BR0314970A - Método para fabricar uma estrutura inorgânica, composição fotorreativa, dispositivo óptico plano e formulação epóxi - Google Patents

Método para fabricar uma estrutura inorgânica, composição fotorreativa, dispositivo óptico plano e formulação epóxi

Info

Publication number
BR0314970A
BR0314970A BR0314970-6A BR0314970A BR0314970A BR 0314970 A BR0314970 A BR 0314970A BR 0314970 A BR0314970 A BR 0314970A BR 0314970 A BR0314970 A BR 0314970A
Authority
BR
Brazil
Prior art keywords
composition
fabricating
optical device
epoxy formulation
inorganic structure
Prior art date
Application number
BR0314970-6A
Other languages
English (en)
Inventor
Catherine A Leatherdale
Craig R Schardt
D Scott Thompson
Wendy L Thompson
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of BR0314970A publication Critical patent/BR0314970A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122—Basic optical elements, e.g. light-guiding paths
    • G02B6/1221—Basic optical elements, e.g. light-guiding paths made from organic materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G02B6/138—Integrated optical circuits characterised by the manufacturing method by using polymerisation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Optical Integrated Circuits (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Paints Or Removers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

"MéTODO PARA FABRICAR UMA ESTRUTURA INORGâNICA, COMPOSIçãO FOTORREATIVA, DISPOSITIVO óPTICO PLANO E FORMULAçãO EPóXI". Um método para fabricar uma estrutura inorgânica que inclui: (a) aplicar uma composição fotorreativa a um substrato, em que a composição inclui: uma espécie reativa, um sistema fotoiniciador e, uma pluralidade de partículas coloidais substancialmente inorgânicas, em que as partículas têm um tamanho de partícula médio de menos do que cerca de 300 mn; (b) fotopadronizar a composição para definir uma estrutura; e (c) submeter a estrutura à temperatura elevada por um tempo suficiente para pirolizar a espécie reativa e para pelo menos fundir parcialmente as partículas
BR0314970-6A 2002-10-02 2003-09-26 Método para fabricar uma estrutura inorgânica, composição fotorreativa, dispositivo óptico plano e formulação epóxi BR0314970A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/263,131 US7232650B2 (en) 2002-10-02 2002-10-02 Planar inorganic device
PCT/US2003/030260 WO2004031860A2 (en) 2002-10-02 2003-09-26 Planar inorganic device

Publications (1)

Publication Number Publication Date
BR0314970A true BR0314970A (pt) 2005-08-02

Family

ID=32041941

Family Applications (1)

Application Number Title Priority Date Filing Date
BR0314970-6A BR0314970A (pt) 2002-10-02 2003-09-26 Método para fabricar uma estrutura inorgânica, composição fotorreativa, dispositivo óptico plano e formulação epóxi

Country Status (9)

Country Link
US (2) US7232650B2 (pt)
EP (1) EP1546807A2 (pt)
JP (1) JP2006501520A (pt)
KR (1) KR20050071539A (pt)
CN (1) CN100573322C (pt)
AU (1) AU2003276944A1 (pt)
BR (1) BR0314970A (pt)
CA (1) CA2500075A1 (pt)
WO (1) WO2004031860A2 (pt)

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US20070207410A1 (en) 2007-09-06
EP1546807A2 (en) 2005-06-29
US7232650B2 (en) 2007-06-19
US20040067450A1 (en) 2004-04-08
CA2500075A1 (en) 2004-04-15
JP2006501520A (ja) 2006-01-12
CN100573322C (zh) 2009-12-23
WO2004031860A3 (en) 2004-06-10
KR20050071539A (ko) 2005-07-07
AU2003276944A1 (en) 2004-04-23
WO2004031860A2 (en) 2004-04-15

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