JP2003332342A5 - - Google Patents

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Publication number
JP2003332342A5
JP2003332342A5 JP2002138895A JP2002138895A JP2003332342A5 JP 2003332342 A5 JP2003332342 A5 JP 2003332342A5 JP 2002138895 A JP2002138895 A JP 2002138895A JP 2002138895 A JP2002138895 A JP 2002138895A JP 2003332342 A5 JP2003332342 A5 JP 2003332342A5
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JP
Japan
Prior art keywords
semiconductor film
rare gas
semiconductor
forming
barrier layer
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Application number
JP2002138895A
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English (en)
Japanese (ja)
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JP2003332342A (ja
JP4267253B2 (ja
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Priority to JP2002138895A priority Critical patent/JP4267253B2/ja
Priority claimed from JP2002138895A external-priority patent/JP4267253B2/ja
Publication of JP2003332342A publication Critical patent/JP2003332342A/ja
Publication of JP2003332342A5 publication Critical patent/JP2003332342A5/ja
Application granted granted Critical
Publication of JP4267253B2 publication Critical patent/JP4267253B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2002138895A 2002-05-14 2002-05-14 半導体装置の作製方法 Expired - Fee Related JP4267253B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002138895A JP4267253B2 (ja) 2002-05-14 2002-05-14 半導体装置の作製方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002138895A JP4267253B2 (ja) 2002-05-14 2002-05-14 半導体装置の作製方法

Publications (3)

Publication Number Publication Date
JP2003332342A JP2003332342A (ja) 2003-11-21
JP2003332342A5 true JP2003332342A5 (enExample) 2005-09-22
JP4267253B2 JP4267253B2 (ja) 2009-05-27

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ID=29700221

Family Applications (1)

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JP2002138895A Expired - Fee Related JP4267253B2 (ja) 2002-05-14 2002-05-14 半導体装置の作製方法

Country Status (1)

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JP (1) JP4267253B2 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101623224B1 (ko) 2008-09-12 2016-05-20 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치 및 반도체 장치의 제조 방법

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