BR0115471A - Fotoiniciadores fluorados em resinas de cura dupla - Google Patents

Fotoiniciadores fluorados em resinas de cura dupla

Info

Publication number
BR0115471A
BR0115471A BR0115471-0A BR0115471A BR0115471A BR 0115471 A BR0115471 A BR 0115471A BR 0115471 A BR0115471 A BR 0115471A BR 0115471 A BR0115471 A BR 0115471A
Authority
BR
Brazil
Prior art keywords
present
dual cure
photoinitiators
cure resins
surface active
Prior art date
Application number
BR0115471-0A
Other languages
English (en)
Inventor
Gisele Baudin
Tunja Jung
Rinaldo Huesler
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Publication of BR0115471A publication Critical patent/BR0115471A/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
    • C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
    • C07D295/10—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms
    • C07D295/104—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings
    • C07D295/108—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings to an acyclic saturated chain
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/23—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
    • C07C323/31—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton
    • C07C323/32—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton having at least one of the nitrogen atoms bound to an acyclic carbon atom of the carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/62—Halogen-containing esters
    • C07C69/63—Halogen-containing esters of saturated acids
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C07F7/1804—Compounds having Si-O-C linkages
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Paints Or Removers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)

Abstract

"FOTOINICIADORES FLUORADOS EM RESINAS DE CURA DUPLA". A presente invenção refere-se a um processo para a preparação de revestimentos resistentes ao arranhão por cura dupla de composições compreendendo compostos de benzoíla ativos em superfície, em que pelo menos um grupo alquila fluorado não-polar está presente. A invenção também refere-se a um processo para a concentração destes fotoiniciadores ativos em superfície na superfície de revestimentos, aos novos compostos de benzoíla ativos em superfície, em que pelo menos um grupo alquila fluorado não-polar está presente, às composições em que os novos fotoiniciadores fluorados ativos em superfície estão presentes, e a um método para aperfeiçoar o escoamento de uma composição curável sobre substratos.
BR0115471-0A 2000-11-20 2001-11-13 Fotoiniciadores fluorados em resinas de cura dupla BR0115471A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP00811098 2000-11-20
PCT/EP2001/013130 WO2002040602A1 (en) 2000-11-20 2001-11-13 Fluorinated-photoinitiators in dual cure resins

Publications (1)

Publication Number Publication Date
BR0115471A true BR0115471A (pt) 2003-08-19

Family

ID=8175040

Family Applications (1)

Application Number Title Priority Date Filing Date
BR0115471-0A BR0115471A (pt) 2000-11-20 2001-11-13 Fotoiniciadores fluorados em resinas de cura dupla

Country Status (12)

Country Link
US (1) US20040067311A1 (pt)
EP (1) EP1392779B1 (pt)
JP (1) JP2004525994A (pt)
KR (1) KR100853363B1 (pt)
CN (1) CN1235984C (pt)
AT (1) ATE429468T1 (pt)
AU (1) AU2002218297A1 (pt)
BR (1) BR0115471A (pt)
CA (1) CA2424477A1 (pt)
DE (1) DE60138488D1 (pt)
MX (1) MXPA03004456A (pt)
WO (1) WO2002040602A1 (pt)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003066693A1 (en) * 2002-02-04 2003-08-14 Ciba Specialty Chemicals Holding Inc. Fluorinated photoinitiators in highly fluorinated monomers
JP4501462B2 (ja) * 2003-03-12 2010-07-14 Ｔｄｋ株式会社 複合ハードコート層付き物体及び複合ハードコート層の形成方法
CA2525412A1 (en) * 2003-06-06 2004-12-16 Ciba Specialty Chemicals Holding Inc. Novel surface-active polysiloxane photoinitiators
US20080241567A1 (en) * 2005-05-25 2008-10-02 Sarfraz Ahmed Siddiqui Frosting methods, frosted articles, & frosting liquids
US7244508B2 (en) * 2005-05-25 2007-07-17 Int'l Cellulose Corp. Frosting coating materials, articles, and methods
CN101268144B (zh) * 2005-09-22 2011-08-03 西巴特殊化学品控股有限公司 抗划性聚合物和涂料组合物
US8343570B2 (en) * 2005-11-17 2013-01-01 Dcc Ip Stabilizers for thermosetting powder coating compositions
JP4874689B2 (ja) * 2006-03-31 2012-02-15 富士フイルム株式会社 ホログラフィック記録用組成物及びこれを用いた光記録媒体
EP2101716A2 (en) * 2006-12-13 2009-09-23 3M Innovative Properties Company Methods of using a dental composition having an acidic component and a photobleachable dye
JP5207837B2 (ja) * 2007-08-02 2013-06-12 富士フイルム株式会社 硬化性組成物、硬化膜、フォトスペーサーの製造方法、液晶表示装置用基板及び液晶表示装置
JP5109632B2 (ja) * 2007-12-10 2012-12-26 コニカミノルタホールディングス株式会社 光開始剤、光重合性組成物及び光硬化方法
CN101812143B (zh) * 2010-04-09 2012-08-29 北京化工大学 一种含氟光引发剂及其应用
JP2014009173A (ja) * 2012-06-28 2014-01-20 Toray Fine Chemicals Co Ltd スルフィド化合物およびその製造方法
CN102912472B (zh) * 2012-11-07 2014-07-02 北京化工大学 一种制备具有表面感光活性电纺丝纳米纤维的制备方法
CN104059402B (zh) * 2014-03-04 2017-01-04 深圳市西卡德科技有限公司 一种光聚合型感光高分子材料、制备方法及其应用
CN110908234B (zh) * 2018-08-28 2022-08-02 深圳光峰科技股份有限公司 固化胶及其投影屏幕
CN114957302A (zh) * 2022-05-10 2022-08-30 常州大学 一种碳硼烷含氟光引发剂及其制备方法和应用

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2590895B1 (fr) * 1985-12-03 1988-01-15 Atochem Monomeres acryliques fluores, polymeres en derivant et leur application comme agents hydrophobes et oleophobes
EP0616617B1 (en) * 1991-12-11 1997-02-19 AlliedSignal Inc. Uv curing of fluorinated monomers
US6620857B2 (en) * 1996-07-02 2003-09-16 Ciba Specialty Chemicals Corporation Process for curing a polymerizable composition
ATE365763T1 (de) * 1996-07-02 2007-07-15 Ciba Sc Holding Ag Verfahren zur vernetzung einen polymerisierbaren zusammensetzung
DE19860041A1 (de) * 1998-12-23 2000-06-29 Basf Ag Durch Addition an Isocyanatgruppen als auch durch strahlungsinduzierte Addition an aktivierte C-C-Doppelbindungen härtbare Beschichtungsmittel
US6448302B1 (en) * 2000-01-19 2002-09-10 The Sherwin-Williams Company Radiation curable coatings having low gloss and coated articles made therefrom

Also Published As

Publication number Publication date
AU2002218297A1 (en) 2002-05-27
EP1392779A1 (en) 2004-03-03
KR100853363B1 (ko) 2008-08-22
CA2424477A1 (en) 2002-05-23
JP2004525994A (ja) 2004-08-26
US20040067311A1 (en) 2004-04-08
EP1392779B1 (en) 2009-04-22
ATE429468T1 (de) 2009-05-15
MXPA03004456A (es) 2003-08-19
CN1474862A (zh) 2004-02-11
KR20030055313A (ko) 2003-07-02
WO2002040602A1 (en) 2002-05-23
CN1235984C (zh) 2006-01-11
DE60138488D1 (de) 2009-06-04

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Legal Events

Date Code Title Description
B11A Dismissal acc. art.33 of ipl - examination not requested within 36 months of filing
B11Y Definitive dismissal - extension of time limit for request of examination expired [chapter 11.1.1 patent gazette]