|
US4601036A
(en)
|
1982-09-30 |
1986-07-15 |
Honeywell Inc. |
Rapidly tunable laser
|
|
JP2631554B2
(ja)
*
|
1989-05-23 |
1997-07-16 |
株式会社小松製作所 |
レーザの波長制御装置
|
|
US6853653B2
(en)
*
|
1997-07-22 |
2005-02-08 |
Cymer, Inc. |
Laser spectral engineering for lithographic process
|
|
US6671294B2
(en)
|
1997-07-22 |
2003-12-30 |
Cymer, Inc. |
Laser spectral engineering for lithographic process
|
|
US20030178583A1
(en)
|
2000-09-18 |
2003-09-25 |
Kampherbeek Bert Jan |
Field emission photo-cathode array for lithography system and lithography system provided with such an array
|
|
US7039086B2
(en)
*
|
2001-04-09 |
2006-05-02 |
Cymer, Inc. |
Control system for a two chamber gas discharge laser
|
|
US6735225B2
(en)
|
2001-06-07 |
2004-05-11 |
Lambda Physik Ag |
Chirp compensation method and apparatus
|
|
US7088758B2
(en)
*
|
2001-07-27 |
2006-08-08 |
Cymer, Inc. |
Relax gas discharge laser lithography light source
|
|
US7154928B2
(en)
*
|
2004-06-23 |
2006-12-26 |
Cymer Inc. |
Laser output beam wavefront splitter for bandwidth spectrum control
|
|
US6963595B2
(en)
|
2001-08-29 |
2005-11-08 |
Cymer, Inc. |
Automatic gas control system for a gas discharge laser
|
|
US7158553B2
(en)
|
2003-02-14 |
2007-01-02 |
Lambda Physik Ag |
Master oscillator/power amplifier excimer laser system with pulse energy and pointing control
|
|
GB2402230B
(en)
|
2003-05-30 |
2006-05-03 |
Xsil Technology Ltd |
Focusing an optical beam to two foci
|
|
EP1517183A1
(en)
|
2003-08-29 |
2005-03-23 |
ASML Netherlands B.V. |
Lithographic apparatus, device manufacturing method, and device manufactured thereby
|
|
US6829040B1
(en)
|
2003-11-07 |
2004-12-07 |
Advanced Micro Devices, Inc. |
Lithography contrast enhancement technique by varying focus with wavelength modulation
|
|
TWI396225B
(zh)
|
2004-07-23 |
2013-05-11 |
尼康股份有限公司 |
成像面測量方法、曝光方法、元件製造方法以及曝光裝置
|
|
US20060114956A1
(en)
*
|
2004-11-30 |
2006-06-01 |
Sandstrom Richard L |
High power high pulse repetition rate gas discharge laser system bandwidth management
|
|
US7534552B2
(en)
|
2004-12-23 |
2009-05-19 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7256870B2
(en)
|
2005-02-01 |
2007-08-14 |
Asml Netherlands B.V. |
Method and apparatus for controlling iso-dense bias in lithography
|
|
US7525638B2
(en)
|
2005-03-23 |
2009-04-28 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7286207B2
(en)
|
2005-04-28 |
2007-10-23 |
Infineon Technologies, Ag |
Exposing a semiconductor wafer using two different spectral wavelengths and adjusting for chromatic aberration
|
|
US20070013889A1
(en)
|
2005-07-12 |
2007-01-18 |
Asml Netherlands B.V. |
Lithographic apparatus, device manufacturing method and device manufactured thereby having an increase in depth of focus
|
|
US8554035B2
(en)
|
2006-10-26 |
2013-10-08 |
Cornell Research Foundation, Inc. |
Production of optical pulses at a desired wavelength using soliton self-frequency shift in higher-order-mode fiber
|
|
JP2009010231A
(ja)
|
2007-06-28 |
2009-01-15 |
Canon Inc |
露光装置およびデバイス製造方法
|
|
EP2183829A4
(en)
|
2007-08-09 |
2014-06-18 |
Alain Villeneuve |
TUNABLE LASER LASER
|
|
US7703069B1
(en)
|
2007-08-14 |
2010-04-20 |
Brion Technologies, Inc. |
Three-dimensional mask model for photolithography simulation
|
|
US8309885B2
(en)
*
|
2009-01-15 |
2012-11-13 |
Electro Scientific Industries, Inc. |
Pulse temporal programmable ultrafast burst mode laser for micromachining
|
|
NL2005424A
(en)
|
2009-10-30 |
2011-05-02 |
Asml Netherlands Bv |
Lithographic method and apparatus.
|
|
JP5755068B2
(ja)
|
2011-07-27 |
2015-07-29 |
株式会社小松製作所 |
狭帯域化レーザのスペクトル幅調整装置
|
|
JP2013062484A
(ja)
|
2011-08-24 |
2013-04-04 |
Gigaphoton Inc |
レーザ装置
|
|
US9207119B2
(en)
|
2012-04-27 |
2015-12-08 |
Cymer, Llc |
Active spectral control during spectrum synthesis
|
|
DE102012211256A1
(de)
|
2012-06-29 |
2014-01-02 |
Carl Zeiss Smt Gmbh |
Projektionsbelichtungsanlage für die Projektionslithographie
|
|
WO2014089120A1
(en)
|
2012-12-07 |
2014-06-12 |
Integrated Plasmonics Corporation |
Plasmonic spectroscopic sensor and cuvette therefor
|
|
JP6151054B2
(ja)
*
|
2013-03-22 |
2017-06-21 |
ギガフォトン株式会社 |
レーザ装置及び極端紫外光生成装置
|
|
US9599510B2
(en)
*
|
2014-06-04 |
2017-03-21 |
Cymer, Llc |
Estimation of spectral feature of pulsed light beam
|
|
US9785050B2
(en)
*
|
2015-06-26 |
2017-10-10 |
Cymer, Llc |
Pulsed light beam spectral feature control
|
|
JP6585174B2
(ja)
|
2015-08-07 |
2019-10-02 |
ギガフォトン株式会社 |
狭帯域化レーザ装置
|
|
JP6549248B2
(ja)
|
2015-12-10 |
2019-07-24 |
ギガフォトン株式会社 |
狭帯域化レーザ装置及びスペクトル線幅計測装置
|
|
NL2017928A
(en)
|
2015-12-18 |
2017-06-28 |
Univ Amsterdam |
Inspection apparatus and method
|
|
US9837784B2
(en)
*
|
2015-12-28 |
2017-12-05 |
Nlight, Inc. |
Fully controllable burst shaping individual pulses from picosecond fiber lasers
|
|
US9997888B2
(en)
|
2016-10-17 |
2018-06-12 |
Cymer, Llc |
Control of a spectral feature of a pulsed light beam
|
|
US9989866B2
(en)
|
2016-10-17 |
2018-06-05 |
Cymer, Llc |
Wafer-based light source parameter control
|
|
KR102428750B1
(ko)
|
2017-10-19 |
2022-08-02 |
사이머 엘엘씨 |
단일의 리소그래피 노광 패스로 복수의 에어리얼 이미지를 형성하는 방법
|
|
KR102462465B1
(ko)
*
|
2018-03-30 |
2022-11-02 |
사이머 엘엘씨 |
펄스형 광 빔의 스펙트럼 특성 선택 및 펄스 타이밍 제어 기술
|