JP2004198416A5 - - Google Patents
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- Publication number
- JP2004198416A5 JP2004198416A5 JP2003411406A JP2003411406A JP2004198416A5 JP 2004198416 A5 JP2004198416 A5 JP 2004198416A5 JP 2003411406 A JP2003411406 A JP 2003411406A JP 2003411406 A JP2003411406 A JP 2003411406A JP 2004198416 A5 JP2004198416 A5 JP 2004198416A5
- Authority
- JP
- Japan
- Prior art keywords
- aperture
- opening
- layer
- region
- measured
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010521 absorption reaction Methods 0.000 claims 3
- 230000002745 absorbent Effects 0.000 claims 2
- 239000002250 absorbent Substances 0.000 claims 2
- 239000011521 glass Substances 0.000 claims 2
- 239000005355 lead glass Substances 0.000 claims 1
- 238000005259 measurement Methods 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10259696.4A DE10259696B4 (de) | 2002-12-18 | 2002-12-18 | Vorrichtung zum Messen der Dicke dünner Schichten |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2004198416A JP2004198416A (ja) | 2004-07-15 |
| JP2004198416A5 true JP2004198416A5 (enExample) | 2007-01-25 |
Family
ID=30128898
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003411406A Pending JP2004198416A (ja) | 2002-12-18 | 2003-12-10 | 薄い層の厚さを計測する装置 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US7076021B2 (enExample) |
| JP (1) | JP2004198416A (enExample) |
| CN (1) | CN100346134C (enExample) |
| DE (1) | DE10259696B4 (enExample) |
| FR (1) | FR2849182B1 (enExample) |
| GB (1) | GB2398632B (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102004020370B4 (de) * | 2004-04-23 | 2006-11-16 | Sirona Dental Systems Gmbh | Röntgenstrahler und Verfahren zur Erzeugung und Darstellung von Röntgenbildern |
| US7310410B2 (en) | 2004-07-28 | 2007-12-18 | General Electric Co. | Single-leaf X-ray collimator |
| DE102005005835A1 (de) * | 2005-02-08 | 2006-08-10 | Immobiliengesellschaft Helmut Fischer Gmbh & Co. Kg | Verfahren zur Optimierung von Messzeiten einer Messvorrichtung |
| CN1316229C (zh) * | 2005-09-30 | 2007-05-16 | 电子科技大学 | 无标样测量薄膜厚度和密度的方法 |
| GB2468766B (en) * | 2009-03-18 | 2013-03-27 | Helmut Fischer Gmbh Inst Fa R Elektronik Und Messtechnik | Measurement stand and method of its electrical control |
| CN101587052B (zh) * | 2009-06-15 | 2011-03-30 | 浙江大学 | 基于x射线的密度、浓度和厚度测试装置及方法 |
| CN105612402B (zh) * | 2013-10-11 | 2019-01-11 | 古河电气工业株式会社 | 被覆厚度检查方法和被覆厚度检查装置 |
| DE102023112042A1 (de) * | 2023-05-09 | 2024-11-14 | Ims Messsysteme Gmbh | Vorrichtung zur berührungslosen Messung der Mikrostruktur von bewegten Materialbahnen |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3717768A (en) | 1970-02-09 | 1973-02-20 | Medinova Ab | X-ray filter device in combination with a positioning light converging means |
| JPS54138656U (enExample) | 1978-03-20 | 1979-09-26 | ||
| DE3144145C2 (de) * | 1981-11-06 | 1986-06-19 | Helmut Fischer GmbH & Co Institut für Elektronik und Meßtechnik, 7032 Sindelfingen | Blendenvorrichtung zum Messen dünner Schichten |
| JPS5897504U (ja) * | 1981-12-24 | 1983-07-02 | セイコーインスツルメンツ株式会社 | 螢光x線膜厚計用コリメ−タ |
| DE3234410A1 (de) * | 1982-09-16 | 1984-03-22 | Siemens AG, 1000 Berlin und 8000 München | Strahlenblende fuer ein roentgenuntersuchungsgeraet |
| DE3239379A1 (de) | 1982-10-23 | 1984-04-26 | Helmut Fischer GmbH & Co Institut für Elektronik und Meßtechnik, 7032 Sindelfingen | Vorrichtung zum messen der dicke duenner schichten |
| JPH0519839Y2 (enExample) * | 1986-06-09 | 1993-05-25 | ||
| DE68907924T2 (de) | 1988-01-20 | 1993-11-11 | Horiba Ltd | Röntgenstrahlvorrichtung, ausgestattet mit einem Strahlungsbereich-Monitor. |
| JPH0581700U (ja) | 1992-04-07 | 1993-11-05 | セイコー電子工業株式会社 | 蛍光x線膜厚測定装置 |
| DE4228082C1 (en) | 1992-08-24 | 1993-09-09 | Siemens Ag, 80333 Muenchen, De | Aperture esp. for X=ray beam - has aperture plate elastically conformable to test object shape |
| DE4229320C2 (de) * | 1992-09-02 | 1995-02-02 | Siemens Ag | Einblendvorrichtung für Strahlengeräte mit wenigstens einer Blendenlamelle |
| US5604353A (en) * | 1995-06-12 | 1997-02-18 | X-Ray Optical Systems, Inc. | Multiple-channel, total-reflection optic with controllable divergence |
| JP3059402B2 (ja) | 1997-07-09 | 2000-07-04 | 理学電機工業株式会社 | 円筒結晶型分光装置とその製造方法 |
| US6345086B1 (en) * | 1999-09-14 | 2002-02-05 | Veeco Instruments Inc. | X-ray fluorescence system and method |
-
2002
- 2002-12-18 DE DE10259696.4A patent/DE10259696B4/de not_active Expired - Fee Related
-
2003
- 2003-12-03 FR FR0314170A patent/FR2849182B1/fr not_active Expired - Fee Related
- 2003-12-10 JP JP2003411406A patent/JP2004198416A/ja active Pending
- 2003-12-11 GB GB0328815A patent/GB2398632B/en not_active Expired - Fee Related
- 2003-12-17 CN CNB200310123119XA patent/CN100346134C/zh not_active Expired - Fee Related
- 2003-12-17 US US10/739,673 patent/US7076021B2/en not_active Expired - Lifetime
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