AU2002218297A1 - Fluorinated-photoinitiators in dual cure resins - Google Patents

Fluorinated-photoinitiators in dual cure resins

Info

Publication number
AU2002218297A1
AU2002218297A1 AU2002218297A AU1829702A AU2002218297A1 AU 2002218297 A1 AU2002218297 A1 AU 2002218297A1 AU 2002218297 A AU2002218297 A AU 2002218297A AU 1829702 A AU1829702 A AU 1829702A AU 2002218297 A1 AU2002218297 A1 AU 2002218297A1
Authority
AU
Australia
Prior art keywords
photoinitiators
present
fluorinated
dual cure
cure resins
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002218297A
Inventor
Gisele Baudin
Rinaldo Husler
Tunja Jung
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Ciba SC Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG, Ciba SC Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Publication of AU2002218297A1 publication Critical patent/AU2002218297A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
    • C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
    • C07D295/10—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms
    • C07D295/104—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings
    • C07D295/108—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings to an acyclic saturated chain
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/23—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
    • C07C323/31—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton
    • C07C323/32—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton having at least one of the nitrogen atoms bound to an acyclic carbon atom of the carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/62—Halogen-containing esters
    • C07C69/63—Halogen-containing esters of saturated acids
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic System
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C07F7/1804—Compounds having Si-O-C linkages
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16

Abstract

The present invention relates to a process for the preparation of scratch-resistant coatings by dual cure of compositions comprising surface active benzoyl compounds wherein at least one non-polar fluorinated alkyl group is present. The invention also relates to a process for concentrating these surface-active photoinitiators in the surface of coatings, to novel surface active benzoyl compounds wherein at least one non-polar fluorinated alkyl group is present, to compositions wherein the novel surface active fluorinated photoinitiators are present, and to a method for improving the flow of a curable composition on substrates.
AU2002218297A 2000-11-20 2001-11-13 Fluorinated-photoinitiators in dual cure resins Abandoned AU2002218297A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP00811098 2000-11-20
EP00811098 2000-11-20
PCT/EP2001/013130 WO2002040602A1 (en) 2000-11-20 2001-11-13 Fluorinated-photoinitiators in dual cure resins

Publications (1)

Publication Number Publication Date
AU2002218297A1 true AU2002218297A1 (en) 2002-05-27

Family

ID=8175040

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002218297A Abandoned AU2002218297A1 (en) 2000-11-20 2001-11-13 Fluorinated-photoinitiators in dual cure resins

Country Status (12)

Country Link
US (1) US20040067311A1 (en)
EP (1) EP1392779B1 (en)
JP (1) JP2004525994A (en)
KR (1) KR100853363B1 (en)
CN (1) CN1235984C (en)
AT (1) ATE429468T1 (en)
AU (1) AU2002218297A1 (en)
BR (1) BR0115471A (en)
CA (1) CA2424477A1 (en)
DE (1) DE60138488D1 (en)
MX (1) MXPA03004456A (en)
WO (1) WO2002040602A1 (en)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2471810A1 (en) * 2002-02-04 2003-08-14 Ciba Speciality Chemicals Holding Inc. Fluorinated photoinitiators in highly fluorinated monomers
JP4501462B2 (en) * 2003-03-12 2010-07-14 Ｔｄｋ株式会社 Object with composite hard coat layer and method for forming composite hard coat layer
JP4767840B2 (en) * 2003-06-06 2011-09-07 チバ ホールディング インコーポレーテッド Novel surfactant polysiloxane photoinitiator
US7244508B2 (en) * 2005-05-25 2007-07-17 Int'l Cellulose Corp. Frosting coating materials, articles, and methods
US20080241567A1 (en) * 2005-05-25 2008-10-02 Sarfraz Ahmed Siddiqui Frosting methods, frosted articles, & frosting liquids
EP1926777A1 (en) * 2005-09-22 2008-06-04 Ciba Holding Inc. Scratch resistant polymer and coating compositions
WO2007057327A1 (en) * 2005-11-17 2007-05-24 Ciba Holding Inc. Stabilizers for thermosetting powder coating compositions
JP4874689B2 (en) * 2006-03-31 2012-02-15 富士フイルム株式会社 Holographic recording composition and optical recording medium using the same
US9943465B2 (en) * 2006-12-13 2018-04-17 3M Innovative Properties Company Methods of using a dental composition having an acidic component and a photobleachable dye
JP5207837B2 (en) * 2007-08-02 2013-06-12 富士フイルム株式会社 Curable composition, cured film, method for producing photospacer, substrate for liquid crystal display device and liquid crystal display device
JP5109632B2 (en) * 2007-12-10 2012-12-26 コニカミノルタホールディングス株式会社 Photoinitiator, photopolymerizable composition, and photocuring method
CN101812143B (en) * 2010-04-09 2012-08-29 北京化工大学 Fluorine-containing photoinitiator and application thereof
JP2014009173A (en) * 2012-06-28 2014-01-20 Toray Fine Chemicals Co Ltd Sulfide compound and method of producing the same
CN102912472B (en) * 2012-11-07 2014-07-02 北京化工大学 Method for preparing electrospinning nanofiber with surface photosensitive activity
CN104059402B (en) * 2014-03-04 2017-01-04 深圳市西卡德科技有限公司 A kind of photo-polymerization type photosensitive macromolecular material, preparation method and applications
CN110908234B (en) * 2018-08-28 2022-08-02 深圳光峰科技股份有限公司 Curing adhesive and projection screen thereof
CN114957302A (en) * 2022-05-10 2022-08-30 常州大学 Carborane fluorine-containing photoinitiator and preparation method and application thereof

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2590895B1 (en) * 1985-12-03 1988-01-15 Atochem FLUORINATED ACRYLIC MONOMERS, DERIVATIVE POLYMERS AND THEIR APPLICATION AS HYDROPHOBIC AND OLEOPHOBIC AGENTS
EP0616617B1 (en) * 1991-12-11 1997-02-19 AlliedSignal Inc. Uv curing of fluorinated monomers
US6620857B2 (en) * 1996-07-02 2003-09-16 Ciba Specialty Chemicals Corporation Process for curing a polymerizable composition
EP0909288B1 (en) * 1996-07-02 2007-06-27 Ciba SC Holding AG Process for curing a polymerizable composition
DE19860041A1 (en) * 1998-12-23 2000-06-29 Basf Ag Coating agents curable by addition to isocyanate groups and also by radiation-induced addition to activated C-C double bonds
US6448302B1 (en) * 2000-01-19 2002-09-10 The Sherwin-Williams Company Radiation curable coatings having low gloss and coated articles made therefrom

Also Published As

Publication number Publication date
EP1392779A1 (en) 2004-03-03
ATE429468T1 (en) 2009-05-15
CN1474862A (en) 2004-02-11
DE60138488D1 (en) 2009-06-04
EP1392779B1 (en) 2009-04-22
CA2424477A1 (en) 2002-05-23
BR0115471A (en) 2003-08-19
CN1235984C (en) 2006-01-11
KR20030055313A (en) 2003-07-02
US20040067311A1 (en) 2004-04-08
KR100853363B1 (en) 2008-08-22
WO2002040602A1 (en) 2002-05-23
MXPA03004456A (en) 2003-08-19
JP2004525994A (en) 2004-08-26

Similar Documents

Publication Publication Date Title
AU2002218297A1 (en) Fluorinated-photoinitiators in dual cure resins
AU3923200A (en) Ultraviolet curable silver composition and related method
EP0885130A4 (en) Glass decorating method using bis phenol-a epoxy resins and related compositions and articles
TW200505810A (en) Nano-structured surface coating process, nano-structured coatings and articles comprising the coating
AU2003217802A1 (en) Novel fused ring compounds, and their use as cationic photoinitiators
CA2081299A1 (en) Foaming agent composition and process
TW353109B (en) Coating solution for silica-based coating film and method for the preparation thereof
MX9603054A (en) A method and composition for promoting improved adhesion to substrates.
JPS5763352A (en) Composition having improved storage stability
AU6210394A (en) Thermosetting polysiloxane compositions for anti-abrasion coating, process for their production and corresponding coated articles, especially ophthalmic glasses and lenses
AU2001269905A1 (en) Novel photoinitiators and applications therefor
AU2001253214A1 (en) Radiation-curable release compositions, use thereof and release coated substrates
AU2003265979A1 (en) Organosilicon compounds and blends for treating silica
TW200619243A (en) Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same
AU2001279776A1 (en) Method for coating substrates
AU2002234551A1 (en) Surface-active photoinitiators
EP1176186A3 (en) Composition for mitigating coke formation in thermal cracking furnaces
WO2003022906A1 (en) Fluorinated unsaturated compounds, fluoropolymers, and curable compositions containing both
WO2003064548A3 (en) Reactive diluents and coatings comprising them
EP1302487A4 (en) Resin containing phosphate group
CA2138412A1 (en) Rapidly curable vinyl ether release coatings
WO2000018750A8 (en) Chelates comprising chinoid groups as photoinitiators
AU2003285154A1 (en) Degreasing compositions
MX246886B (en) Ultraviolet radiation curable ink composition and a process for its application on glass substrates
EP1288280A3 (en) Use of tertiary alcohols or esters as perfuming ingredients