JP3655907B2 - 光情報記録媒体用反射膜と半透過反射膜、および光情報記録媒体 - Google Patents
光情報記録媒体用反射膜と半透過反射膜、および光情報記録媒体 Download PDFInfo
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- JP3655907B2 JP3655907B2 JP2002361117A JP2002361117A JP3655907B2 JP 3655907 B2 JP3655907 B2 JP 3655907B2 JP 2002361117 A JP2002361117 A JP 2002361117A JP 2002361117 A JP2002361117 A JP 2002361117A JP 3655907 B2 JP3655907 B2 JP 3655907B2
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- Prior art keywords
- information recording
- based alloy
- film
- optical information
- reflective film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- 230000003287 optical effect Effects 0.000 title claims description 84
- 229910045601 alloy Inorganic materials 0.000 claims description 108
- 239000000956 alloy Substances 0.000 claims description 108
- 229910052761 rare earth metal Inorganic materials 0.000 claims description 25
- 229910052737 gold Inorganic materials 0.000 claims description 24
- 150000002910 rare earth metals Chemical class 0.000 claims description 22
- 229910052802 copper Inorganic materials 0.000 claims description 21
- 229910052763 palladium Inorganic materials 0.000 claims description 19
- 229910052697 platinum Inorganic materials 0.000 claims description 14
- 229910052703 rhodium Inorganic materials 0.000 claims description 13
- 229910052797 bismuth Inorganic materials 0.000 claims description 11
- 239000010408 film Substances 0.000 description 124
- 239000000523 sample Substances 0.000 description 71
- 239000010409 thin film Substances 0.000 description 53
- 230000000694 effects Effects 0.000 description 28
- 238000005477 sputtering target Methods 0.000 description 28
- 238000002310 reflectometry Methods 0.000 description 18
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- 239000000203 mixture Substances 0.000 description 9
- 229910052709 silver Inorganic materials 0.000 description 9
- 239000000126 substance Substances 0.000 description 9
- 238000011156 evaluation Methods 0.000 description 8
- 229910052801 chlorine Inorganic materials 0.000 description 7
- 239000000460 chlorine Substances 0.000 description 7
- -1 halogen ions Chemical class 0.000 description 7
- 229910017982 Ag—Si Inorganic materials 0.000 description 6
- 229910017980 Ag—Sn Inorganic materials 0.000 description 6
- 229910001020 Au alloy Inorganic materials 0.000 description 6
- 229910001245 Sb alloy Inorganic materials 0.000 description 6
- 229910052782 aluminium Inorganic materials 0.000 description 6
- 229920003023 plastic Polymers 0.000 description 6
- 238000004544 sputter deposition Methods 0.000 description 6
- 230000003746 surface roughness Effects 0.000 description 6
- 229910001152 Bi alloy Inorganic materials 0.000 description 5
- 229910000881 Cu alloy Inorganic materials 0.000 description 5
- 235000005811 Viola adunca Nutrition 0.000 description 5
- 240000009038 Viola odorata Species 0.000 description 5
- 235000013487 Viola odorata Nutrition 0.000 description 5
- 235000002254 Viola papilionacea Nutrition 0.000 description 5
- 238000005275 alloying Methods 0.000 description 5
- 239000013078 crystal Substances 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 230000001681 protective effect Effects 0.000 description 5
- 238000002834 transmittance Methods 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 229910001316 Ag alloy Inorganic materials 0.000 description 4
- 229910052779 Neodymium Inorganic materials 0.000 description 4
- 239000010410 layer Substances 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 229910052727 yttrium Inorganic materials 0.000 description 4
- 229910052725 zinc Inorganic materials 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
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- 229910052751 metal Inorganic materials 0.000 description 3
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- 239000004417 polycarbonate Substances 0.000 description 3
- 229920000515 polycarbonate Polymers 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910000583 Nd alloy Inorganic materials 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 229910000946 Y alloy Inorganic materials 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
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- 229910052718 tin Inorganic materials 0.000 description 2
- 229910017944 Ag—Cu Inorganic materials 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229910017847 Sb—Cu Inorganic materials 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
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- 239000012790 adhesive layer Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
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- 229910052735 hafnium Inorganic materials 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 238000009718 spray deposition Methods 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
- Manufacturing Optical Record Carriers (AREA)
Priority Applications (21)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002361117A JP3655907B2 (ja) | 2002-08-20 | 2002-12-12 | 光情報記録媒体用反射膜と半透過反射膜、および光情報記録媒体 |
| US10/633,550 US7514037B2 (en) | 2002-08-08 | 2003-08-05 | AG base alloy thin film and sputtering target for forming AG base alloy thin film |
| SG200304812A SG103935A1 (en) | 2002-08-08 | 2003-08-06 | Ag base alloy thin film and sputtering target for forming ag base alloy thin film |
| TW94121903A TWI265976B (en) | 2002-08-08 | 2003-08-07 | Ag base alloy thin film and sputtering target for forming Ag base alloy thin film |
| TW92121689A TWI263689B (en) | 2002-08-08 | 2003-08-07 | Ag base alloy thin film and sputtering target for forming Ag base alloy thin film |
| DE10336228A DE10336228B4 (de) | 2002-08-08 | 2003-08-07 | Dünner Film auf Ag-Legierungsbasis, Verwendung dieses Films und Herstellungsverfahren für diesen Film |
| DE10362302.7A DE10362302B4 (de) | 2002-08-08 | 2003-08-07 | Produkt mit zur elektromagnetischen Abschirmung dienendem Film und Herstellungsverfahren dafür |
| DE10362283.7A DE10362283B4 (de) | 2002-08-08 | 2003-08-07 | Herstellungsverfahren für einen Film auf Ag-Legierungsbasis und Sputtertarget |
| CNB031274617A CN1256461C (zh) | 2002-08-08 | 2003-08-07 | Ag基合金薄膜及Ag基合金薄膜形成用溅射靶 |
| KR1020030055105A KR100605840B1 (ko) | 2002-08-08 | 2003-08-08 | Ａｇ계 합금 박막, 및 Ａｇ계 합금 박막 형성용 스퍼터링 타겟 |
| US11/313,815 US7419711B2 (en) | 2002-08-08 | 2005-12-22 | Ag base alloy thin film and sputtering target for forming Ag base alloy thin film |
| US11/353,168 US7566417B2 (en) | 2002-08-08 | 2006-02-14 | Ag base alloy thin film and sputtering target for forming Ag base alloy thin film |
| KR1020060017733A KR20060021939A (ko) | 2002-08-08 | 2006-02-23 | Ａｇ계 합금 박막, 및 Ａｇ계 합금 박막 형성용 스퍼터링타겟 |
| US11/395,227 US20060171842A1 (en) | 2002-08-08 | 2006-04-03 | Ag base alloy thin film and sputtering target for forming Ag base alloy thin film |
| US11/401,853 US7722942B2 (en) | 2002-08-08 | 2006-04-12 | Ag base alloy thin film and sputtering target for forming Ag base alloy thin film |
| US12/100,823 US7758942B2 (en) | 2002-08-08 | 2008-04-10 | Ag base alloy thin film and sputtering target for forming Ag base alloy thin film |
| KR1020080066739A KR100895759B1 (ko) | 2002-08-08 | 2008-07-09 | Ａｇ계 합금으로 이루어진 광반사막을 구비한 액정표시 소자 |
| US12/183,700 US7871686B2 (en) | 2002-08-08 | 2008-07-31 | Ag base alloy thin film and sputtering target for forming Ag base alloy thin film |
| US12/342,507 US7776420B2 (en) | 2002-08-08 | 2008-12-23 | Ag base alloy thin film and sputtering target for forming Ag base alloy thin film |
| US12/915,138 US8178174B2 (en) | 2002-08-08 | 2010-10-29 | Ag base alloy thin film and sputtering target for forming Ag base alloy thin film |
| US13/437,350 US8936856B2 (en) | 2002-08-08 | 2012-04-02 | AG base alloy thin film and sputtering target for forming AG base alloy thin film |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002239972 | 2002-08-20 | ||
| JP2002361117A JP3655907B2 (ja) | 2002-08-20 | 2002-12-12 | 光情報記録媒体用反射膜と半透過反射膜、および光情報記録媒体 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004367547A Division JP4153484B2 (ja) | 2002-08-20 | 2004-12-20 | 光情報記録媒体用Ａｇ基合金スパッタリングターゲット |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004139712A JP2004139712A (ja) | 2004-05-13 |
| JP2004139712A5 JP2004139712A5 (enExample) | 2005-04-07 |
| JP3655907B2 true JP3655907B2 (ja) | 2005-06-02 |
Family
ID=32472536
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002361117A Expired - Lifetime JP3655907B2 (ja) | 2002-08-08 | 2002-12-12 | 光情報記録媒体用反射膜と半透過反射膜、および光情報記録媒体 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3655907B2 (enExample) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008053999A1 (en) | 2006-11-02 | 2008-05-08 | Kabushiki Kaisha Kobe Seiko Sho | Optical information recording medium, method for manufacturing optical information recording medium, and bca (burst cutting area) marking method |
| WO2008133020A1 (ja) | 2007-04-13 | 2008-11-06 | Sony Disc & Digital Solutions Inc. | 光情報記録媒体 |
| US7754307B2 (en) | 2005-04-14 | 2010-07-13 | Kobe Steel, Ltd. | Silver alloy reflective films for optical information recording media, silver alloy sputtering targets therefor, and optical information recording media |
| US7790064B2 (en) | 2005-12-22 | 2010-09-07 | Pioneer Corporation | Polycrystalline aluminum thin film and optical recording medium |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3993530B2 (ja) * | 2003-05-16 | 2007-10-17 | 株式会社神戸製鋼所 | Ａｇ−Ｂｉ系合金スパッタリングターゲットおよびその製造方法 |
| JP3907666B2 (ja) | 2004-07-15 | 2007-04-18 | 株式会社神戸製鋼所 | レーザーマーキング用再生専用光情報記録媒体 |
| JP4575211B2 (ja) | 2005-03-31 | 2010-11-04 | 株式会社東芝 | 記憶媒体、再生方法及び記録方法 |
| JP2007003624A (ja) * | 2005-06-21 | 2007-01-11 | Ishifuku Metal Ind Co Ltd | 半反射型半透過膜 |
| JP4527624B2 (ja) * | 2005-07-22 | 2010-08-18 | 株式会社神戸製鋼所 | Ａｇ合金反射膜を有する光情報媒体 |
| JP2007035104A (ja) | 2005-07-22 | 2007-02-08 | Kobe Steel Ltd | 光情報記録媒体用Ａｇ合金反射膜、光情報記録媒体および光情報記録媒体用Ａｇ合金反射膜の形成用のＡｇ合金スパッタリングターゲット |
| JP4864586B2 (ja) * | 2006-08-01 | 2012-02-01 | 新明和工業株式会社 | 真空成膜装置および真空成膜方法 |
| US8092889B2 (en) | 2006-08-28 | 2012-01-10 | Kobe Steel, Ltd. | Silver alloy reflective film for optical information storage media, optical information storage medium, and sputtering target for the deposition of silver alloy reflective film for optical information storage media |
| JP2008066069A (ja) * | 2006-09-06 | 2008-03-21 | Ichikoh Ind Ltd | 車両用ランプ装置 |
| JP2008066068A (ja) * | 2006-09-06 | 2008-03-21 | Ichikoh Ind Ltd | 車両用ランプ装置 |
| WO2008035617A1 (en) * | 2006-09-21 | 2008-03-27 | Kabushiki Kaisha Kobe Seiko Sho | Ag ALLOY THIN FILM, AND Ag ALLOY SPUTTERING TARGET FOR FORMATION OF THE Ag ALLOY THIN FILM |
| JP4176136B2 (ja) * | 2006-09-21 | 2008-11-05 | 株式会社神戸製鋼所 | Ａｇ合金薄膜 |
| US7833604B2 (en) | 2006-12-01 | 2010-11-16 | Kobe Steel, Ltd. | Ag alloy reflective layer for optical information recording medium, optical information recording medium, and sputtering target for forming Ag alloy reflective layer for optical information recording medium |
| US8399100B2 (en) | 2007-09-25 | 2013-03-19 | Kobe Steel, Ltd. | Reflection film, reflection film laminate, LED, organic EL display, and organic EL illuminating instrument |
| JP5103462B2 (ja) * | 2009-11-18 | 2012-12-19 | 株式会社神戸製鋼所 | Ａｇ合金熱拡散制御膜およびこれを備えた熱アシスト記録用磁気記録媒体 |
| JP2012108440A (ja) * | 2010-11-19 | 2012-06-07 | Seiko Epson Corp | 干渉フィルター、光モジュール、及び光分析装置 |
| JP5742615B2 (ja) * | 2011-09-15 | 2015-07-01 | 三菱マテリアル株式会社 | 導電性膜及びその製造方法並びに導電性膜形成用銀合金スパッタリングターゲット及びその製造方法 |
| JP5910099B2 (ja) * | 2012-01-18 | 2016-04-27 | セイコーエプソン株式会社 | 干渉フィルター、光学モジュールおよび電子機器 |
| WO2014208341A1 (ja) | 2013-06-26 | 2014-12-31 | 株式会社神戸製鋼所 | 反射電極用または配線電極用Ａｇ合金膜、反射電極または配線電極、およびＡｇ合金スパッタリングターゲット |
-
2002
- 2002-12-12 JP JP2002361117A patent/JP3655907B2/ja not_active Expired - Lifetime
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7754307B2 (en) | 2005-04-14 | 2010-07-13 | Kobe Steel, Ltd. | Silver alloy reflective films for optical information recording media, silver alloy sputtering targets therefor, and optical information recording media |
| US7790064B2 (en) | 2005-12-22 | 2010-09-07 | Pioneer Corporation | Polycrystalline aluminum thin film and optical recording medium |
| US7897065B2 (en) | 2005-12-22 | 2011-03-01 | Pioneer Corporation | Polycrystalline aluminum thin film and optical recording medium |
| WO2008053999A1 (en) | 2006-11-02 | 2008-05-08 | Kabushiki Kaisha Kobe Seiko Sho | Optical information recording medium, method for manufacturing optical information recording medium, and bca (burst cutting area) marking method |
| WO2008133020A1 (ja) | 2007-04-13 | 2008-11-06 | Sony Disc & Digital Solutions Inc. | 光情報記録媒体 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2004139712A (ja) | 2004-05-13 |
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