JP2008522439A5 - - Google Patents

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Publication number
JP2008522439A5
JP2008522439A5 JP2007544429A JP2007544429A JP2008522439A5 JP 2008522439 A5 JP2008522439 A5 JP 2008522439A5 JP 2007544429 A JP2007544429 A JP 2007544429A JP 2007544429 A JP2007544429 A JP 2007544429A JP 2008522439 A5 JP2008522439 A5 JP 2008522439A5
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JP
Japan
Prior art keywords
pulse
tuning
center wavelength
laser light
positioning mechanism
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JP2007544429A
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English (en)
Japanese (ja)
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JP5030786B2 (ja
JP2008522439A (ja
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Publication date
Priority claimed from US11/000,684 external-priority patent/US7366219B2/en
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Publication of JP2008522439A publication Critical patent/JP2008522439A/ja
Publication of JP2008522439A5 publication Critical patent/JP2008522439A5/ja
Application granted granted Critical
Publication of JP5030786B2 publication Critical patent/JP5030786B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2007544429A 2004-11-30 2005-11-28 線狭帯域化モジュール Expired - Lifetime JP5030786B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/000,684 2004-11-30
US11/000,684 US7366219B2 (en) 2004-11-30 2004-11-30 Line narrowing module
PCT/US2005/043056 WO2006060360A2 (en) 2004-11-30 2005-11-28 Line narrowing module

Publications (3)

Publication Number Publication Date
JP2008522439A JP2008522439A (ja) 2008-06-26
JP2008522439A5 true JP2008522439A5 (enExample) 2009-01-22
JP5030786B2 JP5030786B2 (ja) 2012-09-19

Family

ID=36565613

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007544429A Expired - Lifetime JP5030786B2 (ja) 2004-11-30 2005-11-28 線狭帯域化モジュール

Country Status (6)

Country Link
US (4) US7366219B2 (enExample)
EP (2) EP1831974B1 (enExample)
JP (1) JP5030786B2 (enExample)
KR (2) KR101235047B1 (enExample)
TW (1) TWI281296B (enExample)
WO (1) WO2006060360A2 (enExample)

Families Citing this family (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8379687B2 (en) * 2005-06-30 2013-02-19 Cymer, Inc. Gas discharge laser line narrowing module
US8259764B2 (en) * 2006-06-21 2012-09-04 Cymer, Inc. Bandwidth control device
US7659529B2 (en) * 2007-04-13 2010-02-09 Cymer, Inc. Method and apparatus for vibration reduction in laser system line narrowing unit wavelength selection optical element
US8144739B2 (en) * 2008-10-24 2012-03-27 Cymer, Inc. System method and apparatus for selecting and controlling light source bandwidth
US8014432B2 (en) * 2009-03-27 2011-09-06 Cymer, Inc. Regenerative ring resonator
USRE45957E1 (en) 2009-03-27 2016-03-29 Cymer, Llc Regenerative ring resonator
US8520186B2 (en) * 2009-08-25 2013-08-27 Cymer, Llc Active spectral control of optical source
US8254420B2 (en) * 2009-11-18 2012-08-28 Cymer, Inc. Advanced laser wavelength control
US8837536B2 (en) 2010-04-07 2014-09-16 Cymer, Llc Method and apparatus for controlling light bandwidth
JP2013070029A (ja) * 2011-09-08 2013-04-18 Gigaphoton Inc マスタオシレータシステムおよびレーザ装置
US9207119B2 (en) 2012-04-27 2015-12-08 Cymer, Llc Active spectral control during spectrum synthesis
CN103091860B (zh) 2012-12-28 2014-12-17 中国科学院上海光学精密机械研究所 棱镜扩束器装调仪及装调方法
US9147995B2 (en) * 2013-03-15 2015-09-29 Daylight Solutions, Inc. Rapidly tunable laser source assembly with long stroke grating mover
US9715180B2 (en) 2013-06-11 2017-07-25 Cymer, Llc Wafer-based light source parameter control
US9599510B2 (en) 2014-06-04 2017-03-21 Cymer, Llc Estimation of spectral feature of pulsed light beam
WO2016075806A1 (ja) * 2014-11-14 2016-05-19 ギガフォトン株式会社 狭帯域化モジュール、狭帯域化レーザ装置、及び、狭帯域化モジュールを位置決めする方法
WO2016189722A1 (ja) 2015-05-28 2016-12-01 ギガフォトン株式会社 レーザ装置及び狭帯域化光学系
US9785050B2 (en) 2015-06-26 2017-10-10 Cymer, Llc Pulsed light beam spectral feature control
CN105186277B (zh) * 2015-07-16 2018-05-22 中国科学院光电研究院 一种光谱控制装置
US9997888B2 (en) 2016-10-17 2018-06-12 Cymer, Llc Control of a spectral feature of a pulsed light beam
US10416471B2 (en) * 2016-10-17 2019-09-17 Cymer, Llc Spectral feature control apparatus
US9989866B2 (en) * 2016-10-17 2018-06-05 Cymer, Llc Wafer-based light source parameter control
US9835959B1 (en) 2016-10-17 2017-12-05 Cymer, Llc Controlling for wafer stage vibration
CN110383606B (zh) * 2017-04-26 2021-11-09 极光先进雷射株式会社 窄带化模块
CN110603695B (zh) 2017-06-13 2022-03-15 极光先进雷射株式会社 激光装置和光学元件的制造方法
US10585215B2 (en) 2017-06-29 2020-03-10 Cymer, Llc Reducing optical damage on an optical element
CN113383469B (zh) 2019-03-13 2023-07-11 极光先进雷射株式会社 激光装置和电子器件的制造方法
US12374853B2 (en) 2019-05-22 2025-07-29 Cymer, Llc Control system for a plurality of deep ultraviolet optical oscillators
US20220385031A1 (en) * 2019-11-07 2022-12-01 Cymer, Llc Controlling a spectral property of an output light beam produced by an optical source
US12130558B2 (en) 2019-11-08 2024-10-29 Cymer, Llc Radiation system for controlling bursts of pulses of radiation
US12476432B2 (en) 2019-12-20 2025-11-18 Cymer, Llc Directed gas purge to reduce dusting of excimer discharge chamber windows
JP7394224B2 (ja) 2019-12-23 2023-12-07 サイマー リミテッド ライアビリティ カンパニー レーザー放電チャンバ内で金属フッ化物塵埃をトラップするための充填層フィルタ
WO2021133556A1 (en) 2019-12-23 2021-07-01 Cymer, Llc Metrology for improving duv laser alignment
CN115039031B (zh) * 2020-03-19 2025-07-22 极光先进雷射株式会社 窄带化装置和电子器件的制造方法
US11329722B2 (en) 2020-03-27 2022-05-10 Relative Dynamics Incorporated Optical terminals
US20230223734A1 (en) 2020-06-09 2023-07-13 Cymer, Llc Systems and methods for controlling a center wavelength
KR102893005B1 (ko) * 2020-12-10 2025-11-27 사이머 엘엘씨 파장 분리를 증가시킨 다초점 이미징
CN116601839A (zh) 2020-12-16 2023-08-15 西默有限公司 根据准分子激光器的重复频率调制其波长的设备和方法
WO2025133752A1 (en) * 2023-12-21 2025-06-26 Cymer, Llc Apparatus for and method of wavelength control for multifocal imaging

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2631554B2 (ja) * 1989-05-23 1997-07-16 株式会社小松製作所 レーザの波長制御装置
US5095492A (en) * 1990-07-17 1992-03-10 Cymer Laser Technologies Spectral narrowing technique
JPH05167163A (ja) * 1991-12-12 1993-07-02 Mitsubishi Electric Corp 狭帯域化レーザ装置
US5898725A (en) * 1997-01-21 1999-04-27 Cymer, Inc. Excimer laser with greater spectral bandwidth and beam stability
US6128323A (en) * 1997-04-23 2000-10-03 Cymer, Inc. Reliable modular production quality narrow-band high REP rate excimer laser
US6028879A (en) 1997-06-04 2000-02-22 Cymer, Inc. Narrow band laser with etalon based output coupler
US5852627A (en) * 1997-09-10 1998-12-22 Cymer, Inc. Laser with line narrowing output coupler
US6212217B1 (en) * 1997-07-01 2001-04-03 Cymer, Inc. Smart laser with automated beam quality control
US6094448A (en) * 1997-07-01 2000-07-25 Cymer, Inc. Grating assembly with bi-directional bandwidth control
US6192064B1 (en) * 1997-07-01 2001-02-20 Cymer, Inc. Narrow band laser with fine wavelength control
US5978409A (en) * 1998-09-28 1999-11-02 Cymer, Inc. Line narrowing apparatus with high transparency prism beam expander
USRE38054E1 (en) * 1997-07-18 2003-04-01 Cymer, Inc. Reliable, modular, production quality narrow-band high rep rate F2 laser
US6529531B1 (en) * 1997-07-22 2003-03-04 Cymer, Inc. Fast wavelength correction technique for a laser
US6721340B1 (en) * 1997-07-22 2004-04-13 Cymer, Inc. Bandwidth control technique for a laser
US6853653B2 (en) * 1997-07-22 2005-02-08 Cymer, Inc. Laser spectral engineering for lithographic process
US6671294B2 (en) * 1997-07-22 2003-12-30 Cymer, Inc. Laser spectral engineering for lithographic process
US6393037B1 (en) * 1999-02-03 2002-05-21 Lambda Physik Ag Wavelength selector for laser with adjustable angular dispersion
US6163559A (en) * 1998-06-22 2000-12-19 Cymer, Inc. Beam expander for ultraviolet lasers
US6493374B1 (en) * 1999-09-03 2002-12-10 Cymer, Inc. Smart laser with fast deformable grating
US6243406B1 (en) * 1999-03-12 2001-06-05 Peter Heist Gas performance control system for gas discharge lasers
US6496528B2 (en) * 1999-09-03 2002-12-17 Cymer, Inc. Line narrowing unit with flexural grating mount
US6532247B2 (en) * 2000-02-09 2003-03-11 Cymer, Inc. Laser wavelength control unit with piezoelectric driver
JP2003518757A (ja) * 1999-12-22 2003-06-10 サイマー， インコーポレイテッド 二方向ビーム拡大を用いた狭線化レーザ
US7075963B2 (en) * 2000-01-27 2006-07-11 Lambda Physik Ag Tunable laser with stabilized grating
US6650666B2 (en) * 2000-02-09 2003-11-18 Cymer, Inc. Laser wavelength control unit with piezoelectric driver
US6856638B2 (en) * 2000-10-23 2005-02-15 Lambda Physik Ag Resonator arrangement for bandwidth control
US6760358B1 (en) * 2001-06-07 2004-07-06 Lambda Physik Ag Line-narrowing optics module having improved mechanical performance
KR20030036254A (ko) * 2001-06-13 2003-05-09 가부시키가이샤 니콘 주사노광방법 및 주사형 노광장치 그리고 디바이스 제조방법
US6992442B2 (en) * 2001-12-11 2006-01-31 Honeywell International Inc. Restricted getter
US20070104231A1 (en) * 2002-08-30 2007-05-10 Jochen Schwarz Wavelength tunable resonator with a prism

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