AU2001266281A1 - Utilizing uv to form and decompose a printing member - Google Patents
Utilizing uv to form and decompose a printing memberInfo
- Publication number
- AU2001266281A1 AU2001266281A1 AU2001266281A AU6628101A AU2001266281A1 AU 2001266281 A1 AU2001266281 A1 AU 2001266281A1 AU 2001266281 A AU2001266281 A AU 2001266281A AU 6628101 A AU6628101 A AU 6628101A AU 2001266281 A1 AU2001266281 A1 AU 2001266281A1
- Authority
- AU
- Australia
- Prior art keywords
- decompose
- utilizing
- printing member
- layer
- printing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1075—Mechanical aspects of on-press plate preparation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
- B41C1/1033—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials by laser or spark ablation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N3/00—Preparing for use and conserving printing surfaces
- B41N3/03—Chemical or electrical pretreatment
- B41N3/038—Treatment with a chromium compound, a silicon compound, a phophorus compound or a compound of a metal of group IVB; Hydrophilic coatings obtained by hydrolysis of organometallic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2035—Exposure; Apparatus therefor simultaneous coating and exposure; using a belt mask, e.g. endless
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/24—Curved surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/16—Waterless working, i.e. ink repelling exposed (imaged) or non-exposed (non-imaged) areas, not requiring fountain solution or water, e.g. dry lithography or driography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N3/00—Preparing for use and conserving printing surfaces
- B41N3/006—Cleaning, washing, rinsing or reclaiming of printing formes other than intaglio formes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/582—Recycling of unreacted starting or intermediate materials
Abstract
In one embodiment, the present invention is directed to a method for preparing a printing member by coating a printing cylinder with a layer comprising ultraviolet-curable silicones and curing the layer using ultraviolet radiation.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US21636800P | 2000-07-05 | 2000-07-05 | |
US60216368 | 2000-07-05 | ||
PCT/IL2001/000541 WO2002002346A2 (en) | 2000-07-05 | 2001-06-12 | Preparation of printing cylinders using ultra-violet radiation |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2001266281A1 true AU2001266281A1 (en) | 2002-01-14 |
Family
ID=22806773
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2001266281A Abandoned AU2001266281A1 (en) | 2000-07-05 | 2001-06-12 | Utilizing uv to form and decompose a printing member |
Country Status (6)
Country | Link |
---|---|
US (1) | US6723491B2 (en) |
EP (1) | EP1299236B1 (en) |
AT (1) | ATE264191T1 (en) |
AU (1) | AU2001266281A1 (en) |
DE (1) | DE60102820T2 (en) |
WO (1) | WO2002002346A2 (en) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6610458B2 (en) * | 2001-07-23 | 2003-08-26 | Kodak Polychrome Graphics Llc | Method and system for direct-to-press imaging |
EP1710093B1 (en) * | 2004-01-27 | 2013-11-20 | Asahi Kasei Chemicals Corporation | Photosensitive resin composition for laser engravable printing substrate |
DE102005046242A1 (en) * | 2005-09-28 | 2007-03-29 | Man Roland Druckmaschinen Ag | Process for imaging printing forms |
KR101274680B1 (en) * | 2006-04-10 | 2013-06-12 | 엘지디스플레이 주식회사 | Blanket for printing roll, Method of manufacturing the same, Patterning Method using for the same and Method of manufacturing Liquid Crystal Display Device |
KR101308431B1 (en) * | 2006-04-26 | 2013-09-30 | 엘지디스플레이 주식회사 | Resist for Printing and Patterning Method using the same |
KR101232179B1 (en) * | 2006-12-04 | 2013-02-12 | 엘지디스플레이 주식회사 | Apparatus And Method of Fabricating Thin Film Pattern |
DE102007005815A1 (en) * | 2007-02-06 | 2008-08-07 | Maschinenfabrik Wifag | Method for illustrating printing plate in offset printing machine, involves applying thermosetting coating material on hydrophobic surface of printing plate, in which coating material is hardened by irradiation or drying process |
DE102007024611A1 (en) * | 2007-05-25 | 2008-11-27 | Manroland Ag | Method and device for producing a permanent and erasable image on a printing form |
DE102015200114B4 (en) * | 2015-01-08 | 2018-12-20 | Koenig & Bauer Ag | Method for reusing a printing plate |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52150103A (en) * | 1976-06-07 | 1977-12-13 | Shinetsu Chemical Co | Method of producing lithographic printing form and press plate |
US4369300A (en) * | 1979-11-26 | 1983-01-18 | Union Carbide Corporation | Acrylated urethane silicone compositions |
DE3015469A1 (en) * | 1980-04-22 | 1981-10-29 | Dai Nippon Printing Co., Ltd. | Lithographic printing plate mfr. - by forming protective hardened organo-polysiloxane layer on silicone layer, rendering unprotected areas oleophilic and removing protection |
US5440987A (en) * | 1994-01-21 | 1995-08-15 | Presstek, Inc. | Laser imaged seamless lithographic printing members and method of making |
JP3123351B2 (en) * | 1994-06-15 | 2001-01-09 | 信越化学工業株式会社 | Curable silicone composition |
JP3322493B2 (en) * | 1994-12-09 | 2002-09-09 | 富士写真フイルム株式会社 | No fountain solution photosensitive lithographic printing plate |
US5713287A (en) * | 1995-05-11 | 1998-02-03 | Creo Products Inc. | Direct-to-Press imaging method using surface modification of a single layer coating |
JP3604700B2 (en) | 1995-10-06 | 2004-12-22 | ポラロイド コーポレイション | Holographic media and processes |
US5855173A (en) * | 1995-10-20 | 1999-01-05 | Eastman Kodak Company | Zirconia alloy cylinders and sleeves for imaging and lithographic printing methods |
JPH09250539A (en) * | 1996-03-19 | 1997-09-22 | Shin Etsu Polymer Co Ltd | Semiconductive roll, and manufacture of it |
JP3966578B2 (en) * | 1997-05-19 | 2007-08-29 | 信越ポリマー株式会社 | Semiconductive roll and developing device |
IL122953A (en) * | 1998-01-15 | 2000-11-21 | Scitex Corp Ltd | Printing member for use with a printing system and method of imaging the printing member |
-
2001
- 2001-06-07 US US09/874,986 patent/US6723491B2/en not_active Expired - Fee Related
- 2001-06-12 AT AT01943753T patent/ATE264191T1/en not_active IP Right Cessation
- 2001-06-12 WO PCT/IL2001/000541 patent/WO2002002346A2/en active IP Right Grant
- 2001-06-12 DE DE60102820T patent/DE60102820T2/en not_active Expired - Lifetime
- 2001-06-12 EP EP01943753A patent/EP1299236B1/en not_active Expired - Lifetime
- 2001-06-12 AU AU2001266281A patent/AU2001266281A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
US20020017211A1 (en) | 2002-02-14 |
WO2002002346A3 (en) | 2002-05-10 |
WO2002002346A2 (en) | 2002-01-10 |
US6723491B2 (en) | 2004-04-20 |
EP1299236B1 (en) | 2004-04-14 |
ATE264191T1 (en) | 2004-04-15 |
DE60102820D1 (en) | 2004-05-19 |
EP1299236A2 (en) | 2003-04-09 |
DE60102820T2 (en) | 2004-09-23 |
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