JP2003535356A5 - - Google Patents
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- Publication number
- JP2003535356A5 JP2003535356A5 JP2001550065A JP2001550065A JP2003535356A5 JP 2003535356 A5 JP2003535356 A5 JP 2003535356A5 JP 2001550065 A JP2001550065 A JP 2001550065A JP 2001550065 A JP2001550065 A JP 2001550065A JP 2003535356 A5 JP2003535356 A5 JP 2003535356A5
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- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US17352399P | 1999-12-29 | 1999-12-29 | |
| US60/173,523 | 1999-12-29 | ||
| DE2000102626 DE10002626A1 (de) | 2000-01-22 | 2000-01-22 | Katadioptrisches Objektiv mit Asphären |
| DE10002626.5 | 2000-01-22 | ||
| DE10021739 | 2000-05-04 | ||
| DE10021739.7 | 2000-05-04 | ||
| PCT/EP2000/013148 WO2001050171A1 (de) | 1999-12-29 | 2000-12-22 | Projektionsobjektiv mit benachbart angeordneten asphärischen linsenoberflächen |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2003535356A JP2003535356A (ja) | 2003-11-25 |
| JP2003535356A5 true JP2003535356A5 (enExample) | 2007-12-27 |
Family
ID=27213593
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001550065A Pending JP2003535356A (ja) | 1999-12-29 | 2000-12-22 | 非球面レンズ表面が隣接して配置されている投影対物レンズ |
Country Status (6)
| Country | Link |
|---|---|
| US (3) | US6646718B2 (enExample) |
| EP (1) | EP1242843B1 (enExample) |
| JP (1) | JP2003535356A (enExample) |
| KR (1) | KR100854052B1 (enExample) |
| DE (1) | DE50012452D1 (enExample) |
| WO (1) | WO2001050171A1 (enExample) |
Families Citing this family (39)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19939088A1 (de) * | 1998-08-18 | 2000-02-24 | Nikon Corp | Belichtungsvorrichtung und -verfahren |
| EP1094350A3 (en) * | 1999-10-21 | 2001-08-16 | Carl Zeiss | Optical projection lens system |
| EP1242843B1 (de) * | 1999-12-29 | 2006-03-22 | Carl Zeiss SMT AG | Projektionsobjektiv mit benachbart angeordneten asphärischen linsenoberflächen |
| EP1344112A2 (de) * | 2000-12-22 | 2003-09-17 | Carl Zeiss SMT AG | Projektionsobjektiv |
| KR20030072568A (ko) * | 2000-12-22 | 2003-09-15 | 칼-짜이스-스티프퉁 트레이딩 에즈 칼 짜이스 | 하나 이상의 비구면 렌즈를 갖는 대물렌즈 |
| JP2002244034A (ja) | 2001-02-21 | 2002-08-28 | Nikon Corp | 投影光学系および該投影光学系を備えた露光装置 |
| JP2002323652A (ja) | 2001-02-23 | 2002-11-08 | Nikon Corp | 投影光学系，該投影光学系を備えた投影露光装置および投影露光方法 |
| JP2004526331A (ja) | 2001-05-15 | 2004-08-26 | カール・ツアイス・エスエムテイ・アーゲー | フッ化物結晶レンズを含む対物レンズ |
| DE10123725A1 (de) | 2001-05-15 | 2002-11-21 | Zeiss Carl | Projektionsbelichtungsanlage der Mikrolithographie, Optisches System und Herstellverfahren |
| US7239447B2 (en) | 2001-05-15 | 2007-07-03 | Carl Zeiss Smt Ag | Objective with crystal lenses |
| DE10151309A1 (de) * | 2001-10-17 | 2003-05-08 | Carl Zeiss Semiconductor Mfg S | Projektionsbelichtungsanlage der Mikrolithographie für Lambda <200 nm |
| DE10162796B4 (de) * | 2001-12-20 | 2007-10-31 | Carl Zeiss Smt Ag | Verfahren zur Optimierung der Abbildungseigenschaften von mindestens zwei optischen Elementen sowie photolithographisches Fertigungsverfahren |
| US7190527B2 (en) | 2002-03-01 | 2007-03-13 | Carl Zeiss Smt Ag | Refractive projection objective |
| JP2005519332A (ja) * | 2002-03-01 | 2005-06-30 | カール・ツアイス・エスエムテイ・アーゲー | 屈折型投影対物レンズ |
| US20050094268A1 (en) * | 2002-03-14 | 2005-05-05 | Carl Zeiss Smt Ag | Optical system with birefringent optical elements |
| US7292388B2 (en) | 2002-05-08 | 2007-11-06 | Carl Zeiss Smt Ag | Lens made of a crystalline material |
| JP2005533285A (ja) * | 2002-07-18 | 2005-11-04 | カール・ツァイス・エスエムティー・アーゲー | 反射屈折投影対物レンズ |
| JP2005537512A (ja) * | 2002-09-03 | 2005-12-08 | カール・ツアイス・エスエムテイ・アーゲー | 複屈折レンズを伴う対物レンズ |
| WO2004023172A1 (de) | 2002-09-03 | 2004-03-18 | Carl Zeiss Smt Ag | Optimierverfahren für ein objektiv mit fluorid-kristall-linsen sowie objektiv mit fluorid-kristall-linsen |
| WO2004025349A1 (de) * | 2002-09-09 | 2004-03-25 | Carl Zeiss Smt Ag | Katadioptrisches projektionsobjektiv sowie verfahren zur kompensation der intrinsischen doppelbrechung in einem solchen |
| TWI305872B (en) | 2003-03-17 | 2009-02-01 | Nikon Corp | Optical projection system, light-exposure apparatus and light-exposure method |
| JP2005017734A (ja) * | 2003-06-26 | 2005-01-20 | Nikon Corp | 投影光学系、露光装置、およびデバイス製造方法 |
| US7085075B2 (en) * | 2003-08-12 | 2006-08-01 | Carl Zeiss Smt Ag | Projection objectives including a plurality of mirrors with lenses ahead of mirror M3 |
| US7551361B2 (en) | 2003-09-09 | 2009-06-23 | Carl Zeiss Smt Ag | Lithography lens system and projection exposure system provided with at least one lithography lens system of this type |
| US8208198B2 (en) | 2004-01-14 | 2012-06-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
| US7177087B2 (en) * | 2003-10-28 | 2007-02-13 | Leupold & Stevens, Inc. | Compound asperic ocular for riflescope |
| WO2005059654A1 (en) | 2003-12-15 | 2005-06-30 | Carl Zeiss Smt Ag | Objective as a microlithography projection objective with at least one liquid lens |
| US20080151364A1 (en) | 2004-01-14 | 2008-06-26 | Carl Zeiss Smt Ag | Catadioptric projection objective |
| CN100592210C (zh) | 2004-02-13 | 2010-02-24 | 卡尔蔡司Smt股份公司 | 微平版印刷投影曝光装置的投影物镜 |
| KR101213831B1 (ko) | 2004-05-17 | 2012-12-24 | 칼 짜이스 에스엠티 게엠베하 | 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈 |
| US7511798B2 (en) | 2004-07-30 | 2009-03-31 | Asml Holding N.V. | Off-axis catadioptric projection optical system for lithography |
| US7301707B2 (en) * | 2004-09-03 | 2007-11-27 | Carl Zeiss Smt Ag | Projection optical system and method |
| US20080123074A1 (en) * | 2004-11-10 | 2008-05-29 | Nikon Corporation | Projection Optical System, Exposure Equipment and Exposure Method |
| TWI454731B (zh) * | 2005-05-27 | 2014-10-01 | Zeiss Carl Smt Gmbh | 用於改進投影物鏡的成像性質之方法以及該投影物鏡 |
| EP1746463A2 (de) * | 2005-07-01 | 2007-01-24 | Carl Zeiss SMT AG | Verfahren zum Korrigieren eines lithographischen Projektionsobjektivs und derartiges Projektionsobjektiv |
| TWI305107B (en) * | 2005-09-29 | 2009-01-01 | Young Optics Inc | Optical projection apparatus |
| DE102008015775A1 (de) | 2007-04-16 | 2008-12-18 | Carl Zeiss Smt Ag | Chromatisch korrigiertes Lithographieobjektiv |
| US7929115B2 (en) * | 2007-06-01 | 2011-04-19 | Carl Zeiss Smt Gmbh | Projection objective and projection exposure apparatus for microlithography |
| KR101505256B1 (ko) * | 2010-04-23 | 2015-03-30 | 칼 짜이스 에스엠티 게엠베하 | 리소그래픽 시스템의 광학 소자의 조작을 포함하는 리소그래픽 시스템의 작동 방법 |
Family Cites Families (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4871237A (en) | 1983-07-27 | 1989-10-03 | Nikon Corporation | Method and apparatus for adjusting imaging performance of projection optical apparatus |
| DE3787035T2 (de) * | 1986-03-12 | 1994-03-10 | Matsushita Electric Ind Co Ltd | Optisches Projektionssystem für Präzisionskopien. |
| US4757354A (en) * | 1986-05-02 | 1988-07-12 | Matsushita Electrical Industrial Co., Ltd. | Projection optical system |
| DE68916451T2 (de) * | 1988-03-11 | 1994-11-17 | Matsushita Electric Ind Co Ltd | Optisches Projektionssystem. |
| SU1587461A1 (ru) | 1988-08-03 | 1990-08-23 | Предприятие П/Я Р-6495 | Проекционный объектив с увеличением -1/5 @ |
| JP2548359B2 (ja) * | 1989-03-01 | 1996-10-30 | 松下電器産業株式会社 | 投影レンズとそれを用いたプロジェクションテレビ |
| US4963007A (en) * | 1989-09-05 | 1990-10-16 | U.S. Precision Lens, Inc. | Color corrected projection lens |
| JP3041939B2 (ja) | 1990-10-22 | 2000-05-15 | 株式会社ニコン | 投影レンズ系 |
| JP3454390B2 (ja) * | 1995-01-06 | 2003-10-06 | 株式会社ニコン | 投影光学系、投影露光装置及び投影露光方法 |
| US5724121A (en) * | 1995-05-12 | 1998-03-03 | Hughes Danbury Optical Systems, Inc. | Mounting member method and apparatus with variable length supports |
| JPH103039A (ja) * | 1996-06-14 | 1998-01-06 | Nikon Corp | 反射屈折光学系 |
| JP4192279B2 (ja) * | 1996-09-27 | 2008-12-10 | 株式会社ニコン | 投影光学系の製造方法、該製造方法によって製造された投影光学系、投影露光装置および方法、並びに半導体装置の製造方法 |
| DE69728126T2 (de) * | 1996-12-28 | 2005-01-20 | Canon K.K. | Projektionsbelichtungsapparat und Verfahren zur Herstellung einer Vorrichtung |
| JPH10197791A (ja) * | 1997-01-13 | 1998-07-31 | Canon Inc | 投影レンズ |
| US5999331A (en) * | 1997-02-07 | 1999-12-07 | Minolta Co., Ltd. | Zoom lens system |
| DE19818444A1 (de) * | 1997-04-25 | 1998-10-29 | Nikon Corp | Abbildungsoptik, Projektionsoptikvorrichtung und Projektionsbelichtungsverfahren |
| JPH10325922A (ja) * | 1997-05-26 | 1998-12-08 | Nikon Corp | 投影光学系 |
| US5990926A (en) * | 1997-07-16 | 1999-11-23 | Nikon Corporation | Projection lens systems for excimer laser exposure lithography |
| JPH1195098A (ja) | 1997-09-16 | 1999-04-09 | Nitto Kogaku Kk | 投写用ズームレンズおよびプロジェクタ装置 |
| JP4083856B2 (ja) * | 1998-02-18 | 2008-04-30 | リコー光学株式会社 | 投射用ズームレンズ |
| US6166864A (en) * | 1998-03-10 | 2000-12-26 | Canon Kabushiki Kaisha | Zoom lens and optical apparatus using the same |
| WO1999052004A1 (en) * | 1998-04-07 | 1999-10-14 | Nikon Corporation | Projection exposure apparatus and method, and reflection refraction optical system |
| JP2000195772A (ja) * | 1998-12-25 | 2000-07-14 | Nikon Corp | 投影露光装置 |
| JPH11307443A (ja) * | 1998-04-24 | 1999-11-05 | Canon Inc | 投影露光装置及びそれを用いたデバイスの製造方法 |
| DE19939088A1 (de) * | 1998-08-18 | 2000-02-24 | Nikon Corp | Belichtungsvorrichtung und -verfahren |
| KR20010041257A (ko) * | 1998-12-25 | 2001-05-15 | 오노 시게오 | 반사굴절 결상 광학계 및 그 광학계를 구비한 투영 노광장치 |
| US6867922B1 (en) * | 1999-06-14 | 2005-03-15 | Canon Kabushiki Kaisha | Projection optical system and projection exposure apparatus using the same |
| JP3423644B2 (ja) * | 1999-06-14 | 2003-07-07 | キヤノン株式会社 | 投影光学系及びそれを用いた投影露光装置 |
| JP3359302B2 (ja) * | 1999-06-14 | 2002-12-24 | キヤノン株式会社 | 投影露光装置 |
| JP4717974B2 (ja) * | 1999-07-13 | 2011-07-06 | 株式会社ニコン | 反射屈折光学系及び該光学系を備える投影露光装置 |
| EP1094350A3 (en) * | 1999-10-21 | 2001-08-16 | Carl Zeiss | Optical projection lens system |
| EP1242843B1 (de) * | 1999-12-29 | 2006-03-22 | Carl Zeiss SMT AG | Projektionsobjektiv mit benachbart angeordneten asphärischen linsenoberflächen |
| US6542723B1 (en) * | 2000-02-11 | 2003-04-01 | Lucent Technologies Inc. | Optoelectronic phase locked loop with balanced photodetection for clock recovery in high-speed optical time division multiplexed systems |
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2000
- 2000-12-22 EP EP00985239A patent/EP1242843B1/de not_active Expired - Lifetime
- 2000-12-22 KR KR1020027008352A patent/KR100854052B1/ko not_active Expired - Fee Related
- 2000-12-22 DE DE50012452T patent/DE50012452D1/de not_active Expired - Fee Related
- 2000-12-22 WO PCT/EP2000/013148 patent/WO2001050171A1/de not_active Ceased
- 2000-12-22 JP JP2001550065A patent/JP2003535356A/ja active Pending
-
2002
- 2002-06-24 US US10/177,580 patent/US6646718B2/en not_active Expired - Lifetime
-
2003
- 2003-11-07 US US10/702,501 patent/US6903802B2/en not_active Expired - Fee Related
-
2005
- 2005-03-15 US US11/079,225 patent/US7154678B2/en not_active Expired - Fee Related