AU2001293732A1 - Process for producing coatings using siloxane photoinitiators - Google Patents

Process for producing coatings using siloxane photoinitiators

Info

Publication number
AU2001293732A1
AU2001293732A1 AU2001293732A AU9373201A AU2001293732A1 AU 2001293732 A1 AU2001293732 A1 AU 2001293732A1 AU 2001293732 A AU2001293732 A AU 2001293732A AU 9373201 A AU9373201 A AU 9373201A AU 2001293732 A1 AU2001293732 A1 AU 2001293732A1
Authority
AU
Australia
Prior art keywords
formulation
producing coatings
photoinitiators
siloxane
siloxane photoinitiators
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001293732A
Inventor
Gisele Baudin
Tunja Jung
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Ciba SC Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG, Ciba SC Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Publication of AU2001293732A1 publication Critical patent/AU2001293732A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/66—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety
    • C07C69/73—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of unsaturated acids
    • C07C69/738—Esters of keto-carboxylic acids or aldehydo-carboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Wood Science & Technology (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Paints Or Removers (AREA)
  • Polymerisation Methods In General (AREA)
  • Silicon Polymers (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

A process for producing stable, scratch-resistant coatings comprising the preparation of a photocurable formulation containing certain siloxane photoinitiators as surface-active initiators, application of the formulation to a substrate and the curing of the formulation by exposure to electromagnetic radiation with wavelengths from 200 nm into the IR region and prior, simultaneous or subsequent exposure to heat.
AU2001293732A 2000-08-14 2001-08-07 Process for producing coatings using siloxane photoinitiators Abandoned AU2001293732A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP00810720 2000-08-14
EP00810720 2000-08-14
PCT/EP2001/009123 WO2002014439A2 (en) 2000-08-14 2001-08-07 Process for producing coatings using surface-active photoinitiators

Publications (1)

Publication Number Publication Date
AU2001293732A1 true AU2001293732A1 (en) 2002-02-25

Family

ID=8174856

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001293732A Abandoned AU2001293732A1 (en) 2000-08-14 2001-08-07 Process for producing coatings using siloxane photoinitiators

Country Status (13)

Country Link
US (1) US7279200B2 (en)
EP (1) EP1311627B1 (en)
JP (1) JP5068413B2 (en)
KR (1) KR100818643B1 (en)
CN (1) CN1211439C (en)
AT (1) ATE360666T1 (en)
AU (1) AU2001293732A1 (en)
BR (1) BR0113233B1 (en)
CA (1) CA2417112A1 (en)
DE (1) DE60128105T8 (en)
MX (1) MXPA03001383A (en)
TW (1) TWI244495B (en)
WO (1) WO2002014439A2 (en)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10022352A1 (en) * 2000-05-08 2001-11-22 Georg Gros Coating sheet metal used in the automobile, aviation and naval industries comprises using a chromate-free, water-dilutable anti corrosive binder coating and curing using UV
WO2002024344A2 (en) * 2000-09-25 2002-03-28 Chemetall Gmbh Method for pretreating and coating metal surfaces, prior to forming, with a paint-like coating and use of substrates so coated
ATE402195T1 (en) 2002-02-04 2008-08-15 Ciba Holding Inc SURFACE-ACTIVE SILOXANE PHOTOINITIATORS
WO2003066693A1 (en) * 2002-02-04 2003-08-14 Ciba Specialty Chemicals Holding Inc. Fluorinated photoinitiators in highly fluorinated monomers
JP4339694B2 (en) 2002-03-06 2009-10-07 チバ ホールディング インコーポレーテッド Enzymatic method for preparing photoinitiators containing organosilicon groups
PL207511B1 (en) * 2002-04-26 2010-12-31 Ciba Sc Holding Ag Incorporable photoinitiator
US20040115363A1 (en) * 2002-12-13 2004-06-17 Desai Umesh C. Sealant and sound dampening composition
CA2525412A1 (en) * 2003-06-06 2004-12-16 Ciba Specialty Chemicals Holding Inc. Novel surface-active polysiloxane photoinitiators
EP1781750A4 (en) * 2004-07-27 2012-08-08 Duluxgroup Australia Pty Ltd System for providing powder coated reconstituted cellulosic substrate
CN101044023B (en) * 2004-10-22 2010-05-05 三菱丽阳株式会社 Matt acrylic resin film for thermoforming, process of its production and laminated body
US20060234026A1 (en) * 2005-04-18 2006-10-19 Huusken Robert W M Non-combustible high pressure laminate
US7919222B2 (en) * 2006-01-29 2011-04-05 Rohm And Haas Electronics Materials Llc Coating compositions for use with an overcoated photoresist
EP2069866A2 (en) * 2006-10-03 2009-06-17 Ciba Holding Inc. Photocurable compositions
US8680176B2 (en) * 2007-03-21 2014-03-25 The University Of Southern Mississippi Nanoencapsulation of isocyanates via aqueous media
WO2010126618A1 (en) * 2009-04-30 2010-11-04 Armstrong World Industries, Inc. Uvv curable coating compositions and method for coating flooring and other substrates with same
CN101880482B (en) * 2010-07-12 2012-10-24 重庆大学 Method for modifying nano metal oxide by coupling graft
DE102014107518A1 (en) * 2014-05-28 2015-12-03 Heraeus Kulzer Gmbh Reactive micro-applicator with metal-containing additives for use with dental adhesives
US10350823B2 (en) 2015-12-22 2019-07-16 Carbon, Inc. Dual precursor resin systems for additive manufacturing with dual cure resins
JP7296692B2 (en) 2016-03-03 2023-06-23 日本製鉄株式会社 Vehicle structural member
JP6531729B2 (en) * 2016-07-19 2019-06-19 株式会社Sumco Method of evaluating carbon concentration of silicon sample, method of evaluating silicon wafer manufacturing process, method of manufacturing silicon wafer, and method of manufacturing silicon single crystal ingot
JP6894015B2 (en) 2017-06-21 2021-06-23 カーボン，インコーポレイテッド Laminated modeling method
US11304492B2 (en) * 2018-03-08 2022-04-19 Applied Lacquer Industries Inc. Artificial nail tip and curing composition set and applying method thereof
US11793289B2 (en) 2018-03-08 2023-10-24 Applied Lacquer Industries Inc. Artificial nail tip and curing composition set and applying method thereof
CN113583539B (en) * 2021-08-11 2022-05-10 武汉工程大学 Optical resin composition and preparation method and application thereof
CN114409902B (en) * 2021-12-27 2023-04-25 北京化工大学 Multifunctional PDMS-based prepolymer, film based on the prepolymer and preparation thereof
JP2023160306A (en) 2022-04-22 2023-11-02 信越化学工業株式会社 Photoreactive organopolysiloxane, method for producing the same, and photocurable composition

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3991416A (en) * 1975-09-18 1976-11-09 Hughes Aircraft Company AC biased and resonated liquid crystal display
US4038164A (en) * 1975-09-18 1977-07-26 Stauffer Chemical Company Photopolymerizable aryl and heterocyclic glyoxylate compositions and process
BR9806940B1 (en) * 1997-01-30 2010-12-14 Non-volatile phenylglyoxylic esters, photopolymerizable compositions, use thereof and process for photopolymerization.
TW557298B (en) * 2000-08-14 2003-10-11 Ciba Sc Holding Ag A compound, a photopolymerizible composition, a process for producing coatings and a method for causing a photoinitiator to accumulate at the surface of coatings

Also Published As

Publication number Publication date
JP5068413B2 (en) 2012-11-07
TWI244495B (en) 2005-12-01
ATE360666T1 (en) 2007-05-15
BR0113233B1 (en) 2013-10-01
KR100818643B1 (en) 2008-04-04
CA2417112A1 (en) 2002-02-21
EP1311627B1 (en) 2007-04-25
US20030213931A1 (en) 2003-11-20
BR0113233A (en) 2003-06-24
JP2004506776A (en) 2004-03-04
CN1447844A (en) 2003-10-08
WO2002014439A3 (en) 2002-06-13
DE60128105D1 (en) 2007-06-06
DE60128105T8 (en) 2008-04-30
US7279200B2 (en) 2007-10-09
KR20030055249A (en) 2003-07-02
MXPA03001383A (en) 2003-06-06
DE60128105T2 (en) 2007-12-27
EP1311627A2 (en) 2003-05-21
CN1211439C (en) 2005-07-20
WO2002014439A2 (en) 2002-02-21

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