JP2003064090A - トリアルキルｖａ族金属化合物 - Google Patents

トリアルキルｖａ族金属化合物

Info

Publication number
JP2003064090A
JP2003064090A JP2002103727A JP2002103727A JP2003064090A JP 2003064090 A JP2003064090 A JP 2003064090A JP 2002103727 A JP2002103727 A JP 2002103727A JP 2002103727 A JP2002103727 A JP 2002103727A JP 2003064090 A JP2003064090 A JP 2003064090A
Authority
JP
Japan
Prior art keywords
group
metal
compound
metal compound
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002103727A
Other languages
English (en)
Japanese (ja)
Other versions
JP2003064090A5 (enExample
Inventor
Deodatta V Shenai-Khatkhate
ディオダタ・ブイ・シェナイ−カートカート
Michael B Power
マイケル・ビー・パワー
Artashes Amamchyan
アルタシェス・アマンチュヤン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DuPont Electronic Materials International LLC
Original Assignee
Shipley Co LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shipley Co LLC filed Critical Shipley Co LLC
Publication of JP2003064090A publication Critical patent/JP2003064090A/ja
Publication of JP2003064090A5 publication Critical patent/JP2003064090A5/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/94—Bismuth compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/66—Arsenic compounds
    • C07F9/70—Organo-arsenic compounds
    • C07F9/72—Aliphatic compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/90—Antimony compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K2323/00—Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
JP2002103727A 2001-04-06 2002-04-05 トリアルキルｖａ族金属化合物 Pending JP2003064090A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US28197701P 2001-04-06 2001-04-06
US60/281977 2001-04-06

Publications (2)

Publication Number Publication Date
JP2003064090A true JP2003064090A (ja) 2003-03-05
JP2003064090A5 JP2003064090A5 (enExample) 2005-09-15

Family

ID=23079564

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002103727A Pending JP2003064090A (ja) 2001-04-06 2002-04-05 トリアルキルｖａ族金属化合物

Country Status (7)

Country Link
US (1) US6660874B2 (enExample)
EP (1) EP1247813B1 (enExample)
JP (1) JP2003064090A (enExample)
KR (1) KR100852361B1 (enExample)
CN (1) CN1259326C (enExample)
DE (1) DE60215408T2 (enExample)
TW (1) TWI239334B (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006104189A (ja) * 2004-09-02 2006-04-20 Rohm & Haas Electronic Materials Llc 有機金属化合物および有機金属化合物を製造する方法
JP2015082573A (ja) * 2013-10-22 2015-04-27 住友電気工業株式会社 エピタキシャルウエハおよびその製造方法

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6787181B2 (en) * 2001-10-26 2004-09-07 Symetrix Corporation Chemical vapor deposition method of making layered superlattice materials using trimethylbismuth
US6956127B2 (en) * 2002-01-17 2005-10-18 Shipley Company, L.L.C. Alkyl group VA metal compounds
US20030171879A1 (en) * 2002-03-08 2003-09-11 Pittalwala Shabbir H. System and method to accomplish pipeline reliability
US6939983B2 (en) * 2003-05-08 2005-09-06 Rohm And Haas Electronic Materials, Llc Alkyl group VA metal compounds
TWI632151B (zh) * 2011-11-28 2018-08-11 烏明克股份有限兩合公司 第iiia族金屬的三烷基化合物之製法
WO2014093419A1 (en) 2012-12-12 2014-06-19 Dow Global Technologies Llc Production of tri-alkyl compounds of group 3a metals
CN106349293B (zh) * 2016-08-27 2018-07-06 广东先导稀材股份有限公司 高纯三乙基锑的制备方法
EP3587430B1 (de) * 2018-06-26 2022-07-13 KE Materials L.L.C. Herstellung von trialkylpnictogen
CN110950911B (zh) * 2018-09-26 2021-10-08 紫石能源有限公司 三甲基胂的制备方法
CN110483580B (zh) * 2019-09-06 2022-04-19 广东先导微电子科技有限公司 一种高纯度三烷基锑及其制备方法与应用
CN113583051B (zh) * 2021-08-03 2022-09-02 安徽亚格盛电子新材料有限公司 利用三甲基铝和三氯化锑制备高纯度三甲基锑的方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3103526A (en) * 1963-09-10 Preparation of alkyl compounds of
GB974056A (enExample) * 1961-11-16 1900-01-01
JP2561482B2 (ja) 1987-08-27 1996-12-11 住友化学工業株式会社 トリアルキル砒素化合物の製造方法
US4857655A (en) * 1988-01-20 1989-08-15 American Cyanamid Company Process for making alkyl arsine compounds
DE4214224A1 (de) * 1992-04-30 1993-11-04 Merck Patent Gmbh Verwendung von elementorganischen verbindungen zur abscheidung des elementes auf substraten
US5326425A (en) * 1993-01-28 1994-07-05 The United States Of America As Represented By The Secretary Of The Navy Preparation of tertiarybutyldimethylantimony and use thereof

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006104189A (ja) * 2004-09-02 2006-04-20 Rohm & Haas Electronic Materials Llc 有機金属化合物および有機金属化合物を製造する方法
JP2015082573A (ja) * 2013-10-22 2015-04-27 住友電気工業株式会社 エピタキシャルウエハおよびその製造方法
WO2015059988A1 (ja) * 2013-10-22 2015-04-30 住友電気工業株式会社 エピタキシャルウエハおよびその製造方法
US9773932B2 (en) 2013-10-22 2017-09-26 Sumitomo Electric Industries, Ltd. Epitaxial wafer and method for manufacturing same

Also Published As

Publication number Publication date
TWI239334B (en) 2005-09-11
CN1259326C (zh) 2006-06-14
US6660874B2 (en) 2003-12-09
EP1247813A2 (en) 2002-10-09
DE60215408T2 (de) 2007-08-30
KR100852361B1 (ko) 2008-08-14
EP1247813A3 (en) 2003-12-17
CN1400214A (zh) 2003-03-05
EP1247813B1 (en) 2006-10-18
DE60215408D1 (de) 2006-11-30
US20020188145A1 (en) 2002-12-12
KR20020077654A (ko) 2002-10-12

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