KR100649386B1 - 가스 광 투과율을 최적화하기 위한 화학적 필터링 - Google Patents

가스 광 투과율을 최적화하기 위한 화학적 필터링 Download PDF

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Publication number
KR100649386B1
KR100649386B1 KR1020017008836A KR20017008836A KR100649386B1 KR 100649386 B1 KR100649386 B1 KR 100649386B1 KR 1020017008836 A KR1020017008836 A KR 1020017008836A KR 20017008836 A KR20017008836 A KR 20017008836A KR 100649386 B1 KR100649386 B1 KR 100649386B1
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South Korea
Prior art keywords
gas
medium
delete delete
light
carbon
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KR1020017008836A
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English (en)
Korean (ko)
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KR20010089824A (ko
Inventor
앤드류제이. 달라스
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도날드슨 캄파니 인코포레이티드
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/909—Controlled atmosphere

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Epidemiology (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Public Health (AREA)
  • Optics & Photonics (AREA)
  • Filtering Materials (AREA)
  • Filtering Of Dispersed Particles In Gases (AREA)
  • Optical Filters (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Carbon And Carbon Compounds (AREA)
KR1020017008836A 1999-01-15 2000-01-05 가스 광 투과율을 최적화하기 위한 화학적 필터링 Expired - Fee Related KR100649386B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/231,737 US6313953B1 (en) 1999-01-15 1999-01-15 Gas chemical filtering for optimal light transmittance; and methods
US09/231,737 1999-01-15

Publications (2)

Publication Number Publication Date
KR20010089824A KR20010089824A (ko) 2001-10-08
KR100649386B1 true KR100649386B1 (ko) 2006-11-24

Family

ID=22870471

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020017008836A Expired - Fee Related KR100649386B1 (ko) 1999-01-15 2000-01-05 가스 광 투과율을 최적화하기 위한 화학적 필터링

Country Status (9)

Country Link
US (1) US6313953B1 (enExample)
EP (1) EP1153336B1 (enExample)
JP (1) JP2002535703A (enExample)
KR (1) KR100649386B1 (enExample)
CN (1) CN1337014A (enExample)
AT (1) ATE337573T1 (enExample)
AU (1) AU2406100A (enExample)
DE (1) DE60030254T2 (enExample)
WO (1) WO2000042475A1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001006548A1 (en) 1999-07-16 2001-01-25 Nikon Corporation Exposure method and system
JP2001118783A (ja) * 1999-10-21 2001-04-27 Nikon Corp 露光方法及び装置、並びにデバイス製造方法
KR100742282B1 (ko) 2006-02-06 2007-07-24 삼성전자주식회사 케미컬 필터
WO2009058598A2 (en) * 2007-11-01 2009-05-07 Shawndra Products, Incorporated Hydrogen sulfide filter
US20090230052A1 (en) * 2008-03-11 2009-09-17 Shawndra Products, Inc. Hydrogen sulfide filter

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5166530A (en) * 1991-12-20 1992-11-24 General Signal Corporation Illuminator for microlithographic integrated circuit manufacture
US5696623A (en) * 1993-08-05 1997-12-09 Fujitsu Limited UV exposure with elongated service lifetime

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3413059A (en) * 1964-03-23 1968-11-26 Bell Telephone Labor Inc Gas lenses for ultrahigh frequency wave energy provided by opposing flows of gases
IT1237944B (it) * 1990-01-05 1993-06-19 Getters Spa Metodo per determinare la fine della vita utile di un purificatore di gas inerte e relativa apparecchiatura
JP2809038B2 (ja) * 1992-03-25 1998-10-08 松下電器産業株式会社 環境制御装置および環境制御方法
JP3265666B2 (ja) * 1992-07-01 2002-03-11 株式会社ニコン 露光装置
FR2696947B1 (fr) * 1992-10-20 1994-11-25 Ceramiques Tech Soc D Module de filtration, de séparation, de purification de gaz ou de liquide, ou de transformation catalytique.
JP3152779B2 (ja) * 1993-01-08 2001-04-03 株式会社東芝 レジスト処理方法及びレジスト処理装置
JP3448670B2 (ja) 1993-09-02 2003-09-22 株式会社ニコン 露光装置及び素子製造方法
BE1007851A3 (nl) 1993-12-03 1995-11-07 Asml Lithography B V Belichtingseenheid met een voorziening tegen vervuiling van optische componenten en een fotolithografisch apparaat voorzien van een dergelijke belichtingseenheid.
DE69535412D1 (de) * 1994-04-08 2007-04-12 Canon Kk Verarbeitungssystem zur Herstellung von Halbleiterbauelementen
US5456740A (en) * 1994-06-22 1995-10-10 Millipore Corporation High-efficiency metal membrane getter element and process for making
JPH08306599A (ja) * 1995-04-27 1996-11-22 Nikon Corp 空気浄化装置及び露光装置
US5902551A (en) * 1995-01-13 1999-05-11 Semi-Gas Systems, Inc. Process gas docking station with point-of-use filter for receiving removable purifier cartridges
US5810031A (en) * 1996-02-21 1998-09-22 Aeroquip Corporation Ultra high purity gas distribution component with integral valved coupling and methods for its use
JP3658852B2 (ja) * 1996-04-03 2005-06-08 株式会社ニコン 露光装置
JPH09283401A (ja) * 1996-04-09 1997-10-31 Nikon Corp 露光装置
JP3633086B2 (ja) * 1996-03-28 2005-03-30 株式会社ニコン 空調装置及びそれを備えた露光装置
JPH09275054A (ja) * 1996-04-03 1997-10-21 Nikon Corp 半導体製造装置
US5853962A (en) * 1996-10-04 1998-12-29 Eco-Snow Systems, Inc. Photoresist and redeposition removal using carbon dioxide jet spray
JPH11111593A (ja) * 1997-10-01 1999-04-23 Canon Inc 環境制御装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5166530A (en) * 1991-12-20 1992-11-24 General Signal Corporation Illuminator for microlithographic integrated circuit manufacture
US5696623A (en) * 1993-08-05 1997-12-09 Fujitsu Limited UV exposure with elongated service lifetime

Also Published As

Publication number Publication date
DE60030254D1 (de) 2006-10-05
ATE337573T1 (de) 2006-09-15
US6313953B1 (en) 2001-11-06
DE60030254T2 (de) 2007-08-30
AU2406100A (en) 2000-08-01
KR20010089824A (ko) 2001-10-08
JP2002535703A (ja) 2002-10-22
EP1153336A1 (en) 2001-11-14
CN1337014A (zh) 2002-02-20
EP1153336B1 (en) 2006-08-23
WO2000042475A1 (en) 2000-07-20

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