JP2004072120A - 現像方法及び現像装置及び液処理方法及び液処理装置 - Google Patents

現像方法及び現像装置及び液処理方法及び液処理装置 Download PDF

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Publication number
JP2004072120A
JP2004072120A JP2003302071A JP2003302071A JP2004072120A JP 2004072120 A JP2004072120 A JP 2004072120A JP 2003302071 A JP2003302071 A JP 2003302071A JP 2003302071 A JP2003302071 A JP 2003302071A JP 2004072120 A JP2004072120 A JP 2004072120A
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substrate
developing
cup
semiconductor wafer
processing
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JP2004072120A5 (https=
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Yoshitake Ito
伊藤　美岳
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  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2003302071A 2002-07-22 2003-07-19 現像方法及び現像装置及び液処理方法及び液処理装置 Pending JP2004072120A (ja)

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JP2003302071A JP2004072120A (ja) 2002-07-22 2003-07-19 現像方法及び現像装置及び液処理方法及び液処理装置

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JP2002244352 2002-07-22
JP2003302071A JP2004072120A (ja) 2002-07-22 2003-07-19 現像方法及び現像装置及び液処理方法及び液処理装置

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JP2004301203A Division JP2005109513A (ja) 2002-07-22 2004-10-15 現像方法及び現像装置及び液処理方法及び液処理装置
JP2005047256A Division JP3847767B2 (ja) 2002-07-22 2005-02-23 基板処理方法及び基板処理装置
JP2005177098A Division JP2005340845A (ja) 2002-07-22 2005-06-17 基板処理装置及び基板処理方法並びに基板の製造方法
JP2006239374A Division JP2007036268A (ja) 2002-07-22 2006-09-04 基板処理方法及び基板処理装置

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JP2004072120A5 JP2004072120A5 (https=) 2006-08-03

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008177436A (ja) * 2007-01-19 2008-07-31 Tokyo Electron Ltd 現像処理装置
DE102009007260B3 (de) * 2009-02-03 2010-06-10 Suss Microtec Lithography Gmbh Vorrichtung zum Beschichten eines Substrats
JP2013129193A (ja) * 2011-12-20 2013-07-04 Oce Printing Systems Gmbh 構成要素から堆積物をクリーニングする装置
JP2022020735A (ja) * 2017-08-10 2022-02-01 東京エレクトロン株式会社 液処理方法

Citations (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63111960U (https=) * 1987-01-13 1988-07-19
JPH04174848A (ja) * 1990-11-08 1992-06-23 Fujitsu Ltd レジスト塗布装置
JPH0997757A (ja) * 1995-09-28 1997-04-08 Dainippon Screen Mfg Co Ltd 基板回転式現像装置
JPH09326361A (ja) * 1996-03-05 1997-12-16 Internatl Business Mach Corp <Ibm> レジスト現像処理方法
JPH10214768A (ja) * 1997-01-29 1998-08-11 Dainippon Screen Mfg Co Ltd 基板処理装置
JPH1187225A (ja) * 1997-09-12 1999-03-30 Dainippon Screen Mfg Co Ltd 基板処理装置
JP2001102298A (ja) * 1999-07-28 2001-04-13 Tokyo Electron Ltd 現像装置、液処理装置及び現像方法
JP2001104861A (ja) * 1999-10-05 2001-04-17 Tokyo Electron Ltd 液処理装置及びその方法
JP2001126982A (ja) * 1999-08-17 2001-05-11 Tokyo Electron Ltd 液処理装置及びその方法
JP3257038B2 (ja) * 1991-06-04 2002-02-18 ソニー株式会社 現像方法及び現像装置
JP2002064044A (ja) * 2000-08-17 2002-02-28 Dainippon Screen Mfg Co Ltd 基板処理装置および基板処理システム
JP2002118051A (ja) * 2000-10-10 2002-04-19 Tokyo Electron Ltd 塗布装置及び塗布方法
JP2002151376A (ja) * 2000-11-07 2002-05-24 Tokyo Electron Ltd 現像処理方法及び現像処理装置
JP2002164410A (ja) * 2000-09-13 2002-06-07 Tokyo Electron Ltd 基板処理装置及び基板処理方法

Patent Citations (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63111960U (https=) * 1987-01-13 1988-07-19
JPH04174848A (ja) * 1990-11-08 1992-06-23 Fujitsu Ltd レジスト塗布装置
JP3257038B2 (ja) * 1991-06-04 2002-02-18 ソニー株式会社 現像方法及び現像装置
JPH0997757A (ja) * 1995-09-28 1997-04-08 Dainippon Screen Mfg Co Ltd 基板回転式現像装置
JPH09326361A (ja) * 1996-03-05 1997-12-16 Internatl Business Mach Corp <Ibm> レジスト現像処理方法
JPH10214768A (ja) * 1997-01-29 1998-08-11 Dainippon Screen Mfg Co Ltd 基板処理装置
JPH1187225A (ja) * 1997-09-12 1999-03-30 Dainippon Screen Mfg Co Ltd 基板処理装置
JP2001102298A (ja) * 1999-07-28 2001-04-13 Tokyo Electron Ltd 現像装置、液処理装置及び現像方法
JP2001126982A (ja) * 1999-08-17 2001-05-11 Tokyo Electron Ltd 液処理装置及びその方法
JP2001104861A (ja) * 1999-10-05 2001-04-17 Tokyo Electron Ltd 液処理装置及びその方法
JP2002064044A (ja) * 2000-08-17 2002-02-28 Dainippon Screen Mfg Co Ltd 基板処理装置および基板処理システム
JP2002164410A (ja) * 2000-09-13 2002-06-07 Tokyo Electron Ltd 基板処理装置及び基板処理方法
JP2002118051A (ja) * 2000-10-10 2002-04-19 Tokyo Electron Ltd 塗布装置及び塗布方法
JP2002151376A (ja) * 2000-11-07 2002-05-24 Tokyo Electron Ltd 現像処理方法及び現像処理装置

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008177436A (ja) * 2007-01-19 2008-07-31 Tokyo Electron Ltd 現像処理装置
DE102009007260B3 (de) * 2009-02-03 2010-06-10 Suss Microtec Lithography Gmbh Vorrichtung zum Beschichten eines Substrats
JP2013129193A (ja) * 2011-12-20 2013-07-04 Oce Printing Systems Gmbh 構成要素から堆積物をクリーニングする装置
JP2022020735A (ja) * 2017-08-10 2022-02-01 東京エレクトロン株式会社 液処理方法

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