BR0113233B1 - processo para a produção de revestimentos, método de motivar um fotoiniciador de se acumular na superfície dos revestimentos, fotoiniciador tensoativo, uso de compostos da fórmula i, composição e substrato revestido - Google Patents
processo para a produção de revestimentos, método de motivar um fotoiniciador de se acumular na superfície dos revestimentos, fotoiniciador tensoativo, uso de compostos da fórmula i, composição e substrato revestidoInfo
- Publication number
- BR0113233B1 BR0113233B1 BRPI0113233-4B1A BR0113233A BR0113233B1 BR 0113233 B1 BR0113233 B1 BR 0113233B1 BR 0113233 A BR0113233 A BR 0113233A BR 0113233 B1 BR0113233 B1 BR 0113233B1
- Authority
- BR
- Brazil
- Prior art keywords
- photoinitiator
- coatings
- motivating
- accumulate
- compounds
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title abstract 4
- 238000000034 method Methods 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 title abstract 2
- 238000000576 coating method Methods 0.000 title 2
- 150000001875 compounds Chemical class 0.000 title 1
- 239000004094 surface-active agent Substances 0.000 title 1
- 238000009472 formulation Methods 0.000 abstract 3
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 abstract 1
- 230000005670 electromagnetic radiation Effects 0.000 abstract 1
- 239000003999 initiator Substances 0.000 abstract 1
- 238000002360 preparation method Methods 0.000 abstract 1
- 239000006120 scratch resistant coating Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
- C07C69/66—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety
- C07C69/73—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of unsaturated acids
- C07C69/738—Esters of keto-carboxylic acids or aldehydo-carboxylic acids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
- C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Wood Science & Technology (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Inorganic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Paints Or Removers (AREA)
- Polymerisation Methods In General (AREA)
- Silicon Polymers (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP00810720 | 2000-08-14 | ||
| PCT/EP2001/009123 WO2002014439A2 (en) | 2000-08-14 | 2001-08-07 | Process for producing coatings using surface-active photoinitiators |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| BR0113233A BR0113233A (pt) | 2003-06-24 |
| BR0113233B1 true BR0113233B1 (pt) | 2013-10-01 |
Family
ID=8174856
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BRPI0113233-4B1A BR0113233B1 (pt) | 2000-08-14 | 2001-08-07 | processo para a produção de revestimentos, método de motivar um fotoiniciador de se acumular na superfície dos revestimentos, fotoiniciador tensoativo, uso de compostos da fórmula i, composição e substrato revestido |
Country Status (13)
| Country | Link |
|---|---|
| US (1) | US7279200B2 (https=) |
| EP (1) | EP1311627B1 (https=) |
| JP (1) | JP5068413B2 (https=) |
| KR (1) | KR100818643B1 (https=) |
| CN (1) | CN1211439C (https=) |
| AT (1) | ATE360666T1 (https=) |
| AU (1) | AU2001293732A1 (https=) |
| BR (1) | BR0113233B1 (https=) |
| CA (1) | CA2417112A1 (https=) |
| DE (1) | DE60128105T8 (https=) |
| MX (1) | MXPA03001383A (https=) |
| TW (1) | TWI244495B (https=) |
| WO (1) | WO2002014439A2 (https=) |
Families Citing this family (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10022352A1 (de) * | 2000-05-08 | 2001-11-22 | Georg Gros | Verfahren zur Beschichtung von elektrolytisch- oder feuerverzinkten Blechen |
| WO2002024344A2 (de) * | 2000-09-25 | 2002-03-28 | Chemetall Gmbh | Verfahren zur vorbehandlung und beschichtung von metallischen oberflächen vor der umformung mit einem lackähnlichen überzug und verwendung der derart beschichteten substrate |
| AU2003205688A1 (en) * | 2002-02-04 | 2003-09-02 | Ciba Specialty Chemicals Holding Inc. | Fluorinated photoinitiators in highly fluorinated monomers |
| JP4222945B2 (ja) | 2002-02-04 | 2009-02-12 | チバ ホールディング インコーポレーテッド | 界面活性シロキサン光開始剤 |
| CN1286984C (zh) | 2002-03-06 | 2006-11-29 | 西巴特殊化学品控股有限公司 | 用于制备含有机硅基团的光敏引发剂的酶促方法 |
| EP1499645B1 (en) * | 2002-04-26 | 2006-03-15 | Ciba SC Holding AG | Incorporable photoinitiator |
| US20040115363A1 (en) * | 2002-12-13 | 2004-06-17 | Desai Umesh C. | Sealant and sound dampening composition |
| ATE527304T1 (de) * | 2003-06-06 | 2011-10-15 | Basf Se | Neue oberflächenaktive polysiloxanphotoinitiatoren |
| EP1781750A4 (en) * | 2004-07-27 | 2012-08-08 | Duluxgroup Australia Pty Ltd | SYSTEM FOR PROVIDING A POWDER-COATED WOOD MATERIAL |
| CN101044023B (zh) * | 2004-10-22 | 2010-05-05 | 三菱丽阳株式会社 | 热成形用消光丙烯酸树脂膜状物、其制造方法以及含有其的层叠体 |
| US20060234026A1 (en) * | 2005-04-18 | 2006-10-19 | Huusken Robert W M | Non-combustible high pressure laminate |
| US7919222B2 (en) * | 2006-01-29 | 2011-04-05 | Rohm And Haas Electronics Materials Llc | Coating compositions for use with an overcoated photoresist |
| CN101523289A (zh) * | 2006-10-03 | 2009-09-02 | 西巴控股有限公司 | 包含苯甲酰甲酸酯型光引发剂的可光固化组合物 |
| US8680176B2 (en) * | 2007-03-21 | 2014-03-25 | The University Of Southern Mississippi | Nanoencapsulation of isocyanates via aqueous media |
| US20100276059A1 (en) * | 2009-04-30 | 2010-11-04 | Dong Tian | UVV curable coating compositions and method for coating flooring and other substrates with same |
| CN101880482B (zh) * | 2010-07-12 | 2012-10-24 | 重庆大学 | 一种偶合接枝改性纳米金属氧化物的方法 |
| DE102014107518A1 (de) * | 2014-05-28 | 2015-12-03 | Heraeus Kulzer Gmbh | Reaktiver Mikro-Applikator mit Metall enthaltenden Additiven zur Verwendung mit dental Adhäsiven |
| CN108139665B (zh) * | 2015-12-22 | 2022-07-05 | 卡本有限公司 | 用于用双重固化树脂的增材制造的双重前体树脂系统 |
| JP6531729B2 (ja) * | 2016-07-19 | 2019-06-19 | 株式会社Sumco | シリコン試料の炭素濃度評価方法、シリコンウェーハ製造工程の評価方法、シリコンウェーハの製造方法およびシリコン単結晶インゴットの製造方法 |
| EP3600843B1 (en) | 2017-06-21 | 2021-07-21 | Carbon, Inc. | Resin dispenser for additive manufacturing |
| US11793289B2 (en) | 2018-03-08 | 2023-10-24 | Applied Lacquer Industries Inc. | Artificial nail tip and curing composition set and applying method thereof |
| US11304492B2 (en) * | 2018-03-08 | 2022-04-19 | Applied Lacquer Industries Inc. | Artificial nail tip and curing composition set and applying method thereof |
| CN113583539B (zh) * | 2021-08-11 | 2022-05-10 | 武汉工程大学 | 一种光学树脂组合物及其制备方法和应用 |
| CN114409902B (zh) * | 2021-12-27 | 2023-04-25 | 北京化工大学 | 多功能型pdms基预聚体、基于该预聚体的膜及其制备 |
| WO2023172029A1 (ko) * | 2022-03-07 | 2023-09-14 | 주식회사 엘지화학 | 화합물 |
| JP7722248B2 (ja) | 2022-04-22 | 2025-08-13 | 信越化学工業株式会社 | 光反応性オルガノポリシロキサン、その製造方法および光硬化性組成物 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4038164A (en) * | 1975-09-18 | 1977-07-26 | Stauffer Chemical Company | Photopolymerizable aryl and heterocyclic glyoxylate compositions and process |
| US3991416A (en) * | 1975-09-18 | 1976-11-09 | Hughes Aircraft Company | AC biased and resonated liquid crystal display |
| DK0956280T3 (da) * | 1997-01-30 | 2003-02-24 | Ciba Sc Holding Ag | Ikke-flygtige phenylglyoxylsyreestere |
| TW557298B (en) * | 2000-08-14 | 2003-10-11 | Ciba Sc Holding Ag | A compound, a photopolymerizible composition, a process for producing coatings and a method for causing a photoinitiator to accumulate at the surface of coatings |
-
2001
- 2001-07-31 TW TW090118671A patent/TWI244495B/zh not_active IP Right Cessation
- 2001-08-07 BR BRPI0113233-4B1A patent/BR0113233B1/pt not_active IP Right Cessation
- 2001-08-07 AT AT01974127T patent/ATE360666T1/de not_active IP Right Cessation
- 2001-08-07 CN CNB018141595A patent/CN1211439C/zh not_active Expired - Lifetime
- 2001-08-07 US US10/343,620 patent/US7279200B2/en not_active Expired - Lifetime
- 2001-08-07 CA CA002417112A patent/CA2417112A1/en not_active Abandoned
- 2001-08-07 JP JP2002519570A patent/JP5068413B2/ja not_active Expired - Lifetime
- 2001-08-07 WO PCT/EP2001/009123 patent/WO2002014439A2/en not_active Ceased
- 2001-08-07 DE DE60128105T patent/DE60128105T8/de active Active
- 2001-08-07 MX MXPA03001383A patent/MXPA03001383A/es active IP Right Grant
- 2001-08-07 KR KR1020037002201A patent/KR100818643B1/ko not_active Expired - Fee Related
- 2001-08-07 AU AU2001293732A patent/AU2001293732A1/en not_active Abandoned
- 2001-08-07 EP EP01974127A patent/EP1311627B1/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| DE60128105T8 (de) | 2008-04-30 |
| JP5068413B2 (ja) | 2012-11-07 |
| US20030213931A1 (en) | 2003-11-20 |
| US7279200B2 (en) | 2007-10-09 |
| BR0113233A (pt) | 2003-06-24 |
| KR20030055249A (ko) | 2003-07-02 |
| EP1311627B1 (en) | 2007-04-25 |
| DE60128105T2 (de) | 2007-12-27 |
| KR100818643B1 (ko) | 2008-04-04 |
| CA2417112A1 (en) | 2002-02-21 |
| EP1311627A2 (en) | 2003-05-21 |
| MXPA03001383A (es) | 2003-06-06 |
| CN1447844A (zh) | 2003-10-08 |
| TWI244495B (en) | 2005-12-01 |
| ATE360666T1 (de) | 2007-05-15 |
| JP2004506776A (ja) | 2004-03-04 |
| CN1211439C (zh) | 2005-07-20 |
| DE60128105D1 (de) | 2007-06-06 |
| WO2002014439A2 (en) | 2002-02-21 |
| WO2002014439A3 (en) | 2002-06-13 |
| AU2001293732A1 (en) | 2002-02-25 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| B06A | Patent application procedure suspended [chapter 6.1 patent gazette] | ||
| B06A | Patent application procedure suspended [chapter 6.1 patent gazette] | ||
| B09A | Decision: intention to grant [chapter 9.1 patent gazette] | ||
| B09X | Republication of the decision to grant [chapter 9.1.3 patent gazette] | ||
| B16A | Patent or certificate of addition of invention granted [chapter 16.1 patent gazette] |
Free format text: PRAZO DE VALIDADE: 10 (DEZ) ANOS CONTADOS A PARTIR DE 01/10/2013, OBSERVADAS AS CONDICOES LEGAIS. |
|
| B15K | Others concerning applications: alteration of classification |
Ipc: G03F 7/075 (2006.01), B33Y 70/00 (2015.01), C07C 6 |
|
| B21F | Lapse acc. art. 78, item iv - on non-payment of the annual fees in time | ||
| B24J | Lapse because of non-payment of annual fees (definitively: art 78 iv lpi, resolution 113/2013 art. 12) |
Free format text: EM VIRTUDE DA EXTINCAO PUBLICADA NA RPI 2474 DE 05-06-2018 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDA A EXTINCAO DA PATENTE E SEUS CERTIFICADOS, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013. |