JP2002535703A - 気体の光透過率を最適化するための化学的フィルタリング - Google Patents

気体の光透過率を最適化するための化学的フィルタリング

Info

Publication number
JP2002535703A
JP2002535703A JP2000593991A JP2000593991A JP2002535703A JP 2002535703 A JP2002535703 A JP 2002535703A JP 2000593991 A JP2000593991 A JP 2000593991A JP 2000593991 A JP2000593991 A JP 2000593991A JP 2002535703 A JP2002535703 A JP 2002535703A
Authority
JP
Japan
Prior art keywords
medium
gas
polar hydrocarbon
selecting
carbon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000593991A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002535703A5 (enExample
Inventor
アンドリュー， ジェイ． ダラス，
Original Assignee
ドナルドソン カンパニー，インコーポレイティド
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ドナルドソン カンパニー，インコーポレイティド filed Critical ドナルドソン カンパニー，インコーポレイティド
Publication of JP2002535703A publication Critical patent/JP2002535703A/ja
Publication of JP2002535703A5 publication Critical patent/JP2002535703A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/909—Controlled atmosphere

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Epidemiology (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Public Health (AREA)
  • Optics & Photonics (AREA)
  • Filtering Materials (AREA)
  • Filtering Of Dispersed Particles In Gases (AREA)
  • Optical Filters (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Carbon And Carbon Compounds (AREA)
JP2000593991A 1999-01-15 2000-01-05 気体の光透過率を最適化するための化学的フィルタリング Pending JP2002535703A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/231,737 US6313953B1 (en) 1999-01-15 1999-01-15 Gas chemical filtering for optimal light transmittance; and methods
US09/231,737 1999-01-15
PCT/US2000/000214 WO2000042475A1 (en) 1999-01-15 2000-01-05 Chemical filtering for optimising the light transmittance of a gas

Publications (2)

Publication Number Publication Date
JP2002535703A true JP2002535703A (ja) 2002-10-22
JP2002535703A5 JP2002535703A5 (enExample) 2007-02-22

Family

ID=22870471

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000593991A Pending JP2002535703A (ja) 1999-01-15 2000-01-05 気体の光透過率を最適化するための化学的フィルタリング

Country Status (9)

Country Link
US (1) US6313953B1 (enExample)
EP (1) EP1153336B1 (enExample)
JP (1) JP2002535703A (enExample)
KR (1) KR100649386B1 (enExample)
CN (1) CN1337014A (enExample)
AT (1) ATE337573T1 (enExample)
AU (1) AU2406100A (enExample)
DE (1) DE60030254T2 (enExample)
WO (1) WO2000042475A1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001006548A1 (en) 1999-07-16 2001-01-25 Nikon Corporation Exposure method and system
JP2001118783A (ja) * 1999-10-21 2001-04-27 Nikon Corp 露光方法及び装置、並びにデバイス製造方法
KR100742282B1 (ko) 2006-02-06 2007-07-24 삼성전자주식회사 케미컬 필터
WO2009058598A2 (en) * 2007-11-01 2009-05-07 Shawndra Products, Incorporated Hydrogen sulfide filter
US20090230052A1 (en) * 2008-03-11 2009-09-17 Shawndra Products, Inc. Hydrogen sulfide filter

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0620906A (ja) * 1992-03-25 1994-01-28 Matsushita Electric Ind Co Ltd 環境制御装置および環境制御方法
JPH0677114A (ja) * 1992-07-01 1994-03-18 Nikon Corp 露光装置
JPH06208947A (ja) * 1993-01-08 1994-07-26 Toshiba Corp レジスト処理方法及びレジスト処理装置
JPH08306599A (ja) * 1995-04-27 1996-11-22 Nikon Corp 空気浄化装置及び露光装置
JPH09266147A (ja) * 1996-03-28 1997-10-07 Nikon Corp 空調装置及びそれを備えた露光装置
JPH09275054A (ja) * 1996-04-03 1997-10-21 Nikon Corp 半導体製造装置
JPH09275055A (ja) * 1996-04-03 1997-10-21 Nikon Corp 露光装置
JPH09283401A (ja) * 1996-04-09 1997-10-31 Nikon Corp 露光装置
JPH11111593A (ja) * 1997-10-01 1999-04-23 Canon Inc 環境制御装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3413059A (en) * 1964-03-23 1968-11-26 Bell Telephone Labor Inc Gas lenses for ultrahigh frequency wave energy provided by opposing flows of gases
IT1237944B (it) * 1990-01-05 1993-06-19 Getters Spa Metodo per determinare la fine della vita utile di un purificatore di gas inerte e relativa apparecchiatura
US5166530A (en) 1991-12-20 1992-11-24 General Signal Corporation Illuminator for microlithographic integrated circuit manufacture
FR2696947B1 (fr) * 1992-10-20 1994-11-25 Ceramiques Tech Soc D Module de filtration, de séparation, de purification de gaz ou de liquide, ou de transformation catalytique.
US5696623A (en) 1993-08-05 1997-12-09 Fujitsu Limited UV exposure with elongated service lifetime
JP3448670B2 (ja) 1993-09-02 2003-09-22 株式会社ニコン 露光装置及び素子製造方法
BE1007851A3 (nl) 1993-12-03 1995-11-07 Asml Lithography B V Belichtingseenheid met een voorziening tegen vervuiling van optische componenten en een fotolithografisch apparaat voorzien van een dergelijke belichtingseenheid.
DE69535412D1 (de) * 1994-04-08 2007-04-12 Canon Kk Verarbeitungssystem zur Herstellung von Halbleiterbauelementen
US5456740A (en) * 1994-06-22 1995-10-10 Millipore Corporation High-efficiency metal membrane getter element and process for making
US5902551A (en) * 1995-01-13 1999-05-11 Semi-Gas Systems, Inc. Process gas docking station with point-of-use filter for receiving removable purifier cartridges
US5810031A (en) * 1996-02-21 1998-09-22 Aeroquip Corporation Ultra high purity gas distribution component with integral valved coupling and methods for its use
US5853962A (en) * 1996-10-04 1998-12-29 Eco-Snow Systems, Inc. Photoresist and redeposition removal using carbon dioxide jet spray

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0620906A (ja) * 1992-03-25 1994-01-28 Matsushita Electric Ind Co Ltd 環境制御装置および環境制御方法
JPH0677114A (ja) * 1992-07-01 1994-03-18 Nikon Corp 露光装置
JPH06208947A (ja) * 1993-01-08 1994-07-26 Toshiba Corp レジスト処理方法及びレジスト処理装置
JPH08306599A (ja) * 1995-04-27 1996-11-22 Nikon Corp 空気浄化装置及び露光装置
JPH09266147A (ja) * 1996-03-28 1997-10-07 Nikon Corp 空調装置及びそれを備えた露光装置
JPH09275054A (ja) * 1996-04-03 1997-10-21 Nikon Corp 半導体製造装置
JPH09275055A (ja) * 1996-04-03 1997-10-21 Nikon Corp 露光装置
JPH09283401A (ja) * 1996-04-09 1997-10-31 Nikon Corp 露光装置
JPH11111593A (ja) * 1997-10-01 1999-04-23 Canon Inc 環境制御装置

Also Published As

Publication number Publication date
DE60030254D1 (de) 2006-10-05
ATE337573T1 (de) 2006-09-15
US6313953B1 (en) 2001-11-06
DE60030254T2 (de) 2007-08-30
AU2406100A (en) 2000-08-01
KR20010089824A (ko) 2001-10-08
EP1153336A1 (en) 2001-11-14
KR100649386B1 (ko) 2006-11-24
CN1337014A (zh) 2002-02-20
EP1153336B1 (en) 2006-08-23
WO2000042475A1 (en) 2000-07-20

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