JP2002529876A - 切換電圧を高めた強誘電体メモリ - Google Patents
切換電圧を高めた強誘電体メモリInfo
- Publication number
- JP2002529876A JP2002529876A JP2000580214A JP2000580214A JP2002529876A JP 2002529876 A JP2002529876 A JP 2002529876A JP 2000580214 A JP2000580214 A JP 2000580214A JP 2000580214 A JP2000580214 A JP 2000580214A JP 2002529876 A JP2002529876 A JP 2002529876A
- Authority
- JP
- Japan
- Prior art keywords
- ferroelectric
- line
- memory
- voltage
- integrated circuit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000015654 memory Effects 0.000 title claims abstract description 275
- 239000003990 capacitor Substances 0.000 claims abstract description 99
- 239000000463 material Substances 0.000 claims abstract description 22
- 238000006073 displacement reaction Methods 0.000 claims abstract description 10
- 238000000034 method Methods 0.000 claims description 36
- 230000004044 response Effects 0.000 claims description 7
- 230000010287 polarization Effects 0.000 abstract description 33
- 238000007599 discharging Methods 0.000 abstract 1
- 230000005684 electric field Effects 0.000 description 13
- 230000008569 process Effects 0.000 description 11
- 238000010586 diagram Methods 0.000 description 9
- 230000006870 function Effects 0.000 description 7
- 230000000694 effects Effects 0.000 description 5
- 230000008901 benefit Effects 0.000 description 4
- 230000008859 change Effects 0.000 description 3
- 229910052797 bismuth Inorganic materials 0.000 description 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000001960 triggered effect Effects 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 241000219492 Quercus Species 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- VNSWULZVUKFJHK-UHFFFAOYSA-N [Sr].[Bi] Chemical compound [Sr].[Bi] VNSWULZVUKFJHK-UHFFFAOYSA-N 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- 230000004941 influx Effects 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000006386 memory function Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
- G11C11/22—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using ferroelectric elements
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Dram (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/184,474 | 1998-11-02 | ||
| US09/184,474 US6031754A (en) | 1998-11-02 | 1998-11-02 | Ferroelectric memory with increased switching voltage |
| PCT/US1999/025662 WO2000026919A1 (en) | 1998-11-02 | 1999-11-02 | Ferroelectric memory with increased switching voltage |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002529876A true JP2002529876A (ja) | 2002-09-10 |
| JP2002529876A5 JP2002529876A5 (enExample) | 2006-12-21 |
Family
ID=22677028
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000580214A Pending JP2002529876A (ja) | 1998-11-02 | 1999-11-02 | 切換電圧を高めた強誘電体メモリ |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US6031754A (enExample) |
| EP (1) | EP1127354A1 (enExample) |
| JP (1) | JP2002529876A (enExample) |
| WO (1) | WO2000026919A1 (enExample) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004319057A (ja) * | 2003-04-17 | 2004-11-11 | Micronics Internatl Co Ltd | 強誘電体メモリへの過剰駆動アクセス方法と強誘電体記憶装置 |
| JPWO2004077441A1 (ja) * | 2003-02-27 | 2006-06-08 | 富士通株式会社 | 半導体記憶装置 |
| JP2013214345A (ja) * | 2012-03-05 | 2013-10-17 | Fujitsu Semiconductor Ltd | 不揮発性ラッチ回路及びメモリ装置 |
| CN109074840A (zh) * | 2016-03-18 | 2018-12-21 | 美光科技公司 | 铁电存储器单元感测 |
| JP2019518300A (ja) * | 2016-04-05 | 2019-06-27 | マイクロン テクノロジー,インク. | 強誘電体メモリセルからの電荷抽出 |
| JP2019522863A (ja) * | 2016-06-27 | 2019-08-15 | マイクロン テクノロジー,インク. | 強誘電体メモリの中のマルチレベルストレージ |
| KR20200081504A (ko) * | 2017-12-19 | 2020-07-07 | 마이크론 테크놀로지, 인크. | 메모리 감지를 위한 전류 분리 |
Families Citing this family (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100324594B1 (ko) | 1999-06-28 | 2002-02-16 | 박종섭 | 강유전체 메모리 장치 |
| US6658608B1 (en) * | 1999-09-21 | 2003-12-02 | David A. Kamp | Apparatus and method for testing ferroelectric memories |
| JP2001319472A (ja) | 2000-05-10 | 2001-11-16 | Toshiba Corp | 半導体記憶装置 |
| US7030435B2 (en) * | 2000-08-24 | 2006-04-18 | Cova Technologies, Inc. | Single transistor rare earth manganite ferroelectric nonvolatile memory cell |
| US6587365B1 (en) * | 2000-08-31 | 2003-07-01 | Micron Technology, Inc. | Array architecture for depletion mode ferroelectric memory devices |
| US6515889B1 (en) * | 2000-08-31 | 2003-02-04 | Micron Technology, Inc. | Junction-isolated depletion mode ferroelectric memory |
| US20020164850A1 (en) | 2001-03-02 | 2002-11-07 | Gnadinger Alfred P. | Single transistor rare earth manganite ferroelectric nonvolatile memory cell |
| KR100425160B1 (ko) | 2001-05-28 | 2004-03-30 | 주식회사 하이닉스반도체 | 불휘발성 강유전체 메모리 장치의 승압전압 발생회로 및그 발생방법 |
| JP3646791B2 (ja) | 2001-10-19 | 2005-05-11 | 沖電気工業株式会社 | 強誘電体メモリ装置およびその動作方法 |
| US6825517B2 (en) | 2002-08-28 | 2004-11-30 | Cova Technologies, Inc. | Ferroelectric transistor with enhanced data retention |
| US6714435B1 (en) | 2002-09-19 | 2004-03-30 | Cova Technologies, Inc. | Ferroelectric transistor for storing two data bits |
| US6888736B2 (en) | 2002-09-19 | 2005-05-03 | Cova Technologies, Inc. | Ferroelectric transistor for storing two data bits |
| US6876590B2 (en) | 2002-11-20 | 2005-04-05 | Infineon Technologies, Ag | 2T2C signal margin test mode using a defined charge exchange between BL and/BL |
| US6826099B2 (en) * | 2002-11-20 | 2004-11-30 | Infineon Technologies Ag | 2T2C signal margin test mode using a defined charge and discharge of BL and /BL |
| US7082046B2 (en) * | 2003-02-27 | 2006-07-25 | Fujitsu Limited | Semiconductor memory device and method of reading data |
| WO2004077442A1 (ja) * | 2003-02-27 | 2004-09-10 | Fujitsu Limited | 半導体記憶装置及びデータ読み出し方法 |
| KR100682366B1 (ko) | 2005-02-03 | 2007-02-15 | 후지쯔 가부시끼가이샤 | 반도체 기억 장치 및 데이터 판독 방법 |
| US8477550B2 (en) * | 2010-05-05 | 2013-07-02 | Stmicroelectronics International N.V. | Pass-gated bump sense amplifier for embedded drams |
| US9378788B2 (en) * | 2012-03-15 | 2016-06-28 | Intel Corporation | Negative bitline write assist circuit and method for operating the same |
| US9070432B2 (en) * | 2013-11-12 | 2015-06-30 | Taiwan Semiconductor Manufacturing Co., Ltd. | Negative bitline boost scheme for SRAM write-assist |
| CN107004443A (zh) | 2014-08-22 | 2017-08-01 | 阿拉克瑞蒂半导体公司 | 用于存储器编程的方法和设备 |
| US9886991B1 (en) | 2016-09-30 | 2018-02-06 | Micron Technology, Inc. | Techniques for sensing logic values stored in memory cells using sense amplifiers that are selectively isolated from digit lines |
| US11127449B2 (en) | 2018-04-25 | 2021-09-21 | Micron Technology, Inc. | Sensing a memory cell |
| US10607676B2 (en) * | 2018-04-25 | 2020-03-31 | Micron Technology, Inc. | Sensing a memory cell |
| US10847201B2 (en) | 2019-02-27 | 2020-11-24 | Kepler Computing Inc. | High-density low voltage non-volatile differential memory bit-cell with shared plate line |
| US11476260B2 (en) | 2019-02-27 | 2022-10-18 | Kepler Computing Inc. | High-density low voltage non-volatile memory with unidirectional plate-line and bit-line and pillar capacitor |
| US11527277B1 (en) | 2021-06-04 | 2022-12-13 | Kepler Computing Inc. | High-density low voltage ferroelectric memory bit-cell |
| US11696451B1 (en) | 2021-11-01 | 2023-07-04 | Kepler Computing Inc. | Common mode compensation for non-linear polar material based 1T1C memory bit-cell |
| US11482270B1 (en) | 2021-11-17 | 2022-10-25 | Kepler Computing Inc. | Pulsing scheme for a ferroelectric memory bit-cell to minimize read or write disturb effect and refresh logic |
| US12108609B1 (en) | 2022-03-07 | 2024-10-01 | Kepler Computing Inc. | Memory bit-cell with stacked and folded planar capacitors |
| US20230395134A1 (en) | 2022-06-03 | 2023-12-07 | Kepler Computing Inc. | Write disturb mitigation for non-linear polar material based multi-capacitor bit-cell |
| US12347476B1 (en) | 2022-12-27 | 2025-07-01 | Kepler Computing Inc. | Apparatus and method to improve sensing noise margin in a non-linear polar material based bit-cell |
| US12334127B2 (en) | 2023-01-30 | 2025-06-17 | Kepler Computing Inc. | Non-linear polar material based multi-capacitor high density bit-cell |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL214049A (enExample) * | 1956-02-07 | |||
| US4873664A (en) * | 1987-02-12 | 1989-10-10 | Ramtron Corporation | Self restoring ferroelectric memory |
| US4888733A (en) * | 1988-09-12 | 1989-12-19 | Ramtron Corporation | Non-volatile memory cell and sensing method |
| JPH088339B2 (ja) * | 1988-10-19 | 1996-01-29 | 株式会社東芝 | 半導体メモリ |
| US5198706A (en) * | 1991-10-15 | 1993-03-30 | National Semiconductor | Ferroelectric programming cell for configurable logic |
| US5523964A (en) * | 1994-04-07 | 1996-06-04 | Symetrix Corporation | Ferroelectric non-volatile memory unit |
| US5406510A (en) * | 1993-07-15 | 1995-04-11 | Symetrix Corporation | Non-volatile memory |
| US5424975A (en) * | 1993-12-30 | 1995-06-13 | Micron Technology, Inc. | Reference circuit for a non-volatile ferroelectric memory |
| US5487030A (en) * | 1994-08-26 | 1996-01-23 | Hughes Aircraft Company | Ferroelectric interruptible read memory |
| JP3672954B2 (ja) * | 1994-12-26 | 2005-07-20 | 株式会社ルネサステクノロジ | 半導体記憶装置 |
| JP2937254B2 (ja) * | 1996-04-25 | 1999-08-23 | 日本電気株式会社 | 強誘電体メモリの修復方法 |
| JP2939973B2 (ja) * | 1996-06-06 | 1999-08-25 | 日本電気株式会社 | 不揮発性半導体メモリ装置の駆動方法 |
-
1998
- 1998-11-02 US US09/184,474 patent/US6031754A/en not_active Expired - Fee Related
-
1999
- 1999-11-02 WO PCT/US1999/025662 patent/WO2000026919A1/en not_active Ceased
- 1999-11-02 EP EP99956834A patent/EP1127354A1/en not_active Withdrawn
- 1999-11-02 JP JP2000580214A patent/JP2002529876A/ja active Pending
Cited By (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPWO2004077441A1 (ja) * | 2003-02-27 | 2006-06-08 | 富士通株式会社 | 半導体記憶装置 |
| JP2004319057A (ja) * | 2003-04-17 | 2004-11-11 | Micronics Internatl Co Ltd | 強誘電体メモリへの過剰駆動アクセス方法と強誘電体記憶装置 |
| US7394678B2 (en) | 2003-04-17 | 2008-07-01 | Macronix International Co., Ltd. | Over-driven access method and device for ferroelectric memory |
| US7453714B2 (en) | 2003-04-17 | 2008-11-18 | Macronix International Co., Ltd. | Over-driven access method and device for ferroelectric memory |
| US7548445B2 (en) | 2003-04-17 | 2009-06-16 | Macronix International Co., Ltd. | Over-driven access method and device for ferroelectric memory |
| JP2013214345A (ja) * | 2012-03-05 | 2013-10-17 | Fujitsu Semiconductor Ltd | 不揮発性ラッチ回路及びメモリ装置 |
| CN109074840A (zh) * | 2016-03-18 | 2018-12-21 | 美光科技公司 | 铁电存储器单元感测 |
| JP2019515408A (ja) * | 2016-03-18 | 2019-06-06 | マイクロン テクノロジー,インク. | 強誘電体メモリ・セル検知 |
| US11475934B2 (en) | 2016-03-18 | 2022-10-18 | Micron Technology, Inc. | Ferroelectric memory cell sensing |
| CN109074840B (zh) * | 2016-03-18 | 2022-08-19 | 美光科技公司 | 铁电存储器单元感测 |
| US11322191B2 (en) | 2016-04-05 | 2022-05-03 | Micron Technology, Inc. | Charge extraction from ferroelectric memory cell |
| US11087816B2 (en) | 2016-04-05 | 2021-08-10 | Micron Technology, Inc. | Charge extraction from ferroelectric memory cell |
| JP2019518300A (ja) * | 2016-04-05 | 2019-06-27 | マイクロン テクノロジー,インク. | 強誘電体メモリセルからの電荷抽出 |
| US11017832B2 (en) | 2016-06-27 | 2021-05-25 | Micron Technology, Inc. | Multi-level storage in ferroelectric memory |
| JP2019522863A (ja) * | 2016-06-27 | 2019-08-15 | マイクロン テクノロジー,インク. | 強誘電体メモリの中のマルチレベルストレージ |
| US11848042B2 (en) | 2016-06-27 | 2023-12-19 | Micron Technology, Inc. | Multi-level storage in ferroelectric memory |
| JP2021507443A (ja) * | 2017-12-19 | 2021-02-22 | マイクロン テクノロジー,インク. | メモリ検知のための電流分離 |
| KR102352778B1 (ko) | 2017-12-19 | 2022-01-19 | 마이크론 테크놀로지, 인크. | 메모리 감지를 위한 전류 분리 |
| KR20200081504A (ko) * | 2017-12-19 | 2020-07-07 | 마이크론 테크놀로지, 인크. | 메모리 감지를 위한 전류 분리 |
| US11670353B2 (en) | 2017-12-19 | 2023-06-06 | Micron Technology, Inc. | Current separation for memory sensing |
Also Published As
| Publication number | Publication date |
|---|---|
| US6031754A (en) | 2000-02-29 |
| EP1127354A1 (en) | 2001-08-29 |
| WO2000026919A1 (en) | 2000-05-11 |
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