JP5253248B2 - 構造体及びその製造方法 - Google Patents
構造体及びその製造方法 Download PDFInfo
- Publication number
- JP5253248B2 JP5253248B2 JP2009060688A JP2009060688A JP5253248B2 JP 5253248 B2 JP5253248 B2 JP 5253248B2 JP 2009060688 A JP2009060688 A JP 2009060688A JP 2009060688 A JP2009060688 A JP 2009060688A JP 5253248 B2 JP5253248 B2 JP 5253248B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- substrate
- plane
- silica
- confirmed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B37/00—Compounds having molecular sieve properties but not having base-exchange properties
- C01B37/02—Crystalline silica-polymorphs, e.g. silicalites dealuminated aluminosilicate zeolites
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24273—Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
- Y10T428/24322—Composite web or sheet
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
- Y10T428/24496—Foamed or cellular component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
- Y10T428/249967—Inorganic matrix in void-containing component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
- Y10T428/249967—Inorganic matrix in void-containing component
- Y10T428/249969—Of silicon-containing material [e.g., glass, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
Description
[非特許文献4]Chemistry of Materials誌第11巻1609頁
面内X線回折分析では、図3に示すように、面間隔7.64nmと3.79nmに回折線が確認された。これらの回折線は、入射X線の基板面投影成分がラビング方向に平行になるような初期配置で測定した場合には強度が小さいが、その両者が直交するような初期配置で測定した場合には強度が大きいことが確かめられ、格子面の配向に面内の強い異方性があることが確認された。
アセトン、エタノール、純水で洗浄し、オゾンで表面をクリーニングした石英基板ガラスを、そのままで使用し、実施例1で示した手順に従って、シリカメソ構造体の膜を作製した。この工程で、基板上には透明な連続膜が形成されていた。
12 構造体
13 細孔又は両親媒性分子の集合体
14 膜面に垂直な6回対称軸
15 膜面に垂直な6回対称軸を含む構造の対称反射面
Claims (2)
- 両親媒性分子の球状の集合体と前記分子の集合体の周囲に形成された無機物を含む化合物とを備える構造体の製造方法であって、
表面に分子の配向による異方性を有する基板と、無機の化合物を含み両親媒性分子が球状ミセルを形成するモル濃度の溶液を用意する工程と、
前記基板を前記溶液中に保持することにより、前記基板上に前記構造体を形成する工程とを有することを特徴とする構造体の製造方法。 - 両親媒性分子の球状の集合体と前記分子の集合体の周囲に形成された無機物を含む化合物とを備える構造体の製造方法であって、
表面に分子の配向による異方性を有する基板と、無機の化合物を含み両親媒性分子が球状ミセルを形成するモル濃度の溶液を用意する工程と、
前記基板に前記溶液を付与することにより、前記基板上に前記構造体を形成する工程とを有することを特徴とする構造体の製造方法。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009060688A JP5253248B2 (ja) | 2003-08-08 | 2009-03-13 | 構造体及びその製造方法 |
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003290535 | 2003-08-08 | ||
JP2003290535 | 2003-08-08 | ||
JP2004029350 | 2004-02-05 | ||
JP2004029350 | 2004-02-05 | ||
JP2009060688A JP5253248B2 (ja) | 2003-08-08 | 2009-03-13 | 構造体及びその製造方法 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004228084A Division JP4298605B2 (ja) | 2003-08-08 | 2004-08-04 | メソ構造体膜、メソポーラス物質膜及びその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009149514A JP2009149514A (ja) | 2009-07-09 |
JP5253248B2 true JP5253248B2 (ja) | 2013-07-31 |
Family
ID=34137941
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009060688A Expired - Fee Related JP5253248B2 (ja) | 2003-08-08 | 2009-03-13 | 構造体及びその製造方法 |
Country Status (3)
Country | Link |
---|---|
US (1) | US7618703B2 (ja) |
JP (1) | JP5253248B2 (ja) |
WO (1) | WO2005014480A1 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9622834B2 (en) | 1995-06-02 | 2017-04-18 | Ormco Corporation | Custom orthodontic appliance forming method and apparatus |
US10011050B2 (en) | 2011-10-12 | 2018-07-03 | Ormco Corporation | Fabrication of an orthodontic aligner from a negative mold designed by a computational device |
US10383704B2 (en) | 2011-10-12 | 2019-08-20 | Ormco Corporation | Direct manufacture of orthodontic aligner appliance |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4708861B2 (ja) * | 2005-05-25 | 2011-06-22 | キヤノン株式会社 | 電界効果型トランジスタの製造方法 |
US20110198214A1 (en) * | 2008-12-04 | 2011-08-18 | Canon Kabushiki Kaisha | Mesoporous silica film and process for production thereof |
US8722428B2 (en) * | 2009-11-25 | 2014-05-13 | University Of Maryland, Baltimore County | Metal enhanced fluorescence from metallic nanoburger structures |
JP5606226B2 (ja) * | 2009-11-30 | 2014-10-15 | キヤノン株式会社 | X線モノクロメータ及びx線分光装置 |
EP2571607A4 (en) * | 2010-05-21 | 2016-12-21 | Adrian Brozell | SURFACE ASSISTING SURFACE STRUCTURES |
WO2013078464A1 (en) | 2011-11-22 | 2013-05-30 | Znano Llc | Self-assembled surfactant structures |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2006A (en) * | 1841-03-16 | Clamp for crimping leather | ||
US6329017B1 (en) * | 1998-12-23 | 2001-12-11 | Battelle Memorial Institute | Mesoporous silica film from a solution containing a surfactant and methods of making same |
JP4250287B2 (ja) * | 1999-01-07 | 2009-04-08 | キヤノン株式会社 | シリカメソ構造体の製造方法 |
JP3587373B2 (ja) * | 1999-09-10 | 2004-11-10 | キヤノン株式会社 | メソ構造体薄膜及びその製造方法 |
JP2002241121A (ja) * | 2000-07-25 | 2002-08-28 | Canon Inc | 細孔を有する構造体の製造方法 |
JP2002338229A (ja) * | 2001-05-10 | 2002-11-27 | Canon Inc | シリカメソ構造体薄膜、メソポーラスシリカ薄膜、シリカメソ構造体薄膜の製造方法及びメソポーラスシリカ薄膜の製造方法 |
JP4497863B2 (ja) * | 2002-08-09 | 2010-07-07 | キヤノン株式会社 | 金属酸化物を含有する膜及びその製造方法 |
-
2004
- 2004-08-05 US US10/544,109 patent/US7618703B2/en not_active Expired - Fee Related
- 2004-08-05 WO PCT/JP2004/011582 patent/WO2005014480A1/en active Application Filing
-
2009
- 2009-03-13 JP JP2009060688A patent/JP5253248B2/ja not_active Expired - Fee Related
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9622834B2 (en) | 1995-06-02 | 2017-04-18 | Ormco Corporation | Custom orthodontic appliance forming method and apparatus |
US10011050B2 (en) | 2011-10-12 | 2018-07-03 | Ormco Corporation | Fabrication of an orthodontic aligner from a negative mold designed by a computational device |
US10383704B2 (en) | 2011-10-12 | 2019-08-20 | Ormco Corporation | Direct manufacture of orthodontic aligner appliance |
Also Published As
Publication number | Publication date |
---|---|
WO2005014480A1 (en) | 2005-02-17 |
US7618703B2 (en) | 2009-11-17 |
JP2009149514A (ja) | 2009-07-09 |
US20060204758A1 (en) | 2006-09-14 |
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