JP2002523902A - パワートランジスタ装置 - Google Patents
パワートランジスタ装置Info
- Publication number
- JP2002523902A JP2002523902A JP2000566891A JP2000566891A JP2002523902A JP 2002523902 A JP2002523902 A JP 2002523902A JP 2000566891 A JP2000566891 A JP 2000566891A JP 2000566891 A JP2000566891 A JP 2000566891A JP 2002523902 A JP2002523902 A JP 2002523902A
- Authority
- JP
- Japan
- Prior art keywords
- temperature
- sensor
- cell
- array
- cells
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims abstract description 26
- 238000001514 detection method Methods 0.000 claims abstract description 22
- 230000001413 cellular effect Effects 0.000 claims abstract description 20
- 239000004065 semiconductor Substances 0.000 claims abstract description 18
- 239000004020 conductor Substances 0.000 claims description 16
- 230000008878 coupling Effects 0.000 claims description 11
- 238000010168 coupling process Methods 0.000 claims description 11
- 238000005859 coupling reaction Methods 0.000 claims description 11
- 238000010438 heat treatment Methods 0.000 claims description 7
- 210000004027 cell Anatomy 0.000 description 177
- 238000004519 manufacturing process Methods 0.000 description 11
- 230000002093 peripheral effect Effects 0.000 description 11
- 238000000034 method Methods 0.000 description 7
- 230000035945 sensitivity Effects 0.000 description 5
- 230000008859 change Effects 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 210000003850 cellular structure Anatomy 0.000 description 3
- 230000001419 dependent effect Effects 0.000 description 3
- 239000002131 composite material Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 230000008901 benefit Effects 0.000 description 1
- 210000003888 boundary cell Anatomy 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000010259 detection of temperature stimulus Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 230000031070 response to heat Effects 0.000 description 1
- 230000004043 responsiveness Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D89/00—Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/64—Double-diffused metal-oxide semiconductor [DMOS] FETs
- H10D30/66—Vertical DMOS [VDMOS] FETs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D12/00—Bipolar devices controlled by the field effect, e.g. insulated-gate bipolar transistors [IGBT]
- H10D12/411—Insulated-gate bipolar transistors [IGBT]
- H10D12/441—Vertical IGBTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/124—Shapes, relative sizes or dispositions of the regions of semiconductor bodies or of junctions between the regions
- H10D62/126—Top-view geometrical layouts of the regions or the junctions
- H10D62/127—Top-view geometrical layouts of the regions or the junctions of cellular field-effect devices, e.g. multicellular DMOS transistors or IGBTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/101—Integrated devices comprising main components and built-in components, e.g. IGBT having built-in freewheel diode
- H10D84/141—VDMOS having built-in components
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D89/00—Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
- H10D89/10—Integrated device layouts
- H10D89/105—Integrated device layouts adapted for thermal considerations
Landscapes
- Semiconductor Integrated Circuits (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB9818044.1 | 1998-08-20 | ||
| GBGB9818044.1A GB9818044D0 (en) | 1998-08-20 | 1998-08-20 | Power transistor device |
| PCT/EP1999/005776 WO2000011720A1 (en) | 1998-08-20 | 1999-08-06 | Power transistor device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002523902A true JP2002523902A (ja) | 2002-07-30 |
| JP2002523902A5 JP2002523902A5 (enExample) | 2006-10-12 |
Family
ID=10837485
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000566891A Pending JP2002523902A (ja) | 1998-08-20 | 1999-08-06 | パワートランジスタ装置 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US6144085A (enExample) |
| EP (1) | EP1048077A1 (enExample) |
| JP (1) | JP2002523902A (enExample) |
| KR (1) | KR100664332B1 (enExample) |
| GB (1) | GB9818044D0 (enExample) |
| WO (1) | WO2000011720A1 (enExample) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005322781A (ja) * | 2004-05-10 | 2005-11-17 | Mitsubishi Electric Corp | 半導体装置 |
| JP2007234850A (ja) * | 2006-03-01 | 2007-09-13 | Mitsubishi Electric Corp | 半導体装置 |
| CN106558583A (zh) * | 2015-09-30 | 2017-04-05 | 瑞萨电子株式会社 | 半导体装置 |
| CN108291843A (zh) * | 2015-11-26 | 2018-07-17 | 罗伯特·博世有限公司 | 具有第一温度测量元件的半导体构件以及用于确定流过半导体构件的电流的方法 |
| JP2018120930A (ja) * | 2017-01-24 | 2018-08-02 | トヨタ自動車株式会社 | 半導体装置 |
Families Citing this family (37)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6855985B2 (en) * | 2002-09-29 | 2005-02-15 | Advanced Analogic Technologies, Inc. | Modular bipolar-CMOS-DMOS analog integrated circuit & power transistor technology |
| JP3783707B2 (ja) | 2003-03-19 | 2006-06-07 | セイコーエプソン株式会社 | 検査素子付基板並びに電気光学装置用基板及び電気光学装置及び電子機器 |
| DE10317466A1 (de) * | 2003-04-16 | 2004-12-09 | Robert Bosch Gmbh | Elektromotor |
| US7187053B2 (en) * | 2003-06-26 | 2007-03-06 | International Business Machines Corporation | Thermal sensing method and system |
| DE102004021393B4 (de) * | 2004-04-30 | 2006-06-14 | Infineon Technologies Ag | Feldeffekt-Leistungstransistor |
| US8120135B2 (en) * | 2004-05-19 | 2012-02-21 | Infineon Technologies Ag | Transistor |
| DE102004063946B4 (de) * | 2004-05-19 | 2018-03-22 | Infineon Technologies Ag | Transistoranordnungen mit einer in einem Trennungstrench angeordneten Elektrode |
| DE102004024887B4 (de) * | 2004-05-19 | 2012-01-26 | Infineon Technologies Ag | Transistor mit Zellenfeld, Temperatursensor und Isolationsstruktur |
| DE102004026233B4 (de) * | 2004-05-28 | 2015-02-12 | Infineon Technologies Ag | Trenchtransistor |
| TWI242334B (en) * | 2004-06-02 | 2005-10-21 | Microelectronics Tech Inc | Receiver signal strength indicator (RSSI) having automatic output detection circuit |
| JP5080721B2 (ja) * | 2004-09-22 | 2012-11-21 | 株式会社リコー | 半導体装置及びその半導体装置を使用したボルテージレギュレータ |
| EP1875501A1 (en) * | 2005-04-13 | 2008-01-09 | Freescale Semiconductor, Inc. | Protection of an integrated circuit and method therefor |
| US7655944B1 (en) * | 2005-06-03 | 2010-02-02 | The United States Of America As Represented By The Secretary Of The Army | Systems and methods for estimating thermal resistance of field effect transistor structures |
| US7800171B2 (en) * | 2006-10-13 | 2010-09-21 | Infineon Technologies Austria Ag | Integrated circuit including a semiconductor device |
| DE102007020249B4 (de) * | 2007-04-30 | 2015-01-08 | Infineon Technologies Austria Ag | Halbleiterbauelement, Halbleitersensorstruktur sowie Vorrichtung und Verfahren zum Herstellen eines Halbleiterbauelement |
| JP4357546B2 (ja) * | 2007-06-07 | 2009-11-04 | 株式会社東芝 | 半導体装置 |
| US7734440B2 (en) * | 2007-10-31 | 2010-06-08 | Agere Systems Inc. | On-chip over-temperature detection |
| US8203315B2 (en) * | 2008-09-30 | 2012-06-19 | Infineon Technologies Ag | System and method for temperature based control of a power semiconductor circuit |
| US20110051302A1 (en) | 2009-08-27 | 2011-03-03 | Infineon Technologies Ag | Integrated power device and method |
| US8848330B2 (en) * | 2011-07-29 | 2014-09-30 | Infineon Technologies Austria Ag | Circuit with a temperature protected electronic switch |
| CN103426916B (zh) | 2012-05-14 | 2018-12-04 | 恩智浦美国有限公司 | 功率mosfet结构及方法 |
| CN103489862B (zh) | 2012-06-12 | 2018-05-22 | 恩智浦美国有限公司 | 功率mosfet电流传感结构和方法 |
| US10819101B2 (en) * | 2017-02-20 | 2020-10-27 | Microsemi Corporation | Over-current protection apparatus and method |
| DE102019102929B3 (de) | 2019-02-06 | 2020-07-09 | Infineon Technologies Ag | Intelligenter Halbleiterschalter |
| DE102019119973B3 (de) | 2019-07-24 | 2021-01-21 | Infineon Technologies Ag | Intelligenter elektronischer schalter |
| DE102019119975B3 (de) | 2019-07-24 | 2021-01-21 | Infineon Technologies Ag | Intelligenter elektronischer schalter |
| DE102019119972B3 (de) | 2019-07-24 | 2021-01-21 | Infineon Technologies Ag | Intelligenter elektronischer schalter |
| DE102019121685B4 (de) | 2019-08-12 | 2021-03-04 | Infineon Technologies Ag | Intelligenter elektronischer schalter |
| DE102019121726A1 (de) | 2019-08-13 | 2021-02-18 | Infineon Technologies Ag | Intelligenter halbleiterschalter |
| DE102019121794A1 (de) | 2019-08-13 | 2021-02-18 | Infineon Technologies Ag | Intelligenter elektronischer schalter |
| DE102019121795B4 (de) | 2019-08-13 | 2022-01-20 | Infineon Technologies Ag | Intelligenter elektronischer schalter |
| DE102020122571B4 (de) | 2020-08-28 | 2023-03-30 | Infineon Technologies Ag | Intelligenter elektronischer schalter |
| US10972088B1 (en) | 2020-09-01 | 2021-04-06 | Infineon Technologies Ag | Temperature detection of a power switch based on paired measurements of current and voltage |
| US11378614B2 (en) | 2020-09-01 | 2022-07-05 | Infineon Technologies Ag | Temperature detection of power switch using modulation of driver output impedance |
| DE102020123149A1 (de) | 2020-09-04 | 2022-03-10 | Infineon Technologies Ag | Ansteuerschaltung für elektronischen schalter |
| US20220357211A1 (en) * | 2021-05-05 | 2022-11-10 | Mediatek Inc. | Integration friendly thermal sensor |
| DE102022115099B4 (de) | 2022-06-15 | 2025-05-22 | Infineon Technologies Ag | Intelligenter halbleiterschalter |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01268065A (ja) * | 1988-04-19 | 1989-10-25 | Nec Corp | 縦型電界効果トランジスタ |
| JPH04273030A (ja) * | 1990-09-24 | 1992-09-29 | Philips Gloeilampenfab:Nv | 温度検出回路 |
| JPH05198846A (ja) * | 1991-07-19 | 1993-08-06 | Philips Gloeilampenfab:Nv | 温度感知装置およびこの装置を用いる温度感知回路 |
| JPH0758293A (ja) * | 1993-08-18 | 1995-03-03 | Hitachi Ltd | 絶縁ゲート型半導体装置およびそれを用いた駆動回路装置ならびに電子システム |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4783690A (en) * | 1983-09-06 | 1988-11-08 | General Electric Company | Power semiconductor device with main current section and emulation current section |
| US4931844A (en) * | 1988-03-09 | 1990-06-05 | Ixys Corporation | High power transistor with voltage, current, power, resistance, and temperature sensing capability |
| US5444219A (en) * | 1990-09-24 | 1995-08-22 | U.S. Philips Corporation | Temperature sensing device and a temperature sensing circuit using such a device |
| US5336943A (en) * | 1991-07-19 | 1994-08-09 | U.S. Philips Corporation | Temperature sensing circuit |
| US5563437A (en) * | 1992-02-21 | 1996-10-08 | Motorola, Inc. | Semiconductor device having a large sense voltage |
| GB9206058D0 (en) * | 1992-03-20 | 1992-05-06 | Philips Electronics Uk Ltd | A semiconductor switch and a temperature sensing circuit for such a switch |
| GB9513420D0 (en) * | 1995-06-30 | 1995-09-06 | Philips Electronics Uk Ltd | Power semiconductor devices |
| DE19534604C1 (de) * | 1995-09-18 | 1996-10-24 | Siemens Ag | Durch Feldeffekt steuerbares Halbleiterbauelement mit mehreren Temperatursensoren zum Schutz vor Überlastung |
| DE19548060A1 (de) * | 1995-12-21 | 1997-06-26 | Siemens Ag | Durch Feldeffekt steuerbares Leistungs-Halbleiterbauelement mit Temperatursensor |
| JP2000509906A (ja) * | 1997-02-19 | 2000-08-02 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 温度センサ回路を有する出力半導体装置 |
-
1998
- 1998-08-20 GB GBGB9818044.1A patent/GB9818044D0/en not_active Ceased
-
1999
- 1999-08-06 EP EP99944353A patent/EP1048077A1/en not_active Withdrawn
- 1999-08-06 JP JP2000566891A patent/JP2002523902A/ja active Pending
- 1999-08-06 KR KR1020007004159A patent/KR100664332B1/ko not_active Expired - Fee Related
- 1999-08-06 WO PCT/EP1999/005776 patent/WO2000011720A1/en not_active Ceased
- 1999-08-19 US US09/377,359 patent/US6144085A/en not_active Expired - Lifetime
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01268065A (ja) * | 1988-04-19 | 1989-10-25 | Nec Corp | 縦型電界効果トランジスタ |
| JPH04273030A (ja) * | 1990-09-24 | 1992-09-29 | Philips Gloeilampenfab:Nv | 温度検出回路 |
| JPH05198846A (ja) * | 1991-07-19 | 1993-08-06 | Philips Gloeilampenfab:Nv | 温度感知装置およびこの装置を用いる温度感知回路 |
| JPH0758293A (ja) * | 1993-08-18 | 1995-03-03 | Hitachi Ltd | 絶縁ゲート型半導体装置およびそれを用いた駆動回路装置ならびに電子システム |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005322781A (ja) * | 2004-05-10 | 2005-11-17 | Mitsubishi Electric Corp | 半導体装置 |
| JP2007234850A (ja) * | 2006-03-01 | 2007-09-13 | Mitsubishi Electric Corp | 半導体装置 |
| CN106558583A (zh) * | 2015-09-30 | 2017-04-05 | 瑞萨电子株式会社 | 半导体装置 |
| JP2017069412A (ja) * | 2015-09-30 | 2017-04-06 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
| CN106558583B (zh) * | 2015-09-30 | 2021-11-05 | 瑞萨电子株式会社 | 半导体装置 |
| CN108291843A (zh) * | 2015-11-26 | 2018-07-17 | 罗伯特·博世有限公司 | 具有第一温度测量元件的半导体构件以及用于确定流过半导体构件的电流的方法 |
| JP2018536858A (ja) * | 2015-11-26 | 2018-12-13 | ロベルト・ボッシュ・ゲゼルシャフト・ミト・ベシュレンクテル・ハフツングRobert Bosch Gmbh | 第1温度測定素子を備える半導体デバイスおよび半導体デバイスを流れる電流を決定する方法 |
| JP2018120930A (ja) * | 2017-01-24 | 2018-08-02 | トヨタ自動車株式会社 | 半導体装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR100664332B1 (ko) | 2007-01-02 |
| GB9818044D0 (en) | 1998-10-14 |
| KR20010031207A (ko) | 2001-04-16 |
| WO2000011720A1 (en) | 2000-03-02 |
| EP1048077A1 (en) | 2000-11-02 |
| US6144085A (en) | 2000-11-07 |
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