JP2002535703A5 - - Google Patents
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- Publication number
- JP2002535703A5 JP2002535703A5 JP2000593991A JP2000593991A JP2002535703A5 JP 2002535703 A5 JP2002535703 A5 JP 2002535703A5 JP 2000593991 A JP2000593991 A JP 2000593991A JP 2000593991 A JP2000593991 A JP 2000593991A JP 2002535703 A5 JP2002535703 A5 JP 2002535703A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/231,737 US6313953B1 (en) | 1999-01-15 | 1999-01-15 | Gas chemical filtering for optimal light transmittance; and methods |
| US09/231,737 | 1999-01-15 | ||
| PCT/US2000/000214 WO2000042475A1 (en) | 1999-01-15 | 2000-01-05 | Chemical filtering for optimising the light transmittance of a gas |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002535703A JP2002535703A (ja) | 2002-10-22 |
| JP2002535703A5 true JP2002535703A5 (enExample) | 2007-02-22 |
Family
ID=22870471
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000593991A Pending JP2002535703A (ja) | 1999-01-15 | 2000-01-05 | 気体の光透過率を最適化するための化学的フィルタリング |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US6313953B1 (enExample) |
| EP (1) | EP1153336B1 (enExample) |
| JP (1) | JP2002535703A (enExample) |
| KR (1) | KR100649386B1 (enExample) |
| CN (1) | CN1337014A (enExample) |
| AT (1) | ATE337573T1 (enExample) |
| AU (1) | AU2406100A (enExample) |
| DE (1) | DE60030254T2 (enExample) |
| WO (1) | WO2000042475A1 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1229573A4 (en) | 1999-07-16 | 2006-11-08 | Nikon Corp | EXPOSURE METHOD AND SYSTEM |
| JP2001118783A (ja) * | 1999-10-21 | 2001-04-27 | Nikon Corp | 露光方法及び装置、並びにデバイス製造方法 |
| KR100742282B1 (ko) | 2006-02-06 | 2007-07-24 | 삼성전자주식회사 | 케미컬 필터 |
| US20090230052A1 (en) * | 2008-03-11 | 2009-09-17 | Shawndra Products, Inc. | Hydrogen sulfide filter |
| WO2009058598A2 (en) * | 2007-11-01 | 2009-05-07 | Shawndra Products, Incorporated | Hydrogen sulfide filter |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3413059A (en) * | 1964-03-23 | 1968-11-26 | Bell Telephone Labor Inc | Gas lenses for ultrahigh frequency wave energy provided by opposing flows of gases |
| IT1237944B (it) * | 1990-01-05 | 1993-06-19 | Getters Spa | Metodo per determinare la fine della vita utile di un purificatore di gas inerte e relativa apparecchiatura |
| US5166530A (en) | 1991-12-20 | 1992-11-24 | General Signal Corporation | Illuminator for microlithographic integrated circuit manufacture |
| JP2809038B2 (ja) * | 1992-03-25 | 1998-10-08 | 松下電器産業株式会社 | 環境制御装置および環境制御方法 |
| JP3265666B2 (ja) * | 1992-07-01 | 2002-03-11 | 株式会社ニコン | 露光装置 |
| FR2696947B1 (fr) * | 1992-10-20 | 1994-11-25 | Ceramiques Tech Soc D | Module de filtration, de séparation, de purification de gaz ou de liquide, ou de transformation catalytique. |
| JP3152779B2 (ja) * | 1993-01-08 | 2001-04-03 | 株式会社東芝 | レジスト処理方法及びレジスト処理装置 |
| US5696623A (en) | 1993-08-05 | 1997-12-09 | Fujitsu Limited | UV exposure with elongated service lifetime |
| JP3448670B2 (ja) * | 1993-09-02 | 2003-09-22 | 株式会社ニコン | 露光装置及び素子製造方法 |
| BE1007851A3 (nl) | 1993-12-03 | 1995-11-07 | Asml Lithography B V | Belichtingseenheid met een voorziening tegen vervuiling van optische componenten en een fotolithografisch apparaat voorzien van een dergelijke belichtingseenheid. |
| DE69535412D1 (de) * | 1994-04-08 | 2007-04-12 | Canon Kk | Verarbeitungssystem zur Herstellung von Halbleiterbauelementen |
| US5456740A (en) * | 1994-06-22 | 1995-10-10 | Millipore Corporation | High-efficiency metal membrane getter element and process for making |
| JPH08306599A (ja) * | 1995-04-27 | 1996-11-22 | Nikon Corp | 空気浄化装置及び露光装置 |
| US5902551A (en) * | 1995-01-13 | 1999-05-11 | Semi-Gas Systems, Inc. | Process gas docking station with point-of-use filter for receiving removable purifier cartridges |
| US5810031A (en) * | 1996-02-21 | 1998-09-22 | Aeroquip Corporation | Ultra high purity gas distribution component with integral valved coupling and methods for its use |
| JP3633086B2 (ja) * | 1996-03-28 | 2005-03-30 | 株式会社ニコン | 空調装置及びそれを備えた露光装置 |
| JPH09283401A (ja) * | 1996-04-09 | 1997-10-31 | Nikon Corp | 露光装置 |
| JP3658852B2 (ja) * | 1996-04-03 | 2005-06-08 | 株式会社ニコン | 露光装置 |
| JPH09275054A (ja) * | 1996-04-03 | 1997-10-21 | Nikon Corp | 半導体製造装置 |
| US5853962A (en) * | 1996-10-04 | 1998-12-29 | Eco-Snow Systems, Inc. | Photoresist and redeposition removal using carbon dioxide jet spray |
| JPH11111593A (ja) * | 1997-10-01 | 1999-04-23 | Canon Inc | 環境制御装置 |
-
1999
- 1999-01-15 US US09/231,737 patent/US6313953B1/en not_active Expired - Lifetime
-
2000
- 2000-01-05 JP JP2000593991A patent/JP2002535703A/ja active Pending
- 2000-01-05 WO PCT/US2000/000214 patent/WO2000042475A1/en not_active Ceased
- 2000-01-05 KR KR1020017008836A patent/KR100649386B1/ko not_active Expired - Fee Related
- 2000-01-05 EP EP00902325A patent/EP1153336B1/en not_active Expired - Lifetime
- 2000-01-05 CN CN00802807A patent/CN1337014A/zh active Pending
- 2000-01-05 AT AT00902325T patent/ATE337573T1/de not_active IP Right Cessation
- 2000-01-05 AU AU24061/00A patent/AU2406100A/en not_active Abandoned
- 2000-01-05 DE DE60030254T patent/DE60030254T2/de not_active Expired - Lifetime