DE60033801D1 - Uv-härtbare silberzusammensetzung und zugehöriges verfahren - Google Patents

Uv-härtbare silberzusammensetzung und zugehöriges verfahren

Info

Publication number
DE60033801D1
DE60033801D1 DE60033801T DE60033801T DE60033801D1 DE 60033801 D1 DE60033801 D1 DE 60033801D1 DE 60033801 T DE60033801 T DE 60033801T DE 60033801 T DE60033801 T DE 60033801T DE 60033801 D1 DE60033801 D1 DE 60033801D1
Authority
DE
Germany
Prior art keywords
silver
associated method
silver composition
composition
hardenable silver
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60033801T
Other languages
English (en)
Other versions
DE60033801T2 (de
Inventor
Roy C Krohn
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Allied Photochemical Inc
Original Assignee
Allied Photochemical Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Allied Photochemical Inc filed Critical Allied Photochemical Inc
Application granted granted Critical
Publication of DE60033801D1 publication Critical patent/DE60033801D1/de
Publication of DE60033801T2 publication Critical patent/DE60033801T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/09—Use of materials for the conductive, e.g. metallic pattern
    • H05K1/092—Dispersed materials, e.g. conductive pastes or inks
    • H05K1/095—Dispersed materials, e.g. conductive pastes or inks for polymer thick films, i.e. having a permanent organic polymeric binder
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08C—TREATMENT OR CHEMICAL MODIFICATION OF RUBBERS
    • C08C19/00—Chemical modification of rubber
    • C08C19/25—Incorporating silicon atoms into the molecule
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F22/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides or nitriles thereof
    • C08F22/36—Amides or imides
    • C08F22/40—Imides, e.g. cyclic imides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/10—Block- or graft-copolymers containing polysiloxane sequences
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
    • C09D175/04—Polyurethanes
    • C09D175/14—Polyurethanes having carbon-to-carbon unsaturated bonds
    • C09D175/16—Polyurethanes having carbon-to-carbon unsaturated bonds having terminal carbon-to-carbon unsaturated bonds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
DE60033801T 1999-04-14 2000-03-24 Uv-härtbare silberzusammensetzung und zugehöriges verfahren Expired - Lifetime DE60033801T2 (de)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US413577 1995-03-30
US29177499A 1999-04-14 1999-04-14
US291774 1999-04-14
US09/413,577 US6290881B1 (en) 1999-04-14 1999-10-06 Ultraviolet curable silver composition and related method
PCT/US2000/008018 WO2000062586A1 (en) 1999-04-14 2000-03-24 Ultraviolet curable silver composition and related method

Publications (2)

Publication Number Publication Date
DE60033801D1 true DE60033801D1 (de) 2007-04-19
DE60033801T2 DE60033801T2 (de) 2007-12-06

Family

ID=26966964

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60033801T Expired - Lifetime DE60033801T2 (de) 1999-04-14 2000-03-24 Uv-härtbare silberzusammensetzung und zugehöriges verfahren

Country Status (10)

Country Link
US (2) US6290881B1 (de)
EP (1) EP1181848B1 (de)
JP (1) JP2002542315A (de)
KR (1) KR20020007373A (de)
AT (1) ATE356533T1 (de)
AU (1) AU3923200A (de)
CA (1) CA2368372C (de)
DE (1) DE60033801T2 (de)
MX (1) MXPA01010018A (de)
WO (1) WO2000062586A1 (de)

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US7157507B2 (en) * 1999-04-14 2007-01-02 Allied Photochemical, Inc. Ultraviolet curable silver composition and related method
US6767577B1 (en) 1999-10-06 2004-07-27 Allied Photochemical, Inc. Uv curable compositions for producing electroluminescent coatings
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US6509389B1 (en) * 1999-11-05 2003-01-21 Uv Specialties, Inc. UV curable compositions for producing mar resistant coatings and method for depositing same
US6500877B1 (en) * 1999-11-05 2002-12-31 Krohn Industries, Inc. UV curable paint compositions and method of making and applying same
US6805917B1 (en) 1999-12-06 2004-10-19 Roy C. Krohn UV curable compositions for producing decorative metallic coatings
MXPA02005284A (es) * 1999-12-06 2003-09-22 Flexodeco Inc Composiciones curables por uv para producir revestimientos metalicos decorativos.
US20060100302A1 (en) * 1999-12-06 2006-05-11 Krohn Roy C UV curable compositions for producing multilayer paint coatings
EP1252238A2 (de) * 1999-12-06 2002-10-30 Slidekote, Inc. Durch uv strahlung härtbare zusammensetzungen
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US7323499B2 (en) * 2000-09-06 2008-01-29 Allied Photochemical, Inc. UV curable silver chloride compositions for producing silver coatings
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US6784222B2 (en) * 2001-03-07 2004-08-31 Frank David Zychowski 100% solids radiation curable conductive primer
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US6946628B2 (en) * 2003-09-09 2005-09-20 Klai Enterprises, Inc. Heating elements deposited on a substrate and related method
US20050101686A1 (en) * 2003-11-07 2005-05-12 Krohn Roy C. UV curable composition for forming dielectric coatings and related method
US20050101685A1 (en) * 2003-11-07 2005-05-12 Allied Photochemical, Inc. UV curable composition for forming dielectric coatings and related method
US7335239B2 (en) * 2003-11-17 2008-02-26 Advanced Technology Materials, Inc. Chemical mechanical planarization pad
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US8513321B2 (en) 2010-11-05 2013-08-20 Ppg Industries Ohio, Inc. Dual cure coating compositions, methods of coating a substrate, and related coated substrates
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Also Published As

Publication number Publication date
CA2368372C (en) 2009-12-01
KR20020007373A (ko) 2002-01-26
CA2368372A1 (en) 2000-10-19
JP2002542315A (ja) 2002-12-10
US20010050357A1 (en) 2001-12-13
US6290881B1 (en) 2001-09-18
ATE356533T1 (de) 2007-03-15
US6713000B2 (en) 2004-03-30
EP1181848A1 (de) 2002-02-27
WO2000062586A1 (en) 2000-10-19
DE60033801T2 (de) 2007-12-06
AU3923200A (en) 2000-11-14
EP1181848B1 (de) 2007-03-07
MXPA01010018A (es) 2003-07-14

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