JP2004514027A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2004514027A5 JP2004514027A5 JP2002542733A JP2002542733A JP2004514027A5 JP 2004514027 A5 JP2004514027 A5 JP 2004514027A5 JP 2002542733 A JP2002542733 A JP 2002542733A JP 2002542733 A JP2002542733 A JP 2002542733A JP 2004514027 A5 JP2004514027 A5 JP 2004514027A5
- Authority
- JP
- Japan
- Prior art keywords
- dispersion
- liquid carrier
- fumed
- metal ion
- metal oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 description 47
- 239000006185 dispersion Substances 0.000 description 38
- 239000007788 liquid Substances 0.000 description 38
- 229910021645 metal ion Inorganic materials 0.000 description 35
- 229910044991 metal oxide Inorganic materials 0.000 description 33
- 150000004706 metal oxides Chemical class 0.000 description 33
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 17
- 229910021485 fumed silica Inorganic materials 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- 239000002585 base Substances 0.000 description 8
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 8
- 239000000203 mixture Substances 0.000 description 7
- BNGXYYYYKUGPPF-UHFFFAOYSA-M (3-methylphenyl)methyl-triphenylphosphanium;chloride Chemical group [Cl-].CC1=CC=CC(C[P+](C=2C=CC=CC=2)(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1 BNGXYYYYKUGPPF-UHFFFAOYSA-M 0.000 description 4
- 238000004090 dissolution Methods 0.000 description 4
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- YBMRDBCBODYGJE-UHFFFAOYSA-N germanium dioxide Chemical compound O=[Ge]=O YBMRDBCBODYGJE-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910001428 transition metal ion Inorganic materials 0.000 description 2
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 239000005046 Chlorosilane Substances 0.000 description 1
- UEEJHVSXFDXPFK-UHFFFAOYSA-N N-dimethylaminoethanol Chemical compound CN(C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-N 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- 229910003902 SiCl 4 Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical class Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- 229960002887 deanol Drugs 0.000 description 1
- 239000012972 dimethylethanolamine Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L sulfate group Chemical group S(=O)(=O)([O-])[O-] QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US24966400P | 2000-11-15 | 2000-11-15 | |
| US60/249,664 | 2000-11-15 | ||
| PCT/US2001/044250 WO2002040399A2 (en) | 2000-11-15 | 2001-11-14 | Method of preparing a fumed metal oxide dispertion |
Related Child Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009122386A Division JP2009234908A (ja) | 2000-11-15 | 2009-05-20 | フュームド金属酸化物分散体の製造方法 |
| JP2012221498A Division JP2013049620A (ja) | 2000-11-15 | 2012-10-03 | フュームド金属酸化物分散体の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004514027A JP2004514027A (ja) | 2004-05-13 |
| JP2004514027A5 true JP2004514027A5 (enExample) | 2009-02-12 |
| JP5154731B2 JP5154731B2 (ja) | 2013-02-27 |
Family
ID=22944463
Family Applications (4)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002542733A Expired - Fee Related JP5154731B2 (ja) | 2000-11-15 | 2001-11-14 | フュームド金属酸化物分散体の製造方法 |
| JP2009122386A Withdrawn JP2009234908A (ja) | 2000-11-15 | 2009-05-20 | フュームド金属酸化物分散体の製造方法 |
| JP2011000146A Expired - Lifetime JP5524094B2 (ja) | 2000-11-15 | 2011-01-04 | フュームド金属酸化物分散体の製造方法 |
| JP2012221498A Pending JP2013049620A (ja) | 2000-11-15 | 2012-10-03 | フュームド金属酸化物分散体の製造方法 |
Family Applications After (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009122386A Withdrawn JP2009234908A (ja) | 2000-11-15 | 2009-05-20 | フュームド金属酸化物分散体の製造方法 |
| JP2011000146A Expired - Lifetime JP5524094B2 (ja) | 2000-11-15 | 2011-01-04 | フュームド金属酸化物分散体の製造方法 |
| JP2012221498A Pending JP2013049620A (ja) | 2000-11-15 | 2012-10-03 | フュームド金属酸化物分散体の製造方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US6638982B2 (enExample) |
| EP (1) | EP1349809B1 (enExample) |
| JP (4) | JP5154731B2 (enExample) |
| AT (1) | ATE390386T1 (enExample) |
| AU (1) | AU2002219869A1 (enExample) |
| DE (1) | DE60133411T2 (enExample) |
| WO (1) | WO2002040399A2 (enExample) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ATE390386T1 (de) * | 2000-11-15 | 2008-04-15 | Cabot Corp | Verfahren zur herstellung einer dispersion pyrogener metalloxide |
| US6846526B2 (en) * | 2001-01-26 | 2005-01-25 | Eastman Kodak Company | Ink jet recording element |
| US7037553B2 (en) * | 2001-08-21 | 2006-05-02 | Konica Corporation | Manufacturing process for ink-jet recording medium |
| US6746527B1 (en) * | 2003-03-26 | 2004-06-08 | Nu-Kote International, Inc. | Aqueous magnetic ink character recognition ink-jet ink composition containing a combination of special surfactants |
| DE10342826B3 (de) | 2003-09-17 | 2005-05-12 | Degussa Ag | Dispersion von pyrogen hergestelltem Ceroxid |
| JP5107700B2 (ja) * | 2004-05-04 | 2012-12-26 | キャボット コーポレイション | 所望の凝集体粒子直径を有する凝集体金属酸化物粒子分散体の調製方法 |
| DE102004054392A1 (de) * | 2004-08-28 | 2006-03-02 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zum Verbinden von Bauteilen aus hochkieselsäurehaltigem Werkstoff, sowie aus derartigen Bauteilen zusammengefügter Bauteil-Verbund |
| JP4954519B2 (ja) * | 2004-11-12 | 2012-06-20 | 富士フイルム株式会社 | インクジェット記録用媒体、及びインクジェット記録用媒体の製造方法 |
| US8227369B2 (en) * | 2005-05-25 | 2012-07-24 | Celanese International Corp. | Layered composition and processes for preparing and using the composition |
| DE102007049742A1 (de) * | 2007-10-16 | 2009-04-23 | Evonik Degussa Gmbh | Verfahren zur Herstellung einer Titan-Silicium-Mischoxid enthaltenden Dispersion |
| US20090184283A1 (en) * | 2008-01-18 | 2009-07-23 | Deborah Duen Ling Chung | Antioxidants for phase change ability and thermal stability enhancement |
| US10184057B2 (en) | 2011-03-01 | 2019-01-22 | Thomas Villwock | Nanoparticle suspension for inkjet printing magnetizable characters on a substrate |
| US8580138B2 (en) * | 2011-09-11 | 2013-11-12 | Acta Technology Inc | Nanofluids and a method of making nanofluids for ground source heat pumps and other applications |
| US20140197354A1 (en) * | 2011-09-11 | 2014-07-17 | Acta Technology Inc. | Method of making nanaofluids for ground souce heat pumps and other applications |
| US8993490B2 (en) * | 2011-12-20 | 2015-03-31 | Halliburton Energy Services, Inc. | Method for the removal or suppression of interfering metal ions using environmentally friendly competitive binders |
| EP3427106A1 (en) * | 2016-03-07 | 2019-01-16 | Basf Se | Coating process using premixed print formulations |
| US11640615B2 (en) | 2016-09-08 | 2023-05-02 | Thomas Villwock | Methods and systems for authenticating goods and services using electronic analysis of analyte encoded compositions |
Family Cites Families (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE509387A (enExample) * | 1951-03-01 | |||
| US2984629A (en) * | 1957-11-04 | 1961-05-16 | Cabot Corp | Aqueous dispersions of pyrogenic silica |
| US3055831A (en) * | 1961-09-25 | 1962-09-25 | Johns Manville | Handleable heat insulation shapes |
| GB1326574A (en) * | 1970-10-30 | 1973-08-15 | Degussa | Production of stabilised dispersions of pyrogenic silica |
| US4036663A (en) | 1971-11-05 | 1977-07-19 | J. M. Huber Corporation | Inorganic pigments and methods for producing the pigments and aqueous slurries thereof |
| US4010242A (en) | 1972-04-07 | 1977-03-01 | E. I. Dupont De Nemours And Company | Uniform oxide microspheres and a process for their manufacture |
| US3956171A (en) * | 1973-07-30 | 1976-05-11 | E. I. Du Pont De Nemours And Company | Process for preparing stable positively charged alumina coated silica sols and product thereof |
| US4042361A (en) | 1976-04-26 | 1977-08-16 | Corning Glass Works | Method of densifying metal oxides |
| NL7707961A (nl) * | 1977-07-18 | 1979-01-22 | Stamicarbon | Werkwijze ter bereiding van poreus, zuiver siliciumdioxyde. |
| DE2931810A1 (de) * | 1979-08-06 | 1981-02-19 | Degussa | Temperaturstabilisiertes siliciumdioxid-mischoxid, das verfahren zu seiner herstellung und verwendung |
| US4427811A (en) | 1981-12-30 | 1984-01-24 | Dow Corning Corporation | Silicone elastomeric emulsion having improved shelf life |
| US4588421A (en) | 1984-10-15 | 1986-05-13 | Nalco Chemical Company | Aqueous silica compositions for polishing silicon wafers |
| US5221497A (en) * | 1988-03-16 | 1993-06-22 | Nissan Chemical Industries, Ltd. | Elongated-shaped silica sol and method for preparing the same |
| US5116535A (en) * | 1989-03-21 | 1992-05-26 | Cabot Corporation | Aqueous colloidal dispersion of fumed silica without a stabilizer |
| US5246624A (en) | 1989-03-21 | 1993-09-21 | Cabot Corporation | Aqueous colloidal dispersion of fumed silica, acid and stabilizer |
| DE4006392A1 (de) * | 1989-03-21 | 1990-09-27 | Cabot Corp | Waessrige colloidale dispersion aus in der gasphase hergestelltem siliciumdioxid, aus einer saeure und aus einem stabilisator, sowie ein verfahren zu ihrer hertellung |
| JP3546467B2 (ja) * | 1994-04-28 | 2004-07-28 | 日産化学工業株式会社 | 水性アルミナゾル及びその製造法 |
| FR2732327B1 (fr) * | 1995-04-03 | 1997-05-09 | Rhone Poulenc Chimie | Suspension aqueuse de silice et de sulfate d'aluminium ou d'alun, procedes de preparation et utilisations de ladite suspension |
| JPH09142827A (ja) * | 1995-09-12 | 1997-06-03 | Tokuyama Corp | シリカ分散液及びその製造方法 |
| JP3437900B2 (ja) * | 1995-11-10 | 2003-08-18 | 株式会社トクヤマ | 研磨剤 |
| US5660622A (en) * | 1996-08-08 | 1997-08-26 | Nikoloff; Koyu P. | Coating for ink jet recording sheets |
| JPH10172934A (ja) * | 1996-12-05 | 1998-06-26 | Fujimi Inkooporeetetsudo:Kk | 研磨用組成物 |
| JP3922758B2 (ja) * | 1997-05-02 | 2007-05-30 | 株式会社トクヤマ | シリカ分散液の製造方法 |
| KR100510815B1 (ko) * | 1997-05-07 | 2005-10-24 | 제이에스알 가부시끼가이샤 | 무기입자의 수성분산체 및 그의 제조방법 |
| KR19990023544A (ko) | 1997-08-19 | 1999-03-25 | 마쯔모또 에이찌 | 무기 입자의 수성 분산체와 그의 제조 방법 |
| ATE390386T1 (de) * | 2000-11-15 | 2008-04-15 | Cabot Corp | Verfahren zur herstellung einer dispersion pyrogener metalloxide |
-
2001
- 2001-11-14 AT AT01996510T patent/ATE390386T1/de not_active IP Right Cessation
- 2001-11-14 US US09/992,730 patent/US6638982B2/en not_active Expired - Lifetime
- 2001-11-14 WO PCT/US2001/044250 patent/WO2002040399A2/en not_active Ceased
- 2001-11-14 AU AU2002219869A patent/AU2002219869A1/en not_active Abandoned
- 2001-11-14 DE DE60133411T patent/DE60133411T2/de not_active Expired - Lifetime
- 2001-11-14 EP EP01996510A patent/EP1349809B1/en not_active Expired - Lifetime
- 2001-11-14 JP JP2002542733A patent/JP5154731B2/ja not_active Expired - Fee Related
-
2009
- 2009-05-20 JP JP2009122386A patent/JP2009234908A/ja not_active Withdrawn
-
2011
- 2011-01-04 JP JP2011000146A patent/JP5524094B2/ja not_active Expired - Lifetime
-
2012
- 2012-10-03 JP JP2012221498A patent/JP2013049620A/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2004514027A5 (enExample) | ||
| US5116535A (en) | Aqueous colloidal dispersion of fumed silica without a stabilizer | |
| DE60320135D1 (de) | Herstellung von blockformen aus einem seltnererdhalogenid, dadurch hergestellte blockformen, ihre verwendung zur herstellung von einkristallen und dadurch hergestellte einkristalle | |
| JP2949633B2 (ja) | ヒュームドシリカの水性コロイド分散液 | |
| JP2017036209A (ja) | 高純度シリカゾルおよびその製造方法 | |
| US2269059A (en) | Method of preparing finely comminuted oxides | |
| JP3463328B2 (ja) | 酸性シリカゾルの製造方法 | |
| US20200377373A1 (en) | Porous silica particles | |
| JPWO2008111383A1 (ja) | アルミ改質コロイダルシリカ及びその製造方法 | |
| JP2003529520A5 (enExample) | ||
| JP3993993B2 (ja) | シリカゾルおよびシリカ系複合酸化物ゾルの製造方法 | |
| JP2020205320A (ja) | 窒化ケイ素エッチング液用添加剤 | |
| JP2000017259A (ja) | 地盤固結剤 | |
| JP2991987B2 (ja) | 塩基性塩化アルミニウム及びその製造方法 | |
| JP3362793B2 (ja) | シリカゾルの製造方法 | |
| JP4518844B2 (ja) | イットリアゾルの製造方法 | |
| JPS6140813A (ja) | シリカゲルの製造方法 | |
| WO2005090511A1 (ja) | 研磨用組成物および研磨方法 | |
| JPH07291614A (ja) | 高純度コロイダルシリカの製造方法 | |
| JP4088727B2 (ja) | 酸化タングステン−酸化スズ−二酸化珪素複合体ゾルの製造方法 | |
| JP4742422B2 (ja) | 硝酸セリウム（ｉｖ）アンモニウムの製造方法 | |
| JP6814462B2 (ja) | 硫酸根含有塩基性塩化アルミニウム溶液の製造方法 | |
| JP2003342554A (ja) | 研磨組成物 | |
| JPH0350116A (ja) | 球状炭酸カルシウムの製造方法 | |
| JPH0710522A (ja) | 複合酸化物ゾルの製造方法 |