JP2002523707A5 - - Google Patents
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- Publication number
- JP2002523707A5 JP2002523707A5 JP2000567292A JP2000567292A JP2002523707A5 JP 2002523707 A5 JP2002523707 A5 JP 2002523707A5 JP 2000567292 A JP2000567292 A JP 2000567292A JP 2000567292 A JP2000567292 A JP 2000567292A JP 2002523707 A5 JP2002523707 A5 JP 2002523707A5
- Authority
- JP
- Japan
- Prior art keywords
- adsorbent
- gas
- physical
- manufacturing
- metering
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 239000003463 adsorbent Substances 0.000 description 224
- 239000007789 gas Substances 0.000 description 86
- 238000004519 manufacturing process Methods 0.000 description 62
- 238000009826 distribution Methods 0.000 description 57
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 33
- RBFQJDQYXXHULB-UHFFFAOYSA-N arsane Chemical compound [AsH3] RBFQJDQYXXHULB-UHFFFAOYSA-N 0.000 description 27
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 17
- 238000005259 measurement Methods 0.000 description 17
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 16
- 229910002092 carbon dioxide Inorganic materials 0.000 description 16
- 239000001569 carbon dioxide Substances 0.000 description 16
- 229910002091 carbon monoxide Inorganic materials 0.000 description 16
- 238000010438 heat treatment Methods 0.000 description 16
- 238000000034 method Methods 0.000 description 15
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 13
- 238000003860 storage Methods 0.000 description 9
- -1 diborane Chemical compound 0.000 description 8
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 8
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 6
- 229910052799 carbon Inorganic materials 0.000 description 6
- 238000003795 desorption Methods 0.000 description 6
- 229910002090 carbon oxide Inorganic materials 0.000 description 5
- 238000007789 sealing Methods 0.000 description 5
- 238000001179 sorption measurement Methods 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 229910015900 BF3 Inorganic materials 0.000 description 4
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 description 4
- 229910000074 antimony hydride Inorganic materials 0.000 description 4
- 239000011324 bead Substances 0.000 description 4
- 239000011261 inert gas Substances 0.000 description 4
- 238000005468 ion implantation Methods 0.000 description 4
- OUULRIDHGPHMNQ-UHFFFAOYSA-N stibane Chemical compound [SbH3] OUULRIDHGPHMNQ-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- YZCKVEUIGOORGS-OUBTZVSYSA-N Deuterium Chemical compound [2H] YZCKVEUIGOORGS-OUBTZVSYSA-N 0.000 description 2
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 229910052805 deuterium Inorganic materials 0.000 description 2
- UFHFLCQGNIYNRP-OUBTZVSYSA-N deuterium atom Chemical compound [2H][H] UFHFLCQGNIYNRP-OUBTZVSYSA-N 0.000 description 2
- 238000005429 filling process Methods 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 150000004678 hydrides Chemical class 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910000042 hydrogen bromide Inorganic materials 0.000 description 2
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 2
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 2
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 2
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 2
- 229910000043 hydrogen iodide Inorganic materials 0.000 description 2
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- SPVXKVOXSXTJOY-UHFFFAOYSA-N selane Chemical compound [SeH2] SPVXKVOXSXTJOY-UHFFFAOYSA-N 0.000 description 2
- 229910000058 selane Inorganic materials 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 229910000059 tellane Inorganic materials 0.000 description 2
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 2
- PORFVJURJXKREL-UHFFFAOYSA-N trimethylstibine Chemical compound C[Sb](C)C PORFVJURJXKREL-UHFFFAOYSA-N 0.000 description 2
- NXHILIPIEUBEPD-UHFFFAOYSA-H tungsten hexafluoride Chemical compound F[W](F)(F)(F)(F)F NXHILIPIEUBEPD-UHFFFAOYSA-H 0.000 description 2
- 229910015844 BCl3 Inorganic materials 0.000 description 1
- 239000005909 Kieselgur Substances 0.000 description 1
- 229910017843 NF3 Inorganic materials 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 230000000274 adsorptive effect Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910000323 aluminium silicate Inorganic materials 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000002594 sorbent Substances 0.000 description 1
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/143,809 US6083298A (en) | 1994-10-13 | 1998-08-31 | Process for fabricating a sorbent-based gas storage and dispensing system, utilizing sorbent material pretreatment |
| US09/143,809 | 1998-08-31 | ||
| PCT/US1999/019868 WO2000012196A1 (en) | 1998-08-31 | 1999-08-30 | Process for fabricating a sorbent-based gas storage and dispensing system, utilizing sorbent material pretreatment |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010280915A Division JP2011099562A (ja) | 1998-08-31 | 2010-12-16 | 吸着剤前処理を利用した吸着型気体貯蔵及び計量分配システムの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002523707A JP2002523707A (ja) | 2002-07-30 |
| JP2002523707A5 true JP2002523707A5 (enExample) | 2009-11-12 |
Family
ID=22505743
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000567292A Pending JP2002523707A (ja) | 1998-08-31 | 1999-08-30 | 吸着剤前処理を利用した吸着型気体貯蔵及び計量分配システムの製造方法 |
| JP2010280915A Pending JP2011099562A (ja) | 1998-08-31 | 2010-12-16 | 吸着剤前処理を利用した吸着型気体貯蔵及び計量分配システムの製造方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010280915A Pending JP2011099562A (ja) | 1998-08-31 | 2010-12-16 | 吸着剤前処理を利用した吸着型気体貯蔵及び計量分配システムの製造方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US6083298A (enExample) |
| EP (1) | EP1109613A4 (enExample) |
| JP (2) | JP2002523707A (enExample) |
| KR (1) | KR100618072B1 (enExample) |
| AU (1) | AU5904799A (enExample) |
| MY (1) | MY133994A (enExample) |
| TW (1) | TW565467B (enExample) |
| WO (1) | WO2000012196A1 (enExample) |
Families Citing this family (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6083298A (en) * | 1994-10-13 | 2000-07-04 | Advanced Technology Materials, Inc. | Process for fabricating a sorbent-based gas storage and dispensing system, utilizing sorbent material pretreatment |
| US6500238B1 (en) * | 2000-08-10 | 2002-12-31 | Advanced Technology Materials, Inc. | Fluid storage and dispensing system |
| JP2003080019A (ja) * | 2001-09-10 | 2003-03-18 | Morikawa Co Ltd | 吸着された有機化合物の脱着装置および脱着方法 |
| US6592653B2 (en) * | 2001-11-12 | 2003-07-15 | Advanced Technology Materials, Inc. | Fluid storage and delivery system utilizing low heels carbon sorbent medium |
| RU2215688C2 (ru) * | 2001-11-13 | 2003-11-10 | Федеральное государственное унитарное предприятие "Сибирский химический комбинат" | Способ извлечения трифторида бора из газовых смесей |
| US6620225B2 (en) * | 2002-01-10 | 2003-09-16 | Advanced Technology Materials, Inc. | Adsorbents for low vapor pressure fluid storage and delivery |
| US6716271B1 (en) | 2002-10-29 | 2004-04-06 | Advanced Technology Materials, Inc. | Apparatus and method for inhibiting decomposition of germane |
| US6991671B2 (en) * | 2002-12-09 | 2006-01-31 | Advanced Technology Materials, Inc. | Rectangular parallelepiped fluid storage and dispensing vessel |
| DE10306344B8 (de) * | 2003-02-15 | 2013-11-21 | Pharmpur Gmbh | Gasspeicher zur Speicherung einer vorgegebenen Gasmenge und Freigabe des Gases für eine medizinische Applikation |
| JP2005024068A (ja) * | 2003-07-02 | 2005-01-27 | Toyo Tanso Kk | ハロゲンガス又はハロゲン含有ガスの供給装置 |
| WO2005054742A1 (en) * | 2003-12-03 | 2005-06-16 | Chemviron Carbon Limited | Storage of gases and their use in dispensing fluids |
| US7253413B2 (en) * | 2004-11-15 | 2007-08-07 | Smiths Detection Inc. | Gas identification system |
| KR101297917B1 (ko) | 2005-08-30 | 2013-08-27 | 어드밴스드 테크놀러지 머티리얼즈, 인코포레이티드 | 대안적인 불화 붕소 전구체를 이용한 붕소 이온 주입 방법,및 주입을 위한 대형 수소화붕소의 형성 방법 |
| CN101410164B (zh) * | 2006-01-30 | 2012-05-02 | 高级技术材料公司 | 纳米多孔碳材料,以及利用其的系统和方法 |
| DE202008000810U1 (de) * | 2007-11-04 | 2008-12-24 | BLüCHER GMBH | Sorptionsfiltermaterial |
| US8598022B2 (en) | 2009-10-27 | 2013-12-03 | Advanced Technology Materials, Inc. | Isotopically-enriched boron-containing compounds, and methods of making and using same |
| US8858819B2 (en) | 2010-02-15 | 2014-10-14 | Air Products And Chemicals, Inc. | Method for chemical mechanical planarization of a tungsten-containing substrate |
| CN102091591A (zh) * | 2010-12-29 | 2011-06-15 | 广东工业大学 | 一种硅藻土改性吸附材料及其制备方法和应用 |
| US8679231B2 (en) | 2011-01-19 | 2014-03-25 | Advanced Technology Materials, Inc. | PVDF pyrolyzate adsorbent and gas storage and dispensing system utilizing same |
| US9073005B2 (en) | 2011-06-09 | 2015-07-07 | Sri International | Falling microbead counter-flow process for separating gas mixtures |
| EP3295075A4 (en) * | 2015-05-12 | 2019-03-20 | Entegris, Inc. | VALVE ARRANGEMENTS AND LIQUID STORAGE AND PACKING THEREFORE |
| CN105664662B (zh) * | 2016-03-31 | 2018-07-13 | 威格气体纯化科技(苏州)股份有限公司 | 在线更换吸附材料的净化柱及手套箱 |
| CN111093802B (zh) * | 2017-09-25 | 2021-08-17 | 纽麦特科技公司 | 高反应性气体的吸附剂辅助稳定化 |
| KR102785430B1 (ko) * | 2017-11-17 | 2025-03-21 | 라시크 아이엔씨. | 기재로부터의 프로세스 가스의 저장 및 전달을 위한 방법, 시스템, 및 디바이스 |
| KR102796847B1 (ko) * | 2019-10-17 | 2025-04-15 | 현대자동차주식회사 | 판상 유도 자기장 코일을 이용하는 자기 유도 열 제어 고체 수소 저장 시스템 |
| CN116391090A (zh) * | 2020-10-23 | 2023-07-04 | 恩特格里斯公司 | 具有高纯度输送气体的吸附型储运容器和相关方法 |
| JP7012189B1 (ja) | 2021-09-02 | 2022-01-27 | 東京瓦斯株式会社 | ガス供給方法 |
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1998
- 1998-08-31 US US09/143,809 patent/US6083298A/en not_active Expired - Lifetime
-
1999
- 1999-08-05 TW TW088113376A patent/TW565467B/zh not_active IP Right Cessation
- 1999-08-25 MY MYPI99003632A patent/MY133994A/en unknown
- 1999-08-30 KR KR1020017002536A patent/KR100618072B1/ko not_active Expired - Lifetime
- 1999-08-30 AU AU59047/99A patent/AU5904799A/en not_active Abandoned
- 1999-08-30 JP JP2000567292A patent/JP2002523707A/ja active Pending
- 1999-08-30 WO PCT/US1999/019868 patent/WO2000012196A1/en not_active Ceased
- 1999-08-30 EP EP99946692A patent/EP1109613A4/en not_active Withdrawn
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2010
- 2010-12-16 JP JP2010280915A patent/JP2011099562A/ja active Pending
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