DE60030254T2 - Chemische Filterung zur Optimierung der Lichtdurchlässigkeit eines Gases - Google Patents
Chemische Filterung zur Optimierung der Lichtdurchlässigkeit eines Gases Download PDFInfo
- Publication number
- DE60030254T2 DE60030254T2 DE60030254T DE60030254T DE60030254T2 DE 60030254 T2 DE60030254 T2 DE 60030254T2 DE 60030254 T DE60030254 T DE 60030254T DE 60030254 T DE60030254 T DE 60030254T DE 60030254 T2 DE60030254 T2 DE 60030254T2
- Authority
- DE
- Germany
- Prior art keywords
- gas
- medium
- filter
- light
- polar hydrocarbons
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000005540 biological transmission Effects 0.000 title claims abstract description 30
- 238000001914 filtration Methods 0.000 title description 6
- 239000000126 substance Substances 0.000 title description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 42
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 27
- 238000000034 method Methods 0.000 claims abstract description 26
- 239000000203 mixture Substances 0.000 claims abstract description 7
- 150000002430 hydrocarbons Chemical class 0.000 claims description 39
- 229930195733 hydrocarbon Natural products 0.000 claims description 38
- 238000010276 construction Methods 0.000 claims description 28
- 239000000356 contaminant Substances 0.000 claims description 16
- 239000004215 Carbon black (E152) Substances 0.000 claims description 13
- 239000012535 impurity Substances 0.000 claims description 12
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 238000004891 communication Methods 0.000 claims description 4
- 238000007599 discharging Methods 0.000 claims description 2
- 238000002594 fluoroscopy Methods 0.000 claims 1
- 239000000463 material Substances 0.000 abstract description 19
- 238000003384 imaging method Methods 0.000 abstract description 5
- 238000002834 transmittance Methods 0.000 abstract 4
- 230000008685 targeting Effects 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 82
- 239000002245 particle Substances 0.000 description 16
- 239000003570 air Substances 0.000 description 13
- 239000000758 substrate Substances 0.000 description 12
- 230000003287 optical effect Effects 0.000 description 11
- 238000007639 printing Methods 0.000 description 11
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- 239000011148 porous material Substances 0.000 description 10
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 239000011324 bead Substances 0.000 description 9
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 9
- 239000004065 semiconductor Substances 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- 239000003575 carbonaceous material Substances 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 238000011144 upstream manufacturing Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 230000032683 aging Effects 0.000 description 4
- -1 ammonium ions Chemical class 0.000 description 4
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 230000018109 developmental process Effects 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- ORQBXQOJMQIAOY-UHFFFAOYSA-N nobelium Chemical compound [No] ORQBXQOJMQIAOY-UHFFFAOYSA-N 0.000 description 3
- 238000010943 off-gassing Methods 0.000 description 3
- 238000001179 sorption measurement Methods 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 2
- 239000002250 absorbent Substances 0.000 description 2
- 230000002745 absorbent Effects 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- SNRUBQQJIBEYMU-UHFFFAOYSA-N dodecane Chemical compound CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 210000003746 feather Anatomy 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 2
- 238000006552 photochemical reaction Methods 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- OQMIRQSWHKCKNJ-UHFFFAOYSA-N 1,1-difluoroethene;1,1,2,3,3,3-hexafluoroprop-1-ene Chemical group FC(F)=C.FC(F)=C(F)C(F)(F)F OQMIRQSWHKCKNJ-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- 244000060011 Cocos nucifera Species 0.000 description 1
- 235000013162 Cocos nucifera Nutrition 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 229920002449 FKM Polymers 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229920002821 Modacrylic Polymers 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 235000006040 Prunus persica var persica Nutrition 0.000 description 1
- 240000006413 Prunus persica var. persica Species 0.000 description 1
- 229920000297 Rayon Polymers 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000012080 ambient air Substances 0.000 description 1
- 150000001722 carbon compounds Chemical class 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000003245 coal Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 229940113088 dimethylacetamide Drugs 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 230000003760 hair shine Effects 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 150000002829 nitrogen Chemical class 0.000 description 1
- 239000003415 peat Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920003053 polystyrene-divinylbenzene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000002964 rayon Substances 0.000 description 1
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 1
- GCLGEJMYGQKIIW-UHFFFAOYSA-H sodium hexametaphosphate Chemical compound [Na]OP1(=O)OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])O1 GCLGEJMYGQKIIW-UHFFFAOYSA-H 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- 229920003051 synthetic elastomer Polymers 0.000 description 1
- 239000005061 synthetic rubber Substances 0.000 description 1
- 229920003249 vinylidene fluoride hexafluoropropylene elastomer Polymers 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/909—Controlled atmosphere
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Epidemiology (AREA)
- Atmospheric Sciences (AREA)
- Toxicology (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Public Health (AREA)
- Optics & Photonics (AREA)
- Filtering Materials (AREA)
- Filtering Of Dispersed Particles In Gases (AREA)
- Optical Filters (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Carbon And Carbon Compounds (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US231737 | 1999-01-15 | ||
| US09/231,737 US6313953B1 (en) | 1999-01-15 | 1999-01-15 | Gas chemical filtering for optimal light transmittance; and methods |
| PCT/US2000/000214 WO2000042475A1 (en) | 1999-01-15 | 2000-01-05 | Chemical filtering for optimising the light transmittance of a gas |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE60030254D1 DE60030254D1 (de) | 2006-10-05 |
| DE60030254T2 true DE60030254T2 (de) | 2007-08-30 |
Family
ID=22870471
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE60030254T Expired - Lifetime DE60030254T2 (de) | 1999-01-15 | 2000-01-05 | Chemische Filterung zur Optimierung der Lichtdurchlässigkeit eines Gases |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US6313953B1 (enExample) |
| EP (1) | EP1153336B1 (enExample) |
| JP (1) | JP2002535703A (enExample) |
| KR (1) | KR100649386B1 (enExample) |
| CN (1) | CN1337014A (enExample) |
| AT (1) | ATE337573T1 (enExample) |
| AU (1) | AU2406100A (enExample) |
| DE (1) | DE60030254T2 (enExample) |
| WO (1) | WO2000042475A1 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2001006548A1 (en) | 1999-07-16 | 2001-01-25 | Nikon Corporation | Exposure method and system |
| JP2001118783A (ja) * | 1999-10-21 | 2001-04-27 | Nikon Corp | 露光方法及び装置、並びにデバイス製造方法 |
| KR100742282B1 (ko) | 2006-02-06 | 2007-07-24 | 삼성전자주식회사 | 케미컬 필터 |
| WO2009058598A2 (en) * | 2007-11-01 | 2009-05-07 | Shawndra Products, Incorporated | Hydrogen sulfide filter |
| US20090230052A1 (en) * | 2008-03-11 | 2009-09-17 | Shawndra Products, Inc. | Hydrogen sulfide filter |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3413059A (en) * | 1964-03-23 | 1968-11-26 | Bell Telephone Labor Inc | Gas lenses for ultrahigh frequency wave energy provided by opposing flows of gases |
| IT1237944B (it) * | 1990-01-05 | 1993-06-19 | Getters Spa | Metodo per determinare la fine della vita utile di un purificatore di gas inerte e relativa apparecchiatura |
| US5166530A (en) | 1991-12-20 | 1992-11-24 | General Signal Corporation | Illuminator for microlithographic integrated circuit manufacture |
| JP2809038B2 (ja) * | 1992-03-25 | 1998-10-08 | 松下電器産業株式会社 | 環境制御装置および環境制御方法 |
| JP3265666B2 (ja) * | 1992-07-01 | 2002-03-11 | 株式会社ニコン | 露光装置 |
| FR2696947B1 (fr) * | 1992-10-20 | 1994-11-25 | Ceramiques Tech Soc D | Module de filtration, de séparation, de purification de gaz ou de liquide, ou de transformation catalytique. |
| JP3152779B2 (ja) * | 1993-01-08 | 2001-04-03 | 株式会社東芝 | レジスト処理方法及びレジスト処理装置 |
| US5696623A (en) | 1993-08-05 | 1997-12-09 | Fujitsu Limited | UV exposure with elongated service lifetime |
| JP3448670B2 (ja) | 1993-09-02 | 2003-09-22 | 株式会社ニコン | 露光装置及び素子製造方法 |
| BE1007851A3 (nl) | 1993-12-03 | 1995-11-07 | Asml Lithography B V | Belichtingseenheid met een voorziening tegen vervuiling van optische componenten en een fotolithografisch apparaat voorzien van een dergelijke belichtingseenheid. |
| DE69535412D1 (de) * | 1994-04-08 | 2007-04-12 | Canon Kk | Verarbeitungssystem zur Herstellung von Halbleiterbauelementen |
| US5456740A (en) * | 1994-06-22 | 1995-10-10 | Millipore Corporation | High-efficiency metal membrane getter element and process for making |
| JPH08306599A (ja) * | 1995-04-27 | 1996-11-22 | Nikon Corp | 空気浄化装置及び露光装置 |
| US5902551A (en) * | 1995-01-13 | 1999-05-11 | Semi-Gas Systems, Inc. | Process gas docking station with point-of-use filter for receiving removable purifier cartridges |
| US5810031A (en) * | 1996-02-21 | 1998-09-22 | Aeroquip Corporation | Ultra high purity gas distribution component with integral valved coupling and methods for its use |
| JP3658852B2 (ja) * | 1996-04-03 | 2005-06-08 | 株式会社ニコン | 露光装置 |
| JPH09283401A (ja) * | 1996-04-09 | 1997-10-31 | Nikon Corp | 露光装置 |
| JP3633086B2 (ja) * | 1996-03-28 | 2005-03-30 | 株式会社ニコン | 空調装置及びそれを備えた露光装置 |
| JPH09275054A (ja) * | 1996-04-03 | 1997-10-21 | Nikon Corp | 半導体製造装置 |
| US5853962A (en) * | 1996-10-04 | 1998-12-29 | Eco-Snow Systems, Inc. | Photoresist and redeposition removal using carbon dioxide jet spray |
| JPH11111593A (ja) * | 1997-10-01 | 1999-04-23 | Canon Inc | 環境制御装置 |
-
1999
- 1999-01-15 US US09/231,737 patent/US6313953B1/en not_active Expired - Lifetime
-
2000
- 2000-01-05 AT AT00902325T patent/ATE337573T1/de not_active IP Right Cessation
- 2000-01-05 AU AU24061/00A patent/AU2406100A/en not_active Abandoned
- 2000-01-05 EP EP00902325A patent/EP1153336B1/en not_active Expired - Lifetime
- 2000-01-05 KR KR1020017008836A patent/KR100649386B1/ko not_active Expired - Fee Related
- 2000-01-05 DE DE60030254T patent/DE60030254T2/de not_active Expired - Lifetime
- 2000-01-05 CN CN00802807A patent/CN1337014A/zh active Pending
- 2000-01-05 JP JP2000593991A patent/JP2002535703A/ja active Pending
- 2000-01-05 WO PCT/US2000/000214 patent/WO2000042475A1/en not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| DE60030254D1 (de) | 2006-10-05 |
| ATE337573T1 (de) | 2006-09-15 |
| US6313953B1 (en) | 2001-11-06 |
| AU2406100A (en) | 2000-08-01 |
| KR20010089824A (ko) | 2001-10-08 |
| JP2002535703A (ja) | 2002-10-22 |
| EP1153336A1 (en) | 2001-11-14 |
| KR100649386B1 (ko) | 2006-11-24 |
| CN1337014A (zh) | 2002-02-20 |
| EP1153336B1 (en) | 2006-08-23 |
| WO2000042475A1 (en) | 2000-07-20 |
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