CN1259326C - 三烷基第va族金属化合物的制备方法 - Google Patents

三烷基第va族金属化合物的制备方法 Download PDF

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Publication number
CN1259326C
CN1259326C CNB021413436A CN02141343A CN1259326C CN 1259326 C CN1259326 C CN 1259326C CN B021413436 A CNB021413436 A CN B021413436A CN 02141343 A CN02141343 A CN 02141343A CN 1259326 C CN1259326 C CN 1259326C
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China
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compound
trialkyl
family
group
group iii
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Expired - Fee Related
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CNB021413436A
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English (en)
Chinese (zh)
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CN1400214A (zh
Inventor
D·V·舍奈-卡特克哈特
M·B·鲍尔
A·阿曼奇安
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SIPOREI CORP
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SIPOREI CORP
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/94Bismuth compounds
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/66Arsenic compounds
    • C07F9/70Organo-arsenic compounds
    • C07F9/72Aliphatic compounds
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/90Antimony compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K2323/00Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
CNB021413436A 2001-04-06 2002-04-05 三烷基第va族金属化合物的制备方法 Expired - Fee Related CN1259326C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US28197701P 2001-04-06 2001-04-06
US60/281,977 2001-04-06

Publications (2)

Publication Number Publication Date
CN1400214A CN1400214A (zh) 2003-03-05
CN1259326C true CN1259326C (zh) 2006-06-14

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ID=23079564

Family Applications (1)

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CNB021413436A Expired - Fee Related CN1259326C (zh) 2001-04-06 2002-04-05 三烷基第va族金属化合物的制备方法

Country Status (7)

Country Link
US (1) US6660874B2 (enExample)
EP (1) EP1247813B1 (enExample)
JP (1) JP2003064090A (enExample)
KR (1) KR100852361B1 (enExample)
CN (1) CN1259326C (enExample)
DE (1) DE60215408T2 (enExample)
TW (1) TWI239334B (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6787181B2 (en) * 2001-10-26 2004-09-07 Symetrix Corporation Chemical vapor deposition method of making layered superlattice materials using trimethylbismuth
US6956127B2 (en) * 2002-01-17 2005-10-18 Shipley Company, L.L.C. Alkyl group VA metal compounds
US20030171879A1 (en) * 2002-03-08 2003-09-11 Pittalwala Shabbir H. System and method to accomplish pipeline reliability
US6939983B2 (en) * 2003-05-08 2005-09-06 Rohm And Haas Electronic Materials, Llc Alkyl group VA metal compounds
TW200619222A (en) * 2004-09-02 2006-06-16 Rohm & Haas Elect Mat Method for making organometallic compounds
TWI632151B (zh) * 2011-11-28 2018-08-11 烏明克股份有限兩合公司 第iiia族金屬的三烷基化合物之製法
WO2014093419A1 (en) 2012-12-12 2014-06-19 Dow Global Technologies Llc Production of tri-alkyl compounds of group 3a metals
JP2015082573A (ja) * 2013-10-22 2015-04-27 住友電気工業株式会社 エピタキシャルウエハおよびその製造方法
CN106349293B (zh) * 2016-08-27 2018-07-06 广东先导稀材股份有限公司 高纯三乙基锑的制备方法
EP3587430B1 (de) * 2018-06-26 2022-07-13 KE Materials L.L.C. Herstellung von trialkylpnictogen
CN110950911B (zh) * 2018-09-26 2021-10-08 紫石能源有限公司 三甲基胂的制备方法
CN110483580B (zh) * 2019-09-06 2022-04-19 广东先导微电子科技有限公司 一种高纯度三烷基锑及其制备方法与应用
CN113583051B (zh) * 2021-08-03 2022-09-02 安徽亚格盛电子新材料有限公司 利用三甲基铝和三氯化锑制备高纯度三甲基锑的方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3103526A (en) * 1963-09-10 Preparation of alkyl compounds of
GB974056A (enExample) * 1961-11-16 1900-01-01
JP2561482B2 (ja) 1987-08-27 1996-12-11 住友化学工業株式会社 トリアルキル砒素化合物の製造方法
US4857655A (en) * 1988-01-20 1989-08-15 American Cyanamid Company Process for making alkyl arsine compounds
DE4214224A1 (de) * 1992-04-30 1993-11-04 Merck Patent Gmbh Verwendung von elementorganischen verbindungen zur abscheidung des elementes auf substraten
US5326425A (en) * 1993-01-28 1994-07-05 The United States Of America As Represented By The Secretary Of The Navy Preparation of tertiarybutyldimethylantimony and use thereof

Also Published As

Publication number Publication date
TWI239334B (en) 2005-09-11
JP2003064090A (ja) 2003-03-05
US6660874B2 (en) 2003-12-09
EP1247813A2 (en) 2002-10-09
DE60215408T2 (de) 2007-08-30
KR100852361B1 (ko) 2008-08-14
EP1247813A3 (en) 2003-12-17
CN1400214A (zh) 2003-03-05
EP1247813B1 (en) 2006-10-18
DE60215408D1 (de) 2006-11-30
US20020188145A1 (en) 2002-12-12
KR20020077654A (ko) 2002-10-12

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GR01 Patent grant
C17 Cessation of patent right
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20060614