|
US3924201A
(en)
*
|
1972-10-02 |
1975-12-02 |
Int Laser Systems Inc |
Laser apparatus employing mechanical stabilization means
|
|
US4551684A
(en)
|
1983-02-04 |
1985-11-05 |
Spectra-Physics, Inc. |
Noise reduction in laser amplifiers
|
|
US4559627A
(en)
*
|
1984-06-18 |
1985-12-17 |
General Electric Company |
Face pumped rectangular slab laser apparatus having an improved optical resonator cavity
|
|
JPH03203279A
(ja)
|
1989-12-28 |
1991-09-04 |
Toshiba Corp |
ガスレーザ発振器
|
|
US5179564A
(en)
|
1991-10-23 |
1993-01-12 |
United Technologies Corporation |
Linear polarization control of high power lasers
|
|
US5179563A
(en)
*
|
1991-10-23 |
1993-01-12 |
United Technologies Corporation |
Linear polarization control of high power lasers
|
|
JPH0613682A
(ja)
|
1992-06-26 |
1994-01-21 |
Fanuc Ltd |
炭酸ガスレーザ発振装置
|
|
US5383199A
(en)
*
|
1992-07-02 |
1995-01-17 |
Advanced Interventional Systems, Inc. |
Apparatus and method for optically controlling the output energy of a pulsed laser source
|
|
US5406578A
(en)
*
|
1992-08-06 |
1995-04-11 |
Carl-Zeiss-Stiftung |
Unstable laser resonator for generating a stable fundamental mode beam profile
|
|
US5392308A
(en)
*
|
1993-01-07 |
1995-02-21 |
Sdl, Inc. |
Semiconductor laser with integral spatial mode filter
|
|
US5390211A
(en)
*
|
1993-08-24 |
1995-02-14 |
Spectra-Physics Lasers, Inc. |
Optical parametric oscillator with unstable resonator
|
|
US5457707A
(en)
*
|
1993-08-24 |
1995-10-10 |
Spectra-Physics Lasers, Inc. |
Master optical parametric oscillator/power optical parametric oscillator
|
|
US5684822A
(en)
*
|
1994-11-17 |
1997-11-04 |
Cymer, Inc. |
Laser system with anamorphic confocal unstable resonator
|
|
JPH08191166A
(ja)
|
1995-01-12 |
1996-07-23 |
Toshiba Corp |
ガスレ−ザ装置
|
|
US5557630A
(en)
*
|
1995-01-13 |
1996-09-17 |
Scaggs; Michael J. |
Unstable laser resonator
|
|
IL112546A
(en)
*
|
1995-02-06 |
1999-04-11 |
Oramir Semiconductor Ltd |
Laser pulse extender
|
|
JP3390603B2
(ja)
|
1995-05-31 |
2003-03-24 |
株式会社半導体エネルギー研究所 |
レーザー処理方法
|
|
US5808178A
(en)
*
|
1995-10-16 |
1998-09-15 |
Thermedics Detection Inc. |
High speed gas chromatography
|
|
US5748656A
(en)
*
|
1996-01-05 |
1998-05-05 |
Cymer, Inc. |
Laser having improved beam quality and reduced operating cost
|
|
DE19606555A1
(de)
*
|
1996-02-22 |
1997-08-28 |
Laser Medizin Zentrum Ggmbh |
Oszillator-Lichtleiter-Verstärker Anordnung für Laserstrahlen
|
|
US6437824B1
(en)
|
1997-02-07 |
2002-08-20 |
Canon Kabushiki Kaisha |
Image pickup apparatus and system
|
|
US6317447B1
(en)
*
|
2000-01-25 |
2001-11-13 |
Cymer, Inc. |
Electric discharge laser with acoustic chirp correction
|
|
US6034977A
(en)
*
|
1998-02-17 |
2000-03-07 |
Trw Inc. |
Optical path difference control system and method for solid state lasers
|
|
US5946337A
(en)
|
1998-04-29 |
1999-08-31 |
Lambda Physik Gmbh |
Hybrid laser resonator with special line narrowing
|
|
US6868106B1
(en)
|
1998-06-04 |
2005-03-15 |
Lambda Physik Ag |
Resonator optics for high power UV lasers
|
|
US6067311A
(en)
*
|
1998-09-04 |
2000-05-23 |
Cymer, Inc. |
Excimer laser with pulse multiplier
|
|
US6567450B2
(en)
*
|
1999-12-10 |
2003-05-20 |
Cymer, Inc. |
Very narrow band, two chamber, high rep rate gas discharge laser system
|
|
US6212211B1
(en)
*
|
1998-10-09 |
2001-04-03 |
Cymer, Inc. |
Shock wave dissipating laser chamber
|
|
US6535535B1
(en)
*
|
1999-02-12 |
2003-03-18 |
Semiconductor Energy Laboratory Co., Ltd. |
Laser irradiation method, laser irradiation apparatus, and semiconductor device
|
|
US6625191B2
(en)
*
|
1999-12-10 |
2003-09-23 |
Cymer, Inc. |
Very narrow band, two chamber, high rep rate gas discharge laser system
|
|
US6549551B2
(en)
*
|
1999-09-27 |
2003-04-15 |
Cymer, Inc. |
Injection seeded laser with precise timing control
|
|
US6801560B2
(en)
*
|
1999-05-10 |
2004-10-05 |
Cymer, Inc. |
Line selected F2 two chamber laser system
|
|
US6535531B1
(en)
*
|
2001-11-29 |
2003-03-18 |
Cymer, Inc. |
Gas discharge laser with pulse multiplier
|
|
US6865210B2
(en)
*
|
2001-05-03 |
2005-03-08 |
Cymer, Inc. |
Timing control for two-chamber gas discharge laser system
|
|
US6381257B1
(en)
*
|
1999-09-27 |
2002-04-30 |
Cymer, Inc. |
Very narrow band injection seeded F2 lithography laser
|
|
JP3562389B2
(ja)
|
1999-06-25 |
2004-09-08 |
三菱電機株式会社 |
レーザ熱処理装置
|
|
JP2001269789A
(ja)
|
2000-01-20 |
2001-10-02 |
Komatsu Ltd |
レーザ加工装置
|
|
JP3629515B2
(ja)
*
|
2000-09-11 |
2005-03-16 |
独立行政法人情報通信研究機構 |
モード同期レーザ装置
|
|
US6538737B2
(en)
*
|
2001-01-29 |
2003-03-25 |
Cymer, Inc. |
High resolution etalon-grating spectrometer
|
|
US6704340B2
(en)
*
|
2001-01-29 |
2004-03-09 |
Cymer, Inc. |
Lithography laser system with in-place alignment tool
|
|
US6690704B2
(en)
*
|
2001-04-09 |
2004-02-10 |
Cymer, Inc. |
Control system for a two chamber gas discharge laser
|
|
US7079564B2
(en)
*
|
2001-04-09 |
2006-07-18 |
Cymer, Inc. |
Control system for a two chamber gas discharge laser
|
|
US7039086B2
(en)
*
|
2001-04-09 |
2006-05-02 |
Cymer, Inc. |
Control system for a two chamber gas discharge laser
|
|
US7061959B2
(en)
*
|
2001-04-18 |
2006-06-13 |
Tcz Gmbh |
Laser thin film poly-silicon annealing system
|
|
US7009140B2
(en)
*
|
2001-04-18 |
2006-03-07 |
Cymer, Inc. |
Laser thin film poly-silicon annealing optical system
|
|
US7167499B2
(en)
*
|
2001-04-18 |
2007-01-23 |
Tcz Pte. Ltd. |
Very high energy, high stability gas discharge laser surface treatment system
|
|
US20050259709A1
(en)
|
2002-05-07 |
2005-11-24 |
Cymer, Inc. |
Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate
|
|
US6928093B2
(en)
*
|
2002-05-07 |
2005-08-09 |
Cymer, Inc. |
Long delay and high TIS pulse stretcher
|
|
US6963595B2
(en)
*
|
2001-08-29 |
2005-11-08 |
Cymer, Inc. |
Automatic gas control system for a gas discharge laser
|
|
US20030120362A1
(en)
|
2001-12-21 |
2003-06-26 |
Shchegrov Andrel Vyacheslavovich |
Method for modeling and design of coupled cavity laser devices
|
|
US6875949B2
(en)
|
2003-03-19 |
2005-04-05 |
Edison Welding Institute |
Method of welding titanium and titanium based alloys to ferrous metals
|
|
US7277188B2
(en)
|
2003-04-29 |
2007-10-02 |
Cymer, Inc. |
Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate
|
|
US7642038B2
(en)
|
2004-03-24 |
2010-01-05 |
Semiconductor Energy Laboratory Co., Ltd. |
Method for forming pattern, thin film transistor, display device, method for manufacturing thereof, and television apparatus
|
|
US7564888B2
(en)
|
2004-05-18 |
2009-07-21 |
Cymer, Inc. |
High power excimer laser with a pulse stretcher
|
|
US20050280887A1
(en)
*
|
2004-06-02 |
2005-12-22 |
Betin Alexander A |
Outcoupler with bragg grating and system and method using same
|
|
US7843978B2
(en)
*
|
2005-02-04 |
2010-11-30 |
Jds Uniphase Corporation |
Passively Q-switched laser with adjustable pulse repetition rate
|
|
US7471455B2
(en)
|
2005-10-28 |
2008-12-30 |
Cymer, Inc. |
Systems and methods for generating laser light shaped as a line beam
|
|
US7433372B2
(en)
|
2006-06-05 |
2008-10-07 |
Cymer, Inc. |
Device and method to stabilize beam shape and symmetry for high energy pulsed laser applications
|