ATE360666T1 - Verfahren zur herstellung von beschichtungen unter verwendung von sich an der oberfläche ansammelnden photoinitiatoren - Google Patents
Verfahren zur herstellung von beschichtungen unter verwendung von sich an der oberfläche ansammelnden photoinitiatorenInfo
- Publication number
- ATE360666T1 ATE360666T1 AT01974127T AT01974127T ATE360666T1 AT E360666 T1 ATE360666 T1 AT E360666T1 AT 01974127 T AT01974127 T AT 01974127T AT 01974127 T AT01974127 T AT 01974127T AT E360666 T1 ATE360666 T1 AT E360666T1
- Authority
- AT
- Austria
- Prior art keywords
- photoinitiators
- collecting
- formulation
- producing coatings
- exposure
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000009472 formulation Methods 0.000 abstract 3
- 239000000203 mixture Substances 0.000 abstract 3
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 abstract 1
- 230000005670 electromagnetic radiation Effects 0.000 abstract 1
- 239000003999 initiator Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 238000002360 preparation method Methods 0.000 abstract 1
- 239000006120 scratch resistant coating Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
- C07C69/66—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety
- C07C69/73—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of unsaturated acids
- C07C69/738—Esters of keto-carboxylic acids or aldehydo-carboxylic acids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
- C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Wood Science & Technology (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Inorganic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Paints Or Removers (AREA)
- Polymerisation Methods In General (AREA)
- Silicon Polymers (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP00810720 | 2000-08-14 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE360666T1 true ATE360666T1 (de) | 2007-05-15 |
Family
ID=8174856
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT01974127T ATE360666T1 (de) | 2000-08-14 | 2001-08-07 | Verfahren zur herstellung von beschichtungen unter verwendung von sich an der oberfläche ansammelnden photoinitiatoren |
Country Status (13)
| Country | Link |
|---|---|
| US (1) | US7279200B2 (de) |
| EP (1) | EP1311627B1 (de) |
| JP (1) | JP5068413B2 (de) |
| KR (1) | KR100818643B1 (de) |
| CN (1) | CN1211439C (de) |
| AT (1) | ATE360666T1 (de) |
| AU (1) | AU2001293732A1 (de) |
| BR (1) | BR0113233B1 (de) |
| CA (1) | CA2417112A1 (de) |
| DE (1) | DE60128105T8 (de) |
| MX (1) | MXPA03001383A (de) |
| TW (1) | TWI244495B (de) |
| WO (1) | WO2002014439A2 (de) |
Families Citing this family (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10022352A1 (de) * | 2000-05-08 | 2001-11-22 | Georg Gros | Verfahren zur Beschichtung von elektrolytisch- oder feuerverzinkten Blechen |
| WO2002024344A2 (de) * | 2000-09-25 | 2002-03-28 | Chemetall Gmbh | Verfahren zur vorbehandlung und beschichtung von metallischen oberflächen vor der umformung mit einem lackähnlichen überzug und verwendung der derart beschichteten substrate |
| CA2471810A1 (en) * | 2002-02-04 | 2003-08-14 | Ciba Speciality Chemicals Holding Inc. | Fluorinated photoinitiators in highly fluorinated monomers |
| EP1472292B1 (de) | 2002-02-04 | 2008-07-23 | Ciba Holding Inc. | Oberflächenaktive siloxanphotoinitiatoren |
| ATE483819T1 (de) | 2002-03-06 | 2010-10-15 | Basf Se | Enzymatisches verfahren zur herstellung einer photoinitiatoren enthaltenden organosiliziumgruppe |
| AU2003233984A1 (en) * | 2002-04-26 | 2003-11-10 | Ciba Specialty Chemicals Holding Inc. | Incorporable photoinitiator |
| US20040115363A1 (en) * | 2002-12-13 | 2004-06-17 | Desai Umesh C. | Sealant and sound dampening composition |
| US20070026509A1 (en) * | 2003-06-06 | 2007-02-01 | Jonathan Rogers | Novel surface-active polysiloxane photoinitiators |
| EP1781750A4 (de) * | 2004-07-27 | 2012-08-08 | Duluxgroup Australia Pty Ltd | System zur bereitstellung eines pulverlackierten holzwerkstoffs |
| CN101044023B (zh) * | 2004-10-22 | 2010-05-05 | 三菱丽阳株式会社 | 热成形用消光丙烯酸树脂膜状物、其制造方法以及含有其的层叠体 |
| US20060234026A1 (en) * | 2005-04-18 | 2006-10-19 | Huusken Robert W M | Non-combustible high pressure laminate |
| US7919222B2 (en) * | 2006-01-29 | 2011-04-05 | Rohm And Haas Electronics Materials Llc | Coating compositions for use with an overcoated photoresist |
| WO2008040650A2 (en) * | 2006-10-03 | 2008-04-10 | Ciba Holding Inc. | Photocurable compositions comprising a photoinitiator of the phenylglyoxylate type |
| US8680176B2 (en) * | 2007-03-21 | 2014-03-25 | The University Of Southern Mississippi | Nanoencapsulation of isocyanates via aqueous media |
| CN105111924A (zh) * | 2009-04-30 | 2015-12-02 | 阿姆斯特郎世界工业公司 | Uvv可固化的涂料组合物和使用其来涂覆地板和其他基材的方法 |
| CN101880482B (zh) * | 2010-07-12 | 2012-10-24 | 重庆大学 | 一种偶合接枝改性纳米金属氧化物的方法 |
| DE102014107518A1 (de) * | 2014-05-28 | 2015-12-03 | Heraeus Kulzer Gmbh | Reaktiver Mikro-Applikator mit Metall enthaltenden Additiven zur Verwendung mit dental Adhäsiven |
| EP3341792A1 (de) * | 2015-12-22 | 2018-07-04 | Carbon, Inc. | Doppelvorläufer-harzsysteme zur generativen fertigung mit doppelhärtungsharzen |
| JP6531729B2 (ja) * | 2016-07-19 | 2019-06-19 | 株式会社Sumco | シリコン試料の炭素濃度評価方法、シリコンウェーハ製造工程の評価方法、シリコンウェーハの製造方法およびシリコン単結晶インゴットの製造方法 |
| CN213006569U (zh) | 2017-06-21 | 2021-04-20 | 卡本有限公司 | 用于增材制造的系统和对分配用于增材制造的树脂有用的分配系统 |
| US11304492B2 (en) * | 2018-03-08 | 2022-04-19 | Applied Lacquer Industries Inc. | Artificial nail tip and curing composition set and applying method thereof |
| US11793289B2 (en) | 2018-03-08 | 2023-10-24 | Applied Lacquer Industries Inc. | Artificial nail tip and curing composition set and applying method thereof |
| CN113583539B (zh) * | 2021-08-11 | 2022-05-10 | 武汉工程大学 | 一种光学树脂组合物及其制备方法和应用 |
| CN114409902B (zh) * | 2021-12-27 | 2023-04-25 | 北京化工大学 | 多功能型pdms基预聚体、基于该预聚体的膜及其制备 |
| EP4491688A4 (de) * | 2022-03-07 | 2025-07-09 | Lg Chemical Ltd | Verbindung |
| JP7722248B2 (ja) | 2022-04-22 | 2025-08-13 | 信越化学工業株式会社 | 光反応性オルガノポリシロキサン、その製造方法および光硬化性組成物 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4038164A (en) * | 1975-09-18 | 1977-07-26 | Stauffer Chemical Company | Photopolymerizable aryl and heterocyclic glyoxylate compositions and process |
| US3991416A (en) | 1975-09-18 | 1976-11-09 | Hughes Aircraft Company | AC biased and resonated liquid crystal display |
| CA2275667A1 (en) * | 1997-01-30 | 1998-08-06 | Ciba Specialty Chemicals Holding Inc. | Non-volatile phenylglyoxalic esters |
| TW557298B (en) * | 2000-08-14 | 2003-10-11 | Ciba Sc Holding Ag | A compound, a photopolymerizible composition, a process for producing coatings and a method for causing a photoinitiator to accumulate at the surface of coatings |
-
2001
- 2001-07-31 TW TW090118671A patent/TWI244495B/zh not_active IP Right Cessation
- 2001-08-07 AT AT01974127T patent/ATE360666T1/de not_active IP Right Cessation
- 2001-08-07 DE DE60128105T patent/DE60128105T8/de active Active
- 2001-08-07 EP EP01974127A patent/EP1311627B1/de not_active Expired - Lifetime
- 2001-08-07 AU AU2001293732A patent/AU2001293732A1/en not_active Abandoned
- 2001-08-07 JP JP2002519570A patent/JP5068413B2/ja not_active Expired - Lifetime
- 2001-08-07 MX MXPA03001383A patent/MXPA03001383A/es active IP Right Grant
- 2001-08-07 US US10/343,620 patent/US7279200B2/en not_active Expired - Lifetime
- 2001-08-07 KR KR1020037002201A patent/KR100818643B1/ko not_active Expired - Fee Related
- 2001-08-07 CN CNB018141595A patent/CN1211439C/zh not_active Expired - Lifetime
- 2001-08-07 WO PCT/EP2001/009123 patent/WO2002014439A2/en not_active Ceased
- 2001-08-07 CA CA002417112A patent/CA2417112A1/en not_active Abandoned
- 2001-08-07 BR BRPI0113233-4B1A patent/BR0113233B1/pt not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| BR0113233B1 (pt) | 2013-10-01 |
| CN1211439C (zh) | 2005-07-20 |
| US7279200B2 (en) | 2007-10-09 |
| AU2001293732A1 (en) | 2002-02-25 |
| CN1447844A (zh) | 2003-10-08 |
| US20030213931A1 (en) | 2003-11-20 |
| CA2417112A1 (en) | 2002-02-21 |
| JP5068413B2 (ja) | 2012-11-07 |
| WO2002014439A3 (en) | 2002-06-13 |
| EP1311627B1 (de) | 2007-04-25 |
| MXPA03001383A (es) | 2003-06-06 |
| KR20030055249A (ko) | 2003-07-02 |
| DE60128105T8 (de) | 2008-04-30 |
| TWI244495B (en) | 2005-12-01 |
| DE60128105T2 (de) | 2007-12-27 |
| BR0113233A (pt) | 2003-06-24 |
| KR100818643B1 (ko) | 2008-04-04 |
| JP2004506776A (ja) | 2004-03-04 |
| EP1311627A2 (de) | 2003-05-21 |
| DE60128105D1 (de) | 2007-06-06 |
| WO2002014439A2 (en) | 2002-02-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE60128105D1 (de) | Verfahren zur herstellung von beschichtungen unter verwendung von sich an der oberfläche ansammelnden photoinitiatoren | |
| ATE435890T1 (de) | Verfahren zur herstellung von nanostrukturierten oberflächenbeschichtung, deren beschichtungen und gegenständen enthaltend die beschichtung | |
| DE50305348D1 (de) | Verfahren zur Herstellung von ablösbaren schmutz- und wasserabweisenden flächigen Beschichtungen | |
| DE60033801D1 (de) | Uv-härtbare silberzusammensetzung und zugehöriges verfahren | |
| JP6138936B2 (ja) | 人工爪の除去方法、人工爪組成物、人工爪、人工爪の形成方法、及び、ネイルアートキット | |
| DE4118184A1 (de) | Beschichtungszusammensetzungen auf der basis von fluorhaltigen anorganischen polykondensaten, deren herstellung und deren verwendung | |
| ATE284780T1 (de) | Verfahren zur herstellung einer augenglaslinse aus kunststoff | |
| EP0989169A4 (de) | Verfahren zur herstellung eines hydrophilen anorganischen beschichtungsfilms und eine zusammensetzung für anorganische beschichtungen | |
| DE60316688D1 (de) | Dehydrophenylahistine und analoge davon sowie ein verfahren zur herstellung von dehydrophenylahistinen und analogen davon | |
| DE3835968A1 (de) | Verfahren zur herstellung von materialien mit einem strukturierten ueberzug | |
| ATE341448T1 (de) | Vefahren und vorrichtung zum prägen von beschichteten scheiben- oder verkleidungsfilmoberflächen, und nach diesem verfahren erhaltene elemente | |
| EP2479238A3 (de) | Zusammensetzungen mit mehrfachen Reaktionen auf Erregungsstrahlung und Verfahren zu deren Herstellung | |
| DE602004029879D1 (de) | Verfahren zur herstellung einer antireflektiven beschichtung | |
| WO2003010603A1 (en) | Positive type radiosensitive composition and method for forming pattern | |
| ATE235383T1 (de) | Verfahren zur herstellung eines dekorierten substrats | |
| BR9607693A (pt) | Fórmula, processo e aparelho para encapsulação | |
| ATE394453T1 (de) | Verfahren zum schutz eines bodenbelag- oder auskleidungsmaterials vor befleckenden substanzen | |
| BR0115471A (pt) | Fotoiniciadores fluorados em resinas de cura dupla | |
| ATE39941T1 (de) | Haertbare organopolysiloxanmassen. | |
| DE69411759D1 (de) | Acryllatex zur bildung photovernetzbarer films | |
| ATE382477T1 (de) | Flachdruckplattenvorläufer sowie verfahren zur herstellung einer flachdruckplatte | |
| ATE278729T1 (de) | Verfahren zur herstellung von organosilizium- zusammensetzungen | |
| ATE526430T1 (de) | Verfahren und vorrichtung zur herstellung von rein refraktiven optischen strukturen | |
| TW200515098A (en) | Over-coating composition for photoresist and process for forming photoresist pattern using the same | |
| DE60031899D1 (de) | Verfahren zur Herstellung einer integrierten Sensormatrixanordung |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |