JP2004506776A5 - - Google Patents
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- Publication number
- JP2004506776A5 JP2004506776A5 JP2002519570A JP2002519570A JP2004506776A5 JP 2004506776 A5 JP2004506776 A5 JP 2004506776A5 JP 2002519570 A JP2002519570 A JP 2002519570A JP 2002519570 A JP2002519570 A JP 2002519570A JP 2004506776 A5 JP2004506776 A5 JP 2004506776A5
- Authority
- JP
- Japan
- Prior art keywords
- alkyl
- phenyl
- photoinitiator
- formula
- unsubstituted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000203 mixture Substances 0.000 description 34
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 26
- 150000001875 compounds Chemical class 0.000 description 14
- -1 anthracyl Chemical group 0.000 description 11
- 239000004094 surface-active agent Substances 0.000 description 9
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- 238000009472 formulation Methods 0.000 description 7
- 229910052736 halogen Inorganic materials 0.000 description 7
- 125000001624 naphthyl group Chemical group 0.000 description 7
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 6
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 6
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 6
- 125000004430 oxygen atom Chemical group O* 0.000 description 6
- 125000001424 substituent group Chemical group 0.000 description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- 150000002367 halogens Chemical class 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 125000004433 nitrogen atom Chemical group N* 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 125000004642 (C1-C12) alkoxy group Chemical group 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 125000005561 phenanthryl group Chemical group 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 230000005670 electromagnetic radiation Effects 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 2
- 125000005842 heteroatom Chemical group 0.000 description 2
- 125000000623 heterocyclic group Chemical group 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 229920000058 polyacrylate Polymers 0.000 description 2
- 150000003254 radicals Chemical class 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 229920000877 Melamine resin Polymers 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 239000011152 fibreglass Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- 150000007974 melamines Chemical class 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 229920005906 polyester polyol Polymers 0.000 description 1
- 229920001228 polyisocyanate Polymers 0.000 description 1
- 239000005056 polyisocyanate Substances 0.000 description 1
- 229920000582 polyisocyanurate Polymers 0.000 description 1
- 239000011495 polyisocyanurate Substances 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000003678 scratch resistant effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- LMBFAGIMSUYTBN-MPZNNTNKSA-N teixobactin Chemical group C([C@H](C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H](CCC(N)=O)C(=O)N[C@H]([C@@H](C)CC)C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H]1C(N[C@@H](C)C(=O)N[C@@H](C[C@@H]2NC(=N)NC2)C(=O)N[C@H](C(=O)O[C@H]1C)[C@@H](C)CC)=O)NC)C1=CC=CC=C1 LMBFAGIMSUYTBN-MPZNNTNKSA-N 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP00810720.3 | 2000-08-14 | ||
| EP00810720 | 2000-08-14 | ||
| PCT/EP2001/009123 WO2002014439A2 (en) | 2000-08-14 | 2001-08-07 | Process for producing coatings using surface-active photoinitiators |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004506776A JP2004506776A (ja) | 2004-03-04 |
| JP2004506776A5 true JP2004506776A5 (https=) | 2008-09-25 |
| JP5068413B2 JP5068413B2 (ja) | 2012-11-07 |
Family
ID=8174856
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002519570A Expired - Lifetime JP5068413B2 (ja) | 2000-08-14 | 2001-08-07 | 界面活性光開始剤を用いるコーティングの製造方法 |
Country Status (13)
| Country | Link |
|---|---|
| US (1) | US7279200B2 (https=) |
| EP (1) | EP1311627B1 (https=) |
| JP (1) | JP5068413B2 (https=) |
| KR (1) | KR100818643B1 (https=) |
| CN (1) | CN1211439C (https=) |
| AT (1) | ATE360666T1 (https=) |
| AU (1) | AU2001293732A1 (https=) |
| BR (1) | BR0113233B1 (https=) |
| CA (1) | CA2417112A1 (https=) |
| DE (1) | DE60128105T8 (https=) |
| MX (1) | MXPA03001383A (https=) |
| TW (1) | TWI244495B (https=) |
| WO (1) | WO2002014439A2 (https=) |
Families Citing this family (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10022352A1 (de) * | 2000-05-08 | 2001-11-22 | Georg Gros | Verfahren zur Beschichtung von elektrolytisch- oder feuerverzinkten Blechen |
| WO2002024344A2 (de) * | 2000-09-25 | 2002-03-28 | Chemetall Gmbh | Verfahren zur vorbehandlung und beschichtung von metallischen oberflächen vor der umformung mit einem lackähnlichen überzug und verwendung der derart beschichteten substrate |
| AU2003205688A1 (en) * | 2002-02-04 | 2003-09-02 | Ciba Specialty Chemicals Holding Inc. | Fluorinated photoinitiators in highly fluorinated monomers |
| JP4222945B2 (ja) | 2002-02-04 | 2009-02-12 | チバ ホールディング インコーポレーテッド | 界面活性シロキサン光開始剤 |
| CN1286984C (zh) | 2002-03-06 | 2006-11-29 | 西巴特殊化学品控股有限公司 | 用于制备含有机硅基团的光敏引发剂的酶促方法 |
| EP1499645B1 (en) * | 2002-04-26 | 2006-03-15 | Ciba SC Holding AG | Incorporable photoinitiator |
| US20040115363A1 (en) * | 2002-12-13 | 2004-06-17 | Desai Umesh C. | Sealant and sound dampening composition |
| ATE527304T1 (de) * | 2003-06-06 | 2011-10-15 | Basf Se | Neue oberflächenaktive polysiloxanphotoinitiatoren |
| EP1781750A4 (en) * | 2004-07-27 | 2012-08-08 | Duluxgroup Australia Pty Ltd | SYSTEM FOR PROVIDING A POWDER-COATED WOOD MATERIAL |
| CN101044023B (zh) * | 2004-10-22 | 2010-05-05 | 三菱丽阳株式会社 | 热成形用消光丙烯酸树脂膜状物、其制造方法以及含有其的层叠体 |
| US20060234026A1 (en) * | 2005-04-18 | 2006-10-19 | Huusken Robert W M | Non-combustible high pressure laminate |
| US7919222B2 (en) * | 2006-01-29 | 2011-04-05 | Rohm And Haas Electronics Materials Llc | Coating compositions for use with an overcoated photoresist |
| CN101523289A (zh) * | 2006-10-03 | 2009-09-02 | 西巴控股有限公司 | 包含苯甲酰甲酸酯型光引发剂的可光固化组合物 |
| US8680176B2 (en) * | 2007-03-21 | 2014-03-25 | The University Of Southern Mississippi | Nanoencapsulation of isocyanates via aqueous media |
| US20100276059A1 (en) * | 2009-04-30 | 2010-11-04 | Dong Tian | UVV curable coating compositions and method for coating flooring and other substrates with same |
| CN101880482B (zh) * | 2010-07-12 | 2012-10-24 | 重庆大学 | 一种偶合接枝改性纳米金属氧化物的方法 |
| DE102014107518A1 (de) * | 2014-05-28 | 2015-12-03 | Heraeus Kulzer Gmbh | Reaktiver Mikro-Applikator mit Metall enthaltenden Additiven zur Verwendung mit dental Adhäsiven |
| CN108139665B (zh) * | 2015-12-22 | 2022-07-05 | 卡本有限公司 | 用于用双重固化树脂的增材制造的双重前体树脂系统 |
| JP6531729B2 (ja) * | 2016-07-19 | 2019-06-19 | 株式会社Sumco | シリコン試料の炭素濃度評価方法、シリコンウェーハ製造工程の評価方法、シリコンウェーハの製造方法およびシリコン単結晶インゴットの製造方法 |
| EP3600843B1 (en) | 2017-06-21 | 2021-07-21 | Carbon, Inc. | Resin dispenser for additive manufacturing |
| US11793289B2 (en) | 2018-03-08 | 2023-10-24 | Applied Lacquer Industries Inc. | Artificial nail tip and curing composition set and applying method thereof |
| US11304492B2 (en) * | 2018-03-08 | 2022-04-19 | Applied Lacquer Industries Inc. | Artificial nail tip and curing composition set and applying method thereof |
| CN113583539B (zh) * | 2021-08-11 | 2022-05-10 | 武汉工程大学 | 一种光学树脂组合物及其制备方法和应用 |
| CN114409902B (zh) * | 2021-12-27 | 2023-04-25 | 北京化工大学 | 多功能型pdms基预聚体、基于该预聚体的膜及其制备 |
| WO2023172029A1 (ko) * | 2022-03-07 | 2023-09-14 | 주식회사 엘지화학 | 화합물 |
| JP7722248B2 (ja) | 2022-04-22 | 2025-08-13 | 信越化学工業株式会社 | 光反応性オルガノポリシロキサン、その製造方法および光硬化性組成物 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4038164A (en) * | 1975-09-18 | 1977-07-26 | Stauffer Chemical Company | Photopolymerizable aryl and heterocyclic glyoxylate compositions and process |
| US3991416A (en) * | 1975-09-18 | 1976-11-09 | Hughes Aircraft Company | AC biased and resonated liquid crystal display |
| DK0956280T3 (da) * | 1997-01-30 | 2003-02-24 | Ciba Sc Holding Ag | Ikke-flygtige phenylglyoxylsyreestere |
| TW557298B (en) * | 2000-08-14 | 2003-10-11 | Ciba Sc Holding Ag | A compound, a photopolymerizible composition, a process for producing coatings and a method for causing a photoinitiator to accumulate at the surface of coatings |
-
2001
- 2001-07-31 TW TW090118671A patent/TWI244495B/zh not_active IP Right Cessation
- 2001-08-07 BR BRPI0113233-4B1A patent/BR0113233B1/pt not_active IP Right Cessation
- 2001-08-07 AT AT01974127T patent/ATE360666T1/de not_active IP Right Cessation
- 2001-08-07 CN CNB018141595A patent/CN1211439C/zh not_active Expired - Lifetime
- 2001-08-07 US US10/343,620 patent/US7279200B2/en not_active Expired - Lifetime
- 2001-08-07 CA CA002417112A patent/CA2417112A1/en not_active Abandoned
- 2001-08-07 JP JP2002519570A patent/JP5068413B2/ja not_active Expired - Lifetime
- 2001-08-07 WO PCT/EP2001/009123 patent/WO2002014439A2/en not_active Ceased
- 2001-08-07 DE DE60128105T patent/DE60128105T8/de active Active
- 2001-08-07 MX MXPA03001383A patent/MXPA03001383A/es active IP Right Grant
- 2001-08-07 KR KR1020037002201A patent/KR100818643B1/ko not_active Expired - Fee Related
- 2001-08-07 AU AU2001293732A patent/AU2001293732A1/en not_active Abandoned
- 2001-08-07 EP EP01974127A patent/EP1311627B1/en not_active Expired - Lifetime
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