JP2004139712A5 - - Google Patents

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Publication number
JP2004139712A5
JP2004139712A5 JP2002361117A JP2002361117A JP2004139712A5 JP 2004139712 A5 JP2004139712 A5 JP 2004139712A5 JP 2002361117 A JP2002361117 A JP 2002361117A JP 2002361117 A JP2002361117 A JP 2002361117A JP 2004139712 A5 JP2004139712 A5 JP 2004139712A5
Authority
JP
Japan
Prior art keywords
reflective film
information recording
optical information
based alloy
recording medium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002361117A
Other languages
English (en)
Japanese (ja)
Other versions
JP2004139712A (ja
JP3655907B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP2002361117A external-priority patent/JP3655907B2/ja
Priority to JP2002361117A priority Critical patent/JP3655907B2/ja
Priority to US10/633,550 priority patent/US7514037B2/en
Priority to SG200304812A priority patent/SG103935A1/en
Priority to DE10362302.7A priority patent/DE10362302B4/de
Priority to TW92121689A priority patent/TWI263689B/zh
Priority to DE10336228A priority patent/DE10336228B4/de
Priority to DE10362283.7A priority patent/DE10362283B4/de
Priority to CNB031274617A priority patent/CN1256461C/zh
Priority to TW94121903A priority patent/TWI265976B/zh
Priority to KR1020030055105A priority patent/KR100605840B1/ko
Publication of JP2004139712A publication Critical patent/JP2004139712A/ja
Publication of JP2004139712A5 publication Critical patent/JP2004139712A5/ja
Application granted granted Critical
Publication of JP3655907B2 publication Critical patent/JP3655907B2/ja
Priority to US11/313,815 priority patent/US7419711B2/en
Priority to US11/353,168 priority patent/US7566417B2/en
Priority to KR1020060017733A priority patent/KR20060021939A/ko
Priority to US11/395,227 priority patent/US20060171842A1/en
Priority to US11/401,853 priority patent/US7722942B2/en
Priority to US12/100,823 priority patent/US7758942B2/en
Priority to KR1020080066739A priority patent/KR100895759B1/ko
Priority to US12/183,700 priority patent/US7871686B2/en
Priority to US12/342,507 priority patent/US7776420B2/en
Priority to US12/915,138 priority patent/US8178174B2/en
Priority to US13/437,350 priority patent/US8936856B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP2002361117A 2002-08-08 2002-12-12 光情報記録媒体用反射膜と半透過反射膜、および光情報記録媒体 Expired - Lifetime JP3655907B2 (ja)

Priority Applications (21)

Application Number Priority Date Filing Date Title
JP2002361117A JP3655907B2 (ja) 2002-08-20 2002-12-12 光情報記録媒体用反射膜と半透過反射膜、および光情報記録媒体
US10/633,550 US7514037B2 (en) 2002-08-08 2003-08-05 AG base alloy thin film and sputtering target for forming AG base alloy thin film
SG200304812A SG103935A1 (en) 2002-08-08 2003-08-06 Ag base alloy thin film and sputtering target for forming ag base alloy thin film
TW94121903A TWI265976B (en) 2002-08-08 2003-08-07 Ag base alloy thin film and sputtering target for forming Ag base alloy thin film
TW92121689A TWI263689B (en) 2002-08-08 2003-08-07 Ag base alloy thin film and sputtering target for forming Ag base alloy thin film
DE10336228A DE10336228B4 (de) 2002-08-08 2003-08-07 Dünner Film auf Ag-Legierungsbasis, Verwendung dieses Films und Herstellungsverfahren für diesen Film
DE10362302.7A DE10362302B4 (de) 2002-08-08 2003-08-07 Produkt mit zur elektromagnetischen Abschirmung dienendem Film und Herstellungsverfahren dafür
DE10362283.7A DE10362283B4 (de) 2002-08-08 2003-08-07 Herstellungsverfahren für einen Film auf Ag-Legierungsbasis und Sputtertarget
CNB031274617A CN1256461C (zh) 2002-08-08 2003-08-07 Ag基合金薄膜及Ag基合金薄膜形成用溅射靶
KR1020030055105A KR100605840B1 (ko) 2002-08-08 2003-08-08 Ａｇ계 합금 박막, 및 Ａｇ계 합금 박막 형성용 스퍼터링 타겟
US11/313,815 US7419711B2 (en) 2002-08-08 2005-12-22 Ag base alloy thin film and sputtering target for forming Ag base alloy thin film
US11/353,168 US7566417B2 (en) 2002-08-08 2006-02-14 Ag base alloy thin film and sputtering target for forming Ag base alloy thin film
KR1020060017733A KR20060021939A (ko) 2002-08-08 2006-02-23 Ａｇ계 합금 박막, 및 Ａｇ계 합금 박막 형성용 스퍼터링타겟
US11/395,227 US20060171842A1 (en) 2002-08-08 2006-04-03 Ag base alloy thin film and sputtering target for forming Ag base alloy thin film
US11/401,853 US7722942B2 (en) 2002-08-08 2006-04-12 Ag base alloy thin film and sputtering target for forming Ag base alloy thin film
US12/100,823 US7758942B2 (en) 2002-08-08 2008-04-10 Ag base alloy thin film and sputtering target for forming Ag base alloy thin film
KR1020080066739A KR100895759B1 (ko) 2002-08-08 2008-07-09 Ａｇ계 합금으로 이루어진 광반사막을 구비한 액정표시 소자
US12/183,700 US7871686B2 (en) 2002-08-08 2008-07-31 Ag base alloy thin film and sputtering target for forming Ag base alloy thin film
US12/342,507 US7776420B2 (en) 2002-08-08 2008-12-23 Ag base alloy thin film and sputtering target for forming Ag base alloy thin film
US12/915,138 US8178174B2 (en) 2002-08-08 2010-10-29 Ag base alloy thin film and sputtering target for forming Ag base alloy thin film
US13/437,350 US8936856B2 (en) 2002-08-08 2012-04-02 AG base alloy thin film and sputtering target for forming AG base alloy thin film

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002239972 2002-08-20
JP2002361117A JP3655907B2 (ja) 2002-08-20 2002-12-12 光情報記録媒体用反射膜と半透過反射膜、および光情報記録媒体

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2004367547A Division JP4153484B2 (ja) 2002-08-20 2004-12-20 光情報記録媒体用Ａｇ基合金スパッタリングターゲット

Publications (3)

Publication Number Publication Date
JP2004139712A JP2004139712A (ja) 2004-05-13
JP2004139712A5 true JP2004139712A5 (enExample) 2005-04-07
JP3655907B2 JP3655907B2 (ja) 2005-06-02

Family

ID=32472536

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002361117A Expired - Lifetime JP3655907B2 (ja) 2002-08-08 2002-12-12 光情報記録媒体用反射膜と半透過反射膜、および光情報記録媒体

Country Status (1)

Country Link
JP (1) JP3655907B2 (enExample)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3993530B2 (ja) * 2003-05-16 2007-10-17 株式会社神戸製鋼所 Ａｇ−Ｂｉ系合金スパッタリングターゲットおよびその製造方法
JP3907666B2 (ja) 2004-07-15 2007-04-18 株式会社神戸製鋼所 レーザーマーキング用再生専用光情報記録媒体
JP4575211B2 (ja) 2005-03-31 2010-11-04 株式会社東芝 記憶媒体、再生方法及び記録方法
JP2006294195A (ja) 2005-04-14 2006-10-26 Kobe Steel Ltd 光情報記録用Ａｇ合金反射膜、光情報記録媒体および光情報記録用Ａｇ合金反射膜の形成用のＡｇ合金スパッタリングターゲット
JP2007003624A (ja) * 2005-06-21 2007-01-11 Ishifuku Metal Ind Co Ltd 半反射型半透過膜
JP4527624B2 (ja) * 2005-07-22 2010-08-18 株式会社神戸製鋼所 Ａｇ合金反射膜を有する光情報媒体
JP2007035104A (ja) 2005-07-22 2007-02-08 Kobe Steel Ltd 光情報記録媒体用Ａｇ合金反射膜、光情報記録媒体および光情報記録媒体用Ａｇ合金反射膜の形成用のＡｇ合金スパッタリングターゲット
US7790064B2 (en) 2005-12-22 2010-09-07 Pioneer Corporation Polycrystalline aluminum thin film and optical recording medium
JP4864586B2 (ja) * 2006-08-01 2012-02-01 新明和工業株式会社 真空成膜装置および真空成膜方法
US8092889B2 (en) 2006-08-28 2012-01-10 Kobe Steel, Ltd. Silver alloy reflective film for optical information storage media, optical information storage medium, and sputtering target for the deposition of silver alloy reflective film for optical information storage media
JP2008066069A (ja) * 2006-09-06 2008-03-21 Ichikoh Ind Ltd 車両用ランプ装置
JP2008066068A (ja) * 2006-09-06 2008-03-21 Ichikoh Ind Ltd 車両用ランプ装置
WO2008035617A1 (en) * 2006-09-21 2008-03-27 Kabushiki Kaisha Kobe Seiko Sho Ag ALLOY THIN FILM, AND Ag ALLOY SPUTTERING TARGET FOR FORMATION OF THE Ag ALLOY THIN FILM
JP4176136B2 (ja) * 2006-09-21 2008-11-05 株式会社神戸製鋼所 Ａｇ合金薄膜
JP2008117470A (ja) 2006-11-02 2008-05-22 Sony Corp 光情報記録媒体および光情報記録媒体の製造方法、ＢＣＡ（ＢｕｒｓｔＣｕｔｔｉｎｇＡｒｅａ）マーキング方法
US7833604B2 (en) 2006-12-01 2010-11-16 Kobe Steel, Ltd. Ag alloy reflective layer for optical information recording medium, optical information recording medium, and sputtering target for forming Ag alloy reflective layer for optical information recording medium
JP4540687B2 (ja) 2007-04-13 2010-09-08 株式会社ソニー・ディスクアンドデジタルソリューションズ 読み出し専用の光情報記録媒体
US8399100B2 (en) 2007-09-25 2013-03-19 Kobe Steel, Ltd. Reflection film, reflection film laminate, LED, organic EL display, and organic EL illuminating instrument
JP5103462B2 (ja) * 2009-11-18 2012-12-19 株式会社神戸製鋼所 Ａｇ合金熱拡散制御膜およびこれを備えた熱アシスト記録用磁気記録媒体
JP2012108440A (ja) * 2010-11-19 2012-06-07 Seiko Epson Corp 干渉フィルター、光モジュール、及び光分析装置
JP5742615B2 (ja) * 2011-09-15 2015-07-01 三菱マテリアル株式会社 導電性膜及びその製造方法並びに導電性膜形成用銀合金スパッタリングターゲット及びその製造方法
JP5910099B2 (ja) * 2012-01-18 2016-04-27 セイコーエプソン株式会社 干渉フィルター、光学モジュールおよび電子機器
WO2014208341A1 (ja) 2013-06-26 2014-12-31 株式会社神戸製鋼所 反射電極用または配線電極用Ａｇ合金膜、反射電極または配線電極、およびＡｇ合金スパッタリングターゲット

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