TWI283093B - Method and apparatus for gas discharge laser bandwidth and center wavelength control - Google Patents

Method and apparatus for gas discharge laser bandwidth and center wavelength control Download PDF

Info

Publication number
TWI283093B
TWI283093B TW094141474A TW94141474A TWI283093B TW I283093 B TWI283093 B TW I283093B TW 094141474 A TW094141474 A TW 094141474A TW 94141474 A TW94141474 A TW 94141474A TW I283093 B TWI283093 B TW I283093B
Authority
TW
Taiwan
Prior art keywords
bandwidth
laser system
gas discharge
controller
laser
Prior art date
Application number
TW094141474A
Other languages
English (en)
Chinese (zh)
Other versions
TW200627739A (en
Inventor
Fedor B Trintchouk
Robert N Jacques
Original Assignee
Cymer Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US11/000,571 external-priority patent/US20060114956A1/en
Application filed by Cymer Inc filed Critical Cymer Inc
Publication of TW200627739A publication Critical patent/TW200627739A/zh
Application granted granted Critical
Publication of TWI283093B publication Critical patent/TWI283093B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/105—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
    • H01S3/1055—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length one of the reflectors being constituted by a diffraction grating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/08072—Thermal lensing or thermally induced birefringence; Compensation thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/10069—Memorized or pre-programmed characteristics, e.g. look-up table [LUT]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
TW094141474A 2004-11-30 2005-11-25 Method and apparatus for gas discharge laser bandwidth and center wavelength control TWI283093B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/000,571 US20060114956A1 (en) 2004-11-30 2004-11-30 High power high pulse repetition rate gas discharge laser system bandwidth management
US11/254,282 US7643522B2 (en) 2004-11-30 2005-10-20 Method and apparatus for gas discharge laser bandwidth and center wavelength control

Publications (2)

Publication Number Publication Date
TW200627739A TW200627739A (en) 2006-08-01
TWI283093B true TWI283093B (en) 2007-06-21

Family

ID=36565614

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094141474A TWI283093B (en) 2004-11-30 2005-11-25 Method and apparatus for gas discharge laser bandwidth and center wavelength control

Country Status (4)

Country Link
US (1) US7643522B2 (enExample)
JP (1) JP5265921B2 (enExample)
TW (1) TWI283093B (enExample)
WO (1) WO2006060361A2 (enExample)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7885309B2 (en) 2005-11-01 2011-02-08 Cymer, Inc. Laser system
US7778302B2 (en) * 2005-11-01 2010-08-17 Cymer, Inc. Laser system
US7999915B2 (en) * 2005-11-01 2011-08-16 Cymer, Inc. Laser system
US7920616B2 (en) * 2005-11-01 2011-04-05 Cymer, Inc. Laser system
US20090296758A1 (en) * 2005-11-01 2009-12-03 Cymer, Inc. Laser system
US20090296755A1 (en) * 2005-11-01 2009-12-03 Cymer, Inc. Laser system
EP1952493A4 (en) * 2005-11-01 2017-05-10 Cymer, LLC Laser system
US7746913B2 (en) 2005-11-01 2010-06-29 Cymer, Inc. Laser system
US7715459B2 (en) * 2005-11-01 2010-05-11 Cymer, Inc. Laser system
US7630424B2 (en) * 2005-11-01 2009-12-08 Cymer, Inc. Laser system
US7643529B2 (en) 2005-11-01 2010-01-05 Cymer, Inc. Laser system
US7822084B2 (en) * 2006-02-17 2010-10-26 Cymer, Inc. Method and apparatus for stabilizing and tuning the bandwidth of laser light
US7852889B2 (en) * 2006-02-17 2010-12-14 Cymer, Inc. Active spectral control of DUV light source
US8259764B2 (en) 2006-06-21 2012-09-04 Cymer, Inc. Bandwidth control device
JP5114767B2 (ja) * 2006-10-10 2013-01-09 株式会社小松製作所 狭帯域化レーザのスペクトル幅調整装置
US7659529B2 (en) * 2007-04-13 2010-02-09 Cymer, Inc. Method and apparatus for vibration reduction in laser system line narrowing unit wavelength selection optical element
US8144739B2 (en) * 2008-10-24 2012-03-27 Cymer, Inc. System method and apparatus for selecting and controlling light source bandwidth
US8837536B2 (en) * 2010-04-07 2014-09-16 Cymer, Llc Method and apparatus for controlling light bandwidth
JP5755068B2 (ja) * 2011-07-27 2015-07-29 株式会社小松製作所 狭帯域化レーザのスペクトル幅調整装置
JP6113426B2 (ja) 2011-09-08 2017-04-12 ギガフォトン株式会社 マスタオシレータシステムおよびレーザ装置
JP5832581B2 (ja) * 2014-04-28 2015-12-16 株式会社小松製作所 狭帯域化レーザのスペクトル幅調整装置
US10816905B2 (en) * 2015-04-08 2020-10-27 Cymer, Llc Wavelength stabilization for an optical source
CN107851958B (zh) 2015-08-07 2021-01-12 极光先进雷射株式会社 窄带化激光装置
CN108475896B (zh) 2016-02-02 2020-12-11 极光先进雷射株式会社 窄带化激光装置
WO2018229823A1 (ja) 2017-06-12 2018-12-20 ギガフォトン株式会社 レーザ装置、及びレーザ装置管理システム、並びにレーザ装置の管理方法
US12374853B2 (en) 2019-05-22 2025-07-29 Cymer, Llc Control system for a plurality of deep ultraviolet optical oscillators
WO2021234835A1 (ja) * 2020-05-20 2021-11-25 ギガフォトン株式会社 狭帯域化ガスレーザ装置、波長制御方法、及び電子デバイスの製造方法
JP2023183776A (ja) 2022-06-16 2023-12-28 ギガフォトン株式会社 Ｅｕｖ光生成システム、及び電子デバイスの製造方法

Family Cites Families (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5095492A (en) * 1990-07-17 1992-03-10 Cymer Laser Technologies Spectral narrowing technique
US5898725A (en) * 1997-01-21 1999-04-27 Cymer, Inc. Excimer laser with greater spectral bandwidth and beam stability
US5982800A (en) * 1997-04-23 1999-11-09 Cymer, Inc. Narrow band excimer laser
JP4102457B2 (ja) * 1997-05-09 2008-06-18 株式会社小松製作所 狭帯域化レーザ装置
US6028879A (en) * 1997-06-04 2000-02-22 Cymer, Inc. Narrow band laser with etalon based output coupler
US5852627A (en) * 1997-09-10 1998-12-22 Cymer, Inc. Laser with line narrowing output coupler
JP3717020B2 (ja) * 1997-06-30 2005-11-16 株式会社小松製作所 反射型波長選択素子の曲げ機構
US6212217B1 (en) * 1997-07-01 2001-04-03 Cymer, Inc. Smart laser with automated beam quality control
ES2195346T3 (es) * 1997-07-01 2003-12-01 Cymer Inc Laser de banda muy estrecha con cavidad de resonancia inestable.
US6094448A (en) * 1997-07-01 2000-07-25 Cymer, Inc. Grating assembly with bi-directional bandwidth control
US6192064B1 (en) * 1997-07-01 2001-02-20 Cymer, Inc. Narrow band laser with fine wavelength control
USRE38054E1 (en) * 1997-07-18 2003-04-01 Cymer, Inc. Reliable, modular, production quality narrow-band high rep rate F2 laser
US5978409A (en) * 1998-09-28 1999-11-02 Cymer, Inc. Line narrowing apparatus with high transparency prism beam expander
US6671294B2 (en) * 1997-07-22 2003-12-30 Cymer, Inc. Laser spectral engineering for lithographic process
US6078599A (en) * 1997-07-22 2000-06-20 Cymer, Inc. Wavelength shift correction technique for a laser
US6721340B1 (en) * 1997-07-22 2004-04-13 Cymer, Inc. Bandwidth control technique for a laser
US6317447B1 (en) * 2000-01-25 2001-11-13 Cymer, Inc. Electric discharge laser with acoustic chirp correction
US6853653B2 (en) * 1997-07-22 2005-02-08 Cymer, Inc. Laser spectral engineering for lithographic process
US6621846B1 (en) * 1997-07-22 2003-09-16 Cymer, Inc. Electric discharge laser with active wavelength chirp correction
US6529531B1 (en) * 1997-07-22 2003-03-04 Cymer, Inc. Fast wavelength correction technique for a laser
US6141081A (en) * 1997-08-08 2000-10-31 Cymer, Inc. Stepper or scanner having two energy monitors for a laser
US6163559A (en) * 1998-06-22 2000-12-19 Cymer, Inc. Beam expander for ultraviolet lasers
US6567450B2 (en) * 1999-12-10 2003-05-20 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
US6493374B1 (en) * 1999-09-03 2002-12-10 Cymer, Inc. Smart laser with fast deformable grating
US6965624B2 (en) * 1999-03-17 2005-11-15 Lambda Physik Ag Laser gas replenishment method
US6625191B2 (en) * 1999-12-10 2003-09-23 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
US6034978A (en) * 1999-05-12 2000-03-07 Cymer, Inc. Gas discharge laser with gas temperature control
US6496528B2 (en) * 1999-09-03 2002-12-17 Cymer, Inc. Line narrowing unit with flexural grating mount
US6532247B2 (en) * 2000-02-09 2003-03-11 Cymer, Inc. Laser wavelength control unit with piezoelectric driver
JP2003518757A (ja) * 1999-12-22 2003-06-10 サイマー， インコーポレイテッド 二方向ビーム拡大を用いた狭線化レーザ
US6650666B2 (en) * 2000-02-09 2003-11-18 Cymer, Inc. Laser wavelength control unit with piezoelectric driver
US6408260B1 (en) * 2000-02-16 2002-06-18 Cymer, Inc. Laser lithography quality alarm system
US6738406B2 (en) * 2000-06-19 2004-05-18 Lambda Physik Ag Precision measurement of wavelengths emitted by a molecular fluorine laser at 157nm
US6690704B2 (en) * 2001-04-09 2004-02-10 Cymer, Inc. Control system for a two chamber gas discharge laser
US6760358B1 (en) * 2001-06-07 2004-07-06 Lambda Physik Ag Line-narrowing optics module having improved mechanical performance
US6735225B2 (en) * 2001-06-07 2004-05-11 Lambda Physik Ag Chirp compensation method and apparatus

Also Published As

Publication number Publication date
JP2008527683A (ja) 2008-07-24
US7643522B2 (en) 2010-01-05
JP5265921B2 (ja) 2013-08-14
WO2006060361A2 (en) 2006-06-08
TW200627739A (en) 2006-08-01
US20060114958A1 (en) 2006-06-01
WO2006060361A3 (en) 2009-04-16

Similar Documents

Publication Publication Date Title
TWI283093B (en) Method and apparatus for gas discharge laser bandwidth and center wavelength control
EP2388800B1 (en) Active Spectral Control of DUV Light Source
US6735225B2 (en) Chirp compensation method and apparatus
US7903700B2 (en) Narrow-spectrum laser device
US6240110B1 (en) Line narrowed F2 laser with etalon based output coupler
US8837536B2 (en) Method and apparatus for controlling light bandwidth
US6392743B1 (en) Control technique for microlithography lasers
JP2000286495A (ja) エキシマレーザーまたはフッ素分子レーザーシステム
JPH10313143A (ja) 狭帯域化レーザ装置
US6516013B1 (en) Laser beam monitoring apparatus and method
JP2007012805A (ja) 狭帯域化レーザ装置
JPH11274632A (ja) 狭帯域化レーザの波面制御装置
US8368041B2 (en) System and method for compensating for thermal effects in an EUV light source
JP2003511688A (ja) 波長計の温度補償方法
US20240380170A1 (en) Method and laser system for generating ultrashort laser pulses having stable pulse parameters
JP5832581B2 (ja) 狭帯域化レーザのスペクトル幅調整装置
JP2015092591A (ja) 狭帯域化レーザ装置
JP5607592B2 (ja) 狭帯域化レーザ装置
JP2019212719A (ja) レーザ照射装置
JP2001320118A (ja) レーザ装置