BR0113233B1 - processo para a produção de revestimentos, método de motivar um fotoiniciador de se acumular na superfície dos revestimentos, fotoiniciador tensoativo, uso de compostos da fórmula i, composição e substrato revestido - Google Patents

processo para a produção de revestimentos, método de motivar um fotoiniciador de se acumular na superfície dos revestimentos, fotoiniciador tensoativo, uso de compostos da fórmula i, composição e substrato revestido

Info

Publication number
BR0113233B1
BR0113233B1 BRPI0113233-4B1A BR0113233A BR0113233B1 BR 0113233 B1 BR0113233 B1 BR 0113233B1 BR 0113233 A BR0113233 A BR 0113233A BR 0113233 B1 BR0113233 B1 BR 0113233B1
Authority
BR
Brazil
Prior art keywords
photoinitiator
coatings
motivating
accumulate
compounds
Prior art date
Application number
BRPI0113233-4B1A
Other languages
English (en)
Other versions
BR0113233A (pt
Inventor
Gisele Baudin
Tunja Jung
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BR0113233A publication Critical patent/BR0113233A/pt
Publication of BR0113233B1 publication Critical patent/BR0113233B1/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/66—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety
    • C07C69/73—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of unsaturated acids
    • C07C69/738—Esters of keto-carboxylic acids or aldehydo-carboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
BRPI0113233-4B1A 2000-08-14 2001-08-07 processo para a produção de revestimentos, método de motivar um fotoiniciador de se acumular na superfície dos revestimentos, fotoiniciador tensoativo, uso de compostos da fórmula i, composição e substrato revestido BR0113233B1 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP00810720 2000-08-14
PCT/EP2001/009123 WO2002014439A2 (en) 2000-08-14 2001-08-07 Process for producing coatings using surface-active photoinitiators

Publications (2)

Publication Number Publication Date
BR0113233A BR0113233A (pt) 2003-06-24
BR0113233B1 true BR0113233B1 (pt) 2013-10-01

Family

ID=8174856

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0113233-4B1A BR0113233B1 (pt) 2000-08-14 2001-08-07 processo para a produção de revestimentos, método de motivar um fotoiniciador de se acumular na superfície dos revestimentos, fotoiniciador tensoativo, uso de compostos da fórmula i, composição e substrato revestido

Country Status (13)

Country Link
US (1) US7279200B2 (pt)
EP (1) EP1311627B1 (pt)
JP (1) JP5068413B2 (pt)
KR (1) KR100818643B1 (pt)
CN (1) CN1211439C (pt)
AT (1) ATE360666T1 (pt)
AU (1) AU2001293732A1 (pt)
BR (1) BR0113233B1 (pt)
CA (1) CA2417112A1 (pt)
DE (1) DE60128105T8 (pt)
MX (1) MXPA03001383A (pt)
TW (1) TWI244495B (pt)
WO (1) WO2002014439A2 (pt)

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DE10022352A1 (de) * 2000-05-08 2001-11-22 Georg Gros Verfahren zur Beschichtung von elektrolytisch- oder feuerverzinkten Blechen
CA2423137A1 (en) * 2000-09-25 2003-03-21 Chemetall Gmbh Method for pretreating and coating metal surfaces, prior to forming, with a paint-like coating and use of substrates so coated
ATE402195T1 (de) 2002-02-04 2008-08-15 Ciba Holding Inc Oberflächenaktive siloxanphotoinitiatoren
DE60319954T2 (de) * 2002-02-04 2009-04-09 Ciba Holding Inc. Fluorierte photoinitiatoren in hochfluorierten monomeren
MXPA04007993A (es) * 2002-03-06 2004-11-26 Ciba Sc Holding Ag Proceso enzimatico para la preparacion de fotoiniciadores que contienen grupos de silicio organicos.
KR100979660B1 (ko) * 2002-04-26 2010-09-02 시바 홀딩 인크 혼입 가능한 광개시제
US20040115363A1 (en) * 2002-12-13 2004-06-17 Desai Umesh C. Sealant and sound dampening composition
BRPI0410985B1 (pt) 2003-06-06 2014-07-22 Ciba Sc Holding Ag Fotoiniciadores poliméricos, seu processo de preparação e seu uso, composição fotocurável e seu uso, processo para produzir revestimentos, método para fazer com que um fotoiniciador se acumule na superfície de revestimentos, e substrato revestido
WO2006010192A1 (en) * 2004-07-27 2006-02-02 Orica Australia Pty. Ltd. System for providing powder coated reconstituted cellulosic substrate
CN101044023B (zh) * 2004-10-22 2010-05-05 三菱丽阳株式会社 热成形用消光丙烯酸树脂膜状物、其制造方法以及含有其的层叠体
US20060234026A1 (en) * 2005-04-18 2006-10-19 Huusken Robert W M Non-combustible high pressure laminate
US7919222B2 (en) * 2006-01-29 2011-04-05 Rohm And Haas Electronics Materials Llc Coating compositions for use with an overcoated photoresist
WO2008040650A2 (en) * 2006-10-03 2008-04-10 Ciba Holding Inc. Photocurable compositions comprising a photoinitiator of the phenylglyoxylate type
US8680176B2 (en) * 2007-03-21 2014-03-25 The University Of Southern Mississippi Nanoencapsulation of isocyanates via aqueous media
CN105111924A (zh) * 2009-04-30 2015-12-02 阿姆斯特郎世界工业公司 Uvv可固化的涂料组合物和使用其来涂覆地板和其他基材的方法
CN101880482B (zh) * 2010-07-12 2012-10-24 重庆大学 一种偶合接枝改性纳米金属氧化物的方法
DE102014107518A1 (de) * 2014-05-28 2015-12-03 Heraeus Kulzer Gmbh Reaktiver Mikro-Applikator mit Metall enthaltenden Additiven zur Verwendung mit dental Adhäsiven
US10350823B2 (en) 2015-12-22 2019-07-16 Carbon, Inc. Dual precursor resin systems for additive manufacturing with dual cure resins
JP7296692B2 (ja) 2016-03-03 2023-06-23 日本製鉄株式会社 車両用構造部材
JP6531729B2 (ja) * 2016-07-19 2019-06-19 株式会社Sumco シリコン試料の炭素濃度評価方法、シリコンウェーハ製造工程の評価方法、シリコンウェーハの製造方法およびシリコン単結晶インゴットの製造方法
JP6894015B2 (ja) 2017-06-21 2021-06-23 カーボン，インコーポレイテッド 積層造形の方法
US11304492B2 (en) * 2018-03-08 2022-04-19 Applied Lacquer Industries Inc. Artificial nail tip and curing composition set and applying method thereof
US11793289B2 (en) 2018-03-08 2023-10-24 Applied Lacquer Industries Inc. Artificial nail tip and curing composition set and applying method thereof
CN113583539B (zh) * 2021-08-11 2022-05-10 武汉工程大学 一种光学树脂组合物及其制备方法和应用
CN114409902B (zh) * 2021-12-27 2023-04-25 北京化工大学 多功能型pdms基预聚体、基于该预聚体的膜及其制备

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4038164A (en) * 1975-09-18 1977-07-26 Stauffer Chemical Company Photopolymerizable aryl and heterocyclic glyoxylate compositions and process
US3991416A (en) 1975-09-18 1976-11-09 Hughes Aircraft Company AC biased and resonated liquid crystal display
AU718619B2 (en) * 1997-01-30 2000-04-20 Ciba Specialty Chemicals Holding Inc. Non-volatile phenylglyoxalic esters
TW557298B (en) * 2000-08-14 2003-10-11 Ciba Sc Holding Ag A compound, a photopolymerizible composition, a process for producing coatings and a method for causing a photoinitiator to accumulate at the surface of coatings

Also Published As

Publication number Publication date
BR0113233A (pt) 2003-06-24
EP1311627B1 (en) 2007-04-25
CN1447844A (zh) 2003-10-08
DE60128105T8 (de) 2008-04-30
WO2002014439A2 (en) 2002-02-21
US7279200B2 (en) 2007-10-09
EP1311627A2 (en) 2003-05-21
KR20030055249A (ko) 2003-07-02
DE60128105D1 (de) 2007-06-06
CN1211439C (zh) 2005-07-20
ATE360666T1 (de) 2007-05-15
JP2004506776A (ja) 2004-03-04
DE60128105T2 (de) 2007-12-27
US20030213931A1 (en) 2003-11-20
WO2002014439A3 (en) 2002-06-13
CA2417112A1 (en) 2002-02-21
KR100818643B1 (ko) 2008-04-04
TWI244495B (en) 2005-12-01
AU2001293732A1 (en) 2002-02-25
MXPA03001383A (es) 2003-06-06
JP5068413B2 (ja) 2012-11-07

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Legal Events

Date Code Title Description
B06A Patent application procedure suspended [chapter 6.1 patent gazette]
B06A Patent application procedure suspended [chapter 6.1 patent gazette]
B09A Decision: intention to grant [chapter 9.1 patent gazette]
B09X Republication of the decision to grant [chapter 9.1.3 patent gazette]
B16A Patent or certificate of addition of invention granted [chapter 16.1 patent gazette]

Free format text: PRAZO DE VALIDADE: 10 (DEZ) ANOS CONTADOS A PARTIR DE 01/10/2013, OBSERVADAS AS CONDICOES LEGAIS.

B15K Others concerning applications: alteration of classification

Ipc: G03F 7/075 (2006.01), B33Y 70/00 (2015.01), C07C 6

B21F Lapse acc. art. 78, item iv - on non-payment of the annual fees in time
B24J Lapse because of non-payment of annual fees (definitively: art 78 iv lpi, resolution 113/2013 art. 12)

Free format text: EM VIRTUDE DA EXTINCAO PUBLICADA NA RPI 2474 DE 05-06-2018 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDA A EXTINCAO DA PATENTE E SEUS CERTIFICADOS, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013.