JP2003503841A5 - - Google Patents

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Publication number
JP2003503841A5
JP2003503841A5 JP2001506576A JP2001506576A JP2003503841A5 JP 2003503841 A5 JP2003503841 A5 JP 2003503841A5 JP 2001506576 A JP2001506576 A JP 2001506576A JP 2001506576 A JP2001506576 A JP 2001506576A JP 2003503841 A5 JP2003503841 A5 JP 2003503841A5
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JP
Japan
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JP2001506576A
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JP2003503841A (ja
JP4792185B2 (ja
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Priority claimed from US09/345,639 external-priority patent/US6344105B1/en
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Publication of JP4792185B2 publication Critical patent/JP4792185B2/ja
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JP2001506576A 1999-06-30 2000-06-29 エッチング速度の均一性を改良するプラズマ処理チャンバ Expired - Lifetime JP4792185B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/345,639 1999-06-30
US09/345,639 US6344105B1 (en) 1999-06-30 1999-06-30 Techniques for improving etch rate uniformity
PCT/US2000/018234 WO2001001445A1 (en) 1999-06-30 2000-06-29 Techniques for improving etch rate uniformity

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2010236658A Division JP2011014943A (ja) 1999-06-30 2010-10-21 エッチング速度の均一性を改良する技術

Publications (3)

Publication Number Publication Date
JP2003503841A JP2003503841A (ja) 2003-01-28
JP2003503841A5 true JP2003503841A5 (ja) 2007-11-01
JP4792185B2 JP4792185B2 (ja) 2011-10-12

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JP2001506576A Expired - Lifetime JP4792185B2 (ja) 1999-06-30 2000-06-29 エッチング速度の均一性を改良するプラズマ処理チャンバ
JP2010236658A Pending JP2011014943A (ja) 1999-06-30 2010-10-21 エッチング速度の均一性を改良する技術

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JP2010236658A Pending JP2011014943A (ja) 1999-06-30 2010-10-21 エッチング速度の均一性を改良する技術

Country Status (9)

Country Link
US (1) US6344105B1 (ja)
EP (2) EP1898444B1 (ja)
JP (2) JP4792185B2 (ja)
KR (1) KR100743872B1 (ja)
CN (2) CN100392791C (ja)
AU (1) AU5908600A (ja)
DE (2) DE60038175T2 (ja)
TW (1) TW463235B (ja)
WO (1) WO2001001445A1 (ja)

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