JP2003173970A5 - - Google Patents

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Publication number
JP2003173970A5
JP2003173970A5 JP2002201265A JP2002201265A JP2003173970A5 JP 2003173970 A5 JP2003173970 A5 JP 2003173970A5 JP 2002201265 A JP2002201265 A JP 2002201265A JP 2002201265 A JP2002201265 A JP 2002201265A JP 2003173970 A5 JP2003173970 A5 JP 2003173970A5
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JP
Japan
Prior art keywords
semiconductor film
manufacturing
rare gas
amorphous structure
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002201265A
Other languages
English (en)
Japanese (ja)
Other versions
JP4212844B2 (ja
JP2003173970A (ja
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Application filed filed Critical
Priority to JP2002201265A priority Critical patent/JP4212844B2/ja
Priority claimed from JP2002201265A external-priority patent/JP4212844B2/ja
Publication of JP2003173970A publication Critical patent/JP2003173970A/ja
Publication of JP2003173970A5 publication Critical patent/JP2003173970A5/ja
Application granted granted Critical
Publication of JP4212844B2 publication Critical patent/JP4212844B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2002201265A 2001-07-10 2002-07-10 半導体装置の作製方法 Expired - Fee Related JP4212844B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002201265A JP4212844B2 (ja) 2001-07-10 2002-07-10 半導体装置の作製方法

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2001209239 2001-07-10
JP2001-209239 2001-07-10
JP2001295341 2001-09-27
JP2001-295341 2001-09-27
JP2002201265A JP4212844B2 (ja) 2001-07-10 2002-07-10 半導体装置の作製方法

Publications (3)

Publication Number Publication Date
JP2003173970A JP2003173970A (ja) 2003-06-20
JP2003173970A5 true JP2003173970A5 (enExample) 2005-10-13
JP4212844B2 JP4212844B2 (ja) 2009-01-21

Family

ID=27347125

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002201265A Expired - Fee Related JP4212844B2 (ja) 2001-07-10 2002-07-10 半導体装置の作製方法

Country Status (1)

Country Link
JP (1) JP4212844B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102959712A (zh) * 2011-06-17 2013-03-06 松下电器产业株式会社 薄膜晶体管以及薄膜晶体管的制造方法
JPWO2012172617A1 (ja) * 2011-06-17 2015-02-23 パナソニック株式会社 薄膜トランジスタ及び薄膜トランジスタの製造方法
JP5955658B2 (ja) 2012-06-15 2016-07-20 株式会社Screenホールディングス 熱処理方法および熱処理装置
JP5739048B2 (ja) * 2013-09-30 2015-06-24 積水フィルム株式会社 農業用多層フィルム

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