TWI281296B - Line narrowing module - Google Patents
Line narrowing module Download PDFInfo
- Publication number
- TWI281296B TWI281296B TW094141498A TW94141498A TWI281296B TW I281296 B TWI281296 B TW I281296B TW 094141498 A TW094141498 A TW 094141498A TW 94141498 A TW94141498 A TW 94141498A TW I281296 B TWI281296 B TW I281296B
- Authority
- TW
- Taiwan
- Prior art keywords
- line narrowing
- narrowing module
- spectral line
- center wavelength
- pulse
- Prior art date
Links
- 230000007246 mechanism Effects 0.000 claims abstract description 240
- 230000003287 optical effect Effects 0.000 claims abstract description 163
- 239000000463 material Substances 0.000 claims abstract description 128
- 238000000034 method Methods 0.000 claims abstract description 41
- 230000005540 biological transmission Effects 0.000 claims abstract description 37
- 230000003595 spectral effect Effects 0.000 claims description 129
- 230000008569 process Effects 0.000 claims description 23
- 230000008859 change Effects 0.000 claims description 17
- 230000010339 dilation Effects 0.000 claims description 15
- 238000001228 spectrum Methods 0.000 claims description 12
- 230000009172 bursting Effects 0.000 claims description 8
- 238000013519 translation Methods 0.000 claims description 7
- 238000000576 coating method Methods 0.000 claims description 5
- 239000011248 coating agent Substances 0.000 claims description 4
- 150000001875 compounds Chemical class 0.000 claims description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 2
- 229910052731 fluorine Inorganic materials 0.000 claims description 2
- 239000011737 fluorine Substances 0.000 claims description 2
- 230000001568 sexual effect Effects 0.000 claims 6
- 238000005259 measurement Methods 0.000 claims 2
- 230000007774 longterm Effects 0.000 claims 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 25
- 239000001301 oxygen Substances 0.000 description 25
- 229910052760 oxygen Inorganic materials 0.000 description 25
- 239000000758 substrate Substances 0.000 description 25
- 239000007789 gas Substances 0.000 description 17
- 230000000694 effects Effects 0.000 description 12
- 229910052751 metal Inorganic materials 0.000 description 11
- 239000002184 metal Substances 0.000 description 11
- 230000002745 absorbent Effects 0.000 description 6
- 239000002250 absorbent Substances 0.000 description 6
- 239000006185 dispersion Substances 0.000 description 6
- 238000001459 lithography Methods 0.000 description 6
- 239000006096 absorbing agent Substances 0.000 description 5
- 230000002457 bidirectional effect Effects 0.000 description 5
- 238000006073 displacement reaction Methods 0.000 description 5
- 230000033001 locomotion Effects 0.000 description 5
- 210000003813 thumb Anatomy 0.000 description 5
- 230000003321 amplification Effects 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- 238000003199 nucleic acid amplification method Methods 0.000 description 4
- 230000014616 translation Effects 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 230000015556 catabolic process Effects 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 238000006731 degradation reaction Methods 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 230000004075 alteration Effects 0.000 description 2
- 230000000712 assembly Effects 0.000 description 2
- 238000000429 assembly Methods 0.000 description 2
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 2
- 238000012937 correction Methods 0.000 description 2
- 230000005284 excitation Effects 0.000 description 2
- 238000005247 gettering Methods 0.000 description 2
- 239000003292 glue Substances 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 238000006303 photolysis reaction Methods 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 238000002310 reflectometry Methods 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 241001674044 Blattodea Species 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 229910001374 Invar Inorganic materials 0.000 description 1
- 241000238633 Odonata Species 0.000 description 1
- 235000006040 Prunus persica var persica Nutrition 0.000 description 1
- 240000006413 Prunus persica var. persica Species 0.000 description 1
- 241000239226 Scorpiones Species 0.000 description 1
- 229910052770 Uranium Inorganic materials 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000010494 dissociation reaction Methods 0.000 description 1
- 230000005593 dissociations Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000007717 exclusion Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 230000005923 long-lasting effect Effects 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000010349 pulsation Effects 0.000 description 1
- 238000003908 quality control method Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000009966 trimming Methods 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
- DNYWZCXLKNTFFI-UHFFFAOYSA-N uranium Chemical compound [U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U] DNYWZCXLKNTFFI-UHFFFAOYSA-N 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/105—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
- H01S3/1055—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length one of the reflectors being constituted by a diffraction grating
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70025—Production of exposure light, i.e. light sources by lasers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08004—Construction or shape of optical resonators or components thereof incorporating a dispersive element, e.g. a prism for wavelength selection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08059—Constructional details of the reflector, e.g. shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
- H01S3/2251—ArF, i.e. argon fluoride is comprised for lasing around 193 nm
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Lasers (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/000,684 US7366219B2 (en) | 2004-11-30 | 2004-11-30 | Line narrowing module |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200627736A TW200627736A (en) | 2006-08-01 |
| TWI281296B true TWI281296B (en) | 2007-05-11 |
Family
ID=36565613
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW094141498A TWI281296B (en) | 2004-11-30 | 2005-11-25 | Line narrowing module |
Country Status (6)
| Country | Link |
|---|---|
| US (4) | US7366219B2 (enExample) |
| EP (2) | EP1831974B1 (enExample) |
| JP (1) | JP5030786B2 (enExample) |
| KR (2) | KR101235047B1 (enExample) |
| TW (1) | TWI281296B (enExample) |
| WO (1) | WO2006060360A2 (enExample) |
Families Citing this family (39)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8379687B2 (en) * | 2005-06-30 | 2013-02-19 | Cymer, Inc. | Gas discharge laser line narrowing module |
| US8259764B2 (en) * | 2006-06-21 | 2012-09-04 | Cymer, Inc. | Bandwidth control device |
| US7659529B2 (en) * | 2007-04-13 | 2010-02-09 | Cymer, Inc. | Method and apparatus for vibration reduction in laser system line narrowing unit wavelength selection optical element |
| US8144739B2 (en) * | 2008-10-24 | 2012-03-27 | Cymer, Inc. | System method and apparatus for selecting and controlling light source bandwidth |
| US8014432B2 (en) * | 2009-03-27 | 2011-09-06 | Cymer, Inc. | Regenerative ring resonator |
| USRE45957E1 (en) | 2009-03-27 | 2016-03-29 | Cymer, Llc | Regenerative ring resonator |
| US8520186B2 (en) * | 2009-08-25 | 2013-08-27 | Cymer, Llc | Active spectral control of optical source |
| US8254420B2 (en) * | 2009-11-18 | 2012-08-28 | Cymer, Inc. | Advanced laser wavelength control |
| US8837536B2 (en) | 2010-04-07 | 2014-09-16 | Cymer, Llc | Method and apparatus for controlling light bandwidth |
| JP2013070029A (ja) * | 2011-09-08 | 2013-04-18 | Gigaphoton Inc | マスタオシレータシステムおよびレーザ装置 |
| US9207119B2 (en) | 2012-04-27 | 2015-12-08 | Cymer, Llc | Active spectral control during spectrum synthesis |
| CN103091860B (zh) | 2012-12-28 | 2014-12-17 | 中国科学院上海光学精密机械研究所 | 棱镜扩束器装调仪及装调方法 |
| US9147995B2 (en) * | 2013-03-15 | 2015-09-29 | Daylight Solutions, Inc. | Rapidly tunable laser source assembly with long stroke grating mover |
| US9715180B2 (en) | 2013-06-11 | 2017-07-25 | Cymer, Llc | Wafer-based light source parameter control |
| US9599510B2 (en) | 2014-06-04 | 2017-03-21 | Cymer, Llc | Estimation of spectral feature of pulsed light beam |
| WO2016075806A1 (ja) * | 2014-11-14 | 2016-05-19 | ギガフォトン株式会社 | 狭帯域化モジュール、狭帯域化レーザ装置、及び、狭帯域化モジュールを位置決めする方法 |
| WO2016189722A1 (ja) | 2015-05-28 | 2016-12-01 | ギガフォトン株式会社 | レーザ装置及び狭帯域化光学系 |
| US9785050B2 (en) | 2015-06-26 | 2017-10-10 | Cymer, Llc | Pulsed light beam spectral feature control |
| CN105186277B (zh) * | 2015-07-16 | 2018-05-22 | 中国科学院光电研究院 | 一种光谱控制装置 |
| US9997888B2 (en) | 2016-10-17 | 2018-06-12 | Cymer, Llc | Control of a spectral feature of a pulsed light beam |
| US10416471B2 (en) * | 2016-10-17 | 2019-09-17 | Cymer, Llc | Spectral feature control apparatus |
| US9989866B2 (en) * | 2016-10-17 | 2018-06-05 | Cymer, Llc | Wafer-based light source parameter control |
| US9835959B1 (en) | 2016-10-17 | 2017-12-05 | Cymer, Llc | Controlling for wafer stage vibration |
| CN110383606B (zh) * | 2017-04-26 | 2021-11-09 | 极光先进雷射株式会社 | 窄带化模块 |
| CN110603695B (zh) | 2017-06-13 | 2022-03-15 | 极光先进雷射株式会社 | 激光装置和光学元件的制造方法 |
| US10585215B2 (en) | 2017-06-29 | 2020-03-10 | Cymer, Llc | Reducing optical damage on an optical element |
| CN113383469B (zh) | 2019-03-13 | 2023-07-11 | 极光先进雷射株式会社 | 激光装置和电子器件的制造方法 |
| US12374853B2 (en) | 2019-05-22 | 2025-07-29 | Cymer, Llc | Control system for a plurality of deep ultraviolet optical oscillators |
| US20220385031A1 (en) * | 2019-11-07 | 2022-12-01 | Cymer, Llc | Controlling a spectral property of an output light beam produced by an optical source |
| US12130558B2 (en) | 2019-11-08 | 2024-10-29 | Cymer, Llc | Radiation system for controlling bursts of pulses of radiation |
| US12476432B2 (en) | 2019-12-20 | 2025-11-18 | Cymer, Llc | Directed gas purge to reduce dusting of excimer discharge chamber windows |
| JP7394224B2 (ja) | 2019-12-23 | 2023-12-07 | サイマー リミテッド ライアビリティ カンパニー | レーザー放電チャンバ内で金属フッ化物塵埃をトラップするための充填層フィルタ |
| WO2021133556A1 (en) | 2019-12-23 | 2021-07-01 | Cymer, Llc | Metrology for improving duv laser alignment |
| CN115039031B (zh) * | 2020-03-19 | 2025-07-22 | 极光先进雷射株式会社 | 窄带化装置和电子器件的制造方法 |
| US11329722B2 (en) | 2020-03-27 | 2022-05-10 | Relative Dynamics Incorporated | Optical terminals |
| US20230223734A1 (en) | 2020-06-09 | 2023-07-13 | Cymer, Llc | Systems and methods for controlling a center wavelength |
| KR102893005B1 (ko) * | 2020-12-10 | 2025-11-27 | 사이머 엘엘씨 | 파장 분리를 증가시킨 다초점 이미징 |
| CN116601839A (zh) | 2020-12-16 | 2023-08-15 | 西默有限公司 | 根据准分子激光器的重复频率调制其波长的设备和方法 |
| WO2025133752A1 (en) * | 2023-12-21 | 2025-06-26 | Cymer, Llc | Apparatus for and method of wavelength control for multifocal imaging |
Family Cites Families (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2631554B2 (ja) * | 1989-05-23 | 1997-07-16 | 株式会社小松製作所 | レーザの波長制御装置 |
| US5095492A (en) * | 1990-07-17 | 1992-03-10 | Cymer Laser Technologies | Spectral narrowing technique |
| JPH05167163A (ja) * | 1991-12-12 | 1993-07-02 | Mitsubishi Electric Corp | 狭帯域化レーザ装置 |
| US5898725A (en) * | 1997-01-21 | 1999-04-27 | Cymer, Inc. | Excimer laser with greater spectral bandwidth and beam stability |
| US6128323A (en) * | 1997-04-23 | 2000-10-03 | Cymer, Inc. | Reliable modular production quality narrow-band high REP rate excimer laser |
| US6028879A (en) | 1997-06-04 | 2000-02-22 | Cymer, Inc. | Narrow band laser with etalon based output coupler |
| US5852627A (en) * | 1997-09-10 | 1998-12-22 | Cymer, Inc. | Laser with line narrowing output coupler |
| US6212217B1 (en) * | 1997-07-01 | 2001-04-03 | Cymer, Inc. | Smart laser with automated beam quality control |
| US6094448A (en) * | 1997-07-01 | 2000-07-25 | Cymer, Inc. | Grating assembly with bi-directional bandwidth control |
| US6192064B1 (en) * | 1997-07-01 | 2001-02-20 | Cymer, Inc. | Narrow band laser with fine wavelength control |
| US5978409A (en) * | 1998-09-28 | 1999-11-02 | Cymer, Inc. | Line narrowing apparatus with high transparency prism beam expander |
| USRE38054E1 (en) * | 1997-07-18 | 2003-04-01 | Cymer, Inc. | Reliable, modular, production quality narrow-band high rep rate F2 laser |
| US6529531B1 (en) * | 1997-07-22 | 2003-03-04 | Cymer, Inc. | Fast wavelength correction technique for a laser |
| US6721340B1 (en) * | 1997-07-22 | 2004-04-13 | Cymer, Inc. | Bandwidth control technique for a laser |
| US6853653B2 (en) * | 1997-07-22 | 2005-02-08 | Cymer, Inc. | Laser spectral engineering for lithographic process |
| US6671294B2 (en) * | 1997-07-22 | 2003-12-30 | Cymer, Inc. | Laser spectral engineering for lithographic process |
| US6393037B1 (en) * | 1999-02-03 | 2002-05-21 | Lambda Physik Ag | Wavelength selector for laser with adjustable angular dispersion |
| US6163559A (en) * | 1998-06-22 | 2000-12-19 | Cymer, Inc. | Beam expander for ultraviolet lasers |
| US6493374B1 (en) * | 1999-09-03 | 2002-12-10 | Cymer, Inc. | Smart laser with fast deformable grating |
| US6243406B1 (en) * | 1999-03-12 | 2001-06-05 | Peter Heist | Gas performance control system for gas discharge lasers |
| US6496528B2 (en) * | 1999-09-03 | 2002-12-17 | Cymer, Inc. | Line narrowing unit with flexural grating mount |
| US6532247B2 (en) * | 2000-02-09 | 2003-03-11 | Cymer, Inc. | Laser wavelength control unit with piezoelectric driver |
| JP2003518757A (ja) * | 1999-12-22 | 2003-06-10 | サイマー， インコーポレイテッド | 二方向ビーム拡大を用いた狭線化レーザ |
| US7075963B2 (en) * | 2000-01-27 | 2006-07-11 | Lambda Physik Ag | Tunable laser with stabilized grating |
| US6650666B2 (en) * | 2000-02-09 | 2003-11-18 | Cymer, Inc. | Laser wavelength control unit with piezoelectric driver |
| US6856638B2 (en) * | 2000-10-23 | 2005-02-15 | Lambda Physik Ag | Resonator arrangement for bandwidth control |
| US6760358B1 (en) * | 2001-06-07 | 2004-07-06 | Lambda Physik Ag | Line-narrowing optics module having improved mechanical performance |
| KR20030036254A (ko) * | 2001-06-13 | 2003-05-09 | 가부시키가이샤 니콘 | 주사노광방법 및 주사형 노광장치 그리고 디바이스 제조방법 |
| US6992442B2 (en) * | 2001-12-11 | 2006-01-31 | Honeywell International Inc. | Restricted getter |
| US20070104231A1 (en) * | 2002-08-30 | 2007-05-10 | Jochen Schwarz | Wavelength tunable resonator with a prism |
-
2004
- 2004-11-30 US US11/000,684 patent/US7366219B2/en not_active Expired - Lifetime
-
2005
- 2005-11-25 TW TW094141498A patent/TWI281296B/zh active
- 2005-11-28 KR KR1020127002413A patent/KR101235047B1/ko not_active Expired - Lifetime
- 2005-11-28 JP JP2007544429A patent/JP5030786B2/ja not_active Expired - Lifetime
- 2005-11-28 EP EP05826233.8A patent/EP1831974B1/en not_active Expired - Lifetime
- 2005-11-28 EP EP13179720.1A patent/EP2665141B1/en not_active Expired - Lifetime
- 2005-11-28 KR KR1020077012317A patent/KR101147316B1/ko not_active Expired - Lifetime
- 2005-11-28 WO PCT/US2005/043056 patent/WO2006060360A2/en not_active Ceased
-
2008
- 2008-02-28 US US12/074,079 patent/US7653112B2/en not_active Expired - Lifetime
-
2009
- 2009-12-14 US US12/653,584 patent/US20100097704A1/en not_active Abandoned
-
2011
- 2011-04-14 US US13/086,858 patent/US8126027B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| US20060114957A1 (en) | 2006-06-01 |
| US20100097704A1 (en) | 2010-04-22 |
| US8126027B2 (en) | 2012-02-28 |
| KR101235047B1 (ko) | 2013-02-21 |
| US20110194580A1 (en) | 2011-08-11 |
| EP1831974A2 (en) | 2007-09-12 |
| US7653112B2 (en) | 2010-01-26 |
| JP5030786B2 (ja) | 2012-09-19 |
| WO2006060360A2 (en) | 2006-06-08 |
| US20080151944A1 (en) | 2008-06-26 |
| TW200627736A (en) | 2006-08-01 |
| EP2665141B1 (en) | 2019-04-03 |
| JP2008522439A (ja) | 2008-06-26 |
| WO2006060360A3 (en) | 2006-10-26 |
| EP1831974A4 (en) | 2010-11-24 |
| EP1831974B1 (en) | 2017-02-08 |
| KR20120025004A (ko) | 2012-03-14 |
| KR101147316B1 (ko) | 2012-05-18 |
| US7366219B2 (en) | 2008-04-29 |
| EP2665141A1 (en) | 2013-11-20 |
| KR20070084624A (ko) | 2007-08-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI281296B (en) | Line narrowing module | |
| KR100909018B1 (ko) | 레이저 리소그래피 빔송출 광원 | |
| TW569508B (en) | Very narrow band, two chamber, high rep rate gas discharge laser system | |
| KR101211490B1 (ko) | 대역폭 스펙트럼 제어를 위한 레이저 출력빔의 파면스플리터 | |
| US6853653B2 (en) | Laser spectral engineering for lithographic process | |
| TW535338B (en) | Injection seeded f2 laser with wavelength control | |
| EP1944841A2 (en) | Very narrow band injection seeded F2 lithography laser | |
| US8014432B2 (en) | Regenerative ring resonator | |
| JP2005525001A5 (enExample) | ||
| WO2005046011A2 (en) | Relax gas discharge laser lithography light source | |
| JP2005524996A (ja) | ガス放電レーザのための自動ガス制御システム | |
| KR102213153B1 (ko) | 광빔의 코히어런스의 양의 조정 방법 | |
| JP5114767B2 (ja) | 狭帯域化レーザのスペクトル幅調整装置 | |
| US8624209B1 (en) | Controlling spatial properties in an excimer ring amplifier | |
| US10916910B2 (en) | Line narrowing module | |
| CN101004530A (zh) | 受激准分子激光器和谱线紧缩模块 | |
| WO1999060674A1 (en) | RELIABLE MODULAR PRODUCTION QUALITY NARROW-BAND HIGH REP RATE ArF EXCIMER LASER | |
| EP4441564A1 (en) | Control voltage threshold selection to facilitate multifocal imaging | |
| JP3636303B2 (ja) | ガスレーザ装置及びガスレーザ装置の狭帯域化ユニットのアライメント方法 | |
| USRE45957E1 (en) | Regenerative ring resonator | |
| RU2340057C2 (ru) | Лазерный литографический источник света с доставкой пучка | |
| CN116491034A (zh) | 具有增加的波长分离的多焦点成像 |