acoustic and shock wave disturbances
US6477193B2 (en) 1998-07-18 2002-11-05 Cymer, Inc. Extreme repetition rate gas discharge laser with improved blower motor
US6208675B1 (en) 1998-08-27 2001-03-27 Cymer, Inc. Blower assembly for a pulsed laser system incorporating ceramic bearings
US6067311A (en) 1998-09-04 2000-05-23 Cymer, Inc. Excimer laser with pulse multiplier
US6208674B1 (en) 1998-09-18 2001-03-27 Cymer, Inc. Laser chamber with fully integrated electrode feedthrough main insulator
WO2000038286A1 (en) * 1998-12-15 2000-06-29 Cymer, Inc. ArF LASER WITH LOW PULSE ENERGY AND HIGH REP RATE
US6154470A (en) * 1999-02-10 2000-11-28 Lamba Physik Gmbh Molecular fluorine (F2) laser with narrow spectral linewidth
US6219368B1 (en) 1999-02-12 2001-04-17 Lambda Physik Gmbh Beam delivery system for molecular fluorine (F2) laser
US6104735A (en) 1999-04-13 2000-08-15 Cymer, Inc. Gas discharge laser with magnetic bearings and magnetic reluctance centering for fan drive assembly
US6164116A (en) 1999-05-06 2000-12-26 Cymer, Inc. Gas module valve automated test fixture
US6483628B1 (en) * 1999-09-20 2002-11-19 The Board Of Trustees Of The Leland Stanford Junior University Polarization and wavelength stable superfluorescent sources using Faraday rotator mirrors

Similar Documents

Publication Publication Date Title
JP2005501399A5 (enExample)
WO2005046011A3 (en) Relax gas discharge laser lithography light source
JP3219736B2 (ja) レーザに関する波長シフト補正システム及び方法
JP2004537176A5 (enExample)
US9207119B2 (en) Active spectral control during spectrum synthesis
TWI294228B (en) Narrow band short pulse duration gas discharge laser output light pulse beam producing system and method
JP4437006B2 (ja) リソグラフィ処理のためのレーザスペクトルエンジニアリング
US7653095B2 (en) Active bandwidth control for a laser
JP2019179935A (ja) 光源のための波長安定化
US20230040812A1 (en) Spectral feature selection and pulse timing control of a pulsed light beam
KR20220111740A (ko) 단일의 리소그래피 노광 패스로 복수의 에어리얼 이미지를 형성하는 방법
JP2021517353A5 (enExample)
US7282666B2 (en) Method and apparatus to increase throughput of processing using pulsed radiation sources
JP3633904B2 (ja) Ｘ線発生方法およびｘ線発生装置
WO2003011595A3 (en) Laser spectral engineering for lithographic process
JP2008504684A5 (enExample)
JP7714656B2 (ja) 放電励起型レーザ装置の制御方法、放電励起型レーザ装置、及び電子デバイスの製造方法
US7116695B2 (en) Laser output light pulse beam parameter transient correction system
US20020122450A1 (en) High repetition rate UV excimer laser
WO2022225647A1 (en) Forming multiple aerial images in a single lithography exposure pass
TWI830501B (zh) 雷射設備及其操作方法
US6839374B2 (en) Barium fluoride high repetition rate UV excimer laser
WO2025074617A1 (ja) レーザ装置、レーザ装置の波長制御方法、及び電子デバイスの製造方法
WO2023135658A1 (ja) 電子デバイスの製造方法、レーザ装置、及び波長シーケンス算出システム