AU2406100A - Chemical filtering for optimising the light transmittance of a gas - Google Patents

Chemical filtering for optimising the light transmittance of a gas

Info

Publication number
AU2406100A
AU2406100A AU24061/00A AU2406100A AU2406100A AU 2406100 A AU2406100 A AU 2406100A AU 24061/00 A AU24061/00 A AU 24061/00A AU 2406100 A AU2406100 A AU 2406100A AU 2406100 A AU2406100 A AU 2406100A
Authority
AU
Australia
Prior art keywords
light transmittance
gas
wavelengths
specific
transmittance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU24061/00A
Other languages
English (en)
Inventor
Andrew J. Dallas
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Donaldson Co Inc
Original Assignee
Donaldson Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Donaldson Co Inc filed Critical Donaldson Co Inc
Publication of AU2406100A publication Critical patent/AU2406100A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/909—Controlled atmosphere

Landscapes

  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Toxicology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Optics & Photonics (AREA)
  • Filtering Materials (AREA)
  • Filtering Of Dispersed Particles In Gases (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Optical Filters (AREA)
  • Carbon And Carbon Compounds (AREA)
AU24061/00A 1999-01-15 2000-01-05 Chemical filtering for optimising the light transmittance of a gas Abandoned AU2406100A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/231,737 US6313953B1 (en) 1999-01-15 1999-01-15 Gas chemical filtering for optimal light transmittance; and methods
US09231737 1999-01-15
PCT/US2000/000214 WO2000042475A1 (en) 1999-01-15 2000-01-05 Chemical filtering for optimising the light transmittance of a gas

Publications (1)

Publication Number Publication Date
AU2406100A true AU2406100A (en) 2000-08-01

Family

ID=22870471

Family Applications (1)

Application Number Title Priority Date Filing Date
AU24061/00A Abandoned AU2406100A (en) 1999-01-15 2000-01-05 Chemical filtering for optimising the light transmittance of a gas

Country Status (9)

Country Link
US (1) US6313953B1 (enExample)
EP (1) EP1153336B1 (enExample)
JP (1) JP2002535703A (enExample)
KR (1) KR100649386B1 (enExample)
CN (1) CN1337014A (enExample)
AT (1) ATE337573T1 (enExample)
AU (1) AU2406100A (enExample)
DE (1) DE60030254T2 (enExample)
WO (1) WO2000042475A1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1229573A4 (en) 1999-07-16 2006-11-08 Nikon Corp EXPOSURE METHOD AND SYSTEM
JP2001118783A (ja) * 1999-10-21 2001-04-27 Nikon Corp 露光方法及び装置、並びにデバイス製造方法
KR100742282B1 (ko) 2006-02-06 2007-07-24 삼성전자주식회사 케미컬 필터
US20090230052A1 (en) * 2008-03-11 2009-09-17 Shawndra Products, Inc. Hydrogen sulfide filter
WO2009058598A2 (en) * 2007-11-01 2009-05-07 Shawndra Products, Incorporated Hydrogen sulfide filter

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3413059A (en) * 1964-03-23 1968-11-26 Bell Telephone Labor Inc Gas lenses for ultrahigh frequency wave energy provided by opposing flows of gases
IT1237944B (it) * 1990-01-05 1993-06-19 Getters Spa Metodo per determinare la fine della vita utile di un purificatore di gas inerte e relativa apparecchiatura
US5166530A (en) 1991-12-20 1992-11-24 General Signal Corporation Illuminator for microlithographic integrated circuit manufacture
JP2809038B2 (ja) * 1992-03-25 1998-10-08 松下電器産業株式会社 環境制御装置および環境制御方法
JP3265666B2 (ja) * 1992-07-01 2002-03-11 株式会社ニコン 露光装置
FR2696947B1 (fr) * 1992-10-20 1994-11-25 Ceramiques Tech Soc D Module de filtration, de séparation, de purification de gaz ou de liquide, ou de transformation catalytique.
JP3152779B2 (ja) * 1993-01-08 2001-04-03 株式会社東芝 レジスト処理方法及びレジスト処理装置
US5696623A (en) 1993-08-05 1997-12-09 Fujitsu Limited UV exposure with elongated service lifetime
JP3448670B2 (ja) * 1993-09-02 2003-09-22 株式会社ニコン 露光装置及び素子製造方法
BE1007851A3 (nl) 1993-12-03 1995-11-07 Asml Lithography B V Belichtingseenheid met een voorziening tegen vervuiling van optische componenten en een fotolithografisch apparaat voorzien van een dergelijke belichtingseenheid.
EP1026549B1 (en) * 1994-04-08 2007-02-28 Canon Kabushiki Kaisha Processing system adapted for semiconductor device manufacture
US5456740A (en) * 1994-06-22 1995-10-10 Millipore Corporation High-efficiency metal membrane getter element and process for making
JPH08306599A (ja) * 1995-04-27 1996-11-22 Nikon Corp 空気浄化装置及び露光装置
US5902551A (en) * 1995-01-13 1999-05-11 Semi-Gas Systems, Inc. Process gas docking station with point-of-use filter for receiving removable purifier cartridges
US5810031A (en) * 1996-02-21 1998-09-22 Aeroquip Corporation Ultra high purity gas distribution component with integral valved coupling and methods for its use
JPH09283401A (ja) * 1996-04-09 1997-10-31 Nikon Corp 露光装置
JP3658852B2 (ja) * 1996-04-03 2005-06-08 株式会社ニコン 露光装置
JP3633086B2 (ja) * 1996-03-28 2005-03-30 株式会社ニコン 空調装置及びそれを備えた露光装置
JPH09275054A (ja) * 1996-04-03 1997-10-21 Nikon Corp 半導体製造装置
US5853962A (en) * 1996-10-04 1998-12-29 Eco-Snow Systems, Inc. Photoresist and redeposition removal using carbon dioxide jet spray
JPH11111593A (ja) * 1997-10-01 1999-04-23 Canon Inc 環境制御装置

Also Published As

Publication number Publication date
WO2000042475A1 (en) 2000-07-20
EP1153336B1 (en) 2006-08-23
DE60030254T2 (de) 2007-08-30
KR100649386B1 (ko) 2006-11-24
ATE337573T1 (de) 2006-09-15
DE60030254D1 (de) 2006-10-05
CN1337014A (zh) 2002-02-20
US6313953B1 (en) 2001-11-06
KR20010089824A (ko) 2001-10-08
JP2002535703A (ja) 2002-10-22
EP1153336A1 (en) 2001-11-14

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase