JP2008504684A5 - - Google Patents
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- JP2008504684A5 JP2008504684A5 JP2007518142A JP2007518142A JP2008504684A5 JP 2008504684 A5 JP2008504684 A5 JP 2008504684A5 JP 2007518142 A JP2007518142 A JP 2007518142A JP 2007518142 A JP2007518142 A JP 2007518142A JP 2008504684 A5 JP2008504684 A5 JP 2008504684A5
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- JP
- Japan
- Prior art keywords
- pulse
- incidence
- selection
- tuning mechanism
- angle
- Prior art date
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Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/875,662 US7154928B2 (en) | 2004-06-23 | 2004-06-23 | Laser output beam wavefront splitter for bandwidth spectrum control |
| US10/875,662 | 2004-06-23 | ||
| PCT/US2005/021585 WO2006009905A1 (en) | 2004-06-23 | 2005-06-17 | Laser output beam wavefront splitter for bandwidth spectrum control |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013145759A Division JP2013214772A (ja) | 2004-06-23 | 2013-07-11 | 帯域幅スペクトル制御のためのレーザ出力ビーム波面スプリッタ |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008504684A JP2008504684A (ja) | 2008-02-14 |
| JP2008504684A5 true JP2008504684A5 (enExample) | 2008-08-07 |
| JP5745736B2 JP5745736B2 (ja) | 2015-07-08 |
Family
ID=35505683
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007518142A Expired - Lifetime JP5745736B2 (ja) | 2004-06-23 | 2005-06-17 | 帯域幅スペクトル制御のためのレーザ出力ビーム波面スプリッタ |
| JP2013145759A Pending JP2013214772A (ja) | 2004-06-23 | 2013-07-11 | 帯域幅スペクトル制御のためのレーザ出力ビーム波面スプリッタ |
| JP2015136326A Expired - Lifetime JP6013566B2 (ja) | 2004-06-23 | 2015-07-07 | 帯域幅スペクトル制御のためのレーザ出力ビーム波面スプリッタ |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013145759A Pending JP2013214772A (ja) | 2004-06-23 | 2013-07-11 | 帯域幅スペクトル制御のためのレーザ出力ビーム波面スプリッタ |
| JP2015136326A Expired - Lifetime JP6013566B2 (ja) | 2004-06-23 | 2015-07-07 | 帯域幅スペクトル制御のためのレーザ出力ビーム波面スプリッタ |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US7154928B2 (enExample) |
| EP (1) | EP1766737B1 (enExample) |
| JP (3) | JP5745736B2 (enExample) |
| KR (1) | KR101211490B1 (enExample) |
| DE (1) | DE602005025124D1 (enExample) |
| TW (1) | TWI294228B (enExample) |
| WO (1) | WO2006009905A1 (enExample) |
Families Citing this family (55)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100702845B1 (ko) * | 2006-01-20 | 2007-04-03 | 삼성전자주식회사 | 엑시머 레이저 및 그의 협대역 모듈 |
| CN100540725C (zh) * | 2006-11-07 | 2009-09-16 | 中国科学院物理研究所 | 一种用于脉冲激光沉积系统中的调节基片角度的装置 |
| JP2008140956A (ja) * | 2006-12-01 | 2008-06-19 | Canon Inc | 露光装置 |
| US20080180696A1 (en) * | 2007-01-30 | 2008-07-31 | Sony Corporation | Process window for EUV lithography |
| US9018561B2 (en) | 2007-05-23 | 2015-04-28 | Cymer, Llc | High power seed/amplifier laser system with beam shaping intermediate the seed and amplifier |
| DE102008050869A1 (de) * | 2008-09-30 | 2009-11-26 | Carl Zeiss Laser Optics Gmbh | Optische Vorrichtung zur Vergrößerung des Einstellbereichs der spektralen Bandbreite eines Laserstrahls |
| US8144739B2 (en) | 2008-10-24 | 2012-03-27 | Cymer, Inc. | System method and apparatus for selecting and controlling light source bandwidth |
| USRE45957E1 (en) | 2009-03-27 | 2016-03-29 | Cymer, Llc | Regenerative ring resonator |
| US8014432B2 (en) * | 2009-03-27 | 2011-09-06 | Cymer, Inc. | Regenerative ring resonator |
| US8520186B2 (en) * | 2009-08-25 | 2013-08-27 | Cymer, Llc | Active spectral control of optical source |
| JP5410396B2 (ja) | 2010-03-23 | 2014-02-05 | ギガフォトン株式会社 | レーザ装置 |
| US8837536B2 (en) | 2010-04-07 | 2014-09-16 | Cymer, Llc | Method and apparatus for controlling light bandwidth |
| JP2013062484A (ja) | 2011-08-24 | 2013-04-04 | Gigaphoton Inc | レーザ装置 |
| JP2013070029A (ja) | 2011-09-08 | 2013-04-18 | Gigaphoton Inc | マスタオシレータシステムおよびレーザ装置 |
| JP6113426B2 (ja) | 2011-09-08 | 2017-04-12 | ギガフォトン株式会社 | マスタオシレータシステムおよびレーザ装置 |
| JP2013145863A (ja) | 2011-11-29 | 2013-07-25 | Gigaphoton Inc | 2光束干渉装置および2光束干渉露光システム |
| JP6063133B2 (ja) | 2012-02-15 | 2017-01-18 | ギガフォトン株式会社 | エキシマレーザおよびレーザ装置 |
| US9207119B2 (en) | 2012-04-27 | 2015-12-08 | Cymer, Llc | Active spectral control during spectrum synthesis |
| JP2013247240A (ja) | 2012-05-25 | 2013-12-09 | Gigaphoton Inc | レーザ装置 |
| TWI469462B (zh) | 2012-11-30 | 2015-01-11 | Ind Tech Res Inst | 時間差調制旁波段增益短脈衝雷射輸出裝置 |
| GB2513884B (en) | 2013-05-08 | 2015-06-17 | Univ Bristol | Method and apparatus for producing an acoustic field |
| US9715180B2 (en) | 2013-06-11 | 2017-07-25 | Cymer, Llc | Wafer-based light source parameter control |
| WO2016084263A1 (ja) * | 2014-11-28 | 2016-06-02 | ギガフォトン株式会社 | 狭帯域化レーザ装置 |
| US9785050B2 (en) | 2015-06-26 | 2017-10-10 | Cymer, Llc | Pulsed light beam spectral feature control |
| US10120196B2 (en) | 2016-09-30 | 2018-11-06 | National Taiwan University Of Science And Technology | Optical device |
| US10416471B2 (en) | 2016-10-17 | 2019-09-17 | Cymer, Llc | Spectral feature control apparatus |
| US9989866B2 (en) | 2016-10-17 | 2018-06-05 | Cymer, Llc | Wafer-based light source parameter control |
| US9997888B2 (en) | 2016-10-17 | 2018-06-12 | Cymer, Llc | Control of a spectral feature of a pulsed light beam |
| US9835959B1 (en) | 2016-10-17 | 2017-12-05 | Cymer, Llc | Controlling for wafer stage vibration |
| JP6846985B2 (ja) * | 2017-05-19 | 2021-03-24 | アイシン高丘株式会社 | 排気装置 |
| JP6616368B2 (ja) * | 2017-09-14 | 2019-12-04 | ファナック株式会社 | レーザ加工前に光学系の汚染レベルに応じて加工条件を補正するレーザ加工装置 |
| KR102428750B1 (ko) * | 2017-10-19 | 2022-08-02 | 사이머 엘엘씨 | 단일의 리소그래피 노광 패스로 복수의 에어리얼 이미지를 형성하는 방법 |
| EP3729418B1 (en) | 2017-12-22 | 2024-11-20 | Ultrahaptics Ip Ltd | Minimizing unwanted responses in haptic systems |
| CN111819741A (zh) | 2018-03-12 | 2020-10-23 | Asml荷兰有限公司 | 控制系统和方法 |
| KR102462465B1 (ko) | 2018-03-30 | 2022-11-02 | 사이머 엘엘씨 | 펄스형 광 빔의 스펙트럼 특성 선택 및 펄스 타이밍 제어 기술 |
| KR102120551B1 (ko) * | 2018-09-14 | 2020-06-09 | (주)오로스 테크놀로지 | 오버레이 측정장치 |
| US12373033B2 (en) | 2019-01-04 | 2025-07-29 | Ultrahaptics Ip Ltd | Mid-air haptic textures |
| TWI749546B (zh) | 2019-05-14 | 2021-12-11 | 美商希瑪有限責任公司 | 用於調變光源波長的裝置及方法 |
| JP7382424B2 (ja) | 2019-05-22 | 2023-11-16 | サイマー リミテッド ライアビリティ カンパニー | 複数の深紫外光発振器のための制御システム |
| KR102562520B1 (ko) * | 2019-05-22 | 2023-08-01 | 사이머 엘엘씨 | 다수의 레이저 빔을 생성하는 장치 및 방법 |
| JP7358610B2 (ja) | 2019-07-23 | 2023-10-10 | サイマー リミテッド ライアビリティ カンパニー | 繰り返し率のずれによって誘発される波長誤差を補償する方法 |
| US11374586B2 (en) * | 2019-10-13 | 2022-06-28 | Ultraleap Limited | Reducing harmonic distortion by dithering |
| JP7454038B2 (ja) * | 2020-03-19 | 2024-03-21 | ギガフォトン株式会社 | 露光システム、レーザ制御パラメータの作成方法、及び電子デバイスの製造方法 |
| WO2021186744A1 (ja) | 2020-03-19 | 2021-09-23 | ギガフォトン株式会社 | 狭帯域化ガスレーザ装置、及び電子デバイスの製造方法 |
| CN115039299B (zh) | 2020-03-19 | 2025-05-27 | 极光先进雷射株式会社 | 窄带化气体激光装置、其控制方法和电子器件的制造方法 |
| WO2021186739A1 (ja) | 2020-03-19 | 2021-09-23 | ギガフォトン株式会社 | 狭帯域化装置、及び電子デバイスの製造方法 |
| CN115039034A (zh) * | 2020-03-19 | 2022-09-09 | 极光先进雷射株式会社 | 窄带化气体激光装置及其控制方法和电子器件的制造方法 |
| CN115485625B (zh) | 2020-05-20 | 2025-12-16 | 极光先进雷射株式会社 | 窄带化气体激光装置、波长控制方法和电子器件的制造方法 |
| US11816267B2 (en) | 2020-06-23 | 2023-11-14 | Ultraleap Limited | Features of airborne ultrasonic fields |
| KR102893005B1 (ko) * | 2020-12-10 | 2025-11-27 | 사이머 엘엘씨 | 파장 분리를 증가시킨 다초점 이미징 |
| CN116670591A (zh) * | 2021-02-24 | 2023-08-29 | 极光先进雷射株式会社 | 激光装置和电子器件的制造方法 |
| TW202307578A (zh) | 2021-04-19 | 2023-02-16 | 美商希瑪有限責任公司 | 在單一微影曝光遍次中形成多個空間影像 |
| WO2023283272A2 (en) * | 2021-07-07 | 2023-01-12 | Owl Autonomous Imaging, Inc. | Split-field optics for imaging and ranging |
| CN118339516A (zh) * | 2021-11-29 | 2024-07-12 | 西默有限公司 | 控制电压阈值选择以促进多焦点成像 |
| CN116526269B (zh) * | 2023-05-22 | 2024-01-30 | 北京国光领航科技有限公司 | 实现波长可自动调谐的锁模钛宝石飞秒激光振荡器及方法 |
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| JPS5131195A (ja) * | 1974-09-10 | 1976-03-17 | Nippon Electric Co | Tasunohachodedojihatsushinkanonareezasochi |
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-
2004
- 2004-06-23 US US10/875,662 patent/US7154928B2/en not_active Expired - Lifetime
-
2005
- 2005-05-18 TW TW094116091A patent/TWI294228B/zh not_active IP Right Cessation
- 2005-06-17 EP EP05766736A patent/EP1766737B1/en not_active Expired - Lifetime
- 2005-06-17 DE DE602005025124T patent/DE602005025124D1/de not_active Expired - Lifetime
- 2005-06-17 JP JP2007518142A patent/JP5745736B2/ja not_active Expired - Lifetime
- 2005-06-17 WO PCT/US2005/021585 patent/WO2006009905A1/en not_active Ceased
-
2006
- 2006-12-22 KR KR1020067027071A patent/KR101211490B1/ko not_active Expired - Lifetime
-
2013
- 2013-07-11 JP JP2013145759A patent/JP2013214772A/ja active Pending
-
2015
- 2015-07-07 JP JP2015136326A patent/JP6013566B2/ja not_active Expired - Lifetime
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