DE60214754D1 - Strahlenhärtbare zusammensetzung um gefärbte dreidimensionale objekte anzufertigen - Google Patents

Strahlenhärtbare zusammensetzung um gefärbte dreidimensionale objekte anzufertigen

Info

Publication number
DE60214754D1
DE60214754D1 DE60214754T DE60214754T DE60214754D1 DE 60214754 D1 DE60214754 D1 DE 60214754D1 DE 60214754 T DE60214754 T DE 60214754T DE 60214754 T DE60214754 T DE 60214754T DE 60214754 D1 DE60214754 D1 DE 60214754D1
Authority
DE
Germany
Prior art keywords
radiation
dimensional objects
dyed
creating
curable composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60214754T
Other languages
English (en)
Other versions
DE60214754T2 (de
Inventor
Anthony Thommes
Alan Lawton
Xiaorong You
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DSM IP Assets BV
Original Assignee
DSM IP Assets BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=23301454&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE60214754(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by DSM IP Assets BV filed Critical DSM IP Assets BV
Application granted granted Critical
Publication of DE60214754D1 publication Critical patent/DE60214754D1/de
Publication of DE60214754T2 publication Critical patent/DE60214754T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
    • C08G65/08—Saturated oxiranes
    • C08G65/10—Saturated oxiranes characterised by the catalysts used
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
    • C08G65/08—Saturated oxiranes
    • C08G65/10—Saturated oxiranes characterised by the catalysts used
    • C08G65/105—Onium compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2650/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G2650/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule characterized by the type of post-polymerisation functionalisation
    • C08G2650/16—Photopolymerisation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Engineering & Computer Science (AREA)
  • Epoxy Resins (AREA)
  • Polymerisation Methods In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
DE60214754T 2001-11-27 2002-11-27 Strahlenhärtbare zusammensetzung um gefärbte dreidimensionale objekte anzufertigen Expired - Lifetime DE60214754T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US33313801P 2001-11-27 2001-11-27
US333138P 2001-11-27
PCT/NL2002/000771 WO2003046042A1 (en) 2001-11-27 2002-11-27 Radiation curable resin composition for making colored three dimensional objects

Publications (2)

Publication Number Publication Date
DE60214754D1 true DE60214754D1 (de) 2006-10-26
DE60214754T2 DE60214754T2 (de) 2007-09-13

Family

ID=23301454

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60214754T Expired - Lifetime DE60214754T2 (de) 2001-11-27 2002-11-27 Strahlenhärtbare zusammensetzung um gefärbte dreidimensionale objekte anzufertigen

Country Status (10)

Country Link
US (4) US20030149124A1 (de)
EP (1) EP1448654B1 (de)
JP (1) JP2005510603A (de)
KR (1) KR20040066846A (de)
CN (1) CN1283685C (de)
AT (1) ATE339460T1 (de)
AU (1) AU2002347659A1 (de)
DE (1) DE60214754T2 (de)
ES (1) ES2272787T3 (de)
WO (1) WO2003046042A1 (de)

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US20030149124A1 (en) * 2001-11-27 2003-08-07 Thommes Glen A. Radiation curable resin composition for making colored three dimensional objects
KR20050007372A (ko) * 2002-05-03 2005-01-17 디에스엠 아이피 어셋츠 비.브이. 방사선 경화성 수지 조성물 및 이를 이용한 쾌속 성형법
US20040137368A1 (en) * 2003-01-13 2004-07-15 3D Systems, Inc. Stereolithographic resins containing selected oxetane compounds
DE112004001165T5 (de) * 2003-06-25 2006-05-04 Cmet Inc., Yokohama Durch aktinische Strahlung härtbare stereolithographische Harzzusammensetzung mit verbesserter Stabilität
EP1502922A1 (de) * 2003-07-30 2005-02-02 Loctite (R & D) Limited Vernetzbare Zusammensetzungen für Verkapselungen
US20050040562A1 (en) * 2003-08-19 2005-02-24 3D Systems Inc. Nanoparticle-filled stereolithographic resins
US7232850B2 (en) * 2003-10-03 2007-06-19 Huntsman Advanced Materials Americas Inc. Photocurable compositions for articles having stable tensile properties
JP4993119B2 (ja) 2005-04-19 2012-08-08 日産化学工業株式会社 光架橋硬化のレジスト下層膜を形成するためのレジスト下層膜形成組成物
US7691557B2 (en) * 2005-06-29 2010-04-06 Dymax Corporation Polymerizable composition exhibiting permanent color change as cure indicator
US20070178271A1 (en) * 2006-01-31 2007-08-02 Gore Makarand P Optical recording medium
US20080103226A1 (en) * 2006-10-31 2008-05-01 Dsm Ip Assets B.V. Photo-curable resin composition
US20090004579A1 (en) * 2007-06-27 2009-01-01 Dsm Ip Assets B.V. Clear and colorless three-dimensional articles made via stereolithography and method of making said articles
US20100160484A1 (en) * 2008-12-19 2010-06-24 Macdonald John G Xanthene-based plasticizer of resins and polymers
CN101776846B (zh) * 2009-01-14 2012-07-18 北京光创物成材料科技有限公司 激光造型专用光固化组合物
EP2526463B1 (de) 2010-01-22 2016-07-13 DSM IP Assets B.V. Verfahren zur herstellung eines dreidimensionalen artikels mit selektiven visuellen effekten
WO2015148613A1 (en) * 2014-03-26 2015-10-01 Dsm Ip Assets B.V. Color and/or opacity changing liquid radiation curable resins for additive fabrication
KR101853387B1 (ko) * 2015-03-27 2018-04-30 동우 화인켐 주식회사 플렉서블 디스플레이용 하드코팅 필름
JP6418065B2 (ja) * 2015-05-21 2018-11-07 オムロン株式会社 光デバイス
WO2018055609A1 (en) * 2016-09-21 2018-03-29 Massivit 3D Printing Technologies Ltd Method and apparatus for manufacturing 3d objects
US9920170B1 (en) * 2017-01-19 2018-03-20 International Business Machines Corporation Bio-derived cross-linkers
US9920171B1 (en) 2017-01-27 2018-03-20 International Business Machines Corporation Crosslinkers from biorenewable resveratrol
US10160838B2 (en) 2017-03-27 2018-12-25 International Business Machines Corporation Crosslinking materials from biorenewable aconitic acid
JP7251715B2 (ja) 2017-12-29 2023-04-04 コベストロ （ネザーランズ） ビー．ブイ． 付加造形用組成物及び物品並びにそれらの使用方法
CN114058289A (zh) * 2020-08-07 2022-02-18 宁波安特弗新材料科技有限公司 一种uv减粘胶及一种uv减粘胶带

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Also Published As

Publication number Publication date
US20050142479A1 (en) 2005-06-30
KR20040066846A (ko) 2004-07-27
AU2002347659A1 (en) 2003-06-10
US20030149124A1 (en) 2003-08-07
ES2272787T3 (es) 2007-05-01
JP2005510603A (ja) 2005-04-21
DE60214754T2 (de) 2007-09-13
CN1283685C (zh) 2006-11-08
ATE339460T1 (de) 2006-10-15
CN1617899A (zh) 2005-05-18
EP1448654A1 (de) 2004-08-25
EP1448654B1 (de) 2006-09-13
US20080118666A1 (en) 2008-05-22
US20070054218A1 (en) 2007-03-08
WO2003046042A1 (en) 2003-06-05

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