JP2002241121A - 細孔を有する構造体の製造方法 - Google Patents

細孔を有する構造体の製造方法

Info

Publication number
JP2002241121A
JP2002241121A JP2001200895A JP2001200895A JP2002241121A JP 2002241121 A JP2002241121 A JP 2002241121A JP 2001200895 A JP2001200895 A JP 2001200895A JP 2001200895 A JP2001200895 A JP 2001200895A JP 2002241121 A JP2002241121 A JP 2002241121A
Authority
JP
Japan
Prior art keywords
substrate
producing
solution
pores
surfactant
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001200895A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002241121A5 (enExample
Inventor
Yoshinori Ogawa
美紀 小川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2001200895A priority Critical patent/JP2002241121A/ja
Priority to US09/910,886 priority patent/US20020041932A1/en
Publication of JP2002241121A publication Critical patent/JP2002241121A/ja
Publication of JP2002241121A5 publication Critical patent/JP2002241121A5/ja
Pending legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
    • B01J20/28—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof characterised by their form or physical properties
    • B01J20/28054—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof characterised by their form or physical properties characterised by their surface properties or porosity
    • B01J20/28078—Pore diameter
    • B01J20/28083—Pore diameter being in the range 2-50 nm, i.e. mesopores
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
    • B01J20/02—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material
    • B01J20/10—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material comprising silica or silicate
    • B01J20/103—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material comprising silica or silicate comprising silica
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J21/00—Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
    • B01J21/06—Silicon, titanium, zirconium or hafnium; Oxides or hydroxides thereof
    • B01J21/08—Silica
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J29/00—Catalysts comprising molecular sieves
    • B01J29/03—Catalysts comprising molecular sieves not having base-exchange properties
    • B01J29/0308—Mesoporous materials not having base exchange properties, e.g. Si-MCM-41
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J35/00—Catalysts, in general, characterised by their form or physical properties
    • B01J35/60—Catalysts, in general, characterised by their form or physical properties characterised by their surface properties or porosity
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2229/00—Aspects of molecular sieve catalysts not covered by B01J29/00
    • B01J2229/60—Synthesis on support
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J35/00—Catalysts, in general, characterised by their form or physical properties
    • B01J35/60—Catalysts, in general, characterised by their form or physical properties characterised by their surface properties or porosity
    • B01J35/64—Pore diameter
    • B01J35/651—50-500 nm

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Analytical Chemistry (AREA)
  • Nanotechnology (AREA)
  • Dispersion Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Silicates, Zeolites, And Molecular Sieves (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Silicon Compounds (AREA)
  • Ink Jet (AREA)
JP2001200895A 2000-07-25 2001-07-02 細孔を有する構造体の製造方法 Pending JP2002241121A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2001200895A JP2002241121A (ja) 2000-07-25 2001-07-02 細孔を有する構造体の製造方法
US09/910,886 US20020041932A1 (en) 2000-07-25 2001-07-24 Method of preparing porous materials

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2000223642 2000-07-25
JP2000-223642 2000-07-25
JP2000-382545 2000-12-15
JP2000382545 2000-12-15
JP2001200895A JP2002241121A (ja) 2000-07-25 2001-07-02 細孔を有する構造体の製造方法

Publications (2)

Publication Number Publication Date
JP2002241121A true JP2002241121A (ja) 2002-08-28
JP2002241121A5 JP2002241121A5 (enExample) 2004-11-25

Family

ID=27344159

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001200895A Pending JP2002241121A (ja) 2000-07-25 2001-07-02 細孔を有する構造体の製造方法

Country Status (2)

Country Link
US (1) US20020041932A1 (enExample)
JP (1) JP2002241121A (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004091318A (ja) * 2002-08-09 2004-03-25 Canon Inc 金属酸化物を含有する膜及びその製造方法
JP2007045701A (ja) * 2005-07-14 2007-02-22 Toyota Central Res & Dev Lab Inc 球状シリカ系メソ多孔体の製造方法
JP2008044825A (ja) * 2006-08-18 2008-02-28 Mitsubishi Electric Corp ナノ多孔質材料の形成方法
JP2009149514A (ja) * 2003-08-08 2009-07-09 Canon Inc 構造体及びその製造方法
JP2019145792A (ja) * 2013-12-17 2019-08-29 東京エレクトロン株式会社 基板への周期的オルガノシリケートまたは自己組織化モノレイヤのスピンオンコーティングのためのシステムおよび方法

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060110424A1 (en) * 2000-03-24 2006-05-25 Lyles Mark B Ceramic and metal compositions
EP1689824B1 (en) * 2003-11-21 2016-10-12 BrisMat Inc. Silica films and method of production thereof
US8734906B2 (en) * 2003-11-21 2014-05-27 Brismat Inc. Films and method of production thereof
US7642199B2 (en) * 2004-11-22 2010-01-05 Xerocoat Inc. Silica and silica-like films and method of production
JP4708861B2 (ja) * 2005-05-25 2011-06-22 キヤノン株式会社 電界効果型トランジスタの製造方法
JP5156256B2 (ja) * 2007-04-17 2013-03-06 花王株式会社 メソポーラスシリカ膜
WO2012038457A1 (en) * 2010-09-23 2012-03-29 Nanolith Sverige Ab Manufacture of structures comprising silicon dioxide on a surface
CN102408251B (zh) * 2011-07-25 2013-03-27 重庆文理学院 一种低介电常数介孔氧化硅薄膜材料的制备方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5858457A (en) * 1997-09-25 1999-01-12 Sandia Corporation Process to form mesostructured films

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004091318A (ja) * 2002-08-09 2004-03-25 Canon Inc 金属酸化物を含有する膜及びその製造方法
JP2009149514A (ja) * 2003-08-08 2009-07-09 Canon Inc 構造体及びその製造方法
JP2007045701A (ja) * 2005-07-14 2007-02-22 Toyota Central Res & Dev Lab Inc 球状シリカ系メソ多孔体の製造方法
JP2008044825A (ja) * 2006-08-18 2008-02-28 Mitsubishi Electric Corp ナノ多孔質材料の形成方法
JP2019145792A (ja) * 2013-12-17 2019-08-29 東京エレクトロン株式会社 基板への周期的オルガノシリケートまたは自己組織化モノレイヤのスピンオンコーティングのためのシステムおよび方法

Also Published As

Publication number Publication date
US20020041932A1 (en) 2002-04-11

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