JP5745736B2 - 帯域幅スペクトル制御のためのレーザ出力ビーム波面スプリッタ - Google Patents

帯域幅スペクトル制御のためのレーザ出力ビーム波面スプリッタ Download PDF

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JP5745736B2
JP5745736B2 JP2007518142A JP2007518142A JP5745736B2 JP 5745736 B2 JP5745736 B2 JP 5745736B2 JP 2007518142 A JP2007518142 A JP 2007518142A JP 2007518142 A JP2007518142 A JP 2007518142A JP 5745736 B2 JP5745736 B2 JP 5745736B2
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pulse
center wavelength
angle
incidence
selection
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JP2008504684A (ja
JP2008504684A5 (enExample
Inventor
サンドストロム　リチャード　エル
リチャード エル サンドストロム
ダニエル ジェイ ダブリュー ブラウン
ダニエル ジェイ ダブリュー ブラウン
アーショフ　アレクサンダー　アイ
アレクサンダー アイ アーショフ
イゴー ヴィー フォーメンコフ
イゴー ヴィー フォーメンコフ
パートロ　ウィリアム　エヌ
ウィリアム エヌ パートロ
Original Assignee
サイマー リミテッド ライアビリティ カンパニー
サイマー リミテッド ライアビリティ カンパニー
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
    • H01S3/0811—Construction or shape of optical resonators or components thereof comprising three or more reflectors incorporating a dispersive element, e.g. a prism for wavelength selection
    • H01S3/0812—Construction or shape of optical resonators or components thereof comprising three or more reflectors incorporating a dispersive element, e.g. a prism for wavelength selection using a diffraction grating
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70025—Production of exposure light, i.e. light sources by lasers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/105—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
    • H01S3/1055—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length one of the reflectors being constituted by a diffraction grating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/08059—Constructional details of the reflector, e.g. shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H01S3/1305—Feedback control systems

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Lasers (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2007518142A 2004-06-23 2005-06-17 帯域幅スペクトル制御のためのレーザ出力ビーム波面スプリッタ Expired - Lifetime JP5745736B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/875,662 2004-06-23
US10/875,662 US7154928B2 (en) 2004-06-23 2004-06-23 Laser output beam wavefront splitter for bandwidth spectrum control
PCT/US2005/021585 WO2006009905A1 (en) 2004-06-23 2005-06-17 Laser output beam wavefront splitter for bandwidth spectrum control

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2013145759A Division JP2013214772A (ja) 2004-06-23 2013-07-11 帯域幅スペクトル制御のためのレーザ出力ビーム波面スプリッタ

Publications (3)

Publication Number Publication Date
JP2008504684A JP2008504684A (ja) 2008-02-14
JP2008504684A5 JP2008504684A5 (enExample) 2008-08-07
JP5745736B2 true JP5745736B2 (ja) 2015-07-08

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JP2007518142A Expired - Lifetime JP5745736B2 (ja) 2004-06-23 2005-06-17 帯域幅スペクトル制御のためのレーザ出力ビーム波面スプリッタ
JP2013145759A Pending JP2013214772A (ja) 2004-06-23 2013-07-11 帯域幅スペクトル制御のためのレーザ出力ビーム波面スプリッタ
JP2015136326A Expired - Lifetime JP6013566B2 (ja) 2004-06-23 2015-07-07 帯域幅スペクトル制御のためのレーザ出力ビーム波面スプリッタ

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JP2013145759A Pending JP2013214772A (ja) 2004-06-23 2013-07-11 帯域幅スペクトル制御のためのレーザ出力ビーム波面スプリッタ
JP2015136326A Expired - Lifetime JP6013566B2 (ja) 2004-06-23 2015-07-07 帯域幅スペクトル制御のためのレーザ出力ビーム波面スプリッタ

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Country Link
US (1) US7154928B2 (enExample)
EP (1) EP1766737B1 (enExample)
JP (3) JP5745736B2 (enExample)
KR (1) KR101211490B1 (enExample)
DE (1) DE602005025124D1 (enExample)
TW (1) TWI294228B (enExample)
WO (1) WO2006009905A1 (enExample)

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TWI294228B (en) 2008-03-01
EP1766737A1 (en) 2007-03-28
US20050286598A1 (en) 2005-12-29
EP1766737A4 (en) 2008-05-07
JP2015222824A (ja) 2015-12-10
JP6013566B2 (ja) 2016-10-25
US7154928B2 (en) 2006-12-26
KR20070028447A (ko) 2007-03-12
JP2013214772A (ja) 2013-10-17
JP2008504684A (ja) 2008-02-14
KR101211490B1 (ko) 2012-12-12
TW200601732A (en) 2006-01-01
DE602005025124D1 (de) 2011-01-13
EP1766737B1 (en) 2010-12-01
WO2006009905A1 (en) 2006-01-26

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