JP2002353568A5 - - Google Patents

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Publication number
JP2002353568A5
JP2002353568A5 JP2001158785A JP2001158785A JP2002353568A5 JP 2002353568 A5 JP2002353568 A5 JP 2002353568A5 JP 2001158785 A JP2001158785 A JP 2001158785A JP 2001158785 A JP2001158785 A JP 2001158785A JP 2002353568 A5 JP2002353568 A5 JP 2002353568A5
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semiconductor laser
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JP2001158785A
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Japanese (ja)
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JP4265875B2 (ja
JP2002353568A (ja
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Priority to JP2001158785A priority Critical patent/JP4265875B2/ja
Priority claimed from JP2001158785A external-priority patent/JP4265875B2/ja
Priority to US10/154,822 priority patent/US6782032B2/en
Publication of JP2002353568A publication Critical patent/JP2002353568A/ja
Publication of JP2002353568A5 publication Critical patent/JP2002353568A5/ja
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JP2001158785A 2001-05-28 2001-05-28 面発光半導体レーザの製造方法 Expired - Fee Related JP4265875B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2001158785A JP4265875B2 (ja) 2001-05-28 2001-05-28 面発光半導体レーザの製造方法
US10/154,822 US6782032B2 (en) 2001-05-28 2002-05-28 Semiconductor laser, ray module using the same and ray communication system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001158785A JP4265875B2 (ja) 2001-05-28 2001-05-28 面発光半導体レーザの製造方法

Publications (3)

Publication Number Publication Date
JP2002353568A JP2002353568A (ja) 2002-12-06
JP2002353568A5 true JP2002353568A5 (https=) 2005-09-08
JP4265875B2 JP4265875B2 (ja) 2009-05-20

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JP2001158785A Expired - Fee Related JP4265875B2 (ja) 2001-05-28 2001-05-28 面発光半導体レーザの製造方法

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US (1) US6782032B2 (https=)
JP (1) JP4265875B2 (https=)

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JP2003152284A (ja) * 2001-11-14 2003-05-23 Fuji Xerox Co Ltd 発光デバイスおよび光伝送装置
JP2004233551A (ja) * 2003-01-29 2004-08-19 Sony Corp 光通信モジュールおよびコネクタ
US7095058B2 (en) * 2003-03-21 2006-08-22 Intel Corporation System and method for an improved light-emitting device
US6973105B2 (en) * 2003-03-21 2005-12-06 Agilent Technologies, Inc. Method and apparatus to enable adaptive equalization at high bandwidths when using single-mode VCSELs over multimode fibers
WO2005031829A1 (ja) * 2003-09-24 2005-04-07 Nec Corporation 清浄処理方法および半導体装置の製造方法
JP4870349B2 (ja) * 2004-01-09 2012-02-08 シャープ株式会社 半導体レーザ装置の製造方法
JP4950432B2 (ja) * 2004-06-11 2012-06-13 株式会社リコー 面発光型半導体レーザ、面発光型半導体レーザアレイ、画像形成装置、光ピックアップ、光送信モジュール、光送受信モジュール及び光通信システム
EP1780849B1 (en) 2004-06-11 2013-01-30 Ricoh Company, Ltd. Surface emitting laser diode and its manufacturing method
CN102983639B (zh) 2005-07-12 2016-01-27 麻省理工学院 无线非辐射能量传递
US7693204B2 (en) 2006-02-03 2010-04-06 Ricoh Company, Ltd. Surface-emitting laser device and surface-emitting laser array including same
US20070181905A1 (en) * 2006-02-07 2007-08-09 Hui-Heng Wang Light emitting diode having enhanced side emitting capability
WO2008078595A1 (ja) * 2006-12-27 2008-07-03 Nec Corporation 面発光レーザ
US7881358B2 (en) 2006-12-27 2011-02-01 Nec Corporation Surface emitting laser
JP2008283028A (ja) * 2007-05-11 2008-11-20 Fuji Xerox Co Ltd 面発光型半導体レーザ、面発光型半導体レーザの製造方法、モジュール、光源装置、情報処理装置、光送信装置、光空間伝送装置および光空間伝送システム。
JP2009021459A (ja) 2007-07-13 2009-01-29 Fuji Xerox Co Ltd 面発光型半導体レーザの駆動方法および光伝送モジュール
US20110122908A1 (en) * 2009-11-24 2011-05-26 Murata Manufacturing Co., Ltd. Surface emitting device
DE102010002204A1 (de) * 2010-02-22 2011-08-25 OSRAM Opto Semiconductors GmbH, 93055 Halbleiterdiode und Verfahren zum Herstellen einer Halbleiterdiode
JP2013243329A (ja) * 2011-07-07 2013-12-05 Ricoh Co Ltd 面発光レーザ素子及び原子発振器
JP2013030505A (ja) * 2011-07-26 2013-02-07 Sumitomo Electric Ind Ltd Iii族窒化物半導体レーザ素子
HK1200602A1 (en) 2011-11-04 2015-08-07 WiTricity公司 Wireless energy transfer modeling tool
US9705283B1 (en) * 2014-05-20 2017-07-11 University Of Central Florida Research Foundation, Inc. Diffused channel semiconductor light sources
JP6700027B2 (ja) * 2015-11-20 2020-05-27 スタンレー電気株式会社 垂直共振器型発光素子
US10483719B2 (en) 2016-07-13 2019-11-19 University Of Central Florida Research Foundation, Inc. Semiconductor devices with depleted heterojunction current blocking regions
US10033156B2 (en) 2016-07-13 2018-07-24 University Of Central Florida Research Foundation, Inc. Low resistance vertical cavity light source with PNPN blocking
JP2018186213A (ja) * 2017-04-27 2018-11-22 スタンレー電気株式会社 垂直共振器型発光素子
KR102515674B1 (ko) * 2018-04-04 2023-03-30 쑤저우 레킨 세미컨덕터 컴퍼니 리미티드 표면 광방출 레이저 소자 및 이를 포함하는 발광장치
US11942762B2 (en) 2018-04-04 2024-03-26 Suzhou Lekin Semiconductor Co., Ltd. Surface-emitting laser device and light emitting device including the same
KR102504307B1 (ko) 2018-06-29 2023-02-28 쑤저우 레킨 세미컨덕터 컴퍼니 리미티드 표면방출발광 레이저소자, 이를 포함하는 발광장치 및 이의 제조방법
US20220209501A1 (en) * 2020-12-31 2022-06-30 Lumentum Operations Llc Multiphase growth sequence for forming a vertical cavity surface emitting laser

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EP0390552B1 (en) * 1989-03-31 1995-12-20 Kabushiki Kaisha Toshiba Method of manufacturing compound semiconductor thin film
US5034958A (en) * 1990-04-19 1991-07-23 Bell Communications Research, Inc. Front-surface emitting diode laser
GB2320609A (en) * 1996-12-21 1998-06-24 Sharp Kk Semiconductor laser device
JP4134366B2 (ja) 1998-01-08 2008-08-20 株式会社日立製作所 面発光レーザ
GB2351390A (en) * 1999-06-16 2000-12-27 Sharp Kk A semiconductor material comprising two dopants

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