JP6732240B2 - X線測定装置 - Google Patents
X線測定装置 Download PDFInfo
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- JP6732240B2 JP6732240B2 JP2017217530A JP2017217530A JP6732240B2 JP 6732240 B2 JP6732240 B2 JP 6732240B2 JP 2017217530 A JP2017217530 A JP 2017217530A JP 2017217530 A JP2017217530 A JP 2017217530A JP 6732240 B2 JP6732240 B2 JP 6732240B2
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- 238000005259 measurement Methods 0.000 claims description 75
- 238000001514 detection method Methods 0.000 claims description 27
- 230000005540 biological transmission Effects 0.000 claims description 11
- 239000004065 semiconductor Substances 0.000 claims description 10
- 238000012546 transfer Methods 0.000 claims description 7
- 238000011144 upstream manufacturing Methods 0.000 claims description 6
- 229910001385 heavy metal Inorganic materials 0.000 description 18
- 239000003990 capacitor Substances 0.000 description 7
- 230000007246 mechanism Effects 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 3
- 230000002776 aggregation Effects 0.000 description 2
- 238000004220 aggregation Methods 0.000 description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/203—Measuring back scattering
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
- G01N23/04—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/20083—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials by using a combination of at least two measurements at least one being a transmission measurement and one a scatter measurement
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/045—Investigating materials by wave or particle radiation combination of at least 2 measurements (transmission and scatter)
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/05—Investigating materials by wave or particle radiation by diffraction, scatter or reflection
- G01N2223/053—Investigating materials by wave or particle radiation by diffraction, scatter or reflection back scatter
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- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Description
以下、本発明の実施の形態について、詳細に説明する。図1は本実施形態に係るX線測定装置1の概観図である。
本実施形態において、X線測定装置1は、X線照射部10、センサ20、重金属板30、および測定部40を備えている。
図3は、センサ20の上面図である。センサ20は、フラットパネルディスプレイであり、複数の素子22が配列され、ガラス状に製膜された素子アレイ、および素子アレイ全面を覆うシンチレータで構成されている。シンチレータは、後方散乱X線を受光し、後方散乱X線を光に変換する機能を備えるX線光変換部である。
本発明の他の実施形態について、以下に説明する。なお、説明の便宜上、上記実施形態にて説明した部材と同じ機能を有する部材については、同じ符号を付記し、その説明を繰り返さない。
本発明の他の実施形態について、以下に説明する。なお、説明の便宜上、上記実施形態にて説明した部材と同じ機能を有する部材については、同じ符号を付記し、その説明を繰り返さない。
本発明の他の実施形態について、以下に説明する。なお、説明の便宜上、上記実施形態にて説明した部材と同じ機能を有する部材については、同じ符号を付記し、その説明を繰り返さない。
本発明の他の実施形態について、以下に説明する。なお、説明の便宜上、上記実施形態にて説明した部材と同じ機能を有する部材については、同じ符号を付記し、その説明を繰り返さない。
本発明の態様1に係るX線測定装置1,1a,1b,1c,1dは、測定対象2にX線を照射するX線照射部10と、上記測定対象2で反射した後方散乱X線に応じた電気信号を検出するX線検出部(センサ20)と、上記X線検出部(センサ20)が出力する電気信号を参照して上記測定対象2を測定する測定部40と、上記後方散乱X線を通過させ、上記後方散乱X線を上記X線検出部(センサ20)上に結像させる開口(ピンホール32)が形成された開口部(重金属板30)とを備えている。
2 測定対象
10 X線照射部
20 センサ(X線検出部)
CO コンデンサ(保持部)
TFT 薄膜トランジスタ(転送部)
30 重金属板(開口部)
32 ピンホール(開口)
60 透過X線センサ(透過X線検出部)
Claims (6)
- 測定対象にX線を照射するX線照射部と、
上記測定対象で反射した後方散乱X線に応じた電気信号を検出するX線検出部と、
上記X線検出部により検出された電気信号を参照して上記測定対象を測定する測定部と、
上記後方散乱X線を通過させ、上記後方散乱X線を上記X線検出部上に結像させる開口が形成されたる開口部と、
上記後方散乱X線の進行方向の上記開口部に対する上流側、および下流側のそれぞれに配された、所定のエネルギー量のX線を透過するフィルタと
を備える
ことを特徴とするX線測定装置。 - 上記X線検出部は、
酸化物半導体を含み、上記後方散乱X線に応じた電気信号を保持する保持部と、
酸化物半導体を含み、上記保持部に保持された上記電気信号を上記測定部へ転送する転送部と
を備える
ことを特徴とする請求項1に記載のX線測定装置。 - 上記X線検出部の検出面の中心は、上記X線照射部から照射されるX線の中心線に対する角度が150°から180°の範囲内の位置に配される
ことを特徴とする請求項1または2に記載のX線測定装置。 - 上記X線検出部を複数備え、
上記複数のX線検出部の検出結果に応じて立体画像を生成する立体画像生成部と
を備える
ことを特徴とする請求項1から3の何れか1項に記載のX線測定装置。 - 測定対象にX線を照射するX線照射部と、
上記測定対象で反射した後方散乱X線に応じた電気信号を検出するX線検出部と、
上記X線検出部により検出された電気信号を参照して上記測定対象を測定する測定部と、
上記後方散乱X線を通過させ、上記後方散乱X線を上記X線検出部上に結像させる開口が形成されたる開口部と
を備えるX線測定装置であって、
上記X線検出部を複数備え、
上記複数のX線検出部の各々に対応させて設けられ、各々開口径が異なる開口が形成された複数の上記開口部を備える
ことを特徴とするX線測定装置。 - 上記測定対象を透過した透過X線を検出する透過X線検出部
を備える
ことを特徴とする請求項1から5の何れか1項に記載のX線測定装置。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017217530A JP6732240B2 (ja) | 2017-11-10 | 2017-11-10 | X線測定装置 |
US16/183,635 US10705032B2 (en) | 2017-11-10 | 2018-11-07 | X-ray inspection device |
CN201811334347.4A CN109946329B (zh) | 2017-11-10 | 2018-11-09 | X射线测量装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017217530A JP6732240B2 (ja) | 2017-11-10 | 2017-11-10 | X線測定装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2019090619A JP2019090619A (ja) | 2019-06-13 |
JP6732240B2 true JP6732240B2 (ja) | 2020-07-29 |
Family
ID=66431250
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JP2017217530A Active JP6732240B2 (ja) | 2017-11-10 | 2017-11-10 | X線測定装置 |
Country Status (3)
Country | Link |
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US (1) | US10705032B2 (ja) |
JP (1) | JP6732240B2 (ja) |
CN (1) | CN109946329B (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20230184701A1 (en) * | 2020-05-19 | 2023-06-15 | Inversa Systems Ltd. | Method and system for inspecting a structure across a cover layer covering the structure |
JP7437337B2 (ja) | 2021-03-02 | 2024-02-22 | 株式会社日立製作所 | 内部状態画像化装置および内部状態画像化方法 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6292532B1 (en) * | 1998-12-28 | 2001-09-18 | Rigaku Industrial Corporation | Fluorescent X-ray analyzer useable as wavelength dispersive type and energy dispersive type |
JP2001208795A (ja) | 2000-01-28 | 2001-08-03 | Ando Electric Co Ltd | キャリア識別システム、キャリア識別方法および記憶媒体 |
US6895077B2 (en) * | 2001-11-21 | 2005-05-17 | University Of Massachusetts Medical Center | System and method for x-ray fluoroscopic imaging |
JP2005091053A (ja) * | 2003-09-12 | 2005-04-07 | I-Bit Co Ltd | X線反射波撮像装置 |
US7535987B2 (en) * | 2005-06-30 | 2009-05-19 | Kabushiki Kaisha Toshiba | X-ray CT apparatus |
JP4987321B2 (ja) * | 2006-02-28 | 2012-07-25 | 株式会社東芝 | X線検査装置およびx線検査方法 |
JP2008002940A (ja) | 2006-06-22 | 2008-01-10 | Ihi Corp | 遠隔x線透視装置および方法 |
CN201378149Y (zh) * | 2009-03-25 | 2010-01-06 | 公安部第一研究所 | 一种应用x射线多效应探测融合技术的安全检查系统 |
US9168016B2 (en) * | 2010-01-29 | 2015-10-27 | Fujifilm Corporation | Radiographic image capturing apparatus, radiographic image capturing system, and method of supplying electric power to radiographic image capturing apparatus |
JP5635894B2 (ja) * | 2010-01-29 | 2014-12-03 | 富士フイルム株式会社 | 放射線画像撮影装置及び放射線画像撮影装置の電力供給方法 |
US8723115B2 (en) * | 2012-03-27 | 2014-05-13 | Kla-Tencor Corporation | Method and apparatus for detecting buried defects |
US9194828B2 (en) * | 2012-05-22 | 2015-11-24 | Aribex, Inc. | Handheld x-ray system for 3D scatter imaging |
US20130315368A1 (en) * | 2012-05-22 | 2013-11-28 | Aribex, Inc. | Handheld X-Ray System for 3D Scatter Imaging |
CN202903697U (zh) * | 2012-11-12 | 2013-04-24 | 宝山钢铁股份有限公司 | 一种射线实时成像装置 |
CN105807328B (zh) * | 2016-04-29 | 2019-03-08 | 同方威视技术股份有限公司 | 基于背散射成像的检测系统和方法 |
CN106093095B (zh) * | 2016-05-30 | 2019-07-16 | 中国工程物理研究院流体物理研究所 | 一种全视场x射线荧光成像系统的成像方法 |
-
2017
- 2017-11-10 JP JP2017217530A patent/JP6732240B2/ja active Active
-
2018
- 2018-11-07 US US16/183,635 patent/US10705032B2/en not_active Expired - Fee Related
- 2018-11-09 CN CN201811334347.4A patent/CN109946329B/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US20190145914A1 (en) | 2019-05-16 |
US10705032B2 (en) | 2020-07-07 |
CN109946329A (zh) | 2019-06-28 |
CN109946329B (zh) | 2022-02-01 |
JP2019090619A (ja) | 2019-06-13 |
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