JP2008527683A5 - - Google Patents

Download PDF

Info

Publication number
JP2008527683A5
JP2008527683A5 JP2007544430A JP2007544430A JP2008527683A5 JP 2008527683 A5 JP2008527683 A5 JP 2008527683A5 JP 2007544430 A JP2007544430 A JP 2007544430A JP 2007544430 A JP2007544430 A JP 2007544430A JP 2008527683 A5 JP2008527683 A5 JP 2008527683A5
Authority
JP
Japan
Prior art keywords
bandwidth
attenuation
functions
time constant
laser system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007544430A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008527683A (ja
JP5265921B2 (ja
Filing date
Publication date
Priority claimed from US11/000,571 external-priority patent/US20060114956A1/en
Priority claimed from US11/254,282 external-priority patent/US7643522B2/en
Application filed filed Critical
Publication of JP2008527683A publication Critical patent/JP2008527683A/ja
Publication of JP2008527683A5 publication Critical patent/JP2008527683A5/ja
Application granted granted Critical
Publication of JP5265921B2 publication Critical patent/JP5265921B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP2007544430A 2004-11-30 2005-11-28 ガス放電レーザ帯域幅及び中心波長制御の方法及び機器 Expired - Lifetime JP5265921B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US11/000,571 2004-11-30
US11/000,571 US20060114956A1 (en) 2004-11-30 2004-11-30 High power high pulse repetition rate gas discharge laser system bandwidth management
US11/254,282 US7643522B2 (en) 2004-11-30 2005-10-20 Method and apparatus for gas discharge laser bandwidth and center wavelength control
US11/254,282 2005-10-20
PCT/US2005/043059 WO2006060361A2 (en) 2004-11-30 2005-11-28 Method and apparatus for gas discharge laser bandwidth and center wavelength control

Publications (3)

Publication Number Publication Date
JP2008527683A JP2008527683A (ja) 2008-07-24
JP2008527683A5 true JP2008527683A5 (enExample) 2009-01-22
JP5265921B2 JP5265921B2 (ja) 2013-08-14

Family

ID=36565614

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007544430A Expired - Lifetime JP5265921B2 (ja) 2004-11-30 2005-11-28 ガス放電レーザ帯域幅及び中心波長制御の方法及び機器

Country Status (4)

Country Link
US (1) US7643522B2 (enExample)
JP (1) JP5265921B2 (enExample)
TW (1) TWI283093B (enExample)
WO (1) WO2006060361A2 (enExample)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7885309B2 (en) 2005-11-01 2011-02-08 Cymer, Inc. Laser system
US7778302B2 (en) * 2005-11-01 2010-08-17 Cymer, Inc. Laser system
US7999915B2 (en) * 2005-11-01 2011-08-16 Cymer, Inc. Laser system
US7920616B2 (en) * 2005-11-01 2011-04-05 Cymer, Inc. Laser system
US20090296758A1 (en) * 2005-11-01 2009-12-03 Cymer, Inc. Laser system
US20090296755A1 (en) * 2005-11-01 2009-12-03 Cymer, Inc. Laser system
EP1952493A4 (en) * 2005-11-01 2017-05-10 Cymer, LLC Laser system
US7746913B2 (en) 2005-11-01 2010-06-29 Cymer, Inc. Laser system
US7715459B2 (en) * 2005-11-01 2010-05-11 Cymer, Inc. Laser system
US7630424B2 (en) * 2005-11-01 2009-12-08 Cymer, Inc. Laser system
US7643529B2 (en) 2005-11-01 2010-01-05 Cymer, Inc. Laser system
US7822084B2 (en) * 2006-02-17 2010-10-26 Cymer, Inc. Method and apparatus for stabilizing and tuning the bandwidth of laser light
US7852889B2 (en) * 2006-02-17 2010-12-14 Cymer, Inc. Active spectral control of DUV light source
US8259764B2 (en) 2006-06-21 2012-09-04 Cymer, Inc. Bandwidth control device
JP5114767B2 (ja) * 2006-10-10 2013-01-09 株式会社小松製作所 狭帯域化レーザのスペクトル幅調整装置
US7659529B2 (en) * 2007-04-13 2010-02-09 Cymer, Inc. Method and apparatus for vibration reduction in laser system line narrowing unit wavelength selection optical element
US8144739B2 (en) * 2008-10-24 2012-03-27 Cymer, Inc. System method and apparatus for selecting and controlling light source bandwidth
US8837536B2 (en) * 2010-04-07 2014-09-16 Cymer, Llc Method and apparatus for controlling light bandwidth
JP5755068B2 (ja) * 2011-07-27 2015-07-29 株式会社小松製作所 狭帯域化レーザのスペクトル幅調整装置
JP6113426B2 (ja) 2011-09-08 2017-04-12 ギガフォトン株式会社 マスタオシレータシステムおよびレーザ装置
JP5832581B2 (ja) * 2014-04-28 2015-12-16 株式会社小松製作所 狭帯域化レーザのスペクトル幅調整装置
US10816905B2 (en) * 2015-04-08 2020-10-27 Cymer, Llc Wavelength stabilization for an optical source
CN107851958B (zh) 2015-08-07 2021-01-12 极光先进雷射株式会社 窄带化激光装置
CN108475896B (zh) 2016-02-02 2020-12-11 极光先进雷射株式会社 窄带化激光装置
WO2018229823A1 (ja) 2017-06-12 2018-12-20 ギガフォトン株式会社 レーザ装置、及びレーザ装置管理システム、並びにレーザ装置の管理方法
US12374853B2 (en) 2019-05-22 2025-07-29 Cymer, Llc Control system for a plurality of deep ultraviolet optical oscillators
WO2021234835A1 (ja) * 2020-05-20 2021-11-25 ギガフォトン株式会社 狭帯域化ガスレーザ装置、波長制御方法、及び電子デバイスの製造方法
JP2023183776A (ja) 2022-06-16 2023-12-28 ギガフォトン株式会社 Ｅｕｖ光生成システム、及び電子デバイスの製造方法

Family Cites Families (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5095492A (en) * 1990-07-17 1992-03-10 Cymer Laser Technologies Spectral narrowing technique
US5898725A (en) * 1997-01-21 1999-04-27 Cymer, Inc. Excimer laser with greater spectral bandwidth and beam stability
US5982800A (en) * 1997-04-23 1999-11-09 Cymer, Inc. Narrow band excimer laser
JP4102457B2 (ja) * 1997-05-09 2008-06-18 株式会社小松製作所 狭帯域化レーザ装置
US6028879A (en) * 1997-06-04 2000-02-22 Cymer, Inc. Narrow band laser with etalon based output coupler
US5852627A (en) * 1997-09-10 1998-12-22 Cymer, Inc. Laser with line narrowing output coupler
JP3717020B2 (ja) * 1997-06-30 2005-11-16 株式会社小松製作所 反射型波長選択素子の曲げ機構
US6212217B1 (en) * 1997-07-01 2001-04-03 Cymer, Inc. Smart laser with automated beam quality control
ES2195346T3 (es) * 1997-07-01 2003-12-01 Cymer Inc Laser de banda muy estrecha con cavidad de resonancia inestable.
US6094448A (en) * 1997-07-01 2000-07-25 Cymer, Inc. Grating assembly with bi-directional bandwidth control
US6192064B1 (en) * 1997-07-01 2001-02-20 Cymer, Inc. Narrow band laser with fine wavelength control
USRE38054E1 (en) * 1997-07-18 2003-04-01 Cymer, Inc. Reliable, modular, production quality narrow-band high rep rate F2 laser
US5978409A (en) * 1998-09-28 1999-11-02 Cymer, Inc. Line narrowing apparatus with high transparency prism beam expander
US6671294B2 (en) * 1997-07-22 2003-12-30 Cymer, Inc. Laser spectral engineering for lithographic process
US6078599A (en) * 1997-07-22 2000-06-20 Cymer, Inc. Wavelength shift correction technique for a laser
US6721340B1 (en) * 1997-07-22 2004-04-13 Cymer, Inc. Bandwidth control technique for a laser
US6317447B1 (en) * 2000-01-25 2001-11-13 Cymer, Inc. Electric discharge laser with acoustic chirp correction
US6853653B2 (en) * 1997-07-22 2005-02-08 Cymer, Inc. Laser spectral engineering for lithographic process
US6621846B1 (en) * 1997-07-22 2003-09-16 Cymer, Inc. Electric discharge laser with active wavelength chirp correction
US6529531B1 (en) * 1997-07-22 2003-03-04 Cymer, Inc. Fast wavelength correction technique for a laser
US6141081A (en) * 1997-08-08 2000-10-31 Cymer, Inc. Stepper or scanner having two energy monitors for a laser
US6163559A (en) * 1998-06-22 2000-12-19 Cymer, Inc. Beam expander for ultraviolet lasers
US6567450B2 (en) * 1999-12-10 2003-05-20 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
US6493374B1 (en) * 1999-09-03 2002-12-10 Cymer, Inc. Smart laser with fast deformable grating
US6965624B2 (en) * 1999-03-17 2005-11-15 Lambda Physik Ag Laser gas replenishment method
US6625191B2 (en) * 1999-12-10 2003-09-23 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
US6034978A (en) * 1999-05-12 2000-03-07 Cymer, Inc. Gas discharge laser with gas temperature control
US6496528B2 (en) * 1999-09-03 2002-12-17 Cymer, Inc. Line narrowing unit with flexural grating mount
US6532247B2 (en) * 2000-02-09 2003-03-11 Cymer, Inc. Laser wavelength control unit with piezoelectric driver
JP2003518757A (ja) * 1999-12-22 2003-06-10 サイマー， インコーポレイテッド 二方向ビーム拡大を用いた狭線化レーザ
US6650666B2 (en) * 2000-02-09 2003-11-18 Cymer, Inc. Laser wavelength control unit with piezoelectric driver
US6408260B1 (en) * 2000-02-16 2002-06-18 Cymer, Inc. Laser lithography quality alarm system
US6738406B2 (en) * 2000-06-19 2004-05-18 Lambda Physik Ag Precision measurement of wavelengths emitted by a molecular fluorine laser at 157nm
US6690704B2 (en) * 2001-04-09 2004-02-10 Cymer, Inc. Control system for a two chamber gas discharge laser
US6760358B1 (en) * 2001-06-07 2004-07-06 Lambda Physik Ag Line-narrowing optics module having improved mechanical performance
US6735225B2 (en) * 2001-06-07 2004-05-11 Lambda Physik Ag Chirp compensation method and apparatus

Similar Documents

Publication Publication Date Title
JP2008527683A5 (enExample)
WO2006060361A3 (en) Method and apparatus for gas discharge laser bandwidth and center wavelength control
JP2009543614A5 (enExample)
JP2008522439A5 (enExample)
JP2018519855A5 (enExample)
DE60138052D1 (de) Optisches System mit elektronischer Punktgrössensteuerung und Fokussierungskontrolle
JP2013507792A5 (enExample)
JP2006523519A5 (enExample)
WO2007138554A3 (en) Color control by alteration of wavelength converting member
ATE505334T1 (de) Bildverarbeitungsverfahren und bildverarbeitungsvorrichtung
JP2005501399A5 (enExample)
WO2007149282A3 (en) Bandwidth control device
ATE479548T1 (de) Bildverarbeitungsverfahren und bildverarbeitungsvorrichtung
WO2006060359A3 (en) High power high pulse repetition rate gas discharge laser system bandwidth management
CA2796472A1 (en) System and method for microablation of tissue
JP2006210581A5 (enExample)
KR102372081B1 (ko) 중이염 치료를 위한 광조사 장치
WO2008092097A3 (en) Multi-beam optical afterheater for laser heated pedstal growth
CA2496661A1 (en) Light source control system
JP2010093078A5 (enExample)
CA2653620A1 (en) Wavelength sweep control
US20070073487A1 (en) System and method for predicting solar ultraviolet exposure and ultraviolet radiation hazard
DE60203933D1 (de) Thermisch einstellbare optische Faservorrichtungen mit mikrokapillaren Heizelementen
WO2005001399A3 (en) Method and apparatus for measuring bandwidth of an optical spectrum output of a very small wavelength very narrow bandwidth high power laser
ATE472836T1 (de) Hochleistungslasersystem