JP2004099333A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2004099333A5 JP2004099333A5 JP2002249963A JP2002249963A JP2004099333A5 JP 2004099333 A5 JP2004099333 A5 JP 2004099333A5 JP 2002249963 A JP2002249963 A JP 2002249963A JP 2002249963 A JP2002249963 A JP 2002249963A JP 2004099333 A5 JP2004099333 A5 JP 2004099333A5
- Authority
- JP
- Japan
- Prior art keywords
- crucible
- crystal
- raw material
- growth
- sealing agent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000013078 crystal Substances 0.000 claims 19
- 239000002994 raw material Substances 0.000 claims 8
- 239000004065 semiconductor Substances 0.000 claims 6
- 150000001875 compounds Chemical class 0.000 claims 5
- 238000004519 manufacturing process Methods 0.000 claims 5
- 238000007789 sealing Methods 0.000 claims 4
- 238000002425 crystallisation Methods 0.000 claims 2
- 230000008025 crystallization Effects 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 230000001105 regulatory effect Effects 0.000 claims 1
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002249963A JP4778188B2 (ja) | 2002-02-13 | 2002-08-29 | 化合物半導体単結晶の製造方法 |
| EP02786108A EP1500633B1 (en) | 2002-02-13 | 2002-12-17 | Production method for compound semiconductor single crystal |
| DE60233170T DE60233170D1 (de) | 2002-02-13 | 2002-12-17 | Verfahren zur herstellung eines verbindungshalbleiter-einkristalls |
| PCT/JP2002/013165 WO2003068696A1 (en) | 2002-02-13 | 2002-12-17 | Production method for compound semiconductor single crystal |
| US10/502,228 US7229494B2 (en) | 2002-02-13 | 2002-12-17 | Production method for compound semiconductor single crystal |
| TW092101996A TWI257963B (en) | 2002-02-13 | 2003-01-29 | Method for producing compound semiconductor single crystal |
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002035551 | 2002-02-13 | ||
| JP2002035551 | 2002-02-13 | ||
| JP2002208530 | 2002-07-17 | ||
| JP2002208530 | 2002-07-17 | ||
| JP2002249963A JP4778188B2 (ja) | 2002-02-13 | 2002-08-29 | 化合物半導体単結晶の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004099333A JP2004099333A (ja) | 2004-04-02 |
| JP2004099333A5 true JP2004099333A5 (enExample) | 2005-06-30 |
| JP4778188B2 JP4778188B2 (ja) | 2011-09-21 |
Family
ID=27738906
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002249963A Expired - Lifetime JP4778188B2 (ja) | 2002-02-13 | 2002-08-29 | 化合物半導体単結晶の製造方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US7229494B2 (enExample) |
| EP (1) | EP1500633B1 (enExample) |
| JP (1) | JP4778188B2 (enExample) |
| DE (1) | DE60233170D1 (enExample) |
| TW (1) | TWI257963B (enExample) |
| WO (1) | WO2003068696A1 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4252300B2 (ja) | 2002-12-18 | 2009-04-08 | 日鉱金属株式会社 | 化合物半導体単結晶の製造方法および結晶成長装置 |
| JP5352245B2 (ja) * | 2007-02-14 | 2013-11-27 | Jx日鉱日石金属株式会社 | 化合物半導体単結晶の製造方法および結晶成長装置 |
| US9822466B2 (en) | 2013-11-22 | 2017-11-21 | Corner Star Limited | Crystal growing systems and crucibles for enhancing heat transfer to a melt |
| JP7155968B2 (ja) * | 2018-12-04 | 2022-10-19 | Tdk株式会社 | 単結晶育成用ルツボ及び単結晶製造方法 |
| CN112176395A (zh) * | 2020-10-13 | 2021-01-05 | 福建福晶科技股份有限公司 | 一种优质大尺寸BiBO晶体熔盐法生长的装置和方法 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6027693A (ja) * | 1983-07-21 | 1985-02-12 | Toshiba Corp | 化合物半導体単結晶の製造方法 |
| JPS6126590A (ja) * | 1984-07-17 | 1986-02-05 | Sumitomo Electric Ind Ltd | 化合物半導体単結晶の引上方法及び装置 |
| JPS6287489A (ja) * | 1985-10-12 | 1987-04-21 | Sumitomo Electric Ind Ltd | るつぼの回収方法及び装置 |
| JPH0699228B2 (ja) * | 1986-06-06 | 1994-12-07 | 住友電気工業株式会社 | 単結晶の引上方法 |
| JPS63195188A (ja) * | 1987-02-06 | 1988-08-12 | Sumitomo Electric Ind Ltd | 化合物半導体単結晶の製造方法および製造装置 |
| JPH01294592A (ja) | 1988-05-23 | 1989-11-28 | Sumitomo Electric Ind Ltd | 単結晶の育成方法 |
| US5078830A (en) * | 1989-04-10 | 1992-01-07 | Mitsubishi Metal Corporation | Method for growing single crystal |
| US5290395A (en) * | 1990-07-26 | 1994-03-01 | Sumitomo Electric Industries, Ltd. | Method of and apparatus for preparing single crystal |
| JPH0717792A (ja) | 1993-06-30 | 1995-01-20 | Sumitomo Electric Ind Ltd | 化合物半導体結晶の製造装置 |
-
2002
- 2002-08-29 JP JP2002249963A patent/JP4778188B2/ja not_active Expired - Lifetime
- 2002-12-17 US US10/502,228 patent/US7229494B2/en not_active Expired - Lifetime
- 2002-12-17 DE DE60233170T patent/DE60233170D1/de not_active Expired - Lifetime
- 2002-12-17 EP EP02786108A patent/EP1500633B1/en not_active Expired - Lifetime
- 2002-12-17 WO PCT/JP2002/013165 patent/WO2003068696A1/ja not_active Ceased
-
2003
- 2003-01-29 TW TW092101996A patent/TWI257963B/zh not_active IP Right Cessation
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP1571240A3 (en) | Method for producing compound semiconductor single crystal | |
| US6989059B2 (en) | Process for producing single crystal of compound semiconductor and crystal growing apparatus | |
| JP2004099333A5 (enExample) | ||
| JP2008105896A (ja) | SiC単結晶の製造方法 | |
| KR101251674B1 (ko) | 부분적으로 실투되어 있는 도가니 | |
| EP1500633A4 (en) | METHOD FOR PRODUCING A CONNECTING SEMICONDUCTOR CRYSTAL | |
| KR101599338B1 (ko) | Ccz용 이중도가니 | |
| EP1741808B1 (en) | InP SINGLE CRYSTAL WAFER AND InP SINGLE CRYSTAL MANUFACTURING METHOD | |
| KR20130007920A (ko) | 사파이어 단결정 연속 성장 장치 | |
| JP2861240B2 (ja) | 単結晶成長用るつぼ | |
| JPH0412081A (ja) | 3―v族化合物単結晶の製造方法 | |
| KR101567052B1 (ko) | 잉곳 성장 장치용 열차단구조체 | |
| JP2004083301A (ja) | 単結晶製造装置 | |
| JP2025050363A5 (enExample) | ||
| JP3018429B2 (ja) | 単結晶の製造方法および製造装置 | |
| CN206368211U (zh) | 一种提拉式长晶炉 | |
| JP2007223815A (ja) | 化合物半導体単結晶の製造方法及びZnTe単結晶 | |
| JP5352245B2 (ja) | 化合物半導体単結晶の製造方法および結晶成長装置 | |
| JPH0475880B2 (enExample) | ||
| JP2006347792A5 (enExample) | ||
| JPH02212395A (ja) | 化合物半導体結晶の製造方法および製造装置 | |
| JPH0354187A (ja) | 単結晶製造装置 | |
| CN1701042A (zh) | 化合物半导体单晶的制备方法 | |
| JPS61201691A (ja) | 3−5族化合物結晶体の製造装置 | |
| KR20120122564A (ko) | 원료 장입 방법 및 이를 이용한 단결정 잉곳 제조 방법 |