BR0113233A - Processo para a produção de revestimentos usando fotoiniciadores tensoativos - Google Patents
Processo para a produção de revestimentos usando fotoiniciadores tensoativosInfo
- Publication number
- BR0113233A BR0113233A BR0113233-4A BR0113233A BR0113233A BR 0113233 A BR0113233 A BR 0113233A BR 0113233 A BR0113233 A BR 0113233A BR 0113233 A BR0113233 A BR 0113233A
- Authority
- BR
- Brazil
- Prior art keywords
- photoinitiators
- coatings
- surfactant
- production
- formulation
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 2
- 238000000576 coating method Methods 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000004094 surface-active agent Substances 0.000 title 1
- 238000009472 formulation Methods 0.000 abstract 3
- 239000000203 mixture Substances 0.000 abstract 3
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 abstract 1
- 230000005670 electromagnetic radiation Effects 0.000 abstract 1
- 239000003999 initiator Substances 0.000 abstract 1
- 238000002360 preparation method Methods 0.000 abstract 1
- 239000006120 scratch resistant coating Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
- C07C69/66—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety
- C07C69/73—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of unsaturated acids
- C07C69/738—Esters of keto-carboxylic acids or aldehydo-carboxylic acids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
- C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Wood Science & Technology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Inorganic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Paints Or Removers (AREA)
- Polymerisation Methods In General (AREA)
- Silicon Polymers (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
"PROCESSO PARA A PRODUçãO DE REVESTIMENTOS USANDO FOTOINICIADORES TENSOATIVOS". Compostos da fórmula I em que r é um número 1 ou 2; s é um número de 1 a 1000; R é um radical da fórmula II ou R é, por exemplo, naftila, antracila, fenantrila não-substituídas ou substituídas ou um radical heterociclico, R~ 1~, R~ 2~, R~ 3~, R~ 4~ e R~ 5~ independentemente um do outro são, por exemplo, hidrogênio; fenila ou alquila C~ 1~-C~ 12~ não-substituída ou substituídas; A, SE S for 1, é um radical tensoativo da fórmula III ou A, se s for 1, é um radical tensoativo A~ 0~; ou A, se s for um número maior do que 1, é um radical da fórmula III em que n corresponde ao número s, ou A, se s for 2, é um radical A~ 1~; A~ 0~ é, por exemplo, em cada caso alquila C~ 6~- C~ 30~, alquenila C~ 6~-C~ 30~, alquinila C~ 6~-C~ 30~ ou aralquila C~ 6~-C~ 30~ não-substituídas ou substituídas; A~ 1~ é, por exemplo, em cada caso alquileno C~ 6~-C~ 30~, alquenileno C~ 6~-C~ 30~, alquinileno C~ 6~-C~ 30~ ou aralquileno C~ 6~- C~ 30~ não-substituídos ou substituídos; n é, por exemplo, um número de 1 a 1000; m é um número de 0 a 100; p é um número de 0 a 10.000; x é um número de 1 a 10; Y, se r for 1, é um grupo divalente e Y, se r for 2, é um grupo trivalente, e Y, se A tiver a definição A~ 0~, é uma ligação única; G~ 1~, G~ 2~,R~ 13~, R~ 14~, R~ 15~ R~ 17~ R~ 18~ R~ 19~ R~ 20~ R~ 21~ e R~ 22~ são, por exemplo, alquila C~ 1~-C~ 18~; são particularmente adequados como fotoiniciadores que se acumulam na superfície em um processo para revestimentos de cura.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP00810720 | 2000-08-14 | ||
| PCT/EP2001/009123 WO2002014439A2 (en) | 2000-08-14 | 2001-08-07 | Process for producing coatings using surface-active photoinitiators |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| BR0113233A true BR0113233A (pt) | 2003-06-24 |
| BR0113233B1 BR0113233B1 (pt) | 2013-10-01 |
Family
ID=8174856
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BRPI0113233-4B1A BR0113233B1 (pt) | 2000-08-14 | 2001-08-07 | processo para a produção de revestimentos, método de motivar um fotoiniciador de se acumular na superfície dos revestimentos, fotoiniciador tensoativo, uso de compostos da fórmula i, composição e substrato revestido |
Country Status (13)
| Country | Link |
|---|---|
| US (1) | US7279200B2 (pt) |
| EP (1) | EP1311627B1 (pt) |
| JP (1) | JP5068413B2 (pt) |
| KR (1) | KR100818643B1 (pt) |
| CN (1) | CN1211439C (pt) |
| AT (1) | ATE360666T1 (pt) |
| AU (1) | AU2001293732A1 (pt) |
| BR (1) | BR0113233B1 (pt) |
| CA (1) | CA2417112A1 (pt) |
| DE (1) | DE60128105T8 (pt) |
| MX (1) | MXPA03001383A (pt) |
| TW (1) | TWI244495B (pt) |
| WO (1) | WO2002014439A2 (pt) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10022352A1 (de) * | 2000-05-08 | 2001-11-22 | Georg Gros | Verfahren zur Beschichtung von elektrolytisch- oder feuerverzinkten Blechen |
| US20030185990A1 (en) * | 2000-09-25 | 2003-10-02 | Klaus Bittner | Method for pretreating and coating metal surfaces prior to forming, with a paint-like coating and use of substrates so coated |
| EP1472296B1 (en) * | 2002-02-04 | 2008-03-26 | Ciba SC Holding AG | Fluorinated photoinitiators in highly fluorinated monomers |
| JP4222945B2 (ja) | 2002-02-04 | 2009-02-12 | チバ ホールディング インコーポレーテッド | 界面活性シロキサン光開始剤 |
| BR0308200A (pt) | 2002-03-06 | 2005-01-04 | Ciba Sc Holding Ag | Processo enzimático para preparação de fotoiniciadores que contém grupo organossilìcio |
| DK1499645T3 (da) * | 2002-04-26 | 2006-07-17 | Ciba Sc Holding Ag | Fotoinitiator som kan inkorporeres |
| US20040115363A1 (en) * | 2002-12-13 | 2004-06-17 | Desai Umesh C. | Sealant and sound dampening composition |
| US20070026509A1 (en) * | 2003-06-06 | 2007-02-01 | Jonathan Rogers | Novel surface-active polysiloxane photoinitiators |
| EP1781750A4 (en) * | 2004-07-27 | 2012-08-08 | Duluxgroup Australia Pty Ltd | SYSTEM FOR PROVIDING A POWDER-COATED WOOD MATERIAL |
| WO2006043672A1 (ja) * | 2004-10-22 | 2006-04-27 | Mitsubishi Rayon Co., Ltd. | 熱成形用艶消しアクリル樹脂フィルム状物、その製造方法、および、それを含む積層体 |
| US20060234026A1 (en) * | 2005-04-18 | 2006-10-19 | Huusken Robert W M | Non-combustible high pressure laminate |
| US7919222B2 (en) * | 2006-01-29 | 2011-04-05 | Rohm And Haas Electronics Materials Llc | Coating compositions for use with an overcoated photoresist |
| US20100022676A1 (en) * | 2006-10-03 | 2010-01-28 | Jonathan Rogers | Photocurable compositions comprising a photoinitiator of the phenylglyoxylate type |
| US8680176B2 (en) * | 2007-03-21 | 2014-03-25 | The University Of Southern Mississippi | Nanoencapsulation of isocyanates via aqueous media |
| CN102459381A (zh) * | 2009-04-30 | 2012-05-16 | 阿姆斯特郎世界工业公司 | Uvv可固化的涂料组合物和使用其来涂覆地板和其他基材的方法 |
| CN101880482B (zh) * | 2010-07-12 | 2012-10-24 | 重庆大学 | 一种偶合接枝改性纳米金属氧化物的方法 |
| DE102014107518A1 (de) * | 2014-05-28 | 2015-12-03 | Heraeus Kulzer Gmbh | Reaktiver Mikro-Applikator mit Metall enthaltenden Additiven zur Verwendung mit dental Adhäsiven |
| WO2017112653A1 (en) | 2015-12-22 | 2017-06-29 | Carbon, Inc. | Dual precursor resin systems for additive manufacturing with dual cure resins |
| JP7296692B2 (ja) | 2016-03-03 | 2023-06-23 | 日本製鉄株式会社 | 車両用構造部材 |
| JP6531729B2 (ja) * | 2016-07-19 | 2019-06-19 | 株式会社Sumco | シリコン試料の炭素濃度評価方法、シリコンウェーハ製造工程の評価方法、シリコンウェーハの製造方法およびシリコン単結晶インゴットの製造方法 |
| WO2018237038A1 (en) | 2017-06-21 | 2018-12-27 | Carbon, Inc. | ADDITIVE MANUFACTURING METHOD |
| US11793289B2 (en) | 2018-03-08 | 2023-10-24 | Applied Lacquer Industries Inc. | Artificial nail tip and curing composition set and applying method thereof |
| US11304492B2 (en) * | 2018-03-08 | 2022-04-19 | Applied Lacquer Industries Inc. | Artificial nail tip and curing composition set and applying method thereof |
| CN113583539B (zh) * | 2021-08-11 | 2022-05-10 | 武汉工程大学 | 一种光学树脂组合物及其制备方法和应用 |
| CN114409902B (zh) * | 2021-12-27 | 2023-04-25 | 北京化工大学 | 多功能型pdms基预聚体、基于该预聚体的膜及其制备 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4038164A (en) * | 1975-09-18 | 1977-07-26 | Stauffer Chemical Company | Photopolymerizable aryl and heterocyclic glyoxylate compositions and process |
| US3991416A (en) * | 1975-09-18 | 1976-11-09 | Hughes Aircraft Company | AC biased and resonated liquid crystal display |
| DK0956280T3 (da) * | 1997-01-30 | 2003-02-24 | Ciba Sc Holding Ag | Ikke-flygtige phenylglyoxylsyreestere |
| TW557298B (en) * | 2000-08-14 | 2003-10-11 | Ciba Sc Holding Ag | A compound, a photopolymerizible composition, a process for producing coatings and a method for causing a photoinitiator to accumulate at the surface of coatings |
-
2001
- 2001-07-31 TW TW090118671A patent/TWI244495B/zh not_active IP Right Cessation
- 2001-08-07 BR BRPI0113233-4B1A patent/BR0113233B1/pt not_active IP Right Cessation
- 2001-08-07 EP EP01974127A patent/EP1311627B1/en not_active Expired - Lifetime
- 2001-08-07 AU AU2001293732A patent/AU2001293732A1/en not_active Abandoned
- 2001-08-07 KR KR1020037002201A patent/KR100818643B1/ko not_active IP Right Cessation
- 2001-08-07 WO PCT/EP2001/009123 patent/WO2002014439A2/en active IP Right Grant
- 2001-08-07 CN CNB018141595A patent/CN1211439C/zh not_active Expired - Lifetime
- 2001-08-07 JP JP2002519570A patent/JP5068413B2/ja not_active Expired - Lifetime
- 2001-08-07 MX MXPA03001383A patent/MXPA03001383A/es active IP Right Grant
- 2001-08-07 US US10/343,620 patent/US7279200B2/en not_active Expired - Lifetime
- 2001-08-07 DE DE60128105T patent/DE60128105T8/de active Active
- 2001-08-07 AT AT01974127T patent/ATE360666T1/de not_active IP Right Cessation
- 2001-08-07 CA CA002417112A patent/CA2417112A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| ATE360666T1 (de) | 2007-05-15 |
| TWI244495B (en) | 2005-12-01 |
| EP1311627B1 (en) | 2007-04-25 |
| CN1211439C (zh) | 2005-07-20 |
| DE60128105D1 (de) | 2007-06-06 |
| DE60128105T8 (de) | 2008-04-30 |
| AU2001293732A1 (en) | 2002-02-25 |
| KR100818643B1 (ko) | 2008-04-04 |
| CA2417112A1 (en) | 2002-02-21 |
| EP1311627A2 (en) | 2003-05-21 |
| DE60128105T2 (de) | 2007-12-27 |
| WO2002014439A3 (en) | 2002-06-13 |
| US20030213931A1 (en) | 2003-11-20 |
| CN1447844A (zh) | 2003-10-08 |
| WO2002014439A2 (en) | 2002-02-21 |
| KR20030055249A (ko) | 2003-07-02 |
| JP2004506776A (ja) | 2004-03-04 |
| JP5068413B2 (ja) | 2012-11-07 |
| US7279200B2 (en) | 2007-10-09 |
| MXPA03001383A (es) | 2003-06-06 |
| BR0113233B1 (pt) | 2013-10-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| B06A | Patent application procedure suspended [chapter 6.1 patent gazette] | ||
| B06A | Patent application procedure suspended [chapter 6.1 patent gazette] | ||
| B09A | Decision: intention to grant [chapter 9.1 patent gazette] | ||
| B09X | Republication of the decision to grant [chapter 9.1.3 patent gazette] | ||
| B16A | Patent or certificate of addition of invention granted [chapter 16.1 patent gazette] |
Free format text: PRAZO DE VALIDADE: 10 (DEZ) ANOS CONTADOS A PARTIR DE 01/10/2013, OBSERVADAS AS CONDICOES LEGAIS. |
|
| B15K | Others concerning applications: alteration of classification |
Ipc: G03F 7/075 (2006.01), B33Y 70/00 (2015.01), C07C 6 |
|
| B21F | Lapse acc. art. 78, item iv - on non-payment of the annual fees in time | ||
| B24J | Lapse because of non-payment of annual fees (definitively: art 78 iv lpi, resolution 113/2013 art. 12) |
Free format text: EM VIRTUDE DA EXTINCAO PUBLICADA NA RPI 2474 DE 05-06-2018 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDA A EXTINCAO DA PATENTE E SEUS CERTIFICADOS, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013. |