KR101235047B1 - 라인 내로우잉 모듈 - Google Patents

라인 내로우잉 모듈 Download PDF

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Publication number
KR101235047B1
KR101235047B1 KR1020127002413A KR20127002413A KR101235047B1 KR 101235047 B1 KR101235047 B1 KR 101235047B1 KR 1020127002413 A KR1020127002413 A KR 1020127002413A KR 20127002413 A KR20127002413 A KR 20127002413A KR 101235047 B1 KR101235047 B1 KR 101235047B1
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KR
South Korea
Prior art keywords
center wavelength
delete delete
laser light
pulse
light beam
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Expired - Lifetime
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KR1020127002413A
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English (en)
Korean (ko)
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KR20120025004A (ko
Inventor
마틴 제이. 알고트스
로버트 에이. 버그스테트
월터 디. 글레스피
블라디미르 에이. 쿨게이코
윌리엄 엔. 파틀로
게르만 이. 라일로프
리차드 엘. 샌드스트롬
브라이언 디. 스트레이트
디모티 에스. 다이어
Original Assignee
사이머 인코포레이티드
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/105—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
    • H01S3/1055—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length one of the reflectors being constituted by a diffraction grating
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70025—Production of exposure light, i.e. light sources by lasers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/08004—Construction or shape of optical resonators or components thereof incorporating a dispersive element, e.g. a prism for wavelength selection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/08059—Constructional details of the reflector, e.g. shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • H01S3/2251—ArF, i.e. argon fluoride is comprised for lasing around 193 nm

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Lasers (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
KR1020127002413A 2004-11-30 2005-11-28 라인 내로우잉 모듈 Expired - Lifetime KR101235047B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/000,684 2004-11-30
US11/000,684 US7366219B2 (en) 2004-11-30 2004-11-30 Line narrowing module
PCT/US2005/043056 WO2006060360A2 (en) 2004-11-30 2005-11-28 Line narrowing module

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020077012317A Division KR101147316B1 (ko) 2004-11-30 2005-11-28 라인 내로우잉 모듈

Publications (2)

Publication Number Publication Date
KR20120025004A KR20120025004A (ko) 2012-03-14
KR101235047B1 true KR101235047B1 (ko) 2013-02-21

Family

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Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020127002413A Expired - Lifetime KR101235047B1 (ko) 2004-11-30 2005-11-28 라인 내로우잉 모듈
KR1020077012317A Expired - Lifetime KR101147316B1 (ko) 2004-11-30 2005-11-28 라인 내로우잉 모듈

Family Applications After (1)

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KR1020077012317A Expired - Lifetime KR101147316B1 (ko) 2004-11-30 2005-11-28 라인 내로우잉 모듈

Country Status (6)

Country Link
US (4) US7366219B2 (enExample)
EP (2) EP1831974B1 (enExample)
JP (1) JP5030786B2 (enExample)
KR (2) KR101235047B1 (enExample)
TW (1) TWI281296B (enExample)
WO (1) WO2006060360A2 (enExample)

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US7659529B2 (en) * 2007-04-13 2010-02-09 Cymer, Inc. Method and apparatus for vibration reduction in laser system line narrowing unit wavelength selection optical element
US8144739B2 (en) * 2008-10-24 2012-03-27 Cymer, Inc. System method and apparatus for selecting and controlling light source bandwidth
US8014432B2 (en) * 2009-03-27 2011-09-06 Cymer, Inc. Regenerative ring resonator
USRE45957E1 (en) 2009-03-27 2016-03-29 Cymer, Llc Regenerative ring resonator
US8520186B2 (en) * 2009-08-25 2013-08-27 Cymer, Llc Active spectral control of optical source
US8254420B2 (en) * 2009-11-18 2012-08-28 Cymer, Inc. Advanced laser wavelength control
US8837536B2 (en) 2010-04-07 2014-09-16 Cymer, Llc Method and apparatus for controlling light bandwidth
JP2013070029A (ja) * 2011-09-08 2013-04-18 Gigaphoton Inc マスタオシレータシステムおよびレーザ装置
US9207119B2 (en) 2012-04-27 2015-12-08 Cymer, Llc Active spectral control during spectrum synthesis
CN103091860B (zh) 2012-12-28 2014-12-17 中国科学院上海光学精密机械研究所 棱镜扩束器装调仪及装调方法
US9147995B2 (en) * 2013-03-15 2015-09-29 Daylight Solutions, Inc. Rapidly tunable laser source assembly with long stroke grating mover
US9715180B2 (en) 2013-06-11 2017-07-25 Cymer, Llc Wafer-based light source parameter control
US9599510B2 (en) 2014-06-04 2017-03-21 Cymer, Llc Estimation of spectral feature of pulsed light beam
WO2016075806A1 (ja) * 2014-11-14 2016-05-19 ギガフォトン株式会社 狭帯域化モジュール、狭帯域化レーザ装置、及び、狭帯域化モジュールを位置決めする方法
WO2016189722A1 (ja) 2015-05-28 2016-12-01 ギガフォトン株式会社 レーザ装置及び狭帯域化光学系
US9785050B2 (en) 2015-06-26 2017-10-10 Cymer, Llc Pulsed light beam spectral feature control
CN105186277B (zh) * 2015-07-16 2018-05-22 中国科学院光电研究院 一种光谱控制装置
US9997888B2 (en) 2016-10-17 2018-06-12 Cymer, Llc Control of a spectral feature of a pulsed light beam
US10416471B2 (en) * 2016-10-17 2019-09-17 Cymer, Llc Spectral feature control apparatus
US9989866B2 (en) * 2016-10-17 2018-06-05 Cymer, Llc Wafer-based light source parameter control
US9835959B1 (en) 2016-10-17 2017-12-05 Cymer, Llc Controlling for wafer stage vibration
CN110383606B (zh) * 2017-04-26 2021-11-09 极光先进雷射株式会社 窄带化模块
CN110603695B (zh) 2017-06-13 2022-03-15 极光先进雷射株式会社 激光装置和光学元件的制造方法
US10585215B2 (en) 2017-06-29 2020-03-10 Cymer, Llc Reducing optical damage on an optical element
CN113383469B (zh) 2019-03-13 2023-07-11 极光先进雷射株式会社 激光装置和电子器件的制造方法
US12374853B2 (en) 2019-05-22 2025-07-29 Cymer, Llc Control system for a plurality of deep ultraviolet optical oscillators
US20220385031A1 (en) * 2019-11-07 2022-12-01 Cymer, Llc Controlling a spectral property of an output light beam produced by an optical source
US12130558B2 (en) 2019-11-08 2024-10-29 Cymer, Llc Radiation system for controlling bursts of pulses of radiation
US12476432B2 (en) 2019-12-20 2025-11-18 Cymer, Llc Directed gas purge to reduce dusting of excimer discharge chamber windows
JP7394224B2 (ja) 2019-12-23 2023-12-07 サイマー リミテッド ライアビリティ カンパニー レーザー放電チャンバ内で金属フッ化物塵埃をトラップするための充填層フィルタ
WO2021133556A1 (en) 2019-12-23 2021-07-01 Cymer, Llc Metrology for improving duv laser alignment
CN115039031B (zh) * 2020-03-19 2025-07-22 极光先进雷射株式会社 窄带化装置和电子器件的制造方法
US11329722B2 (en) 2020-03-27 2022-05-10 Relative Dynamics Incorporated Optical terminals
US20230223734A1 (en) 2020-06-09 2023-07-13 Cymer, Llc Systems and methods for controlling a center wavelength
KR102893005B1 (ko) * 2020-12-10 2025-11-27 사이머 엘엘씨 파장 분리를 증가시킨 다초점 이미징
CN116601839A (zh) 2020-12-16 2023-08-15 西默有限公司 根据准分子激光器的重复频率调制其波长的设备和方法
WO2025133752A1 (en) * 2023-12-21 2025-06-26 Cymer, Llc Apparatus for and method of wavelength control for multifocal imaging

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US5852627A (en) 1997-09-10 1998-12-22 Cymer, Inc. Laser with line narrowing output coupler
US6393037B1 (en) * 1999-02-03 2002-05-21 Lambda Physik Ag Wavelength selector for laser with adjustable angular dispersion
US6856638B2 (en) 2000-10-23 2005-02-15 Lambda Physik Ag Resonator arrangement for bandwidth control

Also Published As

Publication number Publication date
US20060114957A1 (en) 2006-06-01
US20100097704A1 (en) 2010-04-22
US8126027B2 (en) 2012-02-28
US20110194580A1 (en) 2011-08-11
EP1831974A2 (en) 2007-09-12
US7653112B2 (en) 2010-01-26
JP5030786B2 (ja) 2012-09-19
WO2006060360A2 (en) 2006-06-08
US20080151944A1 (en) 2008-06-26
TW200627736A (en) 2006-08-01
EP2665141B1 (en) 2019-04-03
JP2008522439A (ja) 2008-06-26
WO2006060360A3 (en) 2006-10-26
EP1831974A4 (en) 2010-11-24
EP1831974B1 (en) 2017-02-08
KR20120025004A (ko) 2012-03-14
KR101147316B1 (ko) 2012-05-18
US7366219B2 (en) 2008-04-29
EP2665141A1 (en) 2013-11-20
TWI281296B (en) 2007-05-11
KR20070084624A (ko) 2007-08-24

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