CN1259326C - 三烷基第va族金属化合物的制备方法 - Google Patents
三烷基第va族金属化合物的制备方法 Download PDFInfo
- Publication number
- CN1259326C CN1259326C CNB021413436A CN02141343A CN1259326C CN 1259326 C CN1259326 C CN 1259326C CN B021413436 A CNB021413436 A CN B021413436A CN 02141343 A CN02141343 A CN 02141343A CN 1259326 C CN1259326 C CN 1259326C
- Authority
- CN
- China
- Prior art keywords
- compound
- trialkyl
- family
- group
- group iii
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/94—Bismuth compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/66—Arsenic compounds
- C07F9/70—Organo-arsenic compounds
- C07F9/72—Aliphatic compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/90—Antimony compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2323/00—Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US28197701P | 2001-04-06 | 2001-04-06 | |
| US60/281,977 | 2001-04-06 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1400214A CN1400214A (zh) | 2003-03-05 |
| CN1259326C true CN1259326C (zh) | 2006-06-14 |
Family
ID=23079564
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB021413436A Expired - Fee Related CN1259326C (zh) | 2001-04-06 | 2002-04-05 | 三烷基第va族金属化合物的制备方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US6660874B2 (enExample) |
| EP (1) | EP1247813B1 (enExample) |
| JP (1) | JP2003064090A (enExample) |
| KR (1) | KR100852361B1 (enExample) |
| CN (1) | CN1259326C (enExample) |
| DE (1) | DE60215408T2 (enExample) |
| TW (1) | TWI239334B (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6787181B2 (en) * | 2001-10-26 | 2004-09-07 | Symetrix Corporation | Chemical vapor deposition method of making layered superlattice materials using trimethylbismuth |
| US6956127B2 (en) * | 2002-01-17 | 2005-10-18 | Shipley Company, L.L.C. | Alkyl group VA metal compounds |
| US20030171879A1 (en) * | 2002-03-08 | 2003-09-11 | Pittalwala Shabbir H. | System and method to accomplish pipeline reliability |
| US6939983B2 (en) * | 2003-05-08 | 2005-09-06 | Rohm And Haas Electronic Materials, Llc | Alkyl group VA metal compounds |
| TW200619222A (en) * | 2004-09-02 | 2006-06-16 | Rohm & Haas Elect Mat | Method for making organometallic compounds |
| TWI632151B (zh) * | 2011-11-28 | 2018-08-11 | 烏明克股份有限兩合公司 | 第iiia族金屬的三烷基化合物之製法 |
| WO2014093419A1 (en) | 2012-12-12 | 2014-06-19 | Dow Global Technologies Llc | Production of tri-alkyl compounds of group 3a metals |
| JP2015082573A (ja) * | 2013-10-22 | 2015-04-27 | 住友電気工業株式会社 | エピタキシャルウエハおよびその製造方法 |
| CN106349293B (zh) * | 2016-08-27 | 2018-07-06 | 广东先导稀材股份有限公司 | 高纯三乙基锑的制备方法 |
| EP3587430B1 (de) * | 2018-06-26 | 2022-07-13 | KE Materials L.L.C. | Herstellung von trialkylpnictogen |
| CN110950911B (zh) * | 2018-09-26 | 2021-10-08 | 紫石能源有限公司 | 三甲基胂的制备方法 |
| CN110483580B (zh) * | 2019-09-06 | 2022-04-19 | 广东先导微电子科技有限公司 | 一种高纯度三烷基锑及其制备方法与应用 |
| CN113583051B (zh) * | 2021-08-03 | 2022-09-02 | 安徽亚格盛电子新材料有限公司 | 利用三甲基铝和三氯化锑制备高纯度三甲基锑的方法 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3103526A (en) * | 1963-09-10 | Preparation of alkyl compounds of | ||
| GB974056A (enExample) * | 1961-11-16 | 1900-01-01 | ||
| JP2561482B2 (ja) | 1987-08-27 | 1996-12-11 | 住友化学工業株式会社 | トリアルキル砒素化合物の製造方法 |
| US4857655A (en) * | 1988-01-20 | 1989-08-15 | American Cyanamid Company | Process for making alkyl arsine compounds |
| DE4214224A1 (de) * | 1992-04-30 | 1993-11-04 | Merck Patent Gmbh | Verwendung von elementorganischen verbindungen zur abscheidung des elementes auf substraten |
| US5326425A (en) * | 1993-01-28 | 1994-07-05 | The United States Of America As Represented By The Secretary Of The Navy | Preparation of tertiarybutyldimethylantimony and use thereof |
-
2002
- 2002-04-03 KR KR1020020018149A patent/KR100852361B1/ko not_active Expired - Fee Related
- 2002-04-04 TW TW091106812A patent/TWI239334B/zh not_active IP Right Cessation
- 2002-04-05 DE DE60215408T patent/DE60215408T2/de not_active Expired - Fee Related
- 2002-04-05 CN CNB021413436A patent/CN1259326C/zh not_active Expired - Fee Related
- 2002-04-05 EP EP02252450A patent/EP1247813B1/en not_active Expired - Lifetime
- 2002-04-05 JP JP2002103727A patent/JP2003064090A/ja active Pending
- 2002-04-06 US US10/118,382 patent/US6660874B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| TWI239334B (en) | 2005-09-11 |
| JP2003064090A (ja) | 2003-03-05 |
| US6660874B2 (en) | 2003-12-09 |
| EP1247813A2 (en) | 2002-10-09 |
| DE60215408T2 (de) | 2007-08-30 |
| KR100852361B1 (ko) | 2008-08-14 |
| EP1247813A3 (en) | 2003-12-17 |
| CN1400214A (zh) | 2003-03-05 |
| EP1247813B1 (en) | 2006-10-18 |
| DE60215408D1 (de) | 2006-11-30 |
| US20020188145A1 (en) | 2002-12-12 |
| KR20020077654A (ko) | 2002-10-12 |
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| CN1259326C (zh) | 三烷基第va族金属化合物的制备方法 | |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20060614 |