JP5030786B2 - 線狭帯域化モジュール - Google Patents
線狭帯域化モジュール Download PDFInfo
- Publication number
- JP5030786B2 JP5030786B2 JP2007544429A JP2007544429A JP5030786B2 JP 5030786 B2 JP5030786 B2 JP 5030786B2 JP 2007544429 A JP2007544429 A JP 2007544429A JP 2007544429 A JP2007544429 A JP 2007544429A JP 5030786 B2 JP5030786 B2 JP 5030786B2
- Authority
- JP
- Japan
- Prior art keywords
- pulse
- tuning
- diffraction grating
- center wavelength
- laser light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/105—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
- H01S3/1055—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length one of the reflectors being constituted by a diffraction grating
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70025—Production of exposure light, i.e. light sources by lasers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08004—Construction or shape of optical resonators or components thereof incorporating a dispersive element, e.g. a prism for wavelength selection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08059—Constructional details of the reflector, e.g. shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
- H01S3/2251—ArF, i.e. argon fluoride is comprised for lasing around 193 nm
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Lasers (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
Description
本出願は、本出願の同一譲受人に譲渡され、その開示内容全体が引用により本明細書に組み込まれる、代理人ドケット番号第2004−0081−01号、名称「HIGH POWER HIGH PULSE REPETITION RATE GAS DISCHARGE LASER SYSTEM BANDWIDTH MANAGEMENT(高出力高パルス繰返し率ガス放電レーザシステム帯域幅管理)」で2004年11月30日に出願された米国特許出願第11/000,571号の関連出願である、代理人ドケット番号第2004−0056−01号、名称「LINE NARROWING MODULE(線狭帯域化モジュール)」で2004年11月30日に出願された米国特許出願第11/000,684号に対する優先権を主張する。また、本出願は、名称「SPECTRAL NARROWING TECHNIQUE(スペクトル狭帯域化法)」の1992年3月10日にSandstromに付与された米国特許第5,095,492号、名称「LASER WITH LINE NARROWING OUTPUT COUPLER(線狭帯域化出力カプラを有するレーザ)」の1998年12月22日にErshovに付与された米国特許第5,852,627号、名称「Excimer laser with greater spectral bandwidth and beam stability(スペクトル帯域幅及びビーム安定性が向上したエキシマレーザ)」の1999年4月27日にFomenkov他に付与された米国特許第5,898,72号、名称「LINE NARROWING APPARATUS WITH HIGH TRANSPARENCY PRISM BEAM EXPANDER(高透過性プリズムビーム拡大器を有する線狭帯域化装置)」の1999年11月2日にDas他に付与された米国特許第5,978,409号、名称「NARROW BAND LASER WITH ETALON BASED OUTPUT COUPLER(エタロンベース出力カプラを有する狭帯域レーザ)」の2000年2月22日にErshovに付与された米国特許第6,028,879号、名称「GRATING ASSEMBLY WITH BI−DIRECTIONAL BANDWIDTH CONTROL(双方向帯域幅制御を伴う回折格子組立体)」の2000年6月25日にFomenkov他に付与された米国特許第6,094,448号、名称「BEAM EXPANDER FOR ULTRAVIOLET LASERS(紫外線レーザ用ビーム拡大器)」の2000年12月19日にWatsonに付与された米国特許第6,163,559号、名称「NARROW BAND LASER WITH FINE WAVELENGTH CONTROL(高精度波長制御を伴う狭帯域レーザ)」の2001年2月20日にAlgots他に付与された米国特許第6,192,064号、名称「SMART LASER WITH AUTOMATED BEAM QUALITY CONTROL(ビーム品質自動制御を伴うスマートレーザ)」の2001年4月3日にErie他に付与された米国特許第6,212,217号、名称「SMART LASER WITH FAST DEFORMABLE GRATING(高速変形可能回折格子)」の2002年12月10日にFomenkov他に付与された米国特許第6,493,374号、名称「LINE NARROWING UNIT WITH FLEXURAL GRATING MOUNT(曲げ回折格子マウントを有する線狭帯域化ユニット)」の2002年12月17日にTitus他に付与された米国特許第6,496,528号、名称「FAST WAVELENGTH CORRECTION TECHNIQUE FOR A LASER(レーザ用高速波長補正法)」の2003年3月4日にEverage他に付与された米国特許第6,529,531号、名称「LASER WAVELENGTH CONTROL UNIT WITH PIEZOELECTRIC DRIVER(圧電ドライバを有するレーザ波長制御装置)」の2003年3月11日にSpangler他に付与された米国特許第6,532,247号、名称「RELIABLE, MODULAR, PRODUCTION QUALITY NARROW−BAND HIGH REP RATE F2 LASER(信頼性の高いモジュール式製造用高品質狭帯域高繰返し率F2レーザ)の2003年4月1日にHofmann他に付与された米国特許第RE38,054号、名称「LASER WAVELENGTH CONTROL UNIT WITH PIEZOELECTRIC DRIVER(圧電ドライバを有するレーザ波長制御装置)の2003年11月18日にSpangler他に付与された米国特許第6,650,666号、名称「LASER SPECTRAL ENGINEERING FOR LITHOGRAPHIC PROCESS(リソグラフィプロセス用レーザスペクトルエンジニアリング)」の2003年12月30日にKroyan他に付与された米国特許第6,671,294号、名称「BANDWIDTH CONTROL TECHNIQUE FOR A LASER(レーザ用帯域幅制御法)」の2004年4月13日にFomenkov他に付与された米国特許第6,721,340号、及び名称「LINE NARROWED LASER WITH BIDIRECTION BEAM EXPANSION(双方向ビーム拡大を伴う線狭帯域化レーザ)」の2004年5月18日にPartlo他に付与された米国特許第6,738,410号の関連出願であり、これらの各々は、本出願の同一譲受人に譲渡され、各々の開示内容は引用により本明細書に組み込まれる。本出願はまた、2001年12月21日に出願され、名称「LASER SPECTRAL ENGINEERING FOR LITHOGRAPHIC PROCESS(リソグラフィプロセス用レーザスペクトルエンジニアリング)」の公開番号第2002−0167975号A1で2002年11月14日に公開された米国特許出願第10/036,925号、及び代理人ドケット番号第2004−0078−01号の名称「RELAX GAS DISCHARGE LASER LITHOGRAPHY LIGHT SOURCE(リラックスガス放電レーザリソグラフィ光源)」の2004年10月1日に出願された米国特許出願第10/956,784号の関連出願であり、これらは本出願の同一譲受人に譲渡され、その開示内容全体は引用により本明細書に組み込まれる。
「ヒステリシスを除去したレーザ共振器内に取り付けられた光学構成部品の配向を調整する装置は、電気機械素子と、駆動要素と、取り付けられた光学構成部品に結合された機械光学素子とを含む。駆動要素は、機械光学素子の配向及びその結果光学構成部品の配向をレーザ共振器内の既知の配向に調整するように、機械光学素子に接触して該機械光学素子に力を加えるよう構成される。光学構成部品は、マウントにより該光学構成部品に対して印加される応力が均一で、実質的に熱的に影響を受けないように取り付けられる。」
24 分散面
30、32 端部プレート
82、84、86、88 プリズム
100 同調ミラー
114 レーザ光パルスビーム
Claims (9)
- 公称光路を有し、パルスバースト中の出力レーザ光パルスビームパルスを生成する狭帯域DUV高出力高繰返し率ガス放電レーザ用の線狭帯域化モジュールであって、
前記線狭帯域化モジュールの光路に沿って固定的に取り付けられた分散中心波長選択光学体であって、各々のパルスを含む前記レーザ光パルスビームの前記分散中心波長選択光学体上への入射角によって少なくとも部分的に求められる少なくとも1つの中心波長を各パルスについて選択する分散中心波長選択光学体と、
前記分散中心波長選択光学体に向けた前記パルスを含む前記レーザ光パルスビームの伝送角度を選択することによって、各々のパルスを含む前記レーザ光パルスビームの前記分散中心波長選択光学体への前記入射角を選択するように部分的に動作する第1の屈折光学素子を含む第1の同調機構と、
前記第1の同調機構に向けた前記パルスを含む前記レーザ光パルスビームの少なくとも空間的に定義された部分の伝送角度を変えることによって、各々のパルスを含む前記レーザ光パルスビームの少なくとも1つの入射角を選択するように部分的に動作する、前記第1の屈折光学素子から独立して選択可能な第2の屈折光学素子を含む第2の同調機構と、
を備え、
前記第1の同調機構が、前記中心波長の値を粗く選択し、前記第2の同調機構が、前記中心波長の値を微細に選択することを特徴とする線狭帯域化モジュール。 - 前記第1及び第2の屈折光学素子は、第1及び第2のビーム拡大プリズムをそれぞれ有し、
前記第1及び第2の同調機構が、前記線狭帯域化モジュールの公称光路に対して前記第1のビーム拡大プリズム及び前記第2のビーム拡大プリズムのそれぞれの位置を変えることによって、前記分散中心波長選択光学体への前記レーザ光パルスビームの入射角を選択することを特徴とする請求項1に記載の装置。 - 前記第1及び第2の同調機構が、前記パルスバースト中の少なくとも1つの他のパルスの中心波長を検出する中心波長検出器からのフィードバックに基づいて、前記バースト中に中心波長制御装置によって制御され、前記制御装置が、前記バースト中の前記少なくとも1つの他のパルスについて前記検出中心波長を採用するアルゴリズムに基づいて前記フィードバックを提供することを特徴とする請求項1に記載の装置。
- 前記第1及び第2の同調機構が各々、電気機械的な粗い位置決め機構と、作動時に位置又は形状を変える作動可能材料を含む微細な位置決め機構とを備えることを特徴とする請求項1に記載の装置。
- 前記作動可能材料が、電気作動可能材料と、磁気作動可能材料と、音響作動可能材料とからなるグループから選択されることを特徴とする請求項4に記載の装置。
- 前記作動可能材料が圧電材料であることを特徴とする請求項5に記載の装置。
- 前記第1の同調機構が、微同調位置決め機構なしに電気機械位置決め機構を含む第1の伝送角度選択機構を含み、
前記第2の同調機構が、粗い同調位置決め機構なしに作動材料位置決め機構を含む第2の伝送角度選択機構を含む、
ことを特徴とする請求項4に記載の装置。 - 前記作動可能材料位置決め機構が、作動時に位置又は形状を変える作動可能材料を含むことを特徴とする請求項7に記載の装置。
- 前記作動可能材料が、圧電材料を含むことを特徴とする請求項8に記載の装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/000,684 US7366219B2 (en) | 2004-11-30 | 2004-11-30 | Line narrowing module |
US11/000,684 | 2004-11-30 | ||
PCT/US2005/043056 WO2006060360A2 (en) | 2004-11-30 | 2005-11-28 | Line narrowing module |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2008522439A JP2008522439A (ja) | 2008-06-26 |
JP2008522439A5 JP2008522439A5 (ja) | 2009-01-22 |
JP5030786B2 true JP5030786B2 (ja) | 2012-09-19 |
Family
ID=36565613
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007544429A Active JP5030786B2 (ja) | 2004-11-30 | 2005-11-28 | 線狭帯域化モジュール |
Country Status (6)
Country | Link |
---|---|
US (4) | US7366219B2 (ja) |
EP (2) | EP1831974B1 (ja) |
JP (1) | JP5030786B2 (ja) |
KR (2) | KR101235047B1 (ja) |
TW (1) | TWI281296B (ja) |
WO (1) | WO2006060360A2 (ja) |
Families Citing this family (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8379687B2 (en) * | 2005-06-30 | 2013-02-19 | Cymer, Inc. | Gas discharge laser line narrowing module |
US8259764B2 (en) * | 2006-06-21 | 2012-09-04 | Cymer, Inc. | Bandwidth control device |
US7659529B2 (en) * | 2007-04-13 | 2010-02-09 | Cymer, Inc. | Method and apparatus for vibration reduction in laser system line narrowing unit wavelength selection optical element |
US8144739B2 (en) * | 2008-10-24 | 2012-03-27 | Cymer, Inc. | System method and apparatus for selecting and controlling light source bandwidth |
US8014432B2 (en) * | 2009-03-27 | 2011-09-06 | Cymer, Inc. | Regenerative ring resonator |
USRE45957E1 (en) | 2009-03-27 | 2016-03-29 | Cymer, Llc | Regenerative ring resonator |
US8520186B2 (en) * | 2009-08-25 | 2013-08-27 | Cymer, Llc | Active spectral control of optical source |
US8254420B2 (en) * | 2009-11-18 | 2012-08-28 | Cymer, Inc. | Advanced laser wavelength control |
US8837536B2 (en) | 2010-04-07 | 2014-09-16 | Cymer, Llc | Method and apparatus for controlling light bandwidth |
JP2013070029A (ja) * | 2011-09-08 | 2013-04-18 | Gigaphoton Inc | マスタオシレータシステムおよびレーザ装置 |
US9207119B2 (en) | 2012-04-27 | 2015-12-08 | Cymer, Llc | Active spectral control during spectrum synthesis |
CN103091860B (zh) | 2012-12-28 | 2014-12-17 | 中国科学院上海光学精密机械研究所 | 棱镜扩束器装调仪及装调方法 |
US9147995B2 (en) * | 2013-03-15 | 2015-09-29 | Daylight Solutions, Inc. | Rapidly tunable laser source assembly with long stroke grating mover |
US9715180B2 (en) | 2013-06-11 | 2017-07-25 | Cymer, Llc | Wafer-based light source parameter control |
US9599510B2 (en) | 2014-06-04 | 2017-03-21 | Cymer, Llc | Estimation of spectral feature of pulsed light beam |
WO2016075806A1 (ja) * | 2014-11-14 | 2016-05-19 | ギガフォトン株式会社 | 狭帯域化モジュール、狭帯域化レーザ装置、及び、狭帯域化モジュールを位置決めする方法 |
WO2016189722A1 (ja) | 2015-05-28 | 2016-12-01 | ギガフォトン株式会社 | レーザ装置及び狭帯域化光学系 |
US9785050B2 (en) | 2015-06-26 | 2017-10-10 | Cymer, Llc | Pulsed light beam spectral feature control |
CN105186277B (zh) * | 2015-07-16 | 2018-05-22 | 中国科学院光电研究院 | 一种光谱控制装置 |
US9835959B1 (en) | 2016-10-17 | 2017-12-05 | Cymer, Llc | Controlling for wafer stage vibration |
US10416471B2 (en) * | 2016-10-17 | 2019-09-17 | Cymer, Llc | Spectral feature control apparatus |
US9997888B2 (en) | 2016-10-17 | 2018-06-12 | Cymer, Llc | Control of a spectral feature of a pulsed light beam |
US9989866B2 (en) | 2016-10-17 | 2018-06-05 | Cymer, Llc | Wafer-based light source parameter control |
CN110383606B (zh) * | 2017-04-26 | 2021-11-09 | 极光先进雷射株式会社 | 窄带化模块 |
WO2018229854A1 (ja) | 2017-06-13 | 2018-12-20 | ギガフォトン株式会社 | レーザ装置及び光学素子の製造方法 |
US10585215B2 (en) | 2017-06-29 | 2020-03-10 | Cymer, Llc | Reducing optical damage on an optical element |
WO2020183644A1 (ja) | 2019-03-13 | 2020-09-17 | ギガフォトン株式会社 | レーザ装置、及び電子デバイスの製造方法 |
WO2021126641A1 (en) | 2019-12-20 | 2021-06-24 | Cymer, Llc | Directed gas purge to reduce dusting of excimer discharge chamber windows |
KR20220106844A (ko) | 2019-12-23 | 2022-07-29 | 사이머 엘엘씨 | Duv 레이저 정렬을 개선하기 위한 계측법 |
WO2021133568A1 (en) | 2019-12-23 | 2021-07-01 | Cymer, Llc | Packed-bed filter for metal fluoride dust trapping in laser discharge chambers |
US11329722B2 (en) | 2020-03-27 | 2022-05-10 | Relative Dynamics Incorporated | Optical terminals |
KR20230010237A (ko) | 2020-06-09 | 2023-01-18 | 사이머 엘엘씨 | 중심 파장 제어를 위한 시스템 및 방법 |
US20240006838A1 (en) | 2020-12-16 | 2024-01-04 | Cymer, Llc | Apparatus for and method of modulating a wavelength of an excimer laser as a function of its repetition frequency |
Family Cites Families (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2631554B2 (ja) * | 1989-05-23 | 1997-07-16 | 株式会社小松製作所 | レーザの波長制御装置 |
US5095492A (en) | 1990-07-17 | 1992-03-10 | Cymer Laser Technologies | Spectral narrowing technique |
JPH05167163A (ja) * | 1991-12-12 | 1993-07-02 | Mitsubishi Electric Corp | 狭帯域化レーザ装置 |
US5898725A (en) | 1997-01-21 | 1999-04-27 | Cymer, Inc. | Excimer laser with greater spectral bandwidth and beam stability |
US6128323A (en) * | 1997-04-23 | 2000-10-03 | Cymer, Inc. | Reliable modular production quality narrow-band high REP rate excimer laser |
US6028879A (en) * | 1997-06-04 | 2000-02-22 | Cymer, Inc. | Narrow band laser with etalon based output coupler |
US5852627A (en) * | 1997-09-10 | 1998-12-22 | Cymer, Inc. | Laser with line narrowing output coupler |
US6212217B1 (en) | 1997-07-01 | 2001-04-03 | Cymer, Inc. | Smart laser with automated beam quality control |
US6192064B1 (en) * | 1997-07-01 | 2001-02-20 | Cymer, Inc. | Narrow band laser with fine wavelength control |
US6094448A (en) | 1997-07-01 | 2000-07-25 | Cymer, Inc. | Grating assembly with bi-directional bandwidth control |
US5978409A (en) | 1998-09-28 | 1999-11-02 | Cymer, Inc. | Line narrowing apparatus with high transparency prism beam expander |
USRE38054E1 (en) | 1997-07-18 | 2003-04-01 | Cymer, Inc. | Reliable, modular, production quality narrow-band high rep rate F2 laser |
US6721340B1 (en) | 1997-07-22 | 2004-04-13 | Cymer, Inc. | Bandwidth control technique for a laser |
US6529531B1 (en) | 1997-07-22 | 2003-03-04 | Cymer, Inc. | Fast wavelength correction technique for a laser |
US6671294B2 (en) | 1997-07-22 | 2003-12-30 | Cymer, Inc. | Laser spectral engineering for lithographic process |
US6853653B2 (en) | 1997-07-22 | 2005-02-08 | Cymer, Inc. | Laser spectral engineering for lithographic process |
US6393037B1 (en) * | 1999-02-03 | 2002-05-21 | Lambda Physik Ag | Wavelength selector for laser with adjustable angular dispersion |
US6163559A (en) | 1998-06-22 | 2000-12-19 | Cymer, Inc. | Beam expander for ultraviolet lasers |
US6493374B1 (en) | 1999-09-03 | 2002-12-10 | Cymer, Inc. | Smart laser with fast deformable grating |
US6243406B1 (en) * | 1999-03-12 | 2001-06-05 | Peter Heist | Gas performance control system for gas discharge lasers |
US6496528B2 (en) | 1999-09-03 | 2002-12-17 | Cymer, Inc. | Line narrowing unit with flexural grating mount |
US6532247B2 (en) | 2000-02-09 | 2003-03-11 | Cymer, Inc. | Laser wavelength control unit with piezoelectric driver |
EP1240694B1 (en) | 1999-12-22 | 2006-11-22 | Cymer, Inc. | Line narrowed laser with bidirection beam expansion |
US7075963B2 (en) * | 2000-01-27 | 2006-07-11 | Lambda Physik Ag | Tunable laser with stabilized grating |
US6650666B2 (en) | 2000-02-09 | 2003-11-18 | Cymer, Inc. | Laser wavelength control unit with piezoelectric driver |
US6856638B2 (en) * | 2000-10-23 | 2005-02-15 | Lambda Physik Ag | Resonator arrangement for bandwidth control |
US6760358B1 (en) | 2001-06-07 | 2004-07-06 | Lambda Physik Ag | Line-narrowing optics module having improved mechanical performance |
KR20030036254A (ko) * | 2001-06-13 | 2003-05-09 | 가부시키가이샤 니콘 | 주사노광방법 및 주사형 노광장치 그리고 디바이스 제조방법 |
US6992442B2 (en) | 2001-12-11 | 2006-01-31 | Honeywell International Inc. | Restricted getter |
EP1537637B1 (en) * | 2002-08-30 | 2006-11-15 | Agilent Technologies, Inc. | Wavelength tunable resonator with a prism |
-
2004
- 2004-11-30 US US11/000,684 patent/US7366219B2/en active Active
-
2005
- 2005-11-25 TW TW094141498A patent/TWI281296B/zh active
- 2005-11-28 KR KR1020127002413A patent/KR101235047B1/ko active IP Right Grant
- 2005-11-28 EP EP05826233.8A patent/EP1831974B1/en active Active
- 2005-11-28 EP EP13179720.1A patent/EP2665141B1/en active Active
- 2005-11-28 JP JP2007544429A patent/JP5030786B2/ja active Active
- 2005-11-28 KR KR1020077012317A patent/KR101147316B1/ko active IP Right Grant
- 2005-11-28 WO PCT/US2005/043056 patent/WO2006060360A2/en active Application Filing
-
2008
- 2008-02-28 US US12/074,079 patent/US7653112B2/en active Active
-
2009
- 2009-12-14 US US12/653,584 patent/US20100097704A1/en not_active Abandoned
-
2011
- 2011-04-14 US US13/086,858 patent/US8126027B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
US7366219B2 (en) | 2008-04-29 |
US20060114957A1 (en) | 2006-06-01 |
TWI281296B (en) | 2007-05-11 |
WO2006060360A3 (en) | 2006-10-26 |
EP2665141B1 (en) | 2019-04-03 |
KR101147316B1 (ko) | 2012-05-18 |
KR101235047B1 (ko) | 2013-02-21 |
US20110194580A1 (en) | 2011-08-11 |
TW200627736A (en) | 2006-08-01 |
US8126027B2 (en) | 2012-02-28 |
KR20070084624A (ko) | 2007-08-24 |
US20100097704A1 (en) | 2010-04-22 |
JP2008522439A (ja) | 2008-06-26 |
EP1831974A2 (en) | 2007-09-12 |
EP1831974A4 (en) | 2010-11-24 |
WO2006060360A2 (en) | 2006-06-08 |
US20080151944A1 (en) | 2008-06-26 |
EP1831974B1 (en) | 2017-02-08 |
EP2665141A1 (en) | 2013-11-20 |
US7653112B2 (en) | 2010-01-26 |
KR20120025004A (ko) | 2012-03-14 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5030786B2 (ja) | 線狭帯域化モジュール | |
KR100909018B1 (ko) | 레이저 리소그래피 빔송출 광원 | |
US7382815B2 (en) | Laser spectral engineering for lithographic process | |
US6330261B1 (en) | Reliable, modular, production quality narrow-band high rep rate ArF excimer laser | |
US6856638B2 (en) | Resonator arrangement for bandwidth control | |
US6560254B2 (en) | Line-narrowing module for high power laser | |
JP2005525001A5 (ja) | ||
US20110122901A1 (en) | High power high pulse repetition rate gas discharge laser system | |
US20050265417A1 (en) | Control system for a two chamber gas discharge laser | |
JP2005525001A (ja) | ビーム伝達及びビーム照準制御を備えるリソグラフィレーザ | |
US20020186741A1 (en) | Very narrow band excimer or molecular fluorine laser | |
US20040057489A1 (en) | Control system for a two chamber gas discharge laser | |
JP2006049839A (ja) | 高出力ガスレーザ装置 | |
US8624209B1 (en) | Controlling spatial properties in an excimer ring amplifier | |
JP5337848B2 (ja) | 高出力ガスレーザ装置 | |
WO1999060674A1 (en) | RELIABLE MODULAR PRODUCTION QUALITY NARROW-BAND HIGH REP RATE ArF EXCIMER LASER | |
US20230187896A1 (en) | Line narrowing module, gas laser apparatus, and method for manufacturing electronic devices | |
JP7209104B2 (ja) | 深紫外線光源のための光学素子 | |
RU2340057C2 (ru) | Лазерный литографический источник света с доставкой пучка | |
TW556374B (en) | Laser lithography light source with beam delivery | |
CN116491034A (zh) | 具有增加的波长分离的多焦点成像 | |
WO2001041269A1 (en) | Very narrow band excimer or molecular fluorine laser |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20081127 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20081127 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20110704 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20111004 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20120618 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20120626 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5030786 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20150706 Year of fee payment: 3 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313111 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
RD02 | Notification of acceptance of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: R3D02 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |